JPS6358249A - Humidity detecting element - Google Patents

Humidity detecting element

Info

Publication number
JPS6358249A
JPS6358249A JP20406086A JP20406086A JPS6358249A JP S6358249 A JPS6358249 A JP S6358249A JP 20406086 A JP20406086 A JP 20406086A JP 20406086 A JP20406086 A JP 20406086A JP S6358249 A JPS6358249 A JP S6358249A
Authority
JP
Japan
Prior art keywords
moisture
film
polyimide
electrode
moisture sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20406086A
Other languages
Japanese (ja)
Other versions
JPH06105235B2 (en
Inventor
Hiromi Shimizu
清水 洋美
Tatsuo Yamamoto
達夫 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KURABE KK
Original Assignee
KURABE KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KURABE KK filed Critical KURABE KK
Priority to JP20406086A priority Critical patent/JPH06105235B2/en
Publication of JPS6358249A publication Critical patent/JPS6358249A/en
Publication of JPH06105235B2 publication Critical patent/JPH06105235B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To improve the chemical resistance and gas resistance of a moisture sensitive element and to obtain a moisture detecting element which is produced with the fewer processes of production and has high reliability by changing the electrostatic capacity formed by sandwiching the polyimide film of a moisture sensitive material by a semiconductor substrate and thin metallic film with temp. CONSTITUTION:The rear surface of a silicon wafer 2 is subjected to a heat treatment to form an ohmic contact electrode 1 and thereafter, the polyimide moisture sensitive film 3 is cured. Gold is then deposited by evaporation over the entire surface through a metal mask which shields the peripheral part of the detecting element according to the shape of the electrode in order to provide moisture permeability thereto through the metallic film. Polyimide is coated as a protective film 5 over the entire surface and is subjected to a heat treatment. A hole 6 for taking out the upper electrode is formed on the protective film 5. Then the electrostatic capacity between the substrate 1 and the electrode 4 changes linearly with a change in relative humidity.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、静電容量値の変化により雰囲気の相対湿度
を検知する湿度検知素子に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a humidity sensing element that detects the relative humidity of an atmosphere based on a change in capacitance value.

(従来の技術と問題点) 感湿素子は使用される材料と、その動作原理より大きく
2種に分類出来る。その一つは、金属酸化物等の焼結体
を用いた多孔質セラミックス等の湿度に対して電気伝導
度が変化する事を利用した電気抵抗変化型である。これ
らの材料に於ては、感湿素子が使用される環境は、湿度
の外、〃ス。
(Prior Art and Problems) Moisture sensing elements can be roughly classified into two types based on the materials used and their operating principles. One of them is an electrical resistance variable type that takes advantage of the fact that the electrical conductivity of porous ceramics made of sintered materials such as metal oxides changes with respect to humidity. In these materials, the environment in which the moisture sensing element is used is not limited to humidity.

油等を含む場合が多いので抵抗値が使用期間と共に高く
なり所謂経時変化によって、性能の劣化を起し易い。劣
化した素子の性能を回復するためには、加熱クリーニン
グを施す方式があるが、この方式では、ヒータ及び制御
回路が必要である。
Since it often contains oil and the like, the resistance value increases with the use period, and performance is likely to deteriorate due to so-called aging. In order to restore the performance of degraded elements, there is a method of performing thermal cleaning, but this method requires a heater and a control circuit.

他の一つは、静電容量変化型で、感湿材中の水分量によ
り誘電率が変化し容量が変化することを利用したもので
ある。感湿材料としては有機高分子フィルム、金属酸化
物膜、酸化アルミニウム膜等が掲げられる。現在までに
発表されているこれらの材料に於ては感湿特性面で、相
対湿度に対する静電容量の変化が、必ずしも直線的に変
化せず、低湿度或いは高湿度の領域で直線よりずれるも
のも多い。又、同じ湿度の状態に於ても、周囲温度が変
化すると、静電容量の値も変化する所謂温度依存性を持
つものも多い。このため感湿素子出力を信号処理する場
合、回路構成が複雑になるのを避けられない。その池一
般に高分子膜を用いるものでは高温での使用には耐えら
れないという欠点ちある。
The other type is a capacitance variable type, which utilizes the fact that the dielectric constant changes and the capacitance changes depending on the amount of moisture in the moisture sensitive material. Examples of moisture-sensitive materials include organic polymer films, metal oxide films, aluminum oxide films, and the like. Among these materials that have been announced so far, in terms of moisture sensitivity, the change in capacitance with respect to relative humidity does not necessarily change linearly, but deviates from a straight line in low or high humidity regions. There are also many. Further, even under the same humidity condition, many of them have so-called temperature dependence, in which the capacitance value changes as the ambient temperature changes. For this reason, when performing signal processing on the output of the humidity sensing element, it is inevitable that the circuit configuration becomes complicated. Generally, ponds using polymer membranes have the disadvantage that they cannot withstand use at high temperatures.

