JPH01266831A - Device for purifying light gas - Google Patents
Device for purifying light gasInfo
- Publication number
- JPH01266831A JPH01266831A JP63096559A JP9655988A JPH01266831A JP H01266831 A JPH01266831 A JP H01266831A JP 63096559 A JP63096559 A JP 63096559A JP 9655988 A JP9655988 A JP 9655988A JP H01266831 A JPH01266831 A JP H01266831A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- raw material
- pressure swing
- material gas
- separation membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001179 sorption measurement Methods 0.000 claims abstract description 46
- 239000012528 membrane Substances 0.000 claims abstract description 32
- 238000000926 separation method Methods 0.000 claims abstract description 30
- 238000010926 purge Methods 0.000 claims abstract description 21
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002994 raw material Substances 0.000 claims description 48
- 238000000746 purification Methods 0.000 claims description 34
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 30
- 239000003463 adsorbent Substances 0.000 claims description 22
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 15
- 239000001569 carbon dioxide Substances 0.000 claims description 15
- 239000012466 permeate Substances 0.000 claims 1
- 239000002699 waste material Substances 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 155
- 239000000047 product Substances 0.000 description 19
- 239000012535 impurity Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 238000011084 recovery Methods 0.000 description 8
- 239000011265 semifinished product Substances 0.000 description 6
- 230000006835 compression Effects 0.000 description 4
- 238000007906 compression Methods 0.000 description 4
- 238000005345 coagulation Methods 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 3
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 238000005057 refrigeration Methods 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Hydrogen, Water And Hydrids (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Separation Of Gases By Adsorption (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、ヘリウム（トＩｃ）もしくは水素（Ｈ２）
などの軽質ガスを含む混合ガスから水分く１１２０）、
二酸化炭素（ＣＯ２）および空気成分などの不純物を除
去して１−１０もしくは１−１２を精製回収する装置に
関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention is applicable to helium (Ic) or hydrogen (H2).
Remove moisture from a mixed gas containing light gases such as 1120),
This invention relates to an apparatus for purifying and recovering 1-10 or 1-12 by removing impurities such as carbon dioxide (CO2) and air components.
従来、軽質ガス＄５製装置としては低温吸着法による精
製装置、凝固法による精製装置、分離膜法と圧力スイン
グ吸着法との組合せによる精製装置（例えば特開昭６１
−１２７６０９号公報参照）などが知られている。これ
らのうち、低温吸’ｆｑ ｒｋによる精製装置や凝固法
による精製装置では不純物の吸着や凝固に寒冷を必要と
するために、分離膜法と圧力スイング吸着法との組合せ
による精製装置が常温操作をすることができる点で理想
的なものと考えられている。Conventionally, as equipment for producing light gas $5, purification equipment using a low temperature adsorption method, purification equipment using a coagulation method, purification equipment using a combination of a separation membrane method and a pressure swing adsorption method (for example, JP-A-61
-127609) and the like are known. Among these, purification equipment using low-temperature absorption fq rk and purification equipment using the coagulation method require cooling for adsorption and coagulation of impurities, so purification equipment that uses a combination of separation membrane method and pressure swing adsorption method can be operated at room temperature. It is considered ideal in that it allows for
上記分離膜法と圧力スイング吸容法との組合ゼによる精
製装置は、第２図に示すように気体分離膜精製手段２ａ
と圧力スイング吸着手段４ａとを直列接続したものであ
る。この精製装置において、原料ガス供給管路１２ａか
ら供給される原料ガスは原ｉ々１ガス月ｆ？ｉ機１ Ｑ
ａによって加１■され、この加圧された原料ガスを前
処理１５７のいずれかの吸ｒｉ塔７１．７２に通ずこと
により原料ガスからＨ２０Ｊ３よびＣＯ２成分を除去し
、残りのガスを導入？へ２０ａを介して気体分離膜精製
手段２ａ１．：導入する。この導入された原料ガスのう
ち分離膜２１ａに対して不透過性を示づ０２やＮ２など
の不純成分は１１出管２３ａから系外に放出され、透過
ヤ１を示Ｊ軽買ガス（１−１ｃ）などからなる処理湾み
ガス（以下単に゛￥製品ガスという）は出口側の分離配
管２２ａに流れる。A purification apparatus using a combination of the separation membrane method and the pressure swing absorption method is as shown in FIG.
and pressure swing adsorption means 4a are connected in series. In this refining device, the raw material gas supplied from the raw material gas supply pipe 12a is originally i1 gas month f? i machine 1 Q
H20J3 and CO2 components are removed from the raw material gas by passing this pressurized raw material gas to one of the RI towers 71 and 72 of the pretreatment 157, and the remaining gas is introduced. to gas separation membrane purification means 2a1. through 20a. :Introduce. Of this introduced raw material gas, impurity components such as 02 and N2 that are impermeable to the separation membrane 21a are released from the system from the 11 outlet pipe 23a, and the permeation layer 1 is shown as the J light purchase gas (1 -1c) and the like (hereinafter simply referred to as "product gas") flows to the separation pipe 22a on the outlet side.
