JPS637264A - Manufacture of ceramics parts - Google Patents
Manufacture of ceramics partsInfo
- Publication number
- JPS637264A JPS637264A JP15043686A JP15043686A JPS637264A JP S637264 A JPS637264 A JP S637264A JP 15043686 A JP15043686 A JP 15043686A JP 15043686 A JP15043686 A JP 15043686A JP S637264 A JPS637264 A JP S637264A
- Authority
- JP
- Japan
- Prior art keywords
- container
- media
- materials
- polishing
- grinding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 238000005498 polishing Methods 0.000 claims abstract description 46
- 239000000126 substance Substances 0.000 claims abstract description 4
- 239000006061 abrasive grain Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 abstract description 58
- 239000007788 liquid Substances 0.000 abstract description 27
- 238000000227 grinding Methods 0.000 abstract description 10
- 238000005530 etching Methods 0.000 abstract description 9
- 239000002245 particle Substances 0.000 abstract 5
- 239000000243 solution Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000003756 stirring Methods 0.000 description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- -1 sialon Chemical compound 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Devices For Post-Treatments, Processing, Supply, Discharge, And Other Processes (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はセラミックス焼結体に研摩加工を行なうセラミ
ックス部品の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing ceramic parts in which a ceramic sintered body is polished.
[従来の技術]
セラミックスは機械的強度、高温強度などに優れている
ために、近年機械購造部品などの各分野に広く用いられ
ている。[Prior Art] Ceramics have been widely used in various fields such as machine parts in recent years because of their excellent mechanical strength and high-temperature strength.
従来、このセラミックスからなる部品を製造する場合に
、セラミックス焼結体からなる素材を用意し、この素材
に研削加工と施して部品を1個づつ個別に削シ出す方法
が多く採用され゛ている。Conventionally, when manufacturing parts made of ceramics, a method has often been adopted in which a material made of a sintered ceramic body is prepared, and this material is subjected to grinding processing to produce individual parts one by one. .
例えばセラミックスの使れた高温強度を利用して、高温
下で回転運動する回転体を支持する玉軸受に用いる球体
がセラミックスによシ形成されている。For example, by taking advantage of the high-temperature strength of ceramics, ceramics are used to form spheres used in ball bearings that support rotating bodies that rotate under high temperatures.
そして、従来このセラミックスからなる球体を製造する
方法として、セラミックス焼結体からなる棒状の素材を
用意し、この素材の一部を研削加工にて各々球形に形成
した後に素材から分離して球体に成形する方法が採用さ
れている。Conventionally, the method for manufacturing spheres made of ceramics is to prepare a rod-shaped material made of sintered ceramics, grind a part of this material to form each sphere, and then separate it from the material and make it into a sphere. A molding method is used.
[発明が解決しようとする問題点]
しかしながら、前述した従来のセラミックス部品の製造
方法では、研削加工によシ素材から1個づつ部品を削シ
出すものであるから、加工に手間を要し加工能率が悪い
という問題がある。[Problems to be Solved by the Invention] However, in the conventional manufacturing method of ceramic parts described above, parts are cut out one by one from the raw material by grinding, which requires time and effort. The problem is that it is inefficient.
例えばセラミックスからなる球体を製造するための従来
の方法では、棒状のセラミックス焼結体から球体を1個
づつ球形に加工して分離するものであるから、加工に手
間を要して加工能率が悪いという問題がある。For example, in the conventional method for manufacturing ceramic spheres, each sphere is processed into a spherical shape one by one from a rod-shaped ceramic sintered body and separated, which requires time and effort and has low processing efficiency. There is a problem.
本発明は前記事情に基づいてなされたもので、セラミッ
クスからなる部品を能率良く得ることができる量産性に
富んだセラミックス部品の製造方法を提供することを目
的とする。The present invention has been made based on the above-mentioned circumstances, and an object of the present invention is to provide a method for manufacturing ceramic parts that is highly mass-producible and can efficiently obtain parts made of ceramic.
