JPS6365930A - Light gas purifier - Google Patents
Light gas purifierInfo
- Publication number
- JPS6365930A JPS6365930A JP61208137A JP20813786A JPS6365930A JP S6365930 A JPS6365930 A JP S6365930A JP 61208137 A JP61208137 A JP 61208137A JP 20813786 A JP20813786 A JP 20813786A JP S6365930 A JPS6365930 A JP S6365930A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- separation membrane
- pipe
- compressor
- pressure swing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001179 sorption measurement Methods 0.000 claims abstract description 43
- 239000012528 membrane Substances 0.000 claims abstract description 33
- 238000000926 separation method Methods 0.000 claims abstract description 33
- 239000002994 raw material Substances 0.000 claims abstract description 25
- 238000010926 purge Methods 0.000 claims abstract description 17
- 238000000746 purification Methods 0.000 claims description 28
- 239000012466 permeate Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 98
- 239000000463 material Substances 0.000 abstract 4
- 239000006096 absorbing agent Substances 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 description 16
- 238000011084 recovery Methods 0.000 description 12
- 239000000047 product Substances 0.000 description 10
- 239000012535 impurity Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 239000003463 adsorbent Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000011265 semifinished product Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000005345 coagulation Methods 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Separation Of Gases By Adsorption (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はヘリウムや水素で代表される軽質ガスの精製回
収装置に関し、詳細には上記軽質ガスを高純度・高回収
藁で得られ、しかも装置自体が簡単で且つ運転制御が容
易な軽質ガス精製装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a purification and recovery device for light gases such as helium and hydrogen, and more specifically, an apparatus for purifying and recovering light gases such as helium and hydrogen. The present invention relates to a light gas purification device that is simple in itself and whose operation is easy to control.
1種類の軽質ガス成分を混合ガス中から精製分離する方
法としては、低温吸着法、凝固法、分ゴI膜法及び圧力
スイング吸着法などが実用化されており、このうち分離
膜法及び圧力スイング吸着法は常温で操作できることか
ら他の方法に比べて汎用性が高いという長所を持ってい
る。ところが上記分離膜法及び圧力スイング吸着法の単
独実施では高純度、高回収率の両面を満足させることか
できない為、低温吸着法や凝固法に補助的な役割として
利用されたり、或は両者を組み合わせて利用されること
が多い。特に分離膜法と圧力スイング吸着法の組合わせ
はどちらも常温操作の可能な方法であるという共通点を
有する上、お互いの長所と短所を補い合うものであり、
もっとも理想的な組合せと考えられている。第2図及び
第3図は本発明者らが先に提案した上記組合せ例に係る
He緒製装置(特開昭61−1271509号)の概略
説明図である。第2図は気体分離膜精製装置3と圧力ス
イング吸着装置5を直列接続したものであリ、原料ガス
供給管2から供給される加圧ガスを前処理吸着塔10a
、10bのいずれかへ通してN2及びCO2成分を除去
した後、導入管21を介して気体分雌膜精製装M3へ導
入する。該精製装置3に加圧導入された原料ガスのうち
分子s膜11に対して透過性を示す軽質ガス(He)は
分離配管22から次段の圧縮機8bへ送られ、分離膜1
1に対して不透過性を示す不純成分(02やN2等)は
排出管7から系外へ放出される。Practical methods for purifying and separating one type of light gas component from a mixed gas include the low temperature adsorption method, the coagulation method, the separation membrane method, and the pressure swing adsorption method. The swing adsorption method has the advantage of being more versatile than other methods because it can be operated at room temperature. However, since it is not possible to satisfy both high purity and high recovery rate by implementing the above-mentioned separation membrane method and pressure swing adsorption method alone, they are used as a supplementary role to the low-temperature adsorption method and coagulation method, or are used as a combination of both methods. Often used in combination. In particular, the combination of separation membrane method and pressure swing adsorption method has in common that both methods can be operated at room temperature, and they also complement each other's strengths and weaknesses.
This is considered the most ideal combination. FIGS. 2 and 3 are schematic explanatory diagrams of a heel cord manufacturing apparatus (Japanese Patent Application Laid-Open No. 1271509/1982) according to the above combination example previously proposed by the present inventors. FIG. 2 shows a system in which a gas separation membrane purification device 3 and a pressure swing adsorption device 5 are connected in series.
