JPS6387723A - Bubbler container - Google Patents
Bubbler containerInfo
- Publication number
- JPS6387723A JPS6387723A JP23403886A JP23403886A JPS6387723A JP S6387723 A JPS6387723 A JP S6387723A JP 23403886 A JP23403886 A JP 23403886A JP 23403886 A JP23403886 A JP 23403886A JP S6387723 A JPS6387723 A JP S6387723A
- Authority
- JP
- Japan
- Prior art keywords
- bubbler
- air
- valves
- valve
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011344 liquid material Substances 0.000 claims description 7
- 238000007599 discharging Methods 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 17
- 239000012808 vapor phase Substances 0.000 description 14
- 238000010586 diagram Methods 0.000 description 11
- 239000012159 carrier gas Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔概要〕
本発明は半導体の気相エピタキシャル成長に使用するバ
ブラ容器の交換時における空気の混入を防ぐため、前記
容器の開閉用バルブに加えて、容器のガス流入、流出側
にそれぞれ三方バルブを設け、これらを連結して内部に
滞留している空気の除去を行うようにしたものである。[Detailed Description of the Invention] [Summary] In order to prevent air from entering when replacing a bubbler container used for semiconductor vapor phase epitaxial growth, the present invention provides a valve for opening and closing the container, as well as a valve for gas inflow and outflow of the container. A three-way valve is provided on each side, and these are connected to remove air stagnant inside.
本発明は半導体の気相エピタキシャル成長に用いるバブ
ラ容器の改良に関するものである。The present invention relates to improvements in bubbler containers used for vapor phase epitaxial growth of semiconductors.
半導体の気相エピタキシャル成長ではオキシ塩化燐<p
oc >などの塩素化合物やトリメチルガリウム(T
MG )などの有機金属を用いている。これらは室温で
液体であり、水素などのキャリアガスを通じることによ
って飽和蒸気を得、気体として用いており、この気体の
作製にバブラ容器が用いられている。In the vapor phase epitaxial growth of semiconductors, phosphorus oxychloride <p
oc > and other chlorine compounds and trimethylgallium (T
Organic metals such as MG) are used. These are liquids at room temperature, and saturated vapor is obtained by passing a carrier gas such as hydrogen and used as a gas, and a bubbler container is used to produce this gas.
かかるバブラ容器を交換する時、外部より流入した空気
が配管内に滞留し、その空気中の酸素がバブラに収納さ
れているpoc13やTMGを酸化して高品質なエピタ
キシャル膜が得られないこととなる。そこで、配管内に
滞留した空気を容易に除去することができる構造を持っ
たバブラ容器が必要とされている。When replacing such a bubbler container, air flowing in from the outside stays in the piping, and the oxygen in the air oxidizes poc13 and TMG stored in the bubbler, making it impossible to obtain a high-quality epitaxial film. Become. Therefore, there is a need for a bubbler container having a structure that can easily remove the air accumulated in the piping.
第4図は従来のバブラ容器の模式図、第5図は従来のバ
ブラ容器の動作説明のための模式図を示している。FIG. 4 is a schematic diagram of a conventional bubbler container, and FIG. 5 is a schematic diagram for explaining the operation of the conventional bubbler container.
第4図において、従来のバブラ容器は、pocZ3やT
MGの液状材料6を収納するバブラ5と、バブラ5の流
入口5−1および流出口5−2に接続された配管16お
よび17と、該配管16および17の開。In Figure 4, conventional bubbler containers include pocZ3 and T.
The bubbler 5 that stores the MG liquid material 6, the pipes 16 and 17 connected to the inlet 5-1 and the outlet 5-2 of the bubbler 5, and the pipes 16 and 17 are opened.
閉を行う開閉バルブ3および4と、開閉バルブ3および
4の入力端および出力端に配管を介して設けられた継手
1aおよび2aとより構成されている。It is comprised of on-off valves 3 and 4 that close, and joints 1a and 2a provided at the input and output ends of the on-off valves 3 and 4 via piping.