[問題点を解決するための手段と作用]前記問題点を解
決するために本発明のセラミックス部品の製造方法は、
セラミックス焼結体を、研摩用液および砥粒およびメデ
ィアを入れた容器の中に入れ、セラミックス焼結体、研
摩用液および砥粒およびメディアに運動を与えてセラミ
ックス焼結体を研摩することを特徴とするものである。[Means and effects for solving the problems] In order to solve the above problems, the method for manufacturing ceramic parts of the present invention includes:
A ceramic sintered body is placed in a container containing a polishing liquid, abrasive grains, and media, and the ceramic sintered body is polished by giving motion to the ceramic sintered body, polishing liquid, abrasive grains, and media. This is a characteristic feature.
[実施例コ 以下本発明の製造方法の実施例について説明する。[Example code] Examples of the manufacturing method of the present invention will be described below.
本発明を球体を製造する場合に適用した実施例を第1図
ないし第3図について説明する。なお、この実施例では
横形の回転容器を使用する。この実施例は特に表面粗さ
の少ない仕上加工に適する。An embodiment in which the present invention is applied to manufacturing a sphere will be described with reference to FIGS. 1 to 3. Note that in this embodiment, a horizontal rotating container is used. This embodiment is particularly suitable for finishing with little surface roughness.
まず、第3図(、)で示すように全体に緻密で且つ均質
なセラミ、クスの焼結体からなる立方体形状の素材1を
多数個用意する。セラミックスとしては高温強度に優れ
た窒化けい素、サイアロン、窒化アルミニウム、ジルコ
ニア、アルミナなどを使用する。素材を形成するセラミ
ックス焼結体は、高い緻密性をもたせるためにホットプ
レスにより得たものが好ましい。なかでもホットプレス
された窒化けい素焼給体は強度と靭性に優れている。First, as shown in FIG. 3(,), a large number of cube-shaped materials 1 made of a sintered body of ceramic or clay that is dense and homogeneous throughout are prepared. The ceramics used include silicon nitride, sialon, aluminum nitride, zirconia, and alumina, which have excellent high-temperature strength. The ceramic sintered body forming the raw material is preferably obtained by hot pressing in order to have high density. Among these, hot-pressed silicon nitride heat exchangers have excellent strength and toughness.
素材1は加圧焼結されたセラミックス焼結体の板材から
角棒と切り出し、この角棒を順次立方体形状切断して形
成する。The raw material 1 is formed by cutting out square bars from a pressure-sintered ceramic sintered plate and sequentially cutting the square bars into cube shapes.
次いで、粗加工(バレル加工等)にて角部分を丸くした
のち仕上加工を行なう。すなわち第1図および第2図で
示すように容器2の中に多数の素材1を砥粒およびメデ
ィア3、研摩用液4と一緒に入れ、容器2を回転させて
素材1を球状に研摩して第3図伽)で示す球体1′を得
る。容器2′は例えば両端を閉じた円筒形をなすもので
、両端部に軸2aを有している。また、容器2は水平方
向に沿りて設けられ軸2aを介して軸受(図示せず)に
回転自在に支承され、且つ回転駆動装置(図示せず)に
よシ回転するようになっている。前記砥粒およびメディ
ア3は素材1に研摩加工すなわち機械的研摩を施すため
のもので、砥粒、石塊、石英、砂などを仕上げの程度に
応じて用いる。研摩用液4は素材1を工、チング処理す
なわち腐食溶解させて化学研摩を行なうためのもので、
NaOH溶液やKOH溶液などのP)(9〜11程度の
エツチング液を用いる。なお、容器2の中に入れる割合
は、体積比で例えば素材2:砥粒およびメディア6:研
摩用液2の割合である。Next, the corners are rounded by rough machining (barrel machining, etc.), and then finishing machining is performed. That is, as shown in FIGS. 1 and 2, a large number of materials 1 are placed in a container 2 together with abrasive grains, media 3, and polishing liquid 4, and the container 2 is rotated to polish the materials 1 into a spherical shape. As a result, a sphere 1' shown in Fig. 3 is obtained. The container 2' has, for example, a cylindrical shape with both ends closed, and has shafts 2a at both ends. Further, the container 2 is provided along the horizontal direction, is rotatably supported by a bearing (not shown) via a shaft 2a, and is rotated by a rotational drive device (not shown). . The abrasive grains and media 3 are used to perform abrasive processing, that is, mechanical polishing, on the material 1, and abrasive grains, stone blocks, quartz, sand, etc. are used depending on the degree of finishing. The polishing liquid 4 is for chemically polishing the material 1 by processing, etching, or corroding and dissolving it.