本発明は従来技術の問題点を解決するためになされたも
のでその目的とするところは、感湿素子の耐薬品性、耐
ガス性を向上させると共に相対湿度の変化に対して静電
V量が直線的に変化し、温度依存性が無く、しかも製造
工程の少ない信頼性のある湿度検知素子を提供すること
にある。
The present invention was made in order to solve the problems of the prior art, and its purpose is to improve the chemical resistance and gas resistance of a humidity sensing element, and to improve the electrostatic voltage V against changes in relative humidity. It is an object of the present invention to provide a reliable humidity sensing element that changes linearly, has no temperature dependence, and requires fewer manufacturing steps.

(問題点を解決するための手段) 前述の問題点を解決するためには感湿膜の選択が重要で
ある。一般にポリイミド樹脂は耐熱性。
(Means for Solving the Problems) In order to solve the above-mentioned problems, selection of a moisture-sensitive film is important. Polyimide resins are generally heat resistant.

耐溶剤性、耐寒性に優れその池の電気特性においても、
特に比誘電率が温度の変化に対してもほぼ一定で、しが
ら体積抵抗率も高い等の優れた点を持っていることは周
知の事実である。又、ポリイミドl(脂の種類によって
は数%の吸水率を示すものもある。これらの総合利点よ
りポリイミド感湿膜を感湿膜として使用することは適当
である。
Excellent solvent resistance and cold resistance, as well as the electrical properties of the pond.
In particular, it is a well-known fact that it has excellent features such as a dielectric constant that is almost constant even with changes in temperature and a high volume resistivity. In addition, polyimide l (some types of fat exhibit a water absorption rate of several percent depending on the type of fat). These comprehensive advantages make it appropriate to use polyimide moisture-sensitive membranes as moisture-sensitive membranes.

ポリイミド樹脂を用いた容量型感湿素子として発表され
ている文献には例えば、公開特許公報。
Documents published on capacitive moisture sensing elements using polyimide resin include, for example, published patent publications.

昭55−66749号および昭60−166854号等
がある。特開昭55−66749号の場合は金属基板に
接着層を設けその上にポリイミド層を形成し、更に水分
透過可能な金の薄膜より成っている。この場合には上部
金電極が異物等の接触により破損を受は易く、素子の特
性変化に繋がる。
There are No. 55-66749 and No. 60-166854. In the case of JP-A-55-66749, an adhesive layer is provided on a metal substrate, a polyimide layer is formed thereon, and a thin film of gold that is permeable to moisture is further formed. In this case, the upper gold electrode is likely to be damaged by contact with foreign matter, leading to changes in the characteristics of the element.

次に特開昭60−166854号の場合には、ガラス基
板上に櫛形のタンタル金属層を設け、この金属の表面を
酸化して電気絶縁層とし、その上にポリイミド層を形成
後、ポリイミド層の一部をエツチングして除去した部分
に上部の櫛形金属電極を蒸着し熱処理を施すという複雑
な工程を必要とする。さらにその構造上上部金属が露出
しているために感湿素子の劣化の原因になる。これらの
欠点を解決するために、発明者等は基板にシリコン半導
体ウェハーを採択した。この理由はシリコン自体を剛性
基板と下部電極に兼用出来るからである。
Next, in the case of JP-A-60-166854, a comb-shaped tantalum metal layer is provided on a glass substrate, the surface of this metal is oxidized to form an electrically insulating layer, a polyimide layer is formed on it, and then a polyimide layer is formed. This requires a complicated process in which the upper comb-shaped metal electrode is vapor-deposited on the part of the electrode that has been removed by etching, and then heat-treated. Furthermore, because the upper metal is exposed due to its structure, it causes deterioration of the moisture sensing element. To overcome these drawbacks, the inventors adopted a silicon semiconductor wafer as the substrate. The reason for this is that silicon itself can be used both as a rigid substrate and as a lower electrode.

従って特に下部電極層を設ける必要がなく製造工程の簡
略化に槃がる。尚シリコン基板上に感湿素子を形成すれ
ば、これと同一基板上に感湿素子の出力信号処理機能を
持つ回路素子および温度検知素子も集積化でき、更に応
用範囲が広がることも期待出来るからである。
Therefore, there is no need to particularly provide a lower electrode layer, which simplifies the manufacturing process. Furthermore, if the humidity sensing element is formed on a silicon substrate, it is possible to integrate a circuit element with the output signal processing function of the humidity sensing element and a temperature sensing element on the same substrate, which is expected to further expand the range of applications. It is.