このバブラ容器は、第5図に示すように、継手1aおよ
び2aに対応した継手1bおよび2bに接続され、それ
ぞれ配管と空気作動バルブ7および8に接続され、空気
作動バルブ7は外部に設けられた図示しないガス流入装
置と、空気作動バルブ8は図示しない気相エピタキシャ
ル成長装置に接続されている。また、継手1bと2bと
の間に空気作動バルブ9を設けている。As shown in FIG. 5, this bubbler container is connected to fittings 1b and 2b corresponding to fittings 1a and 2a, and connected to piping and air-operated valves 7 and 8, respectively, with air-operated valve 7 provided externally. The gas inlet device (not shown) and the air-operated valve 8 are connected to a vapor phase epitaxial growth device (not shown). Furthermore, an air-operated valve 9 is provided between the joints 1b and 2b.
いま、自然環境の中でバブラ容器を交換するに際し、継
手1aとIb、継手2aと2bをそれぞれ接続し、外部
に設けられたガス流入装置および気相エピタキシャル成
長装置とバブラ6とを接続する時、各継手から空気が配
管内に流入する。Now, when replacing the bubbler container in a natural environment, when connecting the joints 1a and Ib and the joints 2a and 2b, respectively, and connecting the gas inflow device and vapor phase epitaxial growth device provided outside to the bubbler 6, Air flows into the pipe from each joint.
この場合、開閉バルブ3および4は閉とした状態となっ
ておりバブラ5内への空気の流入は防止されるが、空気
作動バルブ7および8と開閉バルブ3および4間の配管
内には空気が流入する。In this case, the on-off valves 3 and 4 are closed and air is prevented from flowing into the bubbler 5, but there is no air in the piping between the air-operated valves 7 and 8 and the on-off valves 3 and 4. will flow in.
そこで、配管内に流入した空気を除去するため、第5図
に示すように、空気作動バルブ?、8.9を開とし、ガ
ス流入機よりガスを流出して実線矢印で示す回路にガス
を通し、回路中に滞留している空気を外部に放出する。Therefore, in order to remove the air that has entered the pipe, an air-operated valve is installed as shown in Figure 5. , 8.9 is opened, the gas flows out from the gas inflow machine and passes through the circuit shown by the solid line arrow, and the air stagnant in the circuit is discharged to the outside.
上記の空気除去が完了後、空気作動バルブ9を閉とし、
開閉バルブ3および4を開として第5図の点線矢印で示
す回路を形成し、ガス流入装置から送出された水素など
のキャリアガスをバブラ5内に通してバブラ5内に収納
されているpoc13 あるいはTMGの液体材料6を
気体として取り出し気相エピタキシャル成長を行う。After the above air removal is completed, the air-operated valve 9 is closed,
The on-off valves 3 and 4 are opened to form a circuit shown by the dotted line arrow in FIG. The TMG liquid material 6 is taken out as a gas and vapor phase epitaxial growth is performed.
上記の空気放出方法においては、継手1aおよび2bと
開閉バルブ3および4との間をキャリアガスが流れない
ため、この間の管内に滞留する空気は容易には放出する
ことができない欠点がある。In the above air release method, since the carrier gas does not flow between the joints 1a and 2b and the on-off valves 3 and 4, there is a drawback that the air remaining in the pipes between them cannot be easily released.
この空気が滞留したままの状態で気相エピタキシャル成
長を行うとバブラ5に収納されている液状材料6が空気
中の酸素で酸化され、良質なエピタキシャル膜が得られ
ないといった問題がある。If vapor phase epitaxial growth is performed while this air remains stagnant, the liquid material 6 stored in the bubbler 5 will be oxidized by oxygen in the air, resulting in a problem that a good quality epitaxial film cannot be obtained.
本発明はこのような点に鑑みて創作されたもので、バブ
ラ容器の交換時に容器内に流入した空気を容易に外部に
放出することができる構造を持ったバブラ容器を提供す
ることを目的としている。The present invention was created in view of these points, and an object of the present invention is to provide a bubbler container having a structure that allows air flowing into the container to be easily released to the outside when the bubbler container is replaced. There is.