, 10b to remove N2 and CO2 components, and then introduced into the gaseous membrane purifier M3 via the inlet pipe 21. Among the raw material gases introduced under pressure into the purification device 3, light gas (He) that exhibits permeability to the molecular s membrane 11 is sent from the separation pipe 22 to the next stage compressor 8b, and is passed through the separation membrane 1.
Impurity components (02, N2, etc.) that are impermeable to 1 are discharged from the system through the discharge pipe 7.
前記圧縮機8bにおいて加圧された気体分離膜精製装置
3の処理済みガス(以下単に半製品ガスともいう)は圧
力スイング扱者装置5のいずれかの吸着塔12a又は1
2bへ送られ、該半製品ガス中の不純成分を活性炭等の
吸着剤に吸着させ、該吸着塔12a又は12bを通過し
た製品ガスを回収用管23を介して製品タンク13内に
回収する。なお吸着塔12a又は12bの不純成分吸着
能力が飽和に達したときには製品タンク13から製品ガ
スをパージ用ガスとしてパージ用配管24から吸着塔1
2a又は12bへ逆送し、不純成分を含むパージガス(
以下単に循環用ガスともいう)はパージガス循環用管2
5を介して原料ガス供給管2へ戻されて再利用される。The processed gas (hereinafter also simply referred to as semi-finished product gas) of the gas separation membrane purification device 3 pressurized by the compressor 8b is transferred to either the adsorption tower 12a or 1 of the pressure swing operator device 5.
2b, impure components in the semi-finished product gas are adsorbed by an adsorbent such as activated carbon, and the product gas that has passed through the adsorption tower 12a or 12b is recovered into the product tank 13 via the recovery pipe 23. Note that when the impurity component adsorption capacity of the adsorption tower 12a or 12b reaches saturation, the product gas from the product tank 13 is used as a purge gas and is transferred from the purge pipe 24 to the adsorption tower 1.
2a or 12b and purge gas containing impure components (
(hereinafter also simply referred to as circulation gas) is the purge gas circulation pipe 2.
5 and is returned to the raw material gas supply pipe 2 for reuse.
第3図に示す装置は第2図に示した気体分離膜精製装置
3と圧力スイング吸着装面5の配置順序を入れ換えたも
のであり、ここでは気体分離膜精製装置3を循環用ガス
の回収用として利用している。従って軽質ガスの製品純
度という点ではやき劣るが分離膜11に対する負荷は少
し軽減される。そしてこれらの装置を利用したヘリウム
や水素の精製装置では回収目的成分を高純度且つ高回収
率で得ることに成功している。The device shown in FIG. 3 is the one in which the arrangement order of the gas separation membrane purification device 3 and the pressure swing adsorption device surface 5 shown in FIG. It is used for purposes. Therefore, although the product purity of the light gas is inferior, the load on the separation membrane 11 is slightly reduced. Helium and hydrogen purification devices using these devices have succeeded in obtaining the components to be recovered with high purity and high recovery rate.
[発明が解決しようとする問題点]
上記した第2.3図に示される装置では気体分離膜精製
装置3出側の半製品ガス及び圧力スイング吸着装置5の
パージガス出側の循環用ガスはいずれも低圧であり、次
に直列して設けられる圧力スイング吸着製雪5又は気体
分離膜精製装置3へこれらのガスを供給する場合には、
各装置手前に別の圧縮機を設けて調圧又は加圧しでやら
なければならない。また上記循環用ガスは圧力スイング
扱者装音5から間欠的に排出されることになるので、パ
ージガス循環用管25にはガス圧均圧化のための緩衝装
Mを別に配設しておかなければならない。[Problems to be solved by the invention] In the apparatus shown in FIG. is also at low pressure, and when these gases are then supplied to the pressure swing adsorption snowmaking 5 or gas separation membrane purification device 3 provided in series,
A separate compressor must be installed in front of each device to regulate or increase the pressure. Furthermore, since the above-mentioned circulating gas will be intermittently discharged from the pressure swing operator sound system 5, a buffer M for equalizing the gas pressure must be separately provided in the purge gas circulating pipe 25. There must be.
