JP5029941B2 - Barrel polishing method - Google Patents

Description

  The present invention relates to a method for forming a concave portion serving as a lubricating oil reservoir and a flat portion serving as a sliding surface on a sliding surface of a machine part or the like. More specifically, a desired surface is provided on the sliding surface of the machine part. The present invention relates to a method of forming a flat portion having surface roughness and a concave portion having a desired area ratio and average area with respect to the flat portion.

In the conventional method of forming a recess that becomes a reservoir for lubricating oil on the sliding surface of a machine part, etc., an unevenness is formed by a centrifugal fluid barrel polisher (hereinafter referred to as “centrifugal barrel polisher”) in the first polishing step. Next, by using a centrifugal barrel polishing device or a rotating barrel polishing device in the second polishing step, the upper end portion of the convex portion is polished to leave a valley portion of the concave portion formed in the first polishing step to form a flat portion. A method is disclosed. (Patent Document 1)

The centrifugal barrel polishing apparatus used in the first polishing process of Patent Document 1 includes a plurality (usually four) of centrifugal barrels provided to rotate and revolve on the concentric circle of the rotation axis around the turret disk. In the polishing tank, (1) a work piece (hereinafter referred to as “work”) having a substantially equal amount of each, a polishing medium (hereinafter referred to as “media”), and an abrasive for the first polishing step (hereinafter referred to as “working”). (Referred to as “abrasive grains”), polishing aid (hereinafter referred to as “compound”), water, and (2) the above-mentioned workpiece, media, abrasive grains, compound, water, polishing scraps, etc. (hereinafter referred to as “contents”) 1), the opening and closing lids of each polishing tank are closed for each tank, and then the polishing tank is attached to the turret disc to rotate and revolve. Polishing is performed.

After completion of the first polishing step, the centrifugal barrel polishing apparatus is stopped, (1) the opening / closing lid of each polishing tank is opened for each tank, and the contents are taken out of the polishing tank. After passing through a cleaning process of washing and discarding the used abrasive grains, compound, and water in the polishing process, (3) collecting the work and media.

In the next second polishing step, when a centrifugal barrel polishing apparatus is used, (1) when the contents are taken out of the polishing bath in the first polishing step, they are attached to the walls in each polishing bath. After thoroughly cleaning the fine abrasive grains and the like with water, (2) the work and media cleaned and recovered in the cleaning step are divided approximately evenly and re-inserted into the respective polishing tanks. (4) Close the open / close lid of each polishing tank for each tank, and then attach each polishing tank to the turret disc as in the first polishing process. Then, the second polishing is performed and the final polishing is completed.

In the case of using the rotating barrel polishing apparatus, as in the case of using the centrifugal barrel polishing apparatus, (1) the work and media cleaned and recovered in the cleaning step are charged into the polishing tank, and (2) the second The compound for the second polishing process and water are charged, (3) the polishing tank is closed, the second polishing is performed, and the final polishing is completed.

In addition, in other prior art, the first polishing step is formed with unevenness by a shot blasting apparatus, and the next second polishing step is performed by any of the methods of lapping, mirror polishing, superfinishing, cutting and grinding, A method for polishing or grinding the convex portion formed in the first step is disclosed. (Patent Document 2)

The formation of irregularities by the shot blasting apparatus in the first polishing step of Patent Document 2 is performed by causing a projection material (hereinafter referred to as “shot”) made of hard particles to collide with a surface that becomes a sliding surface of a workpiece at high speed, A portion where the shot collides strongly becomes a recess, and the periphery of the recess becomes a protrusion.

The second polishing step by any one of lapping, mirror polishing, superfinishing, cutting and grinding after the step of cleaning the blasted surface after finishing the first polishing step is formed in the first polishing step. The sliding surface is formed by polishing or grinding the convex portion while leaving the concave portion as an oil reservoir.
Japanese Patent No. 3083160 Japanese Patent Publication No. 3664058

  A conventional method for forming innumerable recesses (oil sump) on a sliding surface of a machine part or the like is as follows. As shown in both Patent Document 1 and Patent Document 2, unevenness is formed on the surface serving as a sliding surface. A first polishing step to form, a second polishing step to form a flat surface portion to be a sliding surface by polishing or grinding the upper end portion of the convex portion leaving the valley portion of the concave portion to be the oil reservoir, Between the one polishing step and the second polishing step, there is a washing step of washing the work, which has completed the first polishing step, and the media, abrasive grains, compounds, polishing debris, etc. used for polishing in the first polishing step. Since the polishing apparatus used for the first polishing process and the second polishing process is a separate apparatus, the content in the polishing apparatus that has finished the polishing process in the first polishing process is discharged out of the polishing tank ( Man-hours) and cleaning after discharging, abrasives and compounds The workpiece and the media was collected after discarding the polishing dust or the like, the step of re-loading the workpiece and the media in the polishing apparatus of the second polishing step (steps) in which is required.

