JPS6367243U - - Google Patents
Info
- Publication number
- JPS6367243U JPS6367243U JP16138586U JP16138586U JPS6367243U JP S6367243 U JPS6367243 U JP S6367243U JP 16138586 U JP16138586 U JP 16138586U JP 16138586 U JP16138586 U JP 16138586U JP S6367243 U JPS6367243 U JP S6367243U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- cleaning position
- wafer
- sterilizing
- brush
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 6
- 230000001954 sterilising effect Effects 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims 3
- 241000894006 Bacteria Species 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000007921 spray Substances 0.000 claims 1
- 238000005201 scrubbing Methods 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 1
Landscapes
- Cleaning In General (AREA)
Description
第１図は本考案に係る実施例の概略の斜視図、
第２図は実施例の平面図、第３図は第２図中のＡ
―Ａ線断面図、第４図は従来のブラシスクラブ装
置である。
１……ブラシスクラブ装置、２……半導体ウエ
ーハ、３……吸着台、４……回転ブラシ、６……
純水、１０……殺菌手段〔光源〕。
FIG. 1 is a schematic perspective view of an embodiment according to the present invention;
Figure 2 is a plan view of the embodiment, Figure 3 is A in Figure 2.
- A cross-sectional view taken along line A, FIG. 4 shows a conventional brush scrubbing device. 1... Brush scrubbing device, 2... Semiconductor wafer, 3... Suction table, 4... Rotating brush, 6...
Pure water, 10... Sterilization means [light source].
Claims (1)
台と、上記半導体ウエーハの表面に純水を噴射さ
せるノズルと上記半導体ウエーハを擦る回転ブラ
シとを備え、上記回転ブラシを半導体ウエーハ上
の洗浄位置とそれとは離隔した退避位置との間で
移動可能に構成し、上記洗浄位置で上記半導体ウ
エーハの表面をブラシスクラブする装置において
、 上記回転ブラシの退避位置に、回転ブラシに付
着した生菌を殺菌する殺菌手段を配設したことを
特徴とする半導体製造装置。[Claims for Utility Model Registration] A suction stand that vacuum suctions and rotates a semiconductor wafer, a nozzle that sprays pure water onto the surface of the semiconductor wafer, and a rotating brush that rubs the semiconductor wafer; In an apparatus configured to be movable between a cleaning position on a wafer and a retracted position separated from the cleaning position, the apparatus scrubs the surface of the semiconductor wafer with a brush at the cleaning position; A semiconductor manufacturing device characterized by being equipped with a sterilizing means for sterilizing viable bacteria.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16138586U JPS6367243U (en) | 1986-10-20 | 1986-10-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16138586U JPS6367243U (en) | 1986-10-20 | 1986-10-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6367243U true JPS6367243U (en) | 1988-05-06 |
Family
ID=31087649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16138586U Pending JPS6367243U (en) | 1986-10-20 | 1986-10-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6367243U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02109333A (en) * | 1988-10-18 | 1990-04-23 | Tokyo Electron Ltd | Cleaning device |
-
1986
- 1986-10-20 JP JP16138586U patent/JPS6367243U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02109333A (en) * | 1988-10-18 | 1990-04-23 | Tokyo Electron Ltd | Cleaning device |