上記の問題点を解消するため、第1図の本発明のバブラ
容器の模式図に示すように、開閉バルブ3および4とバ
ブラ5の流入口5−1および流出口5−2とを接続する
配管16および17のバブラ5に近い部分にそれぞれ三
方パルプ14および15を設け、該両三方バルブの一端
間を接続した構成としている。In order to solve the above problems, the on-off valves 3 and 4 are connected to the inlet 5-1 and outlet 5-2 of the bubbler 5, as shown in the schematic diagram of the bubbler container of the present invention in FIG. Three-way pulps 14 and 15 are provided in the pipes 16 and 17 near the bubbler 5, respectively, and one ends of both three-way valves are connected.
これによって、第2図の実線矢印で示すような、継手1
b、]、]a−開閉バルプ3−三方バルプ14三方バル
ブ15−開閉バルブ4−継手2a、2bの空気放出回路
を形成している。As a result, the joint 1 as shown by the solid arrow in FIG.
b,],]a-opening/closing valve 3-three-way valve 14 three-way valve 15-opening/closing valve 4-joints 2a, 2b form an air release circuit.
ガス流入装置からガスを放出し、上記形成された空気放
出回路にガスを通すことによって、従来問題とされた継
手1aおよび2bと開閉バルブ3および4との間に滞留
する空気も容易に外部に放出することができる。By releasing gas from the gas inflow device and passing the gas through the air release circuit formed above, the air that remains between the joints 1a and 2b and the on-off valves 3 and 4, which has been a problem in the past, can be easily released to the outside. can be released.
第2図は本発明の一実施例のバブラ容器の空気放出動作
を説明するための模式図、第3図は一実施例のバブラ容
器の気相エピタキシャル成長動作を説明するための模式
図であり、説明を容易とするため、第4図および第5図
と同一部位は同−符号をもって示している。FIG. 2 is a schematic diagram for explaining the air release operation of a bubbler container according to an embodiment of the present invention, and FIG. 3 is a schematic diagram for explaining the vapor phase epitaxial growth operation of a bubbler container according to an embodiment. For ease of explanation, the same parts as in FIGS. 4 and 5 are indicated by the same reference numerals.
第2および第3図に示すように、一実施例のバブラ容器
は、液状材料6を収納するバブラ5と・バブラ5の流入
口5−1および流出口5−2に接続された配管16およ
び17と、該配管16および17の開、閉を行う開閉バ
ルブ3および4と、開閉バルブ3および4の入力端およ
び出力端に配管を介して設けられた継手1aおよび2a
とを備えるとともに、開閉バルブ3および4とバブラ5
の流入口5−1および流出口5−2とを接続する配管1
6および17のバブラ5に近い部分にそれぞれ三方バル
ブ14および15を設け、前記両三方バルブの一端間を
接続した構成としている。As shown in FIGS. 2 and 3, the bubbler container of one embodiment includes a bubbler 5 that stores a liquid material 6, a pipe 16 connected to an inlet 5-1 and an outlet 5-2 of the bubbler 5, and 17, on-off valves 3 and 4 that open and close the pipes 16 and 17, and joints 1a and 2a provided at the input and output ends of the on-off valves 3 and 4 via the pipes.
and on-off valves 3 and 4 and a bubbler 5.
Piping 1 connecting the inlet 5-1 and outlet 5-2 of
Three-way valves 14 and 15 are provided at portions 6 and 17 near the bubbler 5, respectively, and one ends of both three-way valves are connected.
このバブラ容器は、継手1aおよび2aに対応した継手
1bおよび2bに接続され、それぞれ配管と空気作動バ
ルブ7および8に接続され、空気作動バルブ7は外部に
設けられた図示しないガス流入装置と、空気作動バルブ
8は図示しない気相エピタキシャル成長装置に接続され
ている。また、継手1bと2bとの間に空気作動バルブ
9が設けられている。This bubbler container is connected to joints 1b and 2b corresponding to joints 1a and 2a, and connected to piping and air-operated valves 7 and 8, respectively, and air-operated valve 7 is connected to an externally provided gas inflow device (not shown). The air-operated valve 8 is connected to a vapor phase epitaxial growth apparatus (not shown). Additionally, an air-operated valve 9 is provided between the joints 1b and 2b.