  Furthermore, since the polishing apparatuses used in the first polishing process and the second polishing process are separated into two apparatuses, a large installation space for the polishing apparatus is required, and the equipment cost is high. .

Further, the centrifugal barrel polishing apparatus used in Patent Document 1 is a polishing apparatus capable of exhibiting polishing ability among barrel polishing apparatuses, and a plurality of polishing tanks provided to rotate and revolve as described above. Opening and closing the lid to seal each tank, the work, media, abrasive grains, compound, water must be approximately equal to each other, and charging and discharging must be repeated. It is what you need.

  The inventors of the present invention will be described below with reference to FIG. 1 and FIG.

In the first invention, the polishing tank 1 shown in FIG. 1 has a cylindrical fixed tank 2 and a platen-shaped rotating disk 4 that rotates horizontally by forming a sliding contact gap 3 in the inner periphery of the lower end opening of the fixed tank 2. A passage 6 is formed between the rotating plate 4 and the bottom plate 5 of the fixed tank 2 and communicates with the sliding contact gap 3 and a hole 8 formed in the center of rotation of the rotating plate 4. 6 is a method of forming the sliding surface and the concave portion serving as a lubricating oil pool portion of a sliding surface of a mechanical part or the like using a fluid barrel polishing apparatus in which a drain pipe 7 with an on-off valve is connected to 6.
A work, media, abrasives, compound, and water are charged into the polishing tank 1, and the rotating disk 4 is rotated horizontally to allow the work, media, abrasive grains, compound, and water to flow into the polishing tank 1. forming a mass M, a first polishing step of forming irregularities on the surface of the workpiece,
Washing water is supplied into the polishing tank 1 while flowing the mass M that has finished the first polishing step, and abrasives, compounds, water in the mass M, and polishing debris generated during the polishing process are removed from the polishing tank. And a cleaning step for leaving the cleaned workpiece and media in the polishing tank 1;
After newly adding a compound and water to the work and media remaining in the polishing tank 1, the rotating disk 4 is horizontally rotated to polish the upper end portion of the convex portion formed in the first polishing step. to form a sliding surface, and a second polishing step of forming the oil sump, leaving the recess, the sliding surfaces of machine parts or the like to perform by a single fluidized barrel polishing apparatus and sump the oil formation It is a method to do.

The second invention is a machine part or the like provided with an inner cylinder 9 that is fixedly or rotatably supported on the rotation center of the rotating disk 4 of the conventional fluid barrel polishing apparatus used in the first invention shown in FIG. A method of forming a sliding surface and an oil reservoir thereof ,
The flow barrel polishing apparatus, the present inventors are more been filed in PCT / JP2005 / 002233, a polishing process time polishing efficiency than conventional fluid barrel-polishing apparatus used in the first invention is directed above It can be shortened .

A third invention is characterized in that the weight of the abrasive material used in the first polishing step of the first invention or the second invention, mechanical parts, etc. for polishing in the 1/10 or 1/33 of the weight of the workpiece to be polished This is a method of forming a sliding surface and an oil reservoir thereof .

  The present invention relates to a machining process for forming a recess that becomes a reservoir for lubricating oil on a sliding surface of a machine part or the like (workpiece), and a washing process for washing the workpiece, media, etc., and discharging used abrasive grains, compounds, polishing debris, etc. The process is carried out in the polishing tank of one barrel polishing device, and it is not necessary to transfer the mass to another device, especially without the need for mass discharge and charging in the cleaning process. Since it can be shortened, not only can the production efficiency be greatly improved, but also the cost of equipment and facilities can be reduced. Further, with respect to the amount of abrasive grains used, the centrifugal barrel polishing disclosed in the conventional patent document 1 is made by making the polishing device a fluid barrel polishing device in which the workpiece is polished by the contact pressure and relative speed between the workpiece and the medium. Since the machining purpose can be achieved by using fewer devices, the running cost can be reduced.