上記半製品ガスは圧縮１１１０ｂによって再び加圧され
て圧力スイング吸着手段４ａのいずれかの吸ｉ′？塔４
１ａ、４２ａに供給される。この吸着塔４１ａ、４２ａ
では上記半製品ガス中の不純成分が活性炭などの吸着剤
に吸着され、残りのｌｉｅ成分が回収管路４３ａを通し
て製品タンク６ａに回収される。The semi-finished product gas is again pressurized by the compression 1110b and is then sucked i'? tower 4
1a and 42a. These adsorption towers 41a, 42a
Then, the impure components in the semi-finished product gas are adsorbed by an adsorbent such as activated carbon, and the remaining lie components are recovered into the product tank 6a through the recovery pipe 43a.
吸着塔４１８．４２ａ内の吸析剤の不純成分吸盾能力が
飽和に達した時には、製品タンク６ａ内の製品ガスをパ
ージ用ガスとしてパージ用ガス供給管路’１４ａから吸
γ、塔４１ａ、４２ａに逆送させることによりＬ記不純
成分をパージし、不純成分を含むパージガス（以下単に
循環用ガスという）はパージガス循Ｉフ用管路４５ ａ
を通して原料ガス供給管路１２ａに戻されて角刈用され
る。When the ability of the adsorbent in the adsorption tower 418.42a to absorb impurity components reaches saturation, the product gas in the product tank 6a is used as a purge gas to adsorb from the purge gas supply pipe '14a, and the tower 41a, 42a, the impure components listed in L are purged, and the purge gas containing the impure components (hereinafter simply referred to as circulation gas) is passed through the purge gas circulation pipe 45a.
The raw material gas is returned to the raw material gas supply pipe 12a for cutting.
（発明が解決しようとする課題）
上記従来の粘′！Ｊ装買においては、気体分離膜ｔへ装
丁段２ａからの半製品ガスと圧力スイング成層手段４ａ
からの循環用ガスとはいずれも常圧に近いために、上記
半製品ガスの圧力スイング＋１！＞−ｉ手段４ａへの供
給、循環用ガスの気体分離膜精製手段２ａへの供給に際
しては、それぞれの経路に圧縮ｎ１０ａ、１０ｂを設け
、これらの圧縮機１゜ａ、１０ｂに通づことにより調圧
もしく（よ加圧する必要がある。また上記循環用ガスは
圧力スイング吸４手段４ａから間欠的に１）１出される
ために、パージガス循環用管路４５２１にはガス圧を均
圧化づるための緩衝手段（図示せず）を別に設ける必要
がある。このため上記圧縮ｔｉ１０ａ、１０ｂや緩衝手
段などの分だけ装置の構成が複雑となる。(Problem to be solved by the invention) The above conventional adhesive! In J-equipment, the semi-finished product gas from the binding stage 2a and the pressure swing stratification means 4a are transferred to the gas separation membrane t.
Since the circulating gas from the above is close to normal pressure, the pressure swing of the semi-finished product gas mentioned above is +1! >-i When supplying the gas for circulation to the means 4a and supplying the gas for circulation to the gas separation membrane purification means 2a, compressors 10a and 10b are provided in each route, and the gas is passed through these compressors 1°a and 10b. It is necessary to adjust the pressure or pressurize it.Also, since the above-mentioned circulating gas is intermittently discharged from the pressure swing suction means 4a, the gas pressure is equalized in the purge gas circulation pipe 4521. It is necessary to separately provide a buffer means (not shown) for the suspension. Therefore, the configuration of the apparatus becomes complicated due to the compression tires 10a, 10b, buffer means, etc.
また上記装置を連続運転させるにｔよ、複数の圧縮ｔｆ
ｆ１０ａ、１０ｂの入口側および出口側のガス圧を装置
全体の運転状況に合せて数多くの制御機器によって］ン
トロールしなｔプればならず、複雑な制ｍ＋系ヤ）圧力
制御操作が要求されている。In addition, if the above device is operated continuously, multiple compression tf
The gas pressure on the inlet and outlet sides of f10a and f10b must be controlled by numerous control devices according to the operating conditions of the entire device, and complex control systems and pressure control operations are required. ing.
そこで、運転操作および制御を容易化づるために、圧縮
機として原料ガス圧縮機の１つだけ用い、この原料ガス
圧縮機によって加圧される原料ガスを気体分離膜精製手
段と圧力スイング吸４手段とに分岐し−（送給されるよ
うに管路構成するとともに、気体分離膜精製手段からの
半製品ガスをＩ京料ガス圧縮機の入口側に循環させて原
料ガス中の軽質ガス濃度および軽質ガス吊を高めるよう
に装置を’ｔ１４成づることが考えられる。Therefore, in order to facilitate operation and control, only one raw material gas compressor is used as a compressor, and the raw material gas pressurized by this raw material gas compressor is transferred to a gas separation membrane purification means and four pressure swing suction means. The pipe is constructed so that the semi-finished product gas from the gas separation membrane purification means is circulated to the inlet side of the gas compressor to reduce the concentration of light gas in the raw material gas and It is conceivable that the equipment will be constructed in 't14 to increase the light gas capacity.