従って上記の様な装置を連続して運転するためには、装
置全体の運転状況に合わせて圧縮機の入側及び出側のガ
ス圧を数多くの制御機器を使ってコントロールしなけれ
ばならず、複雑な制御系を設ける必要が生じると共に、
煩雑な圧力制御操作が要求されることになる。Therefore, in order to operate the above-mentioned equipment continuously, the gas pressure on the inlet and outlet sides of the compressor must be controlled using numerous control devices in accordance with the operating conditions of the entire equipment. It becomes necessary to set up a complicated control system, and
This requires complicated pressure control operations.
そこで本発明者らは気体分離膜精製装置及び圧力スイン
グ吸着装置を併用して軽質ガスの精製を行なうという訂
提の下で、運転操作及び制御が容易で且つ設備のB車な
精製装置を提供することを目的に、種々研究を重ねた結
果、本発明装置を完成させるに至った。Therefore, the present inventors provide a purification device that is easy to operate and control, and is a B-type equipment, based on the idea of purifying light gas by using a gas separation membrane purification device and a pressure swing adsorption device in combination. As a result of various studies aimed at achieving this goal, the device of the present invention has been completed.
[間逆点を解決するための手段コ
上記目的を達成し得た本発明精製装置は、原料ガス圧縮
1及の出側を分岐して気体分離膜精製装置入側及び圧力
スイング吸着装置入側に夫々連結すると共に、気体分離
膜装置の透過ガス出側及び圧力スイング吸着装置のパー
ジガス排出側を前記圧縮機入側の原料ガス導入部に合流
せしめる様に構成する点に要旨を有するものである。[Means for Solving the Reversal Points] The purification apparatus of the present invention, which has achieved the above object, branches the outlet side of the raw material gas compression 1 and the inlet side of the gas separation membrane purification apparatus and the inlet side of the pressure swing adsorption apparatus. The main feature is that the permeate gas outlet side of the gas separation membrane device and the purge gas outlet side of the pressure swing adsorption device are connected to the raw material gas introduction section on the compressor inlet side. .
[作用]
本発明では気体分離膜精製装置及び圧力スイング吸着装
置の手前に設ける圧縮機を共用することとし、即ち圧縮
機を1つだけとし、圧縮機で加圧される原料ガスを上記
両装置に各々分岐して送給する様に構成する。従って上
記両装置への原料ガスの供給比率を適正に保ちさえすれ
ば、構造の単純な設備によって気体分離膜精製装置及び
圧力スイング吸着装置への原料ガス供給が同時に行なえ
、しかも定常運転操作時の圧力制御も容易に実行するこ
とができる。[Function] In the present invention, the compressor provided before the gas separation membrane purification device and the pressure swing adsorption device is shared, that is, there is only one compressor, and the raw material gas pressurized by the compressor is shared between the two devices. The configuration is such that the feed is branched and fed to each of the above. Therefore, as long as the supply ratio of the raw material gas to both of the above devices is maintained appropriately, the raw material gas can be simultaneously supplied to the gas separation membrane purification device and the pressure swing adsorption device using equipment with a simple structure. Pressure control can also be easily performed.
気体分離膜精製装置において分離膜を透過した軽質ガス
は、分列配管を介して前記圧縮機入側へ循環させて原料
ガス中の軽質ガス濃度及びガス二を高めておく。尚該装
置において分だ膜を透過しない重質ガス成分は従来通り
系外へ排出する。The light gas that has passed through the separation membrane in the gas separation membrane purification device is circulated to the inlet side of the compressor via the separation pipe to increase the light gas concentration and gas concentration in the raw material gas. In this device, heavy gas components that do not pass through the separation membrane are discharged out of the system as usual.