Use an etching solution of about 9 to 11 (P) such as NaOH solution or KOH solution.The ratio of the contents in the container 2 is the volume ratio, for example, the ratio of material 2:abrasive grains and media 6:polishing liquid 2. It is.
そして、回転駆動装置によシ容器2を回転させると、容
器2の中に入れた素材1は砥粒およびメディア3、研摩
用液4が攪拌される。すなわち、容器2の中の素材lと
砥粒およびメディア3との堆積層が容器2の回転ととも
に回転方向へ引き上げられて移動し、ある程度の高さま
で移動すると堆積層の表面部がすベシ落ちて堆積層の下
部と混合する。この繰返しにより攪拌が行なわれる。こ
の攪拌により素材1は砥粒およびメディア3と衝突して
、その表面の凹凸が砥粒およびメディア3によシ削シ取
られ表面が滑らかにされる。すなわち、素材lは研摩加
工される。また、前記攪拌によシ素材1は研摩用液4と
充分接融し、その表面の凹凸が研摩用液4により腐食溶
解され表面が滑らかにされる。すなわち、素材1はエツ
チング処理される。特にこのエツチング処理は素材1の
表面の凹凸を平均化し、表面と滑らかにする上で大変効
果がある。このように砥粒およびメディア3による研摩
加工と研摩用液4による化学研摩の両方を同時に行なう
ために、素材1の角部を効率良く取シ除いて素材1を球
状に形成できるとともに、素材1の表面を効率良く滑ら
かに仕上げて、素材1を第3図(b)で示すように円滑
な球面をもった球体1′に形成できる。すなわち、容器
2の中に入れた多数の素材1を一度にまとめて円滑な球
面を有する球体1′に加工することができる。When the container 2 is rotated by the rotary drive device, the abrasive grains, media 3, and polishing liquid 4 in the material 1 placed in the container 2 are agitated. That is, the deposited layer of the material 1, abrasive grains, and media 3 in the container 2 is pulled up and moved in the rotational direction as the container 2 rotates, and when it moves to a certain height, the surface of the deposited layer completely falls off. Mix with the lower part of the sedimentary layer. Stirring is performed by repeating this process. As a result of this stirring, the material 1 collides with the abrasive grains and the media 3, and the irregularities on the surface of the material 1 are removed by the abrasive grains and the media 3, thereby making the surface smooth. That is, the material 1 is polished. Furthermore, by stirring, the material 1 is sufficiently fused with the polishing liquid 4, and the unevenness on its surface is corroded and dissolved by the polishing liquid 4, and the surface is smoothed. That is, the material 1 is subjected to an etching process. In particular, this etching process is very effective in leveling out the irregularities on the surface of the material 1 and making the surface smooth. In this way, in order to perform both the polishing process using the abrasive grains and media 3 and the chemical polishing using the polishing liquid 4, the corners of the material 1 can be efficiently removed and the material 1 can be formed into a spherical shape. By finishing the surface efficiently and smoothly, the material 1 can be formed into a spherical body 1' having a smooth spherical surface as shown in FIG. 3(b). That is, a large number of raw materials 1 placed in the container 2 can be processed all at once into a spherical body 1' having a smooth spherical surface.