一実施例のバブラ容器の空気放出動作を第2図を参照し
て説明する。The air releasing operation of the bubbler container of one embodiment will be explained with reference to FIG.
空気放出時は、三方バルブ14と15は接続状態、開閉
バルブ3.4および空気作動バルブ7.8は開、空気作
動バルブ9は閉となり、実線矢印で示すような、空気作
動バルブ7−継手1b、1a−開閉バルブ3−三方バル
ブ14−三方バルブ15−開閉バルブ4−継手2a、2
b−空気作動バルブ8の空気放出回路が形成される。When air is released, the three-way valves 14 and 15 are in a connected state, the on-off valve 3.4 and the air-operated valve 7.8 are open, and the air-operated valve 9 is closed, and the air-operated valve 7-joint is closed as shown by the solid arrow. 1b, 1a - Opening/closing valve 3 - Three-way valve 14 - Three-way valve 15 - Opening/closing valve 4 - Joints 2a, 2
b- An air release circuit of the air-operated valve 8 is formed.
いま、ガス流出装置よりガスを放出して前記形成された
空気放出回路を通すことにより、空気放出回路の配管内
の空気をガスと共に外部に放出する。Now, by discharging gas from the gas discharging device and passing it through the formed air discharging circuit, the air in the piping of the air discharging circuit is discharged to the outside together with the gas.
一実施例のバブラ容器の気相エピタキシャル成長動作を
第3図を参照して説明する。The vapor phase epitaxial growth operation of a bubbler container in one embodiment will be explained with reference to FIG.
第3図において、三方バルブ14.15間の接続は断、
開閉バルブ3,4および空気作動バルブ7゜8は開、空
気作動バルブ9は閉となり、点線矢印で示すような、空
気作動バルブ7−11!手1b、la −開閉バルブ3
−三方バルブ14−バブラ5−三方バルブ15−開閉バ
ルブ4−継手2a、2b−空気作動バルブ8の気相エピ
タキシャル成長回路が形成される。In Figure 3, the connection between three-way valves 14 and 15 is disconnected;
The on-off valves 3 and 4 and the air-operated valve 7°8 are open, and the air-operated valve 9 is closed, as shown by the dotted arrow, the air-operated valve 7-11! Hand 1b, la - Open/close valve 3
A vapor phase epitaxial growth circuit of - three-way valve 14 - bubbler 5 - three-way valve 15 - opening/closing valve 4 - joints 2a, 2b - air-operated valve 8 is formed.
ガス流出装置から送出された水素などのキャリアガスは
、第3図点線矢印で示すように、気相エピタキシャル成
長回路を通ってバブラ5内に至り・バブラ5内に収納さ
れているpoc173やTMGの液体材料6を気体とし
て取り出し気相エピタキシャル成長を行う。Carrier gas such as hydrogen sent out from the gas outflow device passes through the vapor phase epitaxial growth circuit and reaches the bubbler 5, as shown by the dotted line arrow in Figure 3, and the liquid of POC173 and TMG stored in the bubbler 5. The material 6 is taken out as a gas and vapor phase epitaxial growth is performed.
以上説明したように本発明によれば、バブラの人、出力
端の近い部分にそれぞれ三方バルブを設け、前記両三方
バルブの一端間を接続した構成としたことによって、バ
ブラ容器の交換時に容器の配管内に滞留した空気を容易
に外部に放出することが可能となり、高品質の気相エピ
タキシャル成長を行うことができる。As explained above, according to the present invention, three-way valves are provided in the bubbler near the person and the output end, and one end of both the three-way valves are connected, so that when the bubbler container is replaced, the container is removed. It becomes possible to easily release the air accumulated in the pipe to the outside, and high-quality vapor phase epitaxial growth can be performed.