ところが、この場合においてもト１２０やＣＯ２の除去
は前処理塔で吸着させることにより行われる。したがっ
て前処理塔の２つの吸着塔について吸着および再生の２
工程に切換え運転操作する必要があるとともに、この前
処理塔の分だけ装置も複鎖化する。However, even in this case, removal of CO120 and CO2 is carried out by adsorption in a pretreatment tower. Therefore, for the two adsorption towers of the pretreatment tower, the adsorption and regeneration
It is necessary to switch operations between processes, and the equipment is also multi-chained due to the number of pre-treatment towers.
この発明は、このような従来の欠点を解消覆るためにな
されたものであり、簡易な構成で、かつ運転操作を容易
に行うことができ、しかし従来と同様に高い純度および
回収率で精製することができる軽質ガス精製装置を提供
−することを目的としている。This invention was made in order to overcome these conventional drawbacks, and has a simple structure and easy operation, while purifying with the same high purity and recovery rate as the conventional method. The purpose of the present invention is to provide a light gas purification device that can perform the following steps.
上記１」的を達成するために、この発明では比重ガス圧
縮機と、気体分離膜精製手段と、圧力スイング吸着手段
と、フロンガス冷凍機とを有し、上記原料ガス圧縮機の
出口側は気体分ｍｌ精製１段の人口側と、圧力スイング
吸着手段の入口側とに分岐し゛（接続され、上記気体分
離膜精製手段の透過ガスの出口側と圧力スイング吸着手
段のパージガスの排出側とは原料ガス圧縮機の入口側の
原ｆｊｌガス導入部と合流するように接続され、上記フ
ロンガス冷凍機は上記原料ガス圧縮機と圧力スイング吸
着手段との間に介在されているとともに、圧力スイング
吸着塔には水分、空気および二酸化炭素を選択的に吸着
する吸着剤が充填されているように構成した。In order to achieve the above object 1, the present invention includes a specific gravity gas compressor, a gas separation membrane purification means, a pressure swing adsorption means, and a fluorocarbon gas refrigerator, and the outlet side of the raw material gas compressor is equipped with a gas It is branched into the input side of the first stage of minute ml purification and the inlet side of the pressure swing adsorption means. The fluorocarbon gas refrigerator is connected to the raw fjl gas introduction section on the inlet side of the gas compressor, and is interposed between the raw material gas compressor and the pressure swing adsorption means, and is connected to the pressure swing adsorption tower. was constructed so that it was filled with an adsorbent that selectively adsorbs moisture, air, and carbon dioxide.
上記構成によれば、従来装置にＪ３いては前処理塔によ
って除去されていたｌ−１２０とＣＯ２とについて、１
１２０はフロンガス冷凍機、ＣＯ２は上記圧力スイング
吸着手段の吸着剤によってそれぞれ除去される。これに
よって上記前処理塔を省略することができるので、装置
を簡易に構成することができるとともに、前処理塔に要
していた切換え操作を省略することができる。According to the above configuration, 1-120 and CO2, which were removed by the pre-treatment tower in J3 in the conventional device, are removed by 1
120 is a fluorocarbon gas refrigerator, and CO2 is removed by the adsorbent of the pressure swing adsorption means. As a result, the pretreatment tower can be omitted, so that the apparatus can be configured simply and the switching operation required for the pretreatment tower can be omitted.
第１図において、原料ガス供給管路１には原料ガス圧縮
機１０が設けられ、この原料ガス圧縮機１０の出口側原
料ガス供給管路１１は２つの分岐管１１１．１１２に分
岐され、一方の分岐管１１１は気体分離膜精製手段２の
入口側、他方の分岐管１１２はフロンガス冷凍機３を介
して圧力スイング吸着手段４の入口側とそれぞれ接続さ
れている。In FIG. 1, a raw material gas supply pipe 1 is provided with a raw material gas compressor 10, and an outlet side raw material gas supply pipe 11 of this raw material gas compressor 10 is branched into two branch pipes 111 and 112, one of which is The branch pipe 111 is connected to the inlet side of the gas separation membrane purification means 2, and the other branch pipe 112 is connected to the inlet side of the pressure swing adsorption means 4 via the fluorocarbon gas refrigerator 3.
気体分離膜精製手段２の分離膜２１は、ｌ−１ｅを選択
的に透過し、ＣＯ２および空気成分などは透過しにくい
性質を有するもので、例えば酢酸セルロース躾、ポリイ
ミド膜もしくはポリスルフォン酸膜などによって形成さ
れている。The separation membrane 21 of the gas separation membrane purification means 2 has a property of selectively permeating l-1e and hardly permeating CO2 and air components, such as a cellulose acetate membrane, a polyimide membrane, or a polysulfonic acid membrane. is formed by.