研摩と終了した後は容器10回転を停市し、容器1の中
から球状に形成した多数の素材1すなわち球体1′を取
シ出す。After polishing is completed, the 10 revolutions of the container are stopped and a number of spherical materials 1, ie, spheres 1' are taken out from the container 1.
次に研摩用液として電解液を用いた場合の実施例を第4
図について説明する。なお、第4図にて第1図と同一部
分は同一符号を付している。この実施例では容器2の両
端を直流電源Eに接続する。Next, a fourth example in which an electrolytic solution is used as the polishing solution will be described.
The diagram will be explained. In addition, in FIG. 4, the same parts as in FIG. 1 are given the same reference numerals. In this embodiment, both ends of the container 2 are connected to a DC power source E.
そして、容器2の中に、素材1と砥粒およびメディア3
と一緒に電解液である研摩用液4と入れる。Then, in container 2, material 1, abrasive grains, and media 3 are placed.
Add polishing liquid 4, which is an electrolytic solution, together with the polishing liquid 4.
電解液としては、水酸基(−OH)をもった水酸化ナト
リウム、水酸化カリウム溶液などを用いる。研摩に際し
ては、容器′1を回転して素材1を砥粒およびメディア
3と一緒に回転させて研摩加工を行なう。これと同時に
直流電源Eから容器1に通電すると、高周波電力により
、共振作用が起こシ、表面層が導体化され電解および放
電現象が生じる。As the electrolytic solution, a sodium hydroxide solution, a potassium hydroxide solution, or the like having a hydroxyl group (-OH) is used. During polishing, the container '1 is rotated to rotate the material 1 together with the abrasive grains and media 3 to perform the polishing process. At the same time, when electricity is supplied to the container 1 from the DC power source E, a resonance effect occurs due to the high frequency power, the surface layer becomes conductive, and electrolysis and discharge phenomena occur.
このため、素材1に対しては研摩加工と電解研摩の両方
を同時に行ない、円滑な球面をもつ球体1′を能率良く
形成することができる。Therefore, it is possible to perform both polishing and electrolytic polishing on the material 1 at the same time, thereby efficiently forming the spherical body 1' having a smooth spherical surface.
なお、前述した各実施例において、横形の容器2の内部
に突条体5を設けることにより、容器2の回転中におけ
る素材1および砥粒およびメディア3の運動量を増大し
て研摩加工を効率的に行なわせることができる。すなわ
ち、突条体5は第5図でも示すような断面形状とし、容
器2の軸方向に沿って設けたもので、容器2と一体に回
転移動する。そして、第5図(a)ないしく、)で示す
ように容器2を回転すると、容器2の上部へ移動した素
材1と砥粒およびメディアs’ts突条体5が容器2の
下部から受けとめるために、素材1と砥粒およびメディ
ア3とが容器2の上部から下部へずれ落ちる時期を突条
体5を設けていない場合に比して遅くなり、その遅れ分
だけ素材1と砥粒およびメディア3がずれ落ちる時の運
動量が増大する。従って、素材1が砥粒およびメディア
3と衝突する度合が増大する。また、容器内中の素材、
メディア、砥粒を大きく攪拌する作用もある。これによ
り素材1に対する研摩刀ロエの効率が向上する。In each of the above-described embodiments, by providing the protruding strips 5 inside the horizontal container 2, the momentum of the material 1, abrasive grains, and media 3 during rotation of the container 2 is increased, making the polishing process more efficient. can be made to do so. That is, the protruding strip 5 has a cross-sectional shape as shown in FIG. 5, is provided along the axial direction of the container 2, and rotates integrally with the container 2. Then, when the container 2 is rotated as shown in FIG. Therefore, the timing at which the material 1, abrasive grains, and media 3 fall from the top to the bottom of the container 2 is delayed compared to the case where the protrusions 5 are not provided, and the material 1, abrasive grains, and media 3 fall by the amount of the delay. The amount of momentum when the media 3 slides down increases. Therefore, the degree to which the material 1 collides with the abrasive grains and the media 3 increases. In addition, the material inside the container,
It also has the effect of greatly stirring the media and abrasive grains. This improves the efficiency of the polishing knife Loe on the material 1.
