JPS635898B2 - - Google Patents
Info
- Publication number
- JPS635898B2 JPS635898B2 JP57211095A JP21109582A JPS635898B2 JP S635898 B2 JPS635898 B2 JP S635898B2 JP 57211095 A JP57211095 A JP 57211095A JP 21109582 A JP21109582 A JP 21109582A JP S635898 B2 JPS635898 B2 JP S635898B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- buffer area
- processed
- vacuum
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P72/3411—
-
- H10P72/0452—
-
- H10P72/3306—
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57211095A JPS59101848A (ja) | 1982-12-01 | 1982-12-01 | 真空処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57211095A JPS59101848A (ja) | 1982-12-01 | 1982-12-01 | 真空処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59101848A JPS59101848A (ja) | 1984-06-12 |
| JPS635898B2 true JPS635898B2 (index.php) | 1988-02-05 |
Family
ID=16600326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57211095A Granted JPS59101848A (ja) | 1982-12-01 | 1982-12-01 | 真空処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59101848A (index.php) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5599739A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Wafer treating method and its equipment |
-
1982
- 1982-12-01 JP JP57211095A patent/JPS59101848A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59101848A (ja) | 1984-06-12 |
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