JPS6367555B2 - - Google Patents

Info

Publication number
JPS6367555B2
JPS6367555B2 JP57149399A JP14939982A JPS6367555B2 JP S6367555 B2 JPS6367555 B2 JP S6367555B2 JP 57149399 A JP57149399 A JP 57149399A JP 14939982 A JP14939982 A JP 14939982A JP S6367555 B2 JPS6367555 B2 JP S6367555B2
Authority
JP
Japan
Prior art keywords
thin film
substrate
silicon
silicon thin
grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57149399A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5939713A (ja
Inventor
Kazunobu Tanaka
Akihisa Matsuda
Keiji Kumagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Toa Nenryo Kogyyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toa Nenryo Kogyyo KK filed Critical Agency of Industrial Science and Technology
Priority to JP14939982A priority Critical patent/JPS5939713A/ja
Publication of JPS5939713A publication Critical patent/JPS5939713A/ja
Publication of JPS6367555B2 publication Critical patent/JPS6367555B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP14939982A 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法 Granted JPS5939713A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14939982A JPS5939713A (ja) 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14939982A JPS5939713A (ja) 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法

Publications (2)

Publication Number Publication Date
JPS5939713A JPS5939713A (ja) 1984-03-05
JPS6367555B2 true JPS6367555B2 (enrdf_load_stackoverflow) 1988-12-26

Family

ID=15474277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14939982A Granted JPS5939713A (ja) 1982-08-29 1982-08-29 シリコン薄膜及びその製造方法

Country Status (1)

Country Link
JP (1) JPS5939713A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658909B2 (ja) * 1985-07-15 1994-08-03 株式会社日立製作所 低温プラズマによる成膜方法及び装置
JPH0611645B2 (ja) * 1986-07-30 1994-02-16 圭弘 浜川 非晶質薄膜の形成方法
JP5148986B2 (ja) * 2007-12-25 2013-02-20 パナソニック株式会社 多結晶薄膜の製造方法、複合ナノ結晶層の製造方法、電界放射型電子源、発光デバイス

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5698820A (en) * 1980-01-09 1981-08-08 Nec Corp Preparation of amorphous semiconductor film
JPS5767020A (en) * 1980-10-15 1982-04-23 Agency Of Ind Science & Technol Thin silicon film and its manufacture

Also Published As

Publication number Publication date
JPS5939713A (ja) 1984-03-05

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