次に縦形の回転容器を用いて球体を製造する場合の実施
例を第6図について説明する。この実施例は、特に粗加
工仕上げに適する。Next, an example in which a sphere is manufactured using a vertical rotating container will be described with reference to FIG. This embodiment is particularly suitable for rough finishing.
この実施例で用いる容器6は、上面を開放した円筒形を
なすもので、この容器6は垂直方向に沿って配置して回
転自在に設けられ、図示しない回転、駆動装置により回
転されるようになっている。The container 6 used in this embodiment has a cylindrical shape with an open top surface, and is arranged vertically so as to be freely rotatable, and is rotated by a rotation and drive device (not shown). It has become.
容器6の上面開放部には蓋7が配置している。この蓋7
は容器6に設けた軸8を挿通させ、高さ調整用コイルば
ね9と軸8に螺合したナツト10によシ保持する。また
容器6の下面郡全体と内周面部全体に夫々砥石11.1
2を設け、さらに蓋7の内面郡全体に砥石13を設ける
。これら砥石11〜13は素材ノを研削加工するための
砥粒として用いるもので、例えばダイヤモンド砥石を使
用する。A lid 7 is placed on the open top of the container 6. This lid 7
A shaft 8 provided in the container 6 is inserted through the container 6, and is held by a height adjusting coil spring 9 and a nut 10 screwed onto the shaft 8. In addition, a grindstone 11.1 is applied to the entire lower surface and the entire inner peripheral surface of the container 6, respectively.
2 is provided, and a grindstone 13 is further provided on the entire inner surface of the lid 7. These grindstones 11 to 13 are used as abrasive grains for grinding the material, and for example, a diamond grindstone is used.
そして、加工と行なう場合には、素材1を研摩用赦4と
一緒に容器6の中に入れる。研摩用液4としては例えば
エツチング液を用いる。容器1を回転させると、容器6
の中に入れた素材1が飛び跳ねて容器6の砥石11.1
2と蓋7の砥石13とに衝突するので、素材1が研削加
工される。この場合、容器6と蓋1とに夫々砥石11〜
13を設けているので、効率良く研削を行なえる。また
、素材1は容器6の中に入れた研摩用液4(エツチング
液)に接触してエツチング加工される。従って、素材1
を効率良く球体に加工できる。When processing is to be carried out, the material 1 is placed into a container 6 together with a polishing tool 4. As the polishing liquid 4, for example, an etching liquid is used. When container 1 is rotated, container 6
The material 1 placed in the container jumps and hits the grindstone 11.1 in the container 6.
2 and the grindstone 13 of the lid 7, the material 1 is ground. In this case, the grindstones 11 to 11 are attached to the container 6 and the lid 1, respectively.
13, grinding can be carried out efficiently. Further, the material 1 is etched by coming into contact with a polishing liquid 4 (etching liquid) placed in a container 6. Therefore, material 1
can be efficiently processed into spheres.
第7図および第8図は縦形の容器と攪拌用羽根車とを組
合せた装置を用いて球体を形成する場合の実施例と示し
ている。図中14は前記容器6と同形の容器で、その下
面部および内周面部に砥石15.16が設けである。こ
の容器14は固定して設けられる。との容器14の内部
には同心的に羽根車17を設ける。この羽根車17はモ
ータ18によシ回転される回転軸19に複数枚の羽根2
0を放射状に取付けたものである。なお、容器14の内
周面部には、円周方向に間隔を存して複数のじゃま板2
1を取付ける。FIGS. 7 and 8 show an example in which a sphere is formed using a device that combines a vertical container and a stirring impeller. In the figure, reference numeral 14 denotes a container having the same shape as the container 6, and grindstones 15 and 16 are provided on the lower surface and inner peripheral surface of the container. This container 14 is fixedly provided. An impeller 17 is provided concentrically inside the container 14. This impeller 17 has a plurality of blades 2 on a rotating shaft 19 rotated by a motor 18.
