JPS6358383B2 - - Google Patents
Info
- Publication number
- JPS6358383B2 JPS6358383B2 JP10938979A JP10938979A JPS6358383B2 JP S6358383 B2 JPS6358383 B2 JP S6358383B2 JP 10938979 A JP10938979 A JP 10938979A JP 10938979 A JP10938979 A JP 10938979A JP S6358383 B2 JPS6358383 B2 JP S6358383B2
- Authority
- JP
- Japan
- Prior art keywords
- density
- gallium phosphide
- light
- nitrogen
- type region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/8242—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP characterised by the dopants
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Led Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10938979A JPS5632780A (en) | 1979-08-27 | 1979-08-27 | Gallium phosphide light emitting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10938979A JPS5632780A (en) | 1979-08-27 | 1979-08-27 | Gallium phosphide light emitting device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5632780A JPS5632780A (en) | 1981-04-02 |
JPS6358383B2 true JPS6358383B2 (enrdf_load_html_response) | 1988-11-15 |
Family
ID=14508988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10938979A Granted JPS5632780A (en) | 1979-08-27 | 1979-08-27 | Gallium phosphide light emitting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5632780A (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2643396B2 (ja) * | 1988-12-15 | 1997-08-20 | 日立電線株式会社 | セラミックコンデンサに半田接合される板状のリード線 |
-
1979
- 1979-08-27 JP JP10938979A patent/JPS5632780A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5632780A (en) | 1981-04-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6110757A (en) | Method of forming epitaxial wafer for light-emitting device including an active layer having a two-phase structure | |
US5027168A (en) | Blue light emitting diode formed in silicon carbide | |
Münch et al. | Silicon carbide light-emitting diodes with epitaxial junctions | |
JPS6057214B2 (ja) | 電気発光物質の製法 | |
US5329141A (en) | Light emitting diode | |
US3634872A (en) | Light-emitting diode with built-in drift field | |
JPS5863183A (ja) | 2−6族間化合物の結晶成長法 | |
Kressel et al. | Electroluminescence and photoluminescence of GaAs: Ge prepared by liquid phase epitaxy | |
JP4032224B2 (ja) | 燐化ガリウム発光素子及びその製造方法 | |
JPS6358383B2 (enrdf_load_html_response) | ||
US3951700A (en) | Method of manufacturing a gallium phosphide light-emitting device | |
US5032539A (en) | Method of manufacturing green light emitting diode | |
JP3633806B2 (ja) | エピタキシャルウエハ及び、これを用いて製造される発光ダイオード | |
US5406093A (en) | Gap pure green light emitting element substrate | |
JP2001226200A (ja) | 低抵抗p型単結晶ZnSおよびその製造方法 | |
JP3762575B2 (ja) | 発光ダイオード | |
JPH0463040B2 (enrdf_load_html_response) | ||
KR820001725B1 (ko) | 인화 갈륨 발광 소자의 제조방법 | |
Chen et al. | Tellurium and zinc doping in In0. 32Ga0. 68P layers grown by liquid‐phase epitaxy | |
JPS6244835B2 (enrdf_load_html_response) | ||
JPH08264467A (ja) | 窒素ドープGaPエピタキシャル層の成長方法 | |
KR820002001B1 (ko) | 인화 칼륨 발광소자의 제조방법 | |
JPH03161981A (ja) | 半導体装置と2―6族化合物半導体結晶層の製造方法 | |
JPS63143810A (ja) | 化合物半導体の気相成長方法 | |
US20010010375A1 (en) | Gallium phosphide semiconductor configuration and production method |