第1図は本発明のバブラ容器の模式図、第2図は本発明
の一実施例のバブラ容器の空気放出動作を説明するため
の模式図、
第3図は一実施例のバブラ容器の気相エピタキシャル成
長動作を説明するための模式図、第4図は従来のバブラ
容器の模式図、
第5図は従来のバブラ容器の動作説明のための模式図で
ある。
図において、1a、1b、2a、2bは継手、3.4は
開閉バルブ、5はバブラ、5−1および5−2はバブラ
の流入口および流出口、6は液体材料、7,8゜9は空
気作動バルブ、14.15は三方バルブ、16.17は
配管をそれぞれ示している。
−情ごpfJq/ずブラメ;器褐、ffl、本gエプタ
代シャ1し〜1trt1作談醪しを−の挨弐に
第3図
ぐ疋、1xlr7−ル廖蔦−ノ黄式閃
第4図
<1J−sノV−フ′ルコミ;シ1+グ1>ff6リイ
nr:sp才itm第5図Fig. 1 is a schematic diagram of a bubbler container of the present invention, Fig. 2 is a schematic diagram for explaining the air release operation of a bubbler container of an embodiment of the invention, and Fig. 3 is a schematic diagram of a bubbler container of an embodiment of the invention. FIG. 4 is a schematic diagram for explaining the operation of phase epitaxial growth, FIG. 4 is a schematic diagram of a conventional bubbler container, and FIG. 5 is a schematic diagram for explaining the operation of a conventional bubbler container. In the figure, 1a, 1b, 2a, 2b are joints, 3.4 is an on-off valve, 5 is a bubbler, 5-1 and 5-2 are inlets and outlets of the bubbler, 6 is a liquid material, 7,8°9 14.15 shows a three-way valve, and 16.17 shows a pipe. -Compassion pfJq/Zuburame; Kiyan, ffl, Book G Epta Dynasty Sha 1 ~ 1 trt 1 Story Melting - Greetings, Figure 3, 1 Figure 1
Claims (1)
5)へのガス流入およびガス流出用の配管(16、17
)とを備えたバブラ容器において、前記ガス流入および
流出用配管(16、17)のそれぞれに三方バルブ(1
4、15)を設け、該両三方バルブ(14、15)の一
端間を接続したことを特徴とするバブラ容器。A bubbler (5) that stores a liquid material (6), and a bubbler (5) that stores a liquid material (6);
5) for gas inflow and gas outflow piping (16, 17)
), each of the gas inflow and outflow pipes (16, 17) is provided with a three-way valve (1
4, 15), and one ends of both the three-way valves (14, 15) are connected.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23403886A JPS6387723A (en) | 1986-09-30 | 1986-09-30 | Bubbler container |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23403886A JPS6387723A (en) | 1986-09-30 | 1986-09-30 | Bubbler container |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6387723A true JPS6387723A (en) | 1988-04-19 |
Family
ID=16964591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23403886A Pending JPS6387723A (en) | 1986-09-30 | 1986-09-30 | Bubbler container |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6387723A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0362921A (en) * | 1989-07-31 | 1991-03-19 | Matsushita Electric Ind Co Ltd | Vapor growth apparatus for organic metal |
US8002247B2 (en) * | 2008-08-22 | 2011-08-23 | Air Products And Chemicals, Inc. | Cross purge valve and container assembly |
CN104154418A (en) * | 2013-05-13 | 2014-11-19 | 上海鸿辉光通科技股份有限公司 | High-purity phosphorus oxychloride feeding steel cylinder |
-
1986
- 1986-09-30 JP JP23403886A patent/JPS6387723A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0362921A (en) * | 1989-07-31 | 1991-03-19 | Matsushita Electric Ind Co Ltd | Vapor growth apparatus for organic metal |
US8002247B2 (en) * | 2008-08-22 | 2011-08-23 | Air Products And Chemicals, Inc. | Cross purge valve and container assembly |
CN104154418A (en) * | 2013-05-13 | 2014-11-19 | 上海鸿辉光通科技股份有限公司 | High-purity phosphorus oxychloride feeding steel cylinder |
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