JPS638402B2 - - Google Patents

Info

Publication number
JPS638402B2
JPS638402B2 JP52119699A JP11969977A JPS638402B2 JP S638402 B2 JPS638402 B2 JP S638402B2 JP 52119699 A JP52119699 A JP 52119699A JP 11969977 A JP11969977 A JP 11969977A JP S638402 B2 JPS638402 B2 JP S638402B2
Authority
JP
Japan
Prior art keywords
light
mask
wafer
optical system
objective lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52119699A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5453562A (en
Inventor
Akyoshi Suzuki
Ichiro Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP11969977A priority Critical patent/JPS5453562A/ja
Priority to DE19782843282 priority patent/DE2843282A1/de
Priority to US05/948,776 priority patent/US4251129A/en
Publication of JPS5453562A publication Critical patent/JPS5453562A/ja
Publication of JPS638402B2 publication Critical patent/JPS638402B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11969977A 1977-10-05 1977-10-05 Photoelectric detector Granted JPS5453562A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP11969977A JPS5453562A (en) 1977-10-05 1977-10-05 Photoelectric detector
DE19782843282 DE2843282A1 (de) 1977-10-05 1978-10-04 Fotoelektrische erfassungsvorrichtung
US05/948,776 US4251129A (en) 1977-10-05 1978-10-05 Photoelectric detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11969977A JPS5453562A (en) 1977-10-05 1977-10-05 Photoelectric detector

Publications (2)

Publication Number Publication Date
JPS5453562A JPS5453562A (en) 1979-04-26
JPS638402B2 true JPS638402B2 (Direct) 1988-02-23

Family

ID=14767873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11969977A Granted JPS5453562A (en) 1977-10-05 1977-10-05 Photoelectric detector

Country Status (1)

Country Link
JP (1) JPS5453562A (Direct)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5624504A (en) * 1979-08-06 1981-03-09 Canon Inc Photoelectric detector
JPS5989420A (ja) * 1982-11-15 1984-05-23 Canon Inc 位置合わせ装置
JPS5999304A (ja) * 1982-11-30 1984-06-08 Asahi Optical Co Ltd 顕微鏡系のレーザ光による比較測長装置
JPS59125009A (ja) * 1982-12-29 1984-07-19 Fujitsu Ltd パタ−ン検知法
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
JPS60261138A (ja) * 1984-06-08 1985-12-24 Canon Inc 位置合わせ装置
US4652134A (en) * 1984-08-28 1987-03-24 Lsi Logic Corporation Mask alignment system
JPH079500B2 (ja) * 1985-04-04 1995-02-01 株式会社ニコン アライメント光学装置
JPH0715366B2 (ja) * 1985-08-13 1995-02-22 株式会社ニコン 物体位置検出光学装置
JPH0785466B2 (ja) * 1986-07-04 1995-09-13 キヤノン株式会社 位置合せ装置
JPH0787175B2 (ja) * 1986-09-19 1995-09-20 キヤノン株式会社 露光方法
JPS62216231A (ja) * 1987-01-24 1987-09-22 Nippon Kogaku Kk <Nikon> アライメント装置
WO1988007695A1 (en) * 1987-03-27 1988-10-06 The Board Of Trustees Of The Leland Stanford Junio Scanning confocal optical microscope

Also Published As

Publication number Publication date
JPS5453562A (en) 1979-04-26

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