0 are attached radially. Note that a plurality of baffle plates 2 are provided on the inner peripheral surface of the container 14 at intervals in the circumferential direction.
Install 1.
そして、加工を行なう場合には、素材1と研摩用液4を
容器14の中に入れる。研摩用液4としては例えばエツ
チング液を用いる。そして、モータ18によシ羽根車1
7を回転させると、容器14の中の素材1と研摩用液4
が容器14の円周方向に沿って流れながら攪拌される。When processing is to be carried out, the material 1 and polishing liquid 4 are placed in a container 14. As the polishing liquid 4, for example, an etching liquid is used. Then, the impeller 1 is driven by the motor 18.
When 7 is rotated, the material 1 and polishing liquid 4 in the container 14 are
is stirred while flowing along the circumferential direction of the container 14.
これによシ素材1は容器14の砥石14.15に衝突し
て研削加工され、同時に素材1は研摩用液4により腐食
溶解される。このため、素材1を効率良く球体に加工で
きる。As a result, the material 1 collides with the grindstone 14, 15 of the container 14 and is ground, and at the same time, the material 1 is corroded and dissolved by the polishing liquid 4. Therefore, the material 1 can be efficiently processed into a sphere.
なお、第6図と第7図および第8図で示す各実施例にお
いて、エツチング液に代シ研摩用液4として電解液を使
用し、研摩を行なう時に容器6゜14に直流電流を通電
することにより、素材1に対し放電現象が生じる。この
現象によシ砥石の目づまシを防ぐとともに、研摩作用を
促進する。また、これら各実施例において容器6.14
の中に素材1と一緒に砥粒およびメディア3を入れて研
摩を行なうようにしても良い。In each of the embodiments shown in FIGS. 6, 7, and 8, an electrolytic solution is used as the polishing solution 4 instead of the etching solution, and a direct current is applied to the container 6° 14 during polishing. As a result, a discharge phenomenon occurs in the material 1. This phenomenon prevents the grindstone from becoming clogged and also promotes the polishing action. In addition, in each of these examples, the container 6.14
The polishing may be performed by placing abrasive grains and media 3 together with the material 1 in the holder.
上記の縦型の回転容器による粗仕上加工ののち、横型の
回転容器による仕上加工と施こすと、より表面が平滑な
セラミックス部品を得ることができる。After the rough finishing using the vertical rotating container, finishing processing using the horizontal rotating container is performed, it is possible to obtain a ceramic component with a smoother surface.
さらに、本発明の製造方法はセラミックス焼結体を球形
に加工する場合に限定されず、セラミックス焼結体から
なる部品を製造するに際して、セラミックス焼結体分研
摩する場合に広く適用することができる。Furthermore, the manufacturing method of the present invention is not limited to processing a ceramic sintered body into a spherical shape, but can be widely applied to the case of polishing a ceramic sintered body when manufacturing a part made of a ceramic sintered body. .
[発明の効果]
以上説明したように本発明のセラミックス部品の製造方
法によれば、素材に対して機械的研摩と化学的研摩の両
方を同時に行なうことにより、滑らかな表面をもったセ
ラミックス焼結体からなる部品を能率的に多数製造する
ことができる。[Effects of the Invention] As explained above, according to the method for manufacturing ceramic parts of the present invention, by simultaneously performing both mechanical polishing and chemical polishing on the material, it is possible to sinter ceramics with a smooth surface. It is possible to efficiently manufacture a large number of body parts.