上記分離膜２１を挟んで透過ガスの出口側は分離配管２
２によって原料ガス圧縮１１１１０人口側の入口側原料
ガス供給管路１２と合流するように接続され、これにに
って分離膜２１を透過したＨａ酸成分らなる半製品ガス
（透過ガス）は上記分離配管２２を通して入口側原料ガ
ス供給管路１２内の原料ガスと合流される。また上記分
離膜２１を透過しない不純成分は排出管２３がら系外へ
放出されるようにしている。Separation piping 2 is located on the exit side of the permeated gas across the separation membrane 21.
2, the raw material gas compression 11110 is connected so as to merge with the inlet side raw material gas supply pipe 12 on the population side, and the semi-finished gas (permeated gas) consisting of the Ha acid component that has permeated through the separation membrane 21 is thereby The raw material gas in the inlet side raw material gas supply pipe 12 is merged with the raw material gas through the separation pipe 22 . Further, impurity components that do not pass through the separation membrane 21 are discharged out of the system through a discharge pipe 23.
フロンガス冷凍機３は、一般のフロン系冷媒（例えばＲ
−１２）を用いた汎用的な冷凍機であり、除去するｌ−
１２０が氷結しないように例えば５層程度の温度に調整
され、またドレンはオートドレンによって除去されるよ
うに構成している。The fluorocarbon gas refrigerator 3 uses a general fluorocarbon refrigerant (for example, R
-12) It is a general-purpose refrigerator that uses l-
The temperature is adjusted to, for example, about 5 layers so that the water 120 does not freeze, and the drain is removed by an auto drain.
圧力スイング吸着手段４は、２堪の吸着塔４１゜４２か
らなり、これらの吸着塔４１．４２内にはト１２ｏ除去
用の第１の吸着剤５１として例えば゛合成ビオライト、
ＣＯ２および空気成分除去用の第２の吸着剤５２として
例えば活性炭が下部入口側から順に２層に分けて充填さ
れている。上記合成ビオライトと活性炭とは、合成ゼオ
ライトが１に対して活性炭を例えば３の割合で充填され
ている。The pressure swing adsorption means 4 consists of two adsorption towers 41 and 42, and in these adsorption towers 41 and 42, for example, "synthetic biolite,
As the second adsorbent 52 for removing CO2 and air components, activated carbon, for example, is filled in two layers sequentially from the lower inlet side. The synthetic biolite and activated carbon are filled with activated carbon in a ratio of, for example, 3 parts to 1 part synthetic zeolite.
上記吸着塔４１．４２の上部出口側は回収管路４３によ
って製品タンク６と接続され、これにより吸着塔４１．
４２で原料ガス中の不純成分が吸着除去された残りの１
１０成分が製品タンク６に回収されるようにしている。The upper outlet side of the adsorption tower 41.
The remaining 1 from which the impurity components in the raw material gas were adsorbed and removed in step 42
Ten components are collected in the product tank 6.
またこの製品タンク６と上記吸着塔４１．４２の上部出
口側とはパージ用ガス供給管路４４によって互いに接続
され、これにより製品タンク６内の回収Ｈｅ （’１
品ガス）がパージ用ガスとして吸着塔４１．４２に逆送
され、この製品ガスによって吸着剤５１．５２に吸着さ
れた不純成分が脱着されるようにしている。Further, this product tank 6 and the upper outlet sides of the adsorption towers 41 and 42 are connected to each other by a purge gas supply pipe 44, whereby the recovered He ('1
Product gas) is sent back to the adsorption tower 41.42 as a purge gas, and impurity components adsorbed on the adsorbent 51.52 are desorbed by this product gas.
吸着塔４１．４２の下部入口側と入口側原料ガス供給管
路１２とはパージガス循環用管路４５によって互いに接
続され、これによって吸着塔４１゜４２内のパージガス
が上記パージガス循環用管路４５を通して入口側原料ガ
ス供給管路１２の原料ガスと合流するようにしている。The lower inlet side of the adsorption towers 41 and 42 and the inlet side raw material gas supply pipe 12 are connected to each other by a purge gas circulation pipe 45, so that the purge gas in the adsorption towers 41 and 42 passes through the purge gas circulation pipe 45. He is trying to merge with the raw material gas of the inlet side raw material gas supply pipe line 12.
なお、上記吸着塔４１．４．２への分岐管１１２からの
原料ガスの供給、回収管路４３を通した製品タンク６へ
の１−１０成分の回収、パージ用ガス供給管路４４から
の製品ガスの供給、およびパージガス循環用管路４５を
通したパージガスの１月出なトＧ、ｔ４ ”） １７）
３方弁４６．４７．４８．４９ノ＃１ｌｌｌ操作によ
って切換え操作が行われるようにしている。In addition, supply of the raw material gas from the branch pipe 112 to the adsorption tower 41.4.2, recovery of components 1-10 to the product tank 6 through the recovery pipe 43, and supply of the raw material gas from the purge gas supply pipe 44. Product gas supply and purge gas discharge through the purge gas circulation pipe 45 (G, t4'') 17)
The switching operation is performed by operating the three-way valve 46, 47, 48, and 49 #1llll.