更に、この発明での湿度検知素子は上部に水分透過可能
な薄いポリイミド保護膜層を備えているので、機械的な
接触や塵埃等よりも保護できより信頼性の高い感湿素子
となる。
Furthermore, since the humidity sensing element of the present invention is provided with a thin polyimide protective film layer on the top that is permeable to moisture, it can be protected from mechanical contact, dust, etc., and becomes a more reliable humidity sensing element.

(実施例) 以下に実施例を示すことで、この発明を説明するが、こ
れによりこの発明を限定するものではな第1図及び第2
図に実施例による感湿素子の構造図を示す。
(Example) This invention will be explained by showing an example below, but this invention is not limited thereto.
The figure shows a structural diagram of a humidity sensing element according to an example.

先ず表面研摩された抵抗率10Ω・cIIl以下のP型
又はN型のシリコン・ウェハー2の裏面にP型の場合は
アルミニウム、N型の場合には金を全面真空蒸着した後
に、真空中で熱処理を施し、オーミック接触電極1を形
成する。
First, on the back side of a P-type or N-type silicon wafer 2 with a resistivity of 10 Ω·cIIl or less that has been surface-polished, aluminum is vacuum-deposited in the case of P-type, and gold is deposited in the case of N-type, and then heat-treated in vacuum. Then, the ohmic contact electrode 1 is formed.

次にシリコン・ウェハー2を十分脱脂洗浄の後、ポリイ
ミド層(脂を適当な粘度に調整し、スピンナーを用いて
塗布し、ポリイミド樹脂メーカー指定の温度と口々開で
ポリイミド感湿膜3の硬化を行なう。この膜厚が厚い場
合には感湿特性の感度が悪くなる。又薄い場合には膜自
体の抵抗値が低くなり、静電容量と並列に構成される抵
抗値が下がり、信号処理上の不都合を来す。一般に1.
0〜5゜0μmの厚さが適当である。
Next, after thoroughly degreasing and cleaning the silicon wafer 2, a polyimide layer (adjust the fat to an appropriate viscosity, apply it using a spinner, and cure the polyimide moisture-sensitive film 3 at the temperature specified by the polyimide resin manufacturer. If this film is thick, the sensitivity of the moisture-sensitive characteristics will deteriorate.If it is thin, the resistance value of the film itself will be low, and the resistance value configured in parallel with the capacitance will be reduced, and signal processing This causes the above inconvenience.Generally 1.
A thickness of 0 to 5°0 μm is suitable.

次に上部電極4を形成する。この上部電極を形成する工
程に於て、電極の形状により2通りの方法がある。その
一つは検知素子の周辺部を遮蔽するメタル・マスクを通
して金を全面に蒸着する方法で、この場合、金属膜を通
して水分の透過性を持たせるために、その膜厚は500
A前後に限定される。池の方法は櫛形の様に金属が蒸着
されない部分を持ったメタル・マスクを使用して形成す
る方法である。この場合には空間の部分より水分の透過
があるために、金属は令息外の金属でも良く、厚さも可
成り厚<(100OA以上)でもよい。
Next, the upper electrode 4 is formed. In the process of forming this upper electrode, there are two methods depending on the shape of the electrode. One method is to evaporate gold over the entire surface through a metal mask that shields the periphery of the sensing element.
Limited to around A. Ike's method uses a metal mask that has a comb-shaped part on which metal is not deposited. In this case, since moisture permeates through the space, the metal may be of a different type, and the thickness may be considerably less than (100 OA or more).

次の工程は保護膜5としてポリイミドを1μm以下の厚
さに全面コートし熱処理を施こす。上部電極取出し用の
穴6を保護膜5に形成する。この方法はフォト・レジス
トを用いた一般のフォト・エツチング法でよい。
In the next step, the entire surface is coated with polyimide as a protective film 5 to a thickness of 1 μm or less, and heat treatment is performed. A hole 6 for taking out the upper electrode is formed in the protective film 5. This method may be a general photo etching method using a photo resist.

次にスクライバ−を用いて個々に分割して完成する。Next, use a scriber to divide it into individual parts and complete.