The present invention includes a first polishing step in which a workpiece and a medium, a compound, abrasive grains, and water are charged to form irregularities on the surface of the workpiece, and the workpiece and the medium are washed after the first polishing step is completed. A cleaning process for leaving the compound, abrasive grains, water, and polishing debris remaining in the polishing tank, together with cleaning water, to the outside of the polishing tank, and a work and media in the polishing tank after the first polishing process. And a second polishing step in which a compound and water are newly added, and a top portion of the convex portion is polished to leave a trough portion of the concave portion formed in the first polishing step, thereby forming a flat portion. A fixed plate having a cylindrical shape and a platen-shaped rotating plate that rotates horizontally by forming a sliding contact gap in the inner peripheral portion of the lower end opening of the fixed vessel, and between the rotating plate and the bottom plate of the fixed vessel Hole formed in the sliding contact gap and the center of rotation of the rotating disk By forming a passage that communicates with the fluid barrel polishing apparatus in which a drain pipe with an on-off valve is connected to the passage, the above steps can be performed without changing the mass of the work and media in the polishing tank. It is to be able to do with the barrel polishing device of the stand.

  Hereinafter, Examples 1 to 3 performed for evaluating the present invention and comparative examples thereof will be described.

  Table 1 shows an overview of the specifications of the polishing apparatus, media, compounds, and abrasive grains used in each example and comparative example.

The difference between (1) Example 1 and (2) Examples 2, 3 and (3) Comparative Example is that the specifications of the polishing apparatus are different. Example 1 is the fluid barrel polishing apparatus shown in FIG. 3 is a fluid barrel polishing apparatus provided with the inner cylinder 9 shown in FIG. 2, and the comparative example is a centrifugal barrel polishing apparatus shown in FIG. 3. The specifications of the media, compound, and abrasive grains are the same in order to unify the processing conditions. It was a thing.

The details of the fluid barrel polishing apparatus of FIG. 1 used in the first embodiment are the description of the first invention, and the details of the fluid barrel polishing apparatus of FIG. 2 used in the second and third embodiments are the second. Since it was described in the explanation of the invention, it is omitted.

The centrifugal barrel polishing apparatus of FIG. 3 used in the comparative example is also used in the above-mentioned Patent Document 1, and the turret plates 12 and 12 revolved by driving the motor 13 on both sides of the horizontal revolution shaft 11. A centrifugal section provided with four polishing tanks 14 having a polygonal cross section with an open / close lid 15 on a body portion that is detachably mounted between the turret plates 12 and 12 via a rotation shaft 16 and rotates. In the barrel polishing apparatus, the workpiece loaded together with the abrasive in each of the polishing tanks 14 is polished while being rubbed against the abrasive by the rotation and revolution of the polishing tank 14.

The workpiece used in this test was a mechanical part of shape: φ2.5 × 20, material: SUJ-2, hardness: HRc 60 to 62, and the rotating disk of the fluid barrel polishing apparatus used in Examples 1, 2, and 3. 4 is 200 min ⁻¹ , the rotation speed (revolution) of the turret plates 12 and 12 of the centrifugal barrel polishing apparatus used in the comparative example is 130 min ^−1, and the rotation speed (rotation) of the polishing tank 14 is 130 min ⁻¹ . .

In addition, the final processing accuracy of the work was evaluated based on the arithmetic average roughness: Ra (JIS-B-0601) 0.07 to 0.15, the skewness of the roughness curve: Rsk (JIS-B-0601) −1.6 or less, recess average area: 30 to 150 μm ² , recess area ratio: 10 to 40%, and the time required for each step for obtaining the processing accuracy is a centrifugal barrel polishing apparatus of a comparative example which is a conventional technique The condition was that it could be processed in a shorter time.

Hereinafter, the first polishing step will be described.

