JPS6350705A - Apparatus for measuring film thickness - Google Patents

Apparatus for measuring film thickness

Info

Publication number
JPS6350705A
JPS6350705A JP19614986A JP19614986A JPS6350705A JP S6350705 A JPS6350705 A JP S6350705A JP 19614986 A JP19614986 A JP 19614986A JP 19614986 A JP19614986 A JP 19614986A JP S6350705 A JPS6350705 A JP S6350705A
Authority
JP
Japan
Prior art keywords
refractive index
film thickness
measured
detector
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19614986A
Other languages
Japanese (ja)
Inventor
Isao Hishikari
功 菱刈
Toshihiko Ide
敏彦 井手
Kosei Aikawa
相川 孝生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chino Corp
Original Assignee
Chino Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chino Corp filed Critical Chino Corp
Priority to JP19614986A priority Critical patent/JPS6350705A/en
Publication of JPS6350705A publication Critical patent/JPS6350705A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

PURPOSE:To obtain an apparatus for automatically correcting the refractive index of an object to be measured, by constituting the title apparatus so that beams are projected to the object to be measured at two or more angles and each interference fringe is detected by a detector and the refractive index of the object to be measured is calculated from a wavelength imparting an extreme value. CONSTITUTION:The relation between each element number of an interference fringe pattern detector 11 and a wavelength is preliminarily stored in the memory of an operation means 13. Then, the output of each element of the detector 11 is successively read at the time of measurement and a wavelength imparting the extreme value of each interference pattern in a measuring range is calculating and degree difference is calculated from the numerical difference of extreme values and predetermined operation is performed based on the refractive index from the memory to calculate the film thickness of an object 4. When the refractive index of the object 4 is unknown, especially, when the kind of the object 4 changes and the refractive index thereof changes, beam sources 1a, 1b are arranged so that beams therefrom are projected to the object 4 at different angles thetaa, thetab with respect to the normal line of the measuring position of the object 4 and both beams are detected by detection parts 14a, 14b. Subsequently, a refractive index is calculated according to a predetermined formula and automatically corrected to calculate the film thickness of the object 4.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、光の干渉を利用して膜厚を測定する装置に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an apparatus for measuring film thickness using optical interference.

[従来の技術] 光の干渉を利用して被測定対象の膜厚を測定するには、
被測定対象に光源よりの光を投光し、そしかしながら、
被測定対象の膜厚を測定するには、あらかじめ屈折率が
既知でおる必要があり、被測定対象の種類が変更となり
屈折率が変わるとこれに応じて測定系の設定値等を変更
する必要がおり、非常に不便であった。
[Prior art] To measure the film thickness of a target using optical interference,
The light from the light source is projected onto the object to be measured, while
To measure the film thickness of the object to be measured, it is necessary to know the refractive index in advance, and if the type of object to be measured changes and the refractive index changes, it is necessary to change the settings of the measurement system accordingly. It was extremely inconvenient.

この発明の目的は、以上の点に鑑み、被測定対象の屈折
率を自動的に補正するようにした膜厚測定装置を提供す
ることでおる。
In view of the above points, an object of the present invention is to provide a film thickness measuring device that automatically corrects the refractive index of an object to be measured.

[問題点を解決するための手段つ この発明は、2個以上の角度で被測定対象に投光を行い
、この各々についての干渉縞を検出器で検出し、極値を
与える波長から被測定対象の屈折率を求め、膜厚を演算
するようにした。膜厚測定装置でおる。
[Means for Solving the Problems] This invention projects light onto the object to be measured at two or more angles, detects interference fringes at each angle with a detector, and selects the object to be measured from the wavelength that gives the extreme value. The refractive index of the object is determined and the film thickness is calculated. Measured using a film thickness measuring device.

[実施例] 第1図は、この発明の一実施例を示す構成説明図でおる
[Embodiment] FIG. 1 is a configuration explanatory diagram showing an embodiment of the present invention.

図において、1は、光源で、光源1からの光は、レン・
〉2によりハーフミラ−3を介してフィルムソ′ のような被測定対象4に投光され、被測定対象4を透過
または反射した光は、この図ではハーフミラ−3、レン
ズ5、チョッパのようなシャッタ手段6、しぼり7、レ
ンズ8を介して回折格子等の分光手段9で分光され、レ
ンズ10を介してccDのようなイメージセンサの検出
器11に入射する。このイメージセンサ11の各素子に
は分光手段9で分光された各波長に対応した光が入射し
、干渉縞パターンの強度が検出される。イメージセンサ
′11の出力は増幅器12で増幅され、演鈴手段13で
所定の演算がなされ、被測定対象4の膜厚dが演算され
る。
In the figure, 1 is a light source, and the light from light source 1 is a lens.
2, the light is projected onto the object to be measured 4, such as a film saw, through the half mirror 3, and the light transmitted or reflected by the object to be measured 4 is transmitted through the half mirror 3, lens 5, and shutter such as a chopper in this figure. The light is separated by a spectroscopic means 9 such as a diffraction grating through a means 6, an aperture 7, and a lens 8, and enters a detector 11 of an image sensor such as a CCD through a lens 10. Light corresponding to each wavelength separated by the spectrometer 9 is incident on each element of the image sensor 11, and the intensity of the interference fringe pattern is detected. The output of the image sensor '11 is amplified by the amplifier 12, and a predetermined calculation is performed by the ringing means 13, whereby the film thickness d of the object to be measured 4 is calculated.