従って圧力スイング吸着装置に供給される原料ガス中の
@質ガス成分は予め高められることになるので、該装置
によって精製回収される軽質ガスは高濃度を達成するこ
とができる。尚吸着塔のパージに使用されるパージガス
は該圧力スイング吸着装置から前記圧縮機入側へ循環用
管を介して戻す様に構成し、回収目的成分が無駄に放出
されるのを防止する。上記構成により、回収目的である
軽質ガスは高純度且つ高回収率で得ることができる。Therefore, since the @ quality gas component in the raw material gas supplied to the pressure swing adsorption device is increased in advance, the light gas purified and recovered by the device can achieve a high concentration. The purge gas used for purging the adsorption tower is configured to be returned from the pressure swing adsorption device to the input side of the compressor via a circulation pipe to prevent wasteful discharge of the components to be recovered. With the above configuration, the light gas to be recovered can be obtained with high purity and high recovery rate.
[実施例]
第1図は本発明の代表的な実施例を示す概略説明図であ
り、Heと空気の混合ガスからHeを回収精製する例に
基づいて以下説明する。原料ガス供給管2には圧縮機8
が接続され、原料ガスを圧縮する。圧縮された加圧ガス
は加圧配管26を介して分岐管27a、27bに分配さ
れる。一方の分岐管27aは気体分離膜精製装置3の入
側に接続され、該装置3の分離膜11を透過するHe成
分は分離配管22を介して原料ガス供給管2へ導かれ、
分m膜11を透過しない不純成分は排出管7から系外へ
放出される。[Example] FIG. 1 is a schematic explanatory diagram showing a typical example of the present invention, which will be described below based on an example in which He is recovered and purified from a mixed gas of He and air. A compressor 8 is installed in the raw material gas supply pipe 2.
is connected to compress the raw material gas. The compressed pressurized gas is distributed to branch pipes 27a and 27b via pressurizing pipe 26. One branch pipe 27a is connected to the inlet side of the gas separation membrane purification device 3, and the He component that permeates through the separation membrane 11 of the device 3 is guided to the raw material gas supply pipe 2 via the separation pipe 22.
Impurity components that do not pass through the separation membrane 11 are discharged from the system through the discharge pipe 7.
他方分岐管27bにはH2O及びCO,を除去する前処
理吸着塔10a、10bが接続され、該吸着塔10a、
10bにおいて吸着されたH2O及びC02成分は適時
吸引ブロワ9によって脱着放出される。前記前処理吸着
塔10a、10bによってH2O及びCo2成分の除去
された原料ガスは導入管21から圧力スイング吸着装置
5へ導かれ、該加圧原料ガスは吸着塔12a、12bの
いずれかに導入され、原料ガス中の不純成分を吸着剤に
吸着させ、回収目的成分であるHeを回収用管23から
製品タンク13内へ回収する。尚吸着塔12a、12b
に吸着された不純成分は製品タンク13内の回収Heを
使用して脱着され、パージガスはパージ用配管24、吸
着塔12a又は12b及びパージガス循環用管25を介
して圧縮機8人側の原料供給管2へ戻される。上記する
吸着塔のパージ工程は間欠的に行なわれるので、原料ガ
ス供給管2内を流通するガス量に変動を生じることにな
るが、一定量で供給される原料ガス及び気体分離膜精製
装置3から循環される半製品ガスが定常的に原料ガス供
給管2へ多量に供給されるので、圧縮m8人側における
循環用ガス(パージ済みガス)によるガス量の変動は小
さなものとなり、圧縮機8の圧縮性能に大きな定置を及
ぼすことはない。On the other hand, pretreatment adsorption towers 10a and 10b for removing H2O and CO are connected to the branch pipe 27b, and the adsorption towers 10a,
The H2O and CO2 components adsorbed in 10b are desorbed and released by the suction blower 9 at appropriate times. The raw material gas from which H2O and Co2 components have been removed by the pretreatment adsorption towers 10a and 10b is led from the introduction pipe 21 to the pressure swing adsorption device 5, and the pressurized raw material gas is introduced into either of the adsorption towers 12a and 12b. , impurity components in the raw material gas are adsorbed by an adsorbent, and He, which is a component to be recovered, is recovered from the recovery pipe 23 into the product tank 13. In addition, adsorption towers 12a and 12b
The impurity components adsorbed on the product tank 13 are desorbed using the recovered He, and the purge gas is supplied to the 8 compressors through the purge pipe 24, the adsorption tower 12a or 12b, and the purge gas circulation pipe 25. Returned to tube 2. Since the purge process of the adsorption tower described above is performed intermittently, the amount of gas flowing through the raw material gas supply pipe 2 will fluctuate, but the raw material gas and the gas separation membrane purification device 3 will be supplied in a constant amount. Since a large amount of semi-finished product gas circulated from the compressor m8 is constantly supplied to the raw material gas supply pipe 2, fluctuations in the gas amount due to the circulating gas (purged gas) on the compressor m8 side are small. It does not have a large effect on the compression performance.