  Example 1, Example 2, 3 and the comparative example were carried out in order to evaluate the polishing efficiency depending on the difference of the polishing apparatus. The fluid barrel polishing apparatus (Shinto Blator) shown in FIG. 2 (type: EVF-04) and the fluid barrel polishing apparatus shown in FIG. 2 used in Examples 2 and 3 (manufactured by Shinto Blator, type: EVFX-1) per one batch (nominal) Are equivalent amounts, and the polishing amount (nominal) per batch of the centrifugal barrel polishing apparatus (manufactured by Shinto Blator, model: ACF-204) used in the comparative example is about 2 of about the above fluid barrel polishing apparatus. Therefore, the workpiece charging amount of Example 1 and Examples 2 and 3 is 10 kg based on the actual results, and the workpiece charging amount of the comparative example is 20 kg which is twice as much as the media, compound, abrasive grains, and water. The amount of charging Similarly to the charging amount, the first polishing process was started by charging the amounts shown in Table 2 at a ratio of Examples 1, 2: Comparative Example = 1: 2 based on the results.

  The polishing apparatus used in the present invention is not limited as long as it is a fluid barrel polishing apparatus shown in FIG. 1 or FIG. 2, but the fluid barrel polishing apparatus shown in FIG. 2 is preferable when it is desired to further improve the polishing efficiency.

  Example 2 and Example 3 were carried out in order to evaluate the difference in polishing efficiency depending on the amount of abrasive grains charged by the polishing apparatus in the fluid barrel polishing apparatus shown in FIG. The charging amount is about 1/3 that of the second embodiment.

  Even in Example 3 in which the amount of abrasive grains charged is small, a reference value for processing accuracy can be obtained without lengthening the polishing time in the first and second polishing steps.

  Next, the cleaning process will be described.

  In Examples 1, 2, and 3 using the fluid barrel polishing apparatus shown in FIGS. 1 and 2, the rotating plate 4 is horizontally rotated while continuously supplying cleaning water from the opening of the fixed tank 2. In addition to cleaning the media and opening the on-off valve, the used compound, abrasive grains, polishing debris and the like are discharged out of the polishing apparatus from the drain pipe 7 together with the cleaning water, and after the cleaning / drainage is completed, The on-off valve can be closed to enter a standby state for the second polishing step.

  In the comparative example using the centrifugal barrel polishing apparatus shown in FIG. 3, the inside of the polishing tank 14 after the completion of the first polishing step is at high pressure and high temperature due to high speed rotation of its own revolution, so it is left for a certain period of time to reduce the pressure. Then, the four polishing tanks 14 are removed from the turret plates 12, 12, and the opening / closing lid 15 of each polishing tank 14 is opened so that the respective workpieces, media, compounds, and abrasive grains are placed outside the polishing tank 14. Then, the workpiece and media are collected while cleaning, and the cleaning process is completed.

  In order to enter a standby state for the next second polishing step, each of the polishing tanks 14 is cleaned, and each of the polished and sorted workpieces (with no abrasive grains) is put in each of the polishing tanks 14. After inserting the media, it is necessary to newly add the same amount of compound and water as in the first polishing step, close the opening / closing lid 15 and then attach it to the turret plates 12 and 12 of the polishing apparatus.

  Next, the second polishing process of this test will be described.

The amount of the compound and water to be newly charged in the polishing tank of the second polishing step was the same as that of the first polishing step shown in Table 2, and the second polishing step was started.

Table 3 shows the required time (min) and total time of each step of the first polishing step, the cleaning step, and the second polishing step, which are the final results of this test, and Table 4 shows the processing accuracy after the polishing is completed.

Based on the above test results, the action obtained in the test will be described below.

The abrasive silicon carbide used in the first polishing process has a hard and sharp cutting edge, so it is easy to form irregularities on the workpiece surface, but because the toughness is low, the workpiece and media being polished As the polishing process proceeds while rubbing each other, the abrasive grains are rapidly crushed. Therefore, as the time elapses, irregularities are formed on the entire workpiece, and the size of the irregularities (surface roughness Ry) once increases but gradually decreases to complete the first polishing. Although silicon carbide was used in the examples of the present invention, the addition of abrasive grains is not necessarily limited to silicon carbide for the purpose of forming irregularities on the workpiece surface, such as aluminum oxide, silicon oxide, zirconium oxide, etc. It may be. Further, the grain size of the abrasive grains is not limited.