第2図で示すように、光源からの平行光線[1、L2は
、膜厚(厚さ)d、屈折率nの被測定対象4の表面およ
び裏面で反射し、両光線L+ 、! 2は、光学的光路
差2 nd/CO3e ’をもち、この光路差が光の波
長の整数倍のとき干渉して第3図のような干渉縞を形成
する。
As shown in FIG. 2, parallel rays [1, L2 from the light source are reflected on the front and back surfaces of the object to be measured 4 having a film thickness (thickness) d and a refractive index n, and both rays L+, ! 2 has an optical path difference 2 nd/CO3e ', and when this optical path difference is an integral multiple of the wavelength of light, interference occurs to form interference fringes as shown in FIG.

とし、次式が成り立つ。Then, the following formula holds true.

(m+N)λ+ =2nd/cosθ′(1)mλ2 
= 2 nd/cosθ′(2)(2〉式よりmを求め
(1)式に代入して整理すると となる。被測定対象4に垂直に投光するθ′−〇のとき
はCOSθ′−1で(3)式は となる。このように、波長λ1、λ2、極値の次数差N
、既知の屈折率nから、被測定対象4の膜厚が(3)、
(4)式より一般的に求まる。
(m+N)λ+ =2nd/cosθ'(1)mλ2
= 2 nd/cos θ' (2) (Determine m from formula 2> and substitute it into formula (1) to organize it. When θ'-〇 is projected perpendicularly to the object to be measured 4, COS θ'- 1, equation (3) becomes: In this way, the wavelengths λ1, λ2, and the order difference N between the extreme values
, from the known refractive index n, the film thickness of the measured object 4 is (3),
It can be generally determined from equation (4).

つまり、必らかじめ、分光手段9により検出器11の各
素子に入射する波長は決まっているので、検出器11の
各素子番号と波長との関係を演算手段13のメモリに2
臣しておく。
In other words, since the wavelength incident on each element of the detector 11 is determined in advance by the spectroscopic means 9, the relationship between each element number of the detector 11 and the wavelength is stored in the memory of the calculation means 13.
I will serve you.

で(へ性を与える素子番号からメモ1)を利用して波長
λ1、λ2を求め、極値の故の差から次数差べを求め、
メモリ内に格納された屈折率を用い(3)、(4)式の
ような演算を行って被測定対象4の膜厚dを求める。
Find the wavelengths λ1 and λ2 using (Memo 1 from the element number that gives hesitivity), and find the order difference from the difference due to the extreme value,
Using the refractive index stored in the memory, calculations such as equations (3) and (4) are performed to determine the film thickness d of the object to be measured 4.

ところで、被測定対象4の屈折率口が未知の場合は、(
3)、(4〉式より膜厚dは求めることができず、特に
被測定対象4の種類か変って5屈折率nが変化するとき
は、次のようにして屈折率りを求め、自動的に補正する
By the way, if the refractive index aperture of the object to be measured 4 is unknown, (
3) The film thickness d cannot be determined from formula (4), and especially when the type of object to be measured 4 changes and the 5 refractive index n changes, calculate the refractive index as follows and automatically Correct it accordingly.

第4図で示すように、光源1a、1bを被測定対象4の
測定位置の法線に対し、異なる角度θa、θbで投光し
、検出部14a、14bで被測定対象4を反射または透
過した光を検出し、第1図と同様な検出系で干渉縞を検
出する。
As shown in FIG. 4, light sources 1a and 1b project light at different angles θa and θb with respect to the normal to the measurement position of the object to be measured 4, and the light is reflected or transmitted through the object to be measured 4 by the detection units 14a and 14b. The interference fringes are detected using a detection system similar to that shown in FIG.

角度θaの投光では波長λa、角度θbの投光では波長
λbで各々次数mの干渉が生じるとし、n =sinθ
a /sinθa ’ 、sinθb /sin O’
It is assumed that interference of order m occurs at wavelength λa when light is projected at an angle θa, and at wavelength λb when light is projected at an angle θb, and n = sin θ
a/sinθa', sinθb/sin O'
.