(発明の効果) 第3図に相対湿度の変化に対する静電容量の変化を測定
した感湿特性を示す。この図の様に感湿特性は完全に直
線的に変化をする。又温度特性では20°C930°C
140°Cに周囲温度を変化させた場合にもほとんど感
湿特性に変化はなく温度依存性はない。ヒステリシス現
象も観測されなかった。又湿度応答も保護膜があるにも
かかわらず、吸湿、脱湿共に30秒以内で実用上問題は
ない。
(Effects of the Invention) Figure 3 shows the humidity sensitivity characteristics measured by measuring changes in capacitance with respect to changes in relative humidity. As shown in this figure, the moisture sensitivity characteristics change completely linearly. Also, the temperature characteristics are 20°C930°C
Even when the ambient temperature is changed to 140°C, there is almost no change in the moisture sensitivity characteristics and there is no temperature dependence. Hysteresis phenomenon was also not observed. Furthermore, despite the presence of a protective film, the humidity response is within 30 seconds for both moisture absorption and dehumidification, which poses no practical problem.

以上のように本発明の湿度検知素子は従来品の問題点を
ほぼ解決した湿度検知素子である。
As described above, the humidity sensing element of the present invention is a humidity sensing element that has almost solved the problems of conventional products.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る湿度検知素子の上面図、第2図は
第1図のA−A間の断面図、第3図は本発明の一実施例
による感湿特性を示すグラフであ1・・・オーミック接
触電極 2・・・シリコン・ウェハー3・・・ポリイミ
ド感)♀膜  4・・・上部電極5・・・保護膜  6
・・・上部電極取出し用の大筒1図 第3図 Z6     40     60.   80   
  100+口対nにノ変  (%)
FIG. 1 is a top view of a humidity sensing element according to the present invention, FIG. 2 is a cross-sectional view taken along line A-A in FIG. 1, and FIG. 3 is a graph showing humidity sensitivity characteristics according to an embodiment of the present invention. 1... Ohmic contact electrode 2... Silicon wafer 3... Polyimide (polyimide) film 4... Upper electrode 5... Protective film 6
...Large tube for taking out the upper electrode Figure 1 Figure 3 Z6 40 60. 80
100+ mouth to n change (%)

Claims (1)

【特許請求の範囲】[Claims] 半導体基板上に感湿材のポリイミド膜,電極用の金属薄
膜,保護用のポリイミド膜を順次堆積し、前記半導体基
板と金属簿膜とで感湿材のポリイミド膜を挾んで静電容
量を形成し、その間の容量が湿度によって変化すること
を検出する静電容量型の湿度検知素子。
A polyimide film as a moisture sensitive material, a metal thin film for an electrode, and a protective polyimide film are sequentially deposited on a semiconductor substrate, and the polyimide film as a moisture sensitive material is sandwiched between the semiconductor substrate and the metal film to form capacitance. A capacitive humidity sensing element that detects that the capacitance between the two changes depending on the humidity.
JP20406086A 1986-08-29 1986-08-29 Humidity detection element Expired - Lifetime JPH06105235B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20406086A JPH06105235B2 (en) 1986-08-29 1986-08-29 Humidity detection element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20406086A JPH06105235B2 (en) 1986-08-29 1986-08-29 Humidity detection element

Publications (2)

Publication Number Publication Date
JPS6358249A true JPS6358249A (en) 1988-03-14
JPH06105235B2 JPH06105235B2 (en) 1994-12-21

Family

ID=16484088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20406086A Expired - Lifetime JPH06105235B2 (en) 1986-08-29 1986-08-29 Humidity detection element

Country Status (1)

Country Link
JP (1) JPH06105235B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02140653A (en) * 1988-11-21 1990-05-30 Kurabe:Kk Humidity detecting element
US6580600B2 (en) 2001-02-20 2003-06-17 Nippon Soken, Inc. Capacitance type humidity sensor and manufacturing method of the same
KR100488432B1 (en) * 2002-03-20 2005-05-11 가부시키가이샤 덴소 Capacitance type humidity sensor with passivation layer
JP2011080833A (en) * 2009-10-06 2011-04-21 Alps Electric Co Ltd Humidity detection sensor
CN102209892A (en) * 2008-09-10 2011-10-05 马来西亚微电子系统有限公司 Improved capacitive sensor and method for making the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002243689A (en) 2001-02-15 2002-08-28 Denso Corp Capacity-type humidity sensor and method for manufacturing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02140653A (en) * 1988-11-21 1990-05-30 Kurabe:Kk Humidity detecting element
US6580600B2 (en) 2001-02-20 2003-06-17 Nippon Soken, Inc. Capacitance type humidity sensor and manufacturing method of the same
KR100488432B1 (en) * 2002-03-20 2005-05-11 가부시키가이샤 덴소 Capacitance type humidity sensor with passivation layer
CN102209892A (en) * 2008-09-10 2011-10-05 马来西亚微电子系统有限公司 Improved capacitive sensor and method for making the same
JP2011080833A (en) * 2009-10-06 2011-04-21 Alps Electric Co Ltd Humidity detection sensor

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Publication number Publication date
JPH06105235B2 (en) 1994-12-21

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