加圧配管26から分岐管27a、27bへの原料ガスの
供給比率は、分岐管27a側で10〜40%、分岐管2
7b側で90〜60%程度とするのが好ましく、該供給
比率の調節手段は圧力調整、流量調整及び濃度調整等の
自動制御機構を採用する。例えば分I!ll膜精製装置
3側には濃度調整機構、圧力スイング吸着装置5側には
流量調整機構、更に圧縮機側には圧力調整機構を設けて
各分岐管27a、27bへのガス分配調節を行なう。The supply ratio of raw material gas from the pressurizing pipe 26 to the branch pipes 27a and 27b is 10 to 40% on the branch pipe 27a side;
It is preferable to set it to about 90 to 60% on the 7b side, and the means for adjusting the supply ratio employs automatic control mechanisms such as pressure adjustment, flow rate adjustment, and concentration adjustment. For example, minute I! A concentration adjustment mechanism is provided on the membrane purification device 3 side, a flow rate adjustment mechanism is provided on the pressure swing adsorption device 5 side, and a pressure adjustment mechanism is provided on the compressor side to adjust gas distribution to each branch pipe 27a, 27b.
実施例1
第1図に示す精製装Mに、He:80容量%、空気=2
0容量%(H2O及びCO2は前処理吸着塔において処
理済み)の原料ガスを導入管21から供給し、これを圧
縮機8で20 kg/cm2Gまで昇圧した後、気体分
離膜精製装置3側へ20%、圧力スイング吸着装置5側
へ80%ずつ分配した。尚気体分I!lll膜にはポリ
エステルを使用し、吸着塔12a、12bの吸着剤には
活性炭を使用し、圧力スイング吸着装置における切替周
期は1サイクル5分とした。この結果、回収用管23に
おける平均He純度は!19.9995%に到達し、ま
たHe回収率は98%を得た。Example 1 In the purification device M shown in FIG. 1, He: 80% by volume, air = 2
A raw material gas of 0% by volume (H2O and CO2 have been processed in the pretreatment adsorption tower) is supplied from the introduction pipe 21, and after being pressurized to 20 kg/cm2G by the compressor 8, it is sent to the gas separation membrane purification device 3 side. 20% and 80% were distributed to the pressure swing adsorption device 5 side. Gas content I! Polyester was used for the Ill membrane, activated carbon was used as the adsorbent for the adsorption towers 12a and 12b, and the switching period in the pressure swing adsorption apparatus was set to 5 minutes per cycle. As a result, the average He purity in the recovery tube 23 is! The He recovery rate reached 19.9995%, and the He recovery rate was 98%.
実施例2
実施例1と同様の条件で、導入管21における原料ガス
の組成を、He:93容量%、空気ニア容量%のものに
変えて実験を行なったところ、回収用管23における平
均He純度は99.9997%となり、He回収率は9
9.3%を得た。上記した例ではHe1i製について説
明したが、本発明装置はその他の軽質ガスの精製におい
ても上記例と同様に通用することができる。Example 2 An experiment was conducted under the same conditions as in Example 1, changing the composition of the raw material gas in the introduction pipe 21 to He: 93% by volume and air near volume%. The purity was 99.9997%, and the He recovery rate was 9.
9.3% was obtained. In the above example, the He1i product was explained, but the apparatus of the present invention can also be used in the purification of other light gases in the same manner as in the above example.