また原料ガス圧縮機１０によって加圧された原石ガスは
、気体分離膜精製手段２側の分岐管１１１に対して例え
ば１０〜４０％程度、圧力スイング吸着手段４側の分岐
管１１２に対して例えば９０〜６０％程度の供給比率と
なるように分配される。この分配調節をするには、圧力
調整、流量調整および濃度調整などにより自動制御を行
えばよく、第１図に示す装置では気体分離膜精製手段２
側に製電調整、圧力スイング吸着手段４側に流Ｍ調整、
原料ガス１１縮機１０側に圧力調整の自動詞ｔ１１１Ｔ
′、段（図示せず）がそれぞれ設けられ、これらの自動
ａＩ制御により分配調節が行なわれている。Further, the raw gas compressed by the raw material gas compressor 10 is, for example, about 10 to 40% of the branch pipe 111 on the gas separation membrane purification means 2 side, and about 10% to 40%, for example, relative to the branch pipe 112 on the pressure swing adsorption means 4 side. It is distributed at a supply ratio of about 90 to 60%. In order to adjust this distribution, automatic control such as pressure adjustment, flow rate adjustment, concentration adjustment, etc. can be performed.In the apparatus shown in FIG.
Electricity adjustment on the side, flow M adjustment on the pressure swing adsorption means 4 side,
Pressure adjustment intransitive t111T on the raw material gas 11 compressor 10 side
', stages (not shown) are provided, and distribution adjustment is performed by automatic aI control of these stages.
」１記構成の軽質ガス精製装置にＪ３いて、原料ガス圧
縮機１０によって加圧された原料ガスが所定の供給比率
で２つの分岐管１１１，１１２に分配され、この原ｒ１
ガスは分岐管１１１を通して気体分離膜精製手段２、分
岐管１１２を通してフロンガス冷凍）幾３および圧力ス
イング吸着手段４にそれぞれ供給される。In the light gas purification apparatus J3 having the configuration described in 1 above, the raw material gas pressurized by the raw material gas compressor 10 is distributed to two branch pipes 111 and 112 at a predetermined supply ratio, and this raw material r1
The gas is supplied through a branch pipe 111 to the gas separation membrane purification means 2, through a branch pipe 112 to a fluorocarbon gas refrigeration system 3, and a pressure swing adsorption means 4, respectively.
気体分離膜精製手段２に供給された原料ガスのうら分離
膜２１を透過しないＣＯ２や空気成分はＩＩ出管２３を
通して放出され、上記分１１１膜２１を透過するｌ」ｅ
成分（よ分離配管２２を通して入口側原石ガス供給管路
１２に戻される。これによってＩｊｒｊ石ガス圧縮１１
０に取入れられる原料ガスの１１Ｃガス１ＩＩＩＱやＨ
ｅガス量が元の原料ガスよりも増１：＋１ する。CO2 and air components that do not pass through the separation membrane 21 from the raw material gas supplied to the gas separation membrane purification means 2 are released through the II outlet pipe 23, and the above-mentioned portions 111 pass through the membrane 21.
The components (return to the inlet gas supply pipe 12 through the separation pipe 22.
11C gas 1IIIQ and H of raw material gas introduced into 0
The amount of e-gas increases by 1:+1 compared to the original raw material gas.
分岐管１１２を通してフロンガス冷凍機３に供給された
Ｉ）：ｌｉ ＄１ガスは、その１」；（料ガス中の１１
２０が凝縮除去され、所定量になればオートドレンによ
り抽出される。このフロンガス冷凍機３を通ることによ
り１１２０が除去された原料ガスは圧力スイング吸る手
段４の吸着ｊハ４１，４２にその下部入Ｅ］側から導入
され、この吸着塔４１．４２では第１の吸着剤にＪ、っ
て上記１京料ガス中の１１２０がさらに吸着除去される
とともに、第２の吸４剤ににつて００２や空気成分が吸
着除去される。これにより導入された原ねガスは不ｆｉ
”Ｔ！物澗度が（，１ぼ１０００ｍ以下、露ｓｋｉがは
ば一７０℃以下になるように精製され、吸着されずに残
った１−１０成分が回収管ｌｔ８／１３を通して製品タ
ンク６に回収される。この製品タンク６内の製品ガスは
製品ガス取出し管６１を通して取出され、例、えば超゛
市導１ｉ？Ｔｉ冷ｆＪＩ用のＨｃ液化冷凍装置などに循
環されて使用される。The I):li $1 gas supplied to the fluorocarbon gas refrigerator 3 through the branch pipe 112 is
20 is condensed and removed, and when a predetermined amount is reached, it is extracted by an auto drain. The raw material gas from which 1120 has been removed by passing through this fluorocarbon gas refrigerator 3 is introduced into the adsorption chambers 41 and 42 of the pressure swing suction means 4 from the lower inlet side, and in this adsorption column 41 and 42, the first The 1120 in the above-mentioned gas is further adsorbed and removed by the adsorbent J, and 002 and air components are adsorbed and removed by the second adsorbent. The raw gas introduced by this is non-fi
The product is purified so that the concentration is less than 1,000m and the dew ski is less than 70°C, and the components 1-10 that remain unadsorbed are passed through the recovery pipe lt8/13 to the product tank 6. The product gas in the product tank 6 is taken out through a product gas take-out pipe 61, and is circulated and used, for example, in a Hc liquefaction refrigeration system for ultra-high-quality commercial 1i?Ti refrigerated FJI.
