JPS6361613B2 - - Google Patents

Info

Publication number
JPS6361613B2
JPS6361613B2 JP56178987A JP17898781A JPS6361613B2 JP S6361613 B2 JPS6361613 B2 JP S6361613B2 JP 56178987 A JP56178987 A JP 56178987A JP 17898781 A JP17898781 A JP 17898781A JP S6361613 B2 JPS6361613 B2 JP S6361613B2
Authority
JP
Japan
Prior art keywords
reticle
photoelectric conversion
conversion element
exposure
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56178987A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5880544A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17898781A priority Critical patent/JPS5880544A/ja
Publication of JPS5880544A publication Critical patent/JPS5880544A/ja
Publication of JPS6361613B2 publication Critical patent/JPS6361613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP17898781A 1981-11-10 1981-11-10 露光装置におけるレチクル上の異物検出装置 Granted JPS5880544A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17898781A JPS5880544A (ja) 1981-11-10 1981-11-10 露光装置におけるレチクル上の異物検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17898781A JPS5880544A (ja) 1981-11-10 1981-11-10 露光装置におけるレチクル上の異物検出装置

Publications (2)

Publication Number Publication Date
JPS5880544A JPS5880544A (ja) 1983-05-14
JPS6361613B2 true JPS6361613B2 (enrdf_load_stackoverflow) 1988-11-29

Family

ID=16058127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17898781A Granted JPS5880544A (ja) 1981-11-10 1981-11-10 露光装置におけるレチクル上の異物検出装置

Country Status (1)

Country Link
JP (1) JPS5880544A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643539A (en) * 1979-09-19 1981-04-22 Hitachi Ltd Defect inspection device of face plate

Also Published As

Publication number Publication date
JPS5880544A (ja) 1983-05-14

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