第1図ないし第3図は本発明の製造方法の一実施例を示
し、第1図および第2図は同実施例に用いる容器を示す
縦断面図および横断面図、第3図(a)は素材を示す斜
視図および第3図(b)は球体を示す斜視図、第4図は
他の実施例に用いる容器の縦断面図、第5図(、)〜(
、)は前記各実施例に用いる容器の回転による素材と砥
粒およびメディアの運動を示す説明図、第6図は異なる
他の実施例に用いる容器の断面図、第7図および第8図
はさらに異なる他の実施例に用いる容器を示す断面図お
よび平面図である。
1・・・素材、1′・・・球体、2,6.14・・・容
器、3・・・砥粒およびメディア、4・・・研摩用液。
出願人代理人 弁理士 鈴 江 武 彦第1図
第2図
(a) (b)
第3図
第4図
第7図
第8図1 to 3 show an embodiment of the manufacturing method of the present invention, FIGS. 1 and 2 are longitudinal and transverse sectional views showing a container used in the embodiment, and FIG. 3(a) is a perspective view showing the material, FIG. 3(b) is a perspective view showing a sphere, FIG. 4 is a vertical cross-sectional view of a container used in another example, and FIGS.
, ) is an explanatory diagram showing the movement of the material, abrasive grains, and media due to the rotation of the container used in each of the above embodiments, FIG. 6 is a sectional view of the container used in another different embodiment, and FIGS. 7 and 8 are FIG. 7 is a cross-sectional view and a plan view showing a container used in yet another example. 1... Material, 1'... Sphere, 2, 6.14... Container, 3... Abrasive grains and media, 4... Polishing liquid. Applicant's representative Patent attorney Takehiko Suzue Figure 1 Figure 2 (a) (b) Figure 3 Figure 4 Figure 7 Figure 8
Claims (6)
びメディアを入れた容器の中に入れ、前記セラミックス
焼結体、研摩溶液および砥粒およびメディアに運動を与
えて前記セラミックス焼結体を研摩することを特徴とす
るセラミックス部品の製造方法。(1) A ceramic sintered body is placed in a container containing a polishing solution, abrasive grains, and media, and the ceramic sintered body is polished by giving motion to the ceramic sintered body, polishing solution, abrasive grains, and media. A method for manufacturing ceramic parts, characterized by:
囲第1項に記載のセラミックス部品の製造方法。(2) The method for manufacturing ceramic parts according to claim 1, wherein the polishing solution is for chemical polishing.
囲第1項に記載のセラミックス部品の製造方法。(3) The method for manufacturing ceramic parts according to claim 1, wherein the polishing solution is for electrolytic polishing.
ある特許請求の範囲第1項ないし第3項のいずれかに記
載のセラミックス部品の製造方法。(4) The method for manufacturing a ceramic component according to any one of claims 1 to 3, wherein the abrasive grains and media are mixed into a polishing solution.
る特許請求の範囲第1項ないし第3項のいずれかに記載
のセラミックス部品の製造方法。(5) The method for manufacturing a ceramic component according to any one of claims 1 to 3, wherein the abrasive grains and the media are a grindstone provided in a container.
第5項いずれかに記載のセラミックス部品の製造方法。(6) The method for manufacturing a ceramic component according to any one of claims 1 to 5, wherein the container is a rotating body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15043686A JPS637264A (en) | 1986-06-26 | 1986-06-26 | Manufacture of ceramics parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15043686A JPS637264A (en) | 1986-06-26 | 1986-06-26 | Manufacture of ceramics parts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS637264A true JPS637264A (en) | 1988-01-13 |
Family
ID=15496886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15043686A Pending JPS637264A (en) | 1986-06-26 | 1986-06-26 | Manufacture of ceramics parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS637264A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04274884A (en) * | 1991-02-27 | 1992-09-30 | Ngk Insulators Ltd | Ceramic guide pin and production thereof |
US5455555A (en) * | 1992-11-24 | 1995-10-03 | Tdk Corporation | Chip varistor |
-
1986
- 1986-06-26 JP JP15043686A patent/JPS637264A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04274884A (en) * | 1991-02-27 | 1992-09-30 | Ngk Insulators Ltd | Ceramic guide pin and production thereof |
US5455555A (en) * | 1992-11-24 | 1995-10-03 | Tdk Corporation | Chip varistor |
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