吸着剤５１．５２の不純物吸着能力が飽和に達した時に
ｔま、製品タンク６の製品ガスがパージ用ガス供給管路
４４を通して吸着塔／１１．４２に逆送され、この製品
ガスによって上記不純物がバージされる。このバルジガ
スはパージガス循環用管路４５を通して入ロ側１京料ガ
ス供給管路１２に戻されてｌｉ：ｊ Ｆ＋ガスの一部と
して再利用される。When the impurity adsorption capacity of the adsorbent 51.52 reaches saturation, the product gas in the product tank 6 is sent back to the adsorption tower/11.42 through the purge gas supply pipe 44, and the product gas removes the impurities. is barged. This bulge gas is returned to the inlet gas supply pipe 12 through the purge gas circulation pipe 45 and reused as part of the li:j F+ gas.
なお上記パージエ稈は間欠的に行なわれるので、入口側
原料ガス供給管路１２内を流通するガス耐に変動を生じ
ることになる。ところが、この人［Ｊ側原料ガス供給管
路１２には一定量で供給される原料ガスと、気体分離膜
精製手段２から戻される半製品ガスとによつ゛Ｃ比較的
多吊のガスが定常的に供給されるので、ト記パージガス
によるガス量変動ｔよ比較的小さく、原料ガス圧縮機１
００汀線能力に大きな影響を与えることはない。Note that since the above-mentioned purge is performed intermittently, the flow rate of the gas flowing through the inlet side raw material gas supply pipe 12 will vary. However, due to the raw material gas supplied in a fixed amount to the J-side raw material gas supply pipe 12 and the semi-finished product gas returned from the gas separation membrane purification means 2, a relatively large amount of gas is constantly present. Since the gas amount fluctuation t due to the purge gas mentioned above is relatively small, the raw material gas compressor 1
00 shoreline capability will not be significantly affected.
このように第１図に示す軽質ガス精ＷＡ装置では、原料
ガス中のト１２０がフロンガス冷凍）蔑３と圧力スイン
グ吸着手段４の吸着塔４１．４２内の第１の吸着剤によ
って、またＣＯ２が上記吸着塔４１゜４２内の第２の吸
着剤によってそれぞれ確実に除去されるために、第２図
に示す従来装置における前処理塔７を省略することがで
きる。またフロンガス冷凍機３には原ｌｉｔガスを単に
通すだけでの操作でよく、しかしこのフロンガス冷凍機
３は汎用的くｇものぐ構成りることができるために、精
製装置を従来装置と比べて簡易に構成することができ、
その操作も上記前処理塔７の操作が省略される分だｔ」
従来装置に比べて容易に行うことができる。In this way, in the light gas purification WA apparatus shown in FIG. are reliably removed by the second adsorbents in the adsorption towers 41 and 42, so that the pretreatment tower 7 in the conventional apparatus shown in FIG. 2 can be omitted. In addition, the fluorocarbon gas refrigerator 3 only needs to be operated by simply passing raw lit gas through it, but since the fluorocarbon gas refrigerator 3 can be constructed in many general-purpose configurations, the purification equipment is not as good as the conventional equipment. Can be easily configured,
This operation also omits the operation of the pretreatment tower 7.
This can be done more easily than with conventional equipment.
しかし得られる製品ガスは従来装置と同様の１−（ｅ純
度および回収率を維持づることができる。However, the resulting product gas can maintain the same 1-(e purity and recovery rate as the conventional device).
原１１ガスとして１−１０が９８容Ｍ％、空気成分、１
」２０．ＣＯ２などの不純物の合計が２容５１％のａ合
ガスを用いて第１図に示す軽質ガス精製装置により精製
試験を行った結果、１ｌｅＩ１１！度９９．９９９％、
露点−７５℃の１１０ガスを９９．５％の回収率で１１
することができた。1-10 as raw 11 gas 98 volume M%, air component, 1
”20. A purification test was conducted using the light gas purification apparatus shown in Fig. 1 using a mixture gas containing a total of 2 volumes and 51% of impurities such as CO2, and the result was 1leI11! degree 99.999%,
110 gas with a dew point of -75℃ with a recovery rate of 99.5%
We were able to.