=2nd/FTTi■ゴ]八箇” = 2nd/  1−5in 2θa /n 2 (5
)mλb = 2nd/   −5in 20b/n 
2 (6)(5)、(6)式を辺々除算して どなり、これより次式が求まる。
= 2nd/FTTi ■Go] 8" = 2nd/ 1-5in 2θa /n 2 (5
) mλb = 2nd/-5in 20b/n
2 (6) By dividing equations (5) and (6) around each side, the following equation can be found.

投光角θa=Qのとき、sinθa−〇で、(8)式は
、 となる。
When the projection angle θa=Q, sin θa−〇, equation (8) becomes as follows.

つまり、この(8)、(9)式より屈折率nを求め、(
3〉、(4)式より膜厚dを求めることができる。
In other words, the refractive index n is determined from equations (8) and (9), and (
3>, the film thickness d can be determined from equation (4).

このよ6F、被測定対象4の屈折率nが不明でおっても
容易にその屈折率nを求めることができ、膜厚dの測定
が可能となる。
In this way, even if the refractive index n of the object to be measured 4 is unknown, the refractive index n can be easily determined and the film thickness d can be measured.

また、光源1a、1b、検出部14a、14bとして、
各々同一のものを用い、必らかしめ測定前に適当な移動
手段で角度を変えて測定し、実際の測定時は、たとえば
垂直方向から測定するようにしてもよい。
In addition, as the light sources 1a and 1b and the detection units 14a and 14b,
It is also possible to use the same one and measure it at different angles using an appropriate moving means before caulking measurement, and during actual measurement, measure from the vertical direction, for example.

なお、第3図A、Bで示すように、被測定対象11の膜
厚のバラツキにより干渉縞パターンがずれて重なり、弱
い部分が生じることがある。これを避けるため、検出器
11の各波長についての出力のうち極大値と(※小値と
の差が所定の値以上のときの極値についての出力から上
記のように膜厚を測定するようにする。このことにより
、不確実で、弱い干渉縞を拾うことなく、強い確実な干
渉縞から被測定対象4の膜厚dを測定できる。
Note that, as shown in FIGS. 3A and 3B, interference fringe patterns may shift and overlap due to variations in the film thickness of the object to be measured 11, resulting in weak portions. In order to avoid this, the film thickness is measured as described above from the output of the extreme value when the difference between the maximum value and the minimum value (*) of the output for each wavelength of the detector 11 is greater than a predetermined value. This makes it possible to measure the film thickness d of the object to be measured 4 from strong and reliable interference fringes without picking up uncertain and weak interference fringes.

また、検出器11に電荷蓄積型日録素子CCDのような
イメージセンサを用いると、被測定対象4が移動してい
て、その厚さ等がずれると、ややトラストが悪くなる。
Furthermore, if an image sensor such as a charge storage type diary element CCD is used as the detector 11, the reliability will be slightly deteriorated if the object 4 to be measured moves and its thickness etc. deviate.

このため、モータによりセクタが回転するチョッパのよ
うなシャッタ手段7により入射光をVfr続して1回の
測定時間を制限し、検出器11への入射光の変動の影響
を少くし、干渉縞のコントラストが悪くなるのを防止し
、測定を確実なものとする。
For this reason, a shutter means 7 such as a chopper whose sectors are rotated by a motor is used to limit the time for one measurement by continuing the incident light to Vfr, thereby reducing the influence of fluctuations in the incident light on the detector 11, and reducing interference fringes. To prevent the contrast from deteriorating and ensure reliable measurement.

[発明の効果コ 以上)ホべたように、この発明は、少くとも2つの角度
についての干渉縞から屈折率nを決定しているので、屈
折率の補正を自動的に行うことができ、被測定対象の種
類、屈折率が変わっても、常に正確な膜厚測定が可能と
なる。
[Effects of the Invention] As mentioned above, this invention determines the refractive index n from the interference fringes at at least two angles, so it is possible to automatically correct the refractive index, and Even if the type of measurement target or refractive index changes, accurate film thickness measurement is always possible.

【図面の簡単な説明】[Brief explanation of drawings]

第1図、第2図、第4図は、この発明の一実施例を示す
偶成説明図、第3図は、干渉縞の説明図である。 1・
・・光源、2.5.8.10・・・レンズ、3・・・ハ
ーフミラ−14・・・被測定対象、6・・・シャツ特許
出願人 株式会社 千野製作所 第10 今 第20
FIG. 1, FIG. 2, and FIG. 4 are conjunctive explanatory diagrams showing one embodiment of the present invention, and FIG. 3 is an explanatory diagram of interference fringes. 1・
...Light source, 2.5.8.10... Lens, 3... Half mirror 14... Measured object, 6... Shirt patent applicant Chino Seisakusho Co., Ltd. No. 10 Now No. 20