In the cleaning process of the present invention using the fluid barrel polishing apparatus shown in FIGS. 1 and 2, the rotating disk is rotated horizontally while continuously supplying cleaning water from the upper opening of the fixed tank, so that the work and media in the mass M are removed. Examples 1, 2, and 3 show that the used compound, abrasive grains, polishing debris and the like can be discharged out of the polishing apparatus from the drain pipe together with the cleaning water while the cleaning valve is opened. As described above, the cleaning can be completed in a short time (5 to 7 minutes) and the standby state of the second polishing step can be established.

As described above, the cleaning process of the comparative example using the centrifugal barrel polishing apparatus shown in FIG. 3 removes the polishing tank after completion of the first polishing process from the turret plate and does not leave it for a certain period of time. Since the decompression and cooling cannot be performed and the open / close lid of each polishing tank cannot be opened, the work, media, compound, abrasive grains, etc. that have finished the first polishing in the polishing tank are removed from the polishing tank for cleaning. In addition, the work and media after cleaning must be reinserted into the polishing tank for the second polishing and the opening / closing lid is closed, and it is necessary to attach the polishing tank to the turret plate for a long time. (60 to 70 min) is required, and the standby state of the second polishing step can be achieved.

Moreover, the sintered alumina which is the material of the media (V-4) used in the present invention has a slight polishing power, and in the second polishing step, the upper end portion of the convex portion is gradually polished. While forming a flat surface, it has the effect | action which leaves the trough part of a recessed part and forms an oil sump.

From the above results, all the tests passed the reference value with respect to the processing accuracy of Examples 1, 2 and 3 and the comparative example tested by the difference in the polishing apparatus. Furthermore, since both of the polishing apparatuses passed the reference values with respect to the processing accuracy of Examples 2 and 3 due to the difference in the amount of abrasive grains charged in the fluid barrel polishing apparatus shown in FIG. The polishing method that satisfies the processing accuracy standard value and significantly reduces the total manufacturing time compared to the comparative example may be the fluid barrel polishing apparatus of Examples 1, 2, and 3, and further the amount of abrasive grains. Example 3 which satisfied the above-described object (problem) even when the reduction to about 1/3 of the conventional example showed the best result.

The side view of the fluid barrel polisher used for Example 1 of the present invention. The side view of the fluid barrel polisher used for Example 2 and Example 3 of the present invention. The block diagram which shows the grinding | polishing tank and turret board of the centrifugal barrel grinding | polishing apparatus used for the comparative example.

Explanation of symbols

1. 1. Polishing tank 2. Fixed tank 3. Sliding contact gap Turntable 5. Bottom plate 6. Aisle 7. Drain pipe8. Hole 9. Inner cylinder M.M. trout

Claims (3)

The polishing tank is composed of a cylindrical fixed tank and a platen-shaped rotating disk that rotates horizontally by forming a sliding contact gap at the inner periphery of the lower end opening of the fixed tank. A passage is formed between the sliding contact gap and a hole formed in the center of rotation of the turntable, and a fluid barrel polishing apparatus in which a drain pipe with an on-off valve is connected to the passage is used to slide mechanical parts and the like. A method of forming a moving surface and its oil reservoir ,
The polishing vessel to work with media and abrasive, compounds, water was charged, forming said turntable is horizontally rotated workpiece into the abrasive tank, the media, the abrasive grains, compound, by flowing water mass and, a first polishing step of forming irregularities on the surface of the workpiece,
Washing water is supplied into the polishing tank while flowing the mass after the first polishing step, and abrasives, compounds, water, and polishing debris generated during the polishing process are discarded outside the polishing tank. A cleaning process for leaving the cleaned work and media in the polishing tank;
After newly adding compound and water to the work and media remaining in the polishing tank, the rotating plate is rotated horizontally to polish and slide the upper end portion of the convex portion formed in the first polishing step. to form a surface, the second polishing step, the sliding surface such as machine parts, characterized in that to perform by a single fluidized barrel polishing apparatus and the oil forming the oil sump, leaving a concave portion A method of forming a pool . 2. A sliding surface of a mechanical part or the like and an oil reservoir thereof according to claim 1, wherein an inner cylinder that is fixedly or rotatably supported is provided at an upper center of a rotation center of a rotating disk of the fluid barrel polishing apparatus. How to form . Wherein the weight of the abrasive material used in the first polishing step, according to claim 1 or claim 2, wherein the machine parts such as sliding of characterized by polishing in the 1/10 or 1/33 of the weight of the workpiece to be polished A method of forming a moving surface and its oil reservoir .