なお上記実施例ではフロンガス冷凍機３を分岐管１１２
上に設けているが、このフロンガス冷凍ｎ３を設ける位
買は原料ガス圧縮機１０と圧力スイング吸着手段４との
間であればよく、例えば上記フロンガス冷凍機３を分岐
１１すの出口側原料ガス供給管路１１上に設けてもよい
。In the above embodiment, the fluorocarbon gas refrigerator 3 is connected to the branch pipe 112.
Although this fluorocarbon gas refrigerator n3 is provided above, it is only necessary to provide it between the raw material gas compressor 10 and the pressure swing adsorption means 4. For example, the fluorocarbon gas refrigerator 3 is connected to the raw material gas on the outlet side of the branch 11. It may also be provided on the supply pipe line 11.
また上記実施例においては、第１の吸着剤と第２の吸着
剤とが２層に分（Ｊて吸着塔４１．４２内に充填されて
いるが、これに限らず、例えば上記第１の吸着剤と第２
の吸着剤とを互いに混合し、この混合された２種類の吸
着剤を上記吸着塔４１゜４２内に充填してもＪ：い。さ
らに２種類の吸着剤を用いずに、１種類の吸着剤（例え
ば合成ゼオライト）を吸着塔４１．４２内に充填し、こ
の１種類の吸着剤によって［］２０、ＣＯ２および空気
成分の吸着を行なわすようにしてもよい。Further, in the above embodiment, the first adsorbent and the second adsorbent are divided into two layers (J and filled in the adsorption tower 41 and 42, but the invention is not limited to this. For example, the first adsorbent adsorbent and second
It is also possible to mix these adsorbents with each other and fill the adsorption towers 41 and 42 with the two mixed adsorbents. Furthermore, instead of using two types of adsorbents, one type of adsorbent (for example, synthetic zeolite) is filled into the adsorption tower 41, 42, and this one type of adsorbent can adsorb []20, CO2, and air components. You may also do so.
また上記実施例では１−１８を含む混合ガスからト１ｅ
を精製する場合について説明したが、Ｈｅの他にＨ２も
Ｈｅと同様の性状を有するために、ト１２を含む混合ガ
スから！−１２を精製する場合にもこの発明の精製装置
を適用することができる。Further, in the above embodiment, from the mixed gas containing 1-18 to 1e
Although we have explained the case of refining H2 in addition to He, since H2 also has properties similar to He, from a mixed gas containing G12! The purification apparatus of the present invention can also be applied to purification of -12.
この発明の！１質ガス精製装置によれば、従来装四では
前処理塔によって除去されていたｌ−１２０とＣＯ２と
について、Ｈ２Ｏは汎用機器であるフロンガス冷凍機お
よび圧力スイング吸着手段の吸む剤、ＣＯ２は上記圧力
スイング吸着手段の吸着剤によってそれぞれ確実に除去
することができるので、上記前処理塔を省略することが
でき、これによって装置を簡易に構成することができる
とともに、前処理塔の切換え操作などを省略することが
でき、運転操作を容易に行うことができる。しかも従来
と同様に高い純度および回収率で精製することができる
。This invention! According to the primary gas purification system, with respect to l-120 and CO2, which were removed by the pretreatment tower in the conventional system, H2O is used as a suction agent for the fluorocarbon gas refrigerator and pressure swing adsorption means, which are general-purpose equipment, and CO2 is Since each can be reliably removed by the adsorbent of the pressure swing adsorption means, the pretreatment tower can be omitted, and this allows for a simple configuration of the device, as well as switching operations for the pretreatment tower. can be omitted, making driving operations easier. Moreover, it can be purified with high purity and recovery rate as in the conventional method.
第１図はこの発明の詳細な説明図、第２図は従来の軽質
ガス精製装置の説明図である。
２・・・気体分−１膜精製手段、３・・・フロンガス冷
凍機、４・・・圧力スイング吸着手段、１０・・・原れ
ガス圧縮機、１２・・・入口側原石ガス供給管路（原料
ガス導入部＞、５１．５２・・・吸着剤。FIG. 1 is a detailed explanatory diagram of the present invention, and FIG. 2 is an explanatory diagram of a conventional light gas purification apparatus. 2... Gas component-1 membrane purification means, 3... Freon gas refrigerator, 4... Pressure swing adsorption means, 10... Raw gas compressor, 12... Raw ore gas supply pipe on the inlet side (Raw material gas introduction section>, 51.52...adsorbent.