Claims (1)

【特許請求の範囲】 1、被測定対象の測定位置の法線に対し少くとも2個以
上の角度で投光する光源と、この光源の2個以上の角度
の投光についての測定対象からの透過光または反射光を
分光手段で分光し干渉縞を検出する検出器と、この検出
器の2個以上の角度についての各干渉縞パターンの極値
を与える波長から被測定対象の屈折率を求め、膜厚を演
算する演算手段とを備えたことを特徴とする膜厚測定装
置。 2、前記光源の投光角度を0度とした場合を含むことを
特徴とする特許請求の範囲第1項記載の膜厚測定装置。 3、前記光源および検出器を2個以上設け、投受光角度
を任意とする移動手段を設けたことを特徴とする特許請
求の範囲第1項または第2項記載の膜厚測定装置。 4、前記検出器としてイメージセンサを用いたことを特
徴とする特許請求の範囲第1項から第3項記載の膜厚測
定装置。
[Claims] 1. A light source that emits light at at least two or more angles with respect to the normal to the measurement position of the object to be measured, and a light source that emits light at two or more angles from the object to be measured. A detector that separates transmitted light or reflected light using a spectroscopic means to detect interference fringes, and calculates the refractive index of the object to be measured from the wavelength that gives the extreme value of each interference fringe pattern at two or more angles of this detector. 1. A film thickness measuring device comprising: a calculation means for calculating film thickness. 2. The film thickness measuring device according to claim 1, which includes a case where the projection angle of the light source is set to 0 degrees. 3. The film thickness measuring device according to claim 1 or 2, characterized in that two or more of the light sources and the detectors are provided, and a moving means is provided that allows the angle of light emission and reception to be arbitrary. 4. The film thickness measuring device according to any one of claims 1 to 3, characterized in that an image sensor is used as the detector.
JP19614986A 1986-08-21 1986-08-21 Apparatus for measuring film thickness Pending JPS6350705A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19614986A JPS6350705A (en) 1986-08-21 1986-08-21 Apparatus for measuring film thickness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19614986A JPS6350705A (en) 1986-08-21 1986-08-21 Apparatus for measuring film thickness

Publications (1)

Publication Number Publication Date
JPS6350705A true JPS6350705A (en) 1988-03-03

Family

ID=16353028

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19614986A Pending JPS6350705A (en) 1986-08-21 1986-08-21 Apparatus for measuring film thickness

Country Status (1)

Country Link
JP (1) JPS6350705A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07270313A (en) * 1994-03-31 1995-10-20 Agency Of Ind Science & Technol Measuring method for refractive index and that for nature characteristic

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838169A (en) * 1971-09-16 1973-06-05
JPS58206906A (en) * 1982-05-01 1983-12-02 Yokogawa Hokushin Electric Corp Method and device for measuring thickness of sheet-like object

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838169A (en) * 1971-09-16 1973-06-05
JPS58206906A (en) * 1982-05-01 1983-12-02 Yokogawa Hokushin Electric Corp Method and device for measuring thickness of sheet-like object

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07270313A (en) * 1994-03-31 1995-10-20 Agency Of Ind Science & Technol Measuring method for refractive index and that for nature characteristic

Similar Documents

Publication Publication Date Title
US6538751B2 (en) Image capturing apparatus and distance measuring method
US7809182B2 (en) Method and device for suppressing electromagnetic background radiation in an image
KR940016660A (en) Thin Film Thickness Measurement Apparatus and Method
US4969744A (en) Optical angle-measuring device
TWI452262B (en) Interferometer system for simultaneous measurement of linear displacement and tilt angle
JPS6350705A (en) Apparatus for measuring film thickness
JPS6350703A (en) Apparatus for measuring film thickness
JP3529516B2 (en) Optical measuring device
JPS6350704A (en) Apparatus for measuring film thickness
JP2595050B2 (en) Small angle measuring device
JPS6350706A (en) Apparatus for measuring film thickness
JPS63109304A (en) Apparatus for measuring thickness of film
JPS6266111A (en) Optical distance detecting device
JPH0499925A (en) Infrared radiation measuring apparatus
JPH0429364Y2 (en)
JP3344328B2 (en) Optical analyzer
JPS63163104A (en) Apparatus for measuring thickness of film
JPH0712648A (en) Wide visual field michelson fourier spectrometer
JP2022112872A (en) Distance measuring device and method
JPS63305228A (en) Radiation thermometer
JP2015194347A (en) Distance metering device and method
JPS63153442A (en) Measuring instrument for optical characteristic of beam splitter
JPS6353481B2 (en)
JPH10170340A (en) Measuring apparatus for interference efficiency of interferometer for ft
JPH07128135A (en) Optical measuring apparatus