[発明の効果コ
本発明装置を利用することによって常温での操作のみに
よって高純度、高回収率の軽質ガス精製か行なえ、しか
も装置は簡単な設備で済み、運転制御も容易に行なうこ
とができる様になった。[Effects of the invention] By using the device of the present invention, light gas purification with high purity and high recovery rate can be performed only by operation at room temperature, and the device requires simple equipment and operation control can be easily performed. It became like that.
第1図は本発明装置の代表的な実施例を示す概略説明図
、第2.3図は従来の精製袋Mの例を示す概略説明図で
ある。
1・・・前処理部 2・・・原料ガス供給管3・
・・気体分離膜精製装置
4・・・製品ガス取出し管
5・・・圧力スイング吸着装置
7・・・排出管 8,8a、〜8d・・・圧縮
機9・・・吸引ブロワ lOa、IQb・・・前処
理吸着塔11 ・・・分Bt n5 12 a
、 12 b ・= IIA着塔l3・・・製品タン
ク 14〜20・・・三方弁21・・・導入管
22・・・分離配管23・・・回収用管
24・・・パージ用配管25・・・パージガス循環用管FIG. 1 is a schematic explanatory diagram showing a typical embodiment of the apparatus of the present invention, and FIGS. 2 and 3 are schematic explanatory diagrams showing an example of a conventional purification bag M. 1... Pretreatment section 2... Raw material gas supply pipe 3.
... Gas separation membrane purification device 4 ... Product gas extraction pipe 5 ... Pressure swing adsorption device 7 ... Discharge pipe 8, 8a, ~8d ... Compressor 9 ... Suction blower lOa, IQb. ...Pretreatment adsorption tower 11 ...min Bt n5 12 a
, 12 b = IIA landing tower l3... Product tank 14-20... Three-way valve 21... Inlet pipe
22...Separation pipe 23...Recovery pipe
24... Purge pipe 25... Purge gas circulation pipe
Claims (1)
構成される軽質ガス精製装置であって、原料ガス圧縮機
の出側を分岐して気体分離膜精製装置入側及び圧力スイ
ング吸着装置入側に夫々連結すると共に、気体分離膜装
置の透過ガス出側及び圧力スイング吸着装置のパージガ
ス排出側を前記圧縮機入側の原料ガス導入部に合流せし
める様に構成されたことを特徴とする軽質ガス精製装置
。A light gas purification device consisting of a gas separation membrane purification device and a pressure swing adsorption device, in which the outlet side of the raw gas compressor is branched and connected to the inlet side of the gas separation membrane purification device and the pressure swing adsorption device, respectively. A light gas purification apparatus characterized in that the permeate gas outlet side of the gas separation membrane device and the purge gas outlet side of the pressure swing adsorption device are configured to merge into the raw material gas introduction section on the compressor inlet side.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61208137A JPS6365930A (en) | 1986-09-04 | 1986-09-04 | Light gas purifier |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61208137A JPS6365930A (en) | 1986-09-04 | 1986-09-04 | Light gas purifier |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6365930A true JPS6365930A (en) | 1988-03-24 |
JPH0580242B2 JPH0580242B2 (en) | 1993-11-08 |
Family
ID=16551246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61208137A Granted JPS6365930A (en) | 1986-09-04 | 1986-09-04 | Light gas purifier |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6365930A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01266831A (en) * | 1988-04-18 | 1989-10-24 | Kobe Steel Ltd | Device for purifying light gas |
US5169412A (en) * | 1991-11-20 | 1992-12-08 | Praxair Technology Inc. | Membrane air drying and separation operations |
WO2023053793A1 (en) * | 2021-09-30 | 2023-04-06 | 日本碍子株式会社 | Gas separation system and gas separation method |
-
1986
- 1986-09-04 JP JP61208137A patent/JPS6365930A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01266831A (en) * | 1988-04-18 | 1989-10-24 | Kobe Steel Ltd | Device for purifying light gas |
US5169412A (en) * | 1991-11-20 | 1992-12-08 | Praxair Technology Inc. | Membrane air drying and separation operations |
WO2023053793A1 (en) * | 2021-09-30 | 2023-04-06 | 日本碍子株式会社 | Gas separation system and gas separation method |
Also Published As
Publication number | Publication date |
---|---|
JPH0580242B2 (en) | 1993-11-08 |
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