Claims (1)
イング吸着手段と、フロンガス冷凍機とを有し、上記原
料ガス圧縮機の出口側は気体分離膜精製手段の入口側と
、圧力スイング吸着手段の入口側とに分岐して接続され
、上記気体分離膜精製手段の透過ガスの出口側と圧力ス
イング吸着手段のパージガスの排出側とは原料ガス圧縮
機の入口側の原料ガス導入部と合流するように接続され
、上記フロンガス冷凍機は上記原料ガス圧縮機と圧力ス
イング吸着手段との間に介在されているとともに、圧力
スイング吸着塔には水分、空気および二酸化炭素を選択
的に吸着する吸着剤が充填されていることを特徴とする
軽質ガス精製装置。1. It has a raw material gas compressor, a gas separation membrane purification means, a pressure swing adsorption means, and a freon gas refrigerator, and the outlet side of the raw material gas compressor is connected to the inlet side of the gas separation membrane purification means, and the pressure swing The permeate gas outlet side of the gas separation membrane purification means and the purge gas discharge side of the pressure swing adsorption means are branched and connected to the inlet side of the adsorption means, and the raw material gas introduction part on the inlet side of the raw gas compressor The fluorocarbon gas refrigerator is interposed between the raw material gas compressor and the pressure swing adsorption means, and the pressure swing adsorption tower selectively adsorbs moisture, air, and carbon dioxide. A light gas purification device characterized by being filled with an adsorbent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63096559A JPH0624604B2 (en) | 1988-04-18 | 1988-04-18 | Light gas purification equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63096559A JPH0624604B2 (en) | 1988-04-18 | 1988-04-18 | Light gas purification equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01266831A true JPH01266831A (en) | 1989-10-24 |
| JPH0624604B2 JPH0624604B2 (en) | 1994-04-06 |
Family
ID=14168405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63096559A Expired - Lifetime JPH0624604B2 (en) | 1988-04-18 | 1988-04-18 | Light gas purification equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0624604B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002308605A (en) * | 2001-04-11 | 2002-10-23 | Japan Pionics Co Ltd | Method for refining gaseous hydrogen |
| JP2003068630A (en) * | 2001-08-29 | 2003-03-07 | Kyocera Corp | Aligner |
| US7294172B2 (en) * | 2001-07-31 | 2007-11-13 | Praxair Technology, Inc. | Helium recovery |
| JP4721575B2 (en) * | 2001-08-29 | 2011-07-13 | 京セラ株式会社 | Exposure equipment |
| WO2015146211A1 (en) * | 2014-03-28 | 2015-10-01 | 住友精化株式会社 | Method and system for purifying helium gas |
| JP2020523548A (en) * | 2017-06-08 | 2020-08-06 | サウジ アラビアン オイル カンパニー | Helium recovery from gaseous streams |
| CN113828103A (en) * | 2021-08-19 | 2021-12-24 | 大连海奥膜技术有限公司 | Process and equipment for recovering light hydrocarbon and carbon dioxide associated with oil field flooding gas |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61283324A (en) * | 1985-06-05 | 1986-12-13 | Mitsubishi Electric Corp | Apparatus for removing carbon dioxide |
| JPS6365930A (en) * | 1986-09-04 | 1988-03-24 | Kobe Steel Ltd | Light gas purifier |
-
1988
- 1988-04-18 JP JP63096559A patent/JPH0624604B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61283324A (en) * | 1985-06-05 | 1986-12-13 | Mitsubishi Electric Corp | Apparatus for removing carbon dioxide |
| JPS6365930A (en) * | 1986-09-04 | 1988-03-24 | Kobe Steel Ltd | Light gas purifier |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002308605A (en) * | 2001-04-11 | 2002-10-23 | Japan Pionics Co Ltd | Method for refining gaseous hydrogen |
| US7294172B2 (en) * | 2001-07-31 | 2007-11-13 | Praxair Technology, Inc. | Helium recovery |
| JP2003068630A (en) * | 2001-08-29 | 2003-03-07 | Kyocera Corp | Aligner |
| JP4721575B2 (en) * | 2001-08-29 | 2011-07-13 | 京セラ株式会社 | Exposure equipment |
| WO2015146211A1 (en) * | 2014-03-28 | 2015-10-01 | 住友精化株式会社 | Method and system for purifying helium gas |
| CN105939960A (en) * | 2014-03-28 | 2016-09-14 | 住友精化株式会社 | Method and system for purifying helium gas |
| KR20160138377A (en) * | 2014-03-28 | 2016-12-05 | 스미또모 세이까 가부시키가이샤 | Method and system for purifying helium gas |
| JPWO2015146211A1 (en) * | 2014-03-28 | 2017-04-13 | 住友精化株式会社 | Helium gas purification method and purification system |
| JP2020523548A (en) * | 2017-06-08 | 2020-08-06 | サウジ アラビアン オイル カンパニー | Helium recovery from gaseous streams |
| CN113828103A (en) * | 2021-08-19 | 2021-12-24 | 大连海奥膜技术有限公司 | Process and equipment for recovering light hydrocarbon and carbon dioxide associated with oil field flooding gas |
| CN113828103B (en) * | 2021-08-19 | 2023-11-10 | 大连海奥膜技术有限公司 | Process and equipment for recycling light hydrocarbon and carbon dioxide in oilfield flooding companion gas |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0624604B2 (en) | 1994-04-06 |
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