JPS6355210B2 - - Google Patents
Info
- Publication number
- JPS6355210B2 JPS6355210B2 JP13485180A JP13485180A JPS6355210B2 JP S6355210 B2 JPS6355210 B2 JP S6355210B2 JP 13485180 A JP13485180 A JP 13485180A JP 13485180 A JP13485180 A JP 13485180A JP S6355210 B2 JPS6355210 B2 JP S6355210B2
- Authority
- JP
- Japan
- Prior art keywords
- feeder
- drive system
- cassette
- sample
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 12
- 238000001514 detection method Methods 0.000 claims description 8
- 230000032258 transport Effects 0.000 claims description 3
- 230000007257 malfunction Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13485180A JPS5759329A (en) | 1980-09-27 | 1980-09-27 | Device for electron beam exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13485180A JPS5759329A (en) | 1980-09-27 | 1980-09-27 | Device for electron beam exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5759329A JPS5759329A (en) | 1982-04-09 |
| JPS6355210B2 true JPS6355210B2 (ko) | 1988-11-01 |
Family
ID=15137948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13485180A Granted JPS5759329A (en) | 1980-09-27 | 1980-09-27 | Device for electron beam exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5759329A (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2578776A1 (fr) * | 1985-03-15 | 1986-09-19 | Commissariat Energie Atomique | Boite de transfert |
-
1980
- 1980-09-27 JP JP13485180A patent/JPS5759329A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5759329A (en) | 1982-04-09 |
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