JPS6391156U - - Google Patents

Info

Publication number
JPS6391156U
JPS6391156U JP18721386U JP18721386U JPS6391156U JP S6391156 U JPS6391156 U JP S6391156U JP 18721386 U JP18721386 U JP 18721386U JP 18721386 U JP18721386 U JP 18721386U JP S6391156 U JPS6391156 U JP S6391156U
Authority
JP
Japan
Prior art keywords
ion beam
ion
irradiating
extracting
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18721386U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18721386U priority Critical patent/JPS6391156U/ja
Publication of JPS6391156U publication Critical patent/JPS6391156U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例のイオン注入装置の
概略構成を示す側面図、第2図は同平面図、第3
図はウエハにイオンビームを注入する状態を示す
ウエハデイスクの正面図、第4図は同側面図であ
る。 1……イオン源部、2……質量分析電磁石、6
……ウエハ、b……イオンビーム。
FIG. 1 is a side view showing a schematic configuration of an ion implantation apparatus according to an embodiment of the present invention, FIG. 2 is a plan view of the same, and FIG.
The figure is a front view of the wafer disk showing a state in which an ion beam is implanted into a wafer, and FIG. 4 is a side view of the same. 1...Ion source part, 2...Mass analysis electromagnet, 6
...Wafer, b...Ion beam.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] イオンビームをそれぞれ発生する複数台のイオ
ン源部と、所望の質量のイオンビームを取り出す
質量分析電磁石と、前記イオンビームをウエハ側
に照射させる垂直および水平電極板とを備えたこ
とを特徴とするイオン注入装置。
It is characterized by comprising a plurality of ion source units each generating an ion beam, a mass analysis electromagnet for extracting an ion beam of a desired mass, and vertical and horizontal electrode plates for irradiating the ion beam onto the wafer side. Ion implanter.
JP18721386U 1986-12-04 1986-12-04 Pending JPS6391156U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18721386U JPS6391156U (en) 1986-12-04 1986-12-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18721386U JPS6391156U (en) 1986-12-04 1986-12-04

Publications (1)

Publication Number Publication Date
JPS6391156U true JPS6391156U (en) 1988-06-13

Family

ID=31137486

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18721386U Pending JPS6391156U (en) 1986-12-04 1986-12-04

Country Status (1)

Country Link
JP (1) JPS6391156U (en)

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