JPS6355535U - - Google Patents

Info

Publication number
JPS6355535U
JPS6355535U JP14932786U JP14932786U JPS6355535U JP S6355535 U JPS6355535 U JP S6355535U JP 14932786 U JP14932786 U JP 14932786U JP 14932786 U JP14932786 U JP 14932786U JP S6355535 U JPS6355535 U JP S6355535U
Authority
JP
Japan
Prior art keywords
ion beam
sample
film
crystal oscillator
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14932786U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14932786U priority Critical patent/JPS6355535U/ja
Publication of JPS6355535U publication Critical patent/JPS6355535U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、この考案の一実施例に係るイオンビ
ームエツチング装置の要部を示す概略図である。 ４……試料、８……エツチング層、１２……イ
オンビーム、２２……水晶発振子、２４……膜、
２６……測定装置。 FIG. 1 is a schematic diagram showing the main parts of an ion beam etching apparatus according to an embodiment of this invention. 4... Sample, 8... Etching layer, 12... Ion beam, 22... Crystal oscillator, 24... Film,
26...Measuring device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 試料にイオンビームを照射してエツチングする
装置において、試料のエツチングされる領域と同
一物質から成る膜を表面に有していて当該膜に前
記イオンビームの一部が照射される所に配置され
た水晶発振子と、当該水晶発振子の発振周波数の
変化を測定する測定装置とを備えることを特徴と
するイオンビームエツチング装置。 In an apparatus for etching a sample by irradiating it with an ion beam, the device has a film on its surface made of the same material as the region to be etched of the sample, and is placed in a place where the film is partially irradiated with the ion beam. An ion beam etching apparatus comprising a crystal oscillator and a measuring device for measuring changes in the oscillation frequency of the crystal oscillator.
JP14932786U 1986-09-29 1986-09-29 Pending JPS6355535U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14932786U JPS6355535U (en) 1986-09-29 1986-09-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14932786U JPS6355535U (en) 1986-09-29 1986-09-29

Publications (1)

Publication Number Publication Date
JPS6355535U true JPS6355535U (en) 1988-04-14

Family

ID=31064428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14932786U Pending JPS6355535U (en) 1986-09-29 1986-09-29

Country Status (1)

Country Link
JP (1) JPS6355535U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344745A (en) * 2005-06-08 2006-12-21 Tdk Corp Device for measuring quantity of etching, etching device and method for measuring quantity of etching
JP2019510374A (en) * 2016-03-11 2019-04-11 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Wafer processing tool with microsensor
CN109937471A (en) * 2016-11-14 2019-06-25 应用材料公司 Selective etch rate monitor
WO2022157908A1 (en) * 2021-01-22 2022-07-28 株式会社日立ハイテク Ion milling device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006344745A (en) * 2005-06-08 2006-12-21 Tdk Corp Device for measuring quantity of etching, etching device and method for measuring quantity of etching
JP2019510374A (en) * 2016-03-11 2019-04-11 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Wafer processing tool with microsensor
JP2022020718A (en) * 2016-03-11 2022-02-01 アプライド マテリアルズ インコーポレイテッド Wafer processing tool with micro sensor
CN109937471A (en) * 2016-11-14 2019-06-25 应用材料公司 Selective etch rate monitor
JP2019536281A (en) * 2016-11-14 2019-12-12 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Selective etch rate monitor
JP2021106272A (en) * 2016-11-14 2021-07-26 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Selective etch rate monitor
CN109937471B (en) * 2016-11-14 2023-08-22 应用材料公司 Selective Etch Rate Monitor
WO2022157908A1 (en) * 2021-01-22 2022-07-28 株式会社日立ハイテク Ion milling device
TWI821868B (en) * 2021-01-22 2023-11-11 日商日立全球先端科技股份有限公司 Ion milling device

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