JPS63163104A - Apparatus for measuring thickness of film - Google Patents

Apparatus for measuring thickness of film

Info

Publication number
JPS63163104A
JPS63163104A JP31349486A JP31349486A JPS63163104A JP S63163104 A JPS63163104 A JP S63163104A JP 31349486 A JP31349486 A JP 31349486A JP 31349486 A JP31349486 A JP 31349486A JP S63163104 A JPS63163104 A JP S63163104A
Authority
JP
Japan
Prior art keywords
time
resetting
measured
image sensor
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31349486A
Other languages
Japanese (ja)
Other versions
JPH0444202B2 (en
Inventor
Isao Hishikari
功 菱刈
Toshihiko Ide
敏彦 井手
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chino Corp
Original Assignee
Chino Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chino Corp filed Critical Chino Corp
Priority to JP31349486A priority Critical patent/JPS63163104A/en
Publication of JPS63163104A publication Critical patent/JPS63163104A/en
Publication of JPH0444202B2 publication Critical patent/JPH0444202B2/ja
Granted legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To obtain the title apparatus capable of measuring the thickness of a film with sufficiently high accuracy even in continuous measurement, by providing a resetting means for generating a reset pulse in an image sensor to perform resetting. CONSTITUTION:Since the wavelength incident to each element of an image sensor 11 is predetermined by a spectral means 9, the relation between the number of each element of the sensor 11 and the wavelength is preliminarily stored in the memory of an operation means 13. At the time of measurement, the output of each element of the sensor 11 is successively read and the memory is utilized to calculate wavelengths lambda1, lambda2 from the element number imparting an extreme value within a measuring range and degree difference N is calculated from the difference in the number of extreme values and predetermined operation is performed using the refractive index in the memory to calculate the thickness of an object 4 to be measured. In this case, each pixel output of the sensor 11 is transmitted at every predetermined time T and charge is accumulated in each pixel during that time but, when resetting is performed only for a time t1 by a resetting means 6, charge is not accumulated in each pixel during this period and the charge only corresponding to the time t2 after the release of resetting is accumulated. As mentioned above, when measurement is performed while an accumulation time is limited, the thickness of a film can be stably and continuously measured with high accuracy.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、光の干渉を利用して膜厚を測定する装置に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an apparatus for measuring film thickness using optical interference.

[従来の技術」 光の干渉を利用して被測定対象の膜厚を測定するには、
被測定対象に光源よりの光を投光し、その透過光または
反射光を分光して干渉縞を検出器で検出し、被測定対象
の膜厚を測定している。
[Conventional technology] To measure the film thickness of an object using optical interference,
Light from a light source is projected onto the object to be measured, the transmitted light or reflected light is separated, and interference fringes are detected by a detector to measure the film thickness of the object to be measured.

[この発明が解決しようとする問題点]しかしながら、
被測定対象の測定スポット内で屈折率、膜厚等にわずか
のバラツキ等があると、膜厚等の相違に応じて干渉縞の
パターンが異なり、これが同時に重なり合って合成され
ると、第4図で示すように、うなりを生じたり、コント
ラストが弱くなり、測定が困難となることがある。
[Problems to be solved by this invention] However,
If there are slight variations in the refractive index, film thickness, etc. within the measurement spot of the object to be measured, the pattern of interference fringes will vary depending on the difference in film thickness, etc., and when these are overlapped and synthesized at the same time, the pattern shown in Figure 4 is As shown in , this may cause beats or the contrast may become weak, making measurement difficult.

また、検出器に、電荷蓄積型搬像装置CODのようなイ
メージセンサを用いて、高分子フィルム等の連続して流
れている被測定対象を測定する場合、電荷蓄積の一走査
周期内に長い距離の部分を測定すると、分光してイメー
ジセンサに投影される干渉縞パターンは、被測定対象の
膜厚の相違に応じて異るものとなり、これが合成されて
、第3図で示すようなうなりを生じたり、平均化されて
コントラストが弱くなり、測定が困難となることがある
In addition, when measuring a continuously flowing object such as a polymer film by using an image sensor such as a charge accumulation type image carrier COD as a detector, the charge accumulation time is long within one scanning period. When measuring the distance part, the interference fringe pattern that is separated and projected onto the image sensor will differ depending on the difference in the film thickness of the object to be measured, and these will be combined to produce a beat as shown in Figure 3. This may cause contrast to be averaged, weakening the contrast, and making measurement difficult.

この発明の目的は、以上の点に鑑み、連続的な測定でお
っても、十分高精度な測定を可能とした膜厚測定装置を
提供することである。
In view of the above points, an object of the present invention is to provide a film thickness measuring device that enables measurement with sufficiently high accuracy even in continuous measurement.

[問題点を解決するための手段] この発明は、光源からの光を被測定対象に投光し、その
透過光または反射光を分光して干渉縞をイメージセンナ
で検出し、被測定対象の膜厚を測定する装置において、
イメージセンサのリセット時間を変化させるリセット手
段を設けるようにした膜厚測定装置である。
[Means for Solving the Problems] This invention projects light from a light source onto an object to be measured, spectrally transmits or reflects the light, detects interference fringes with an image sensor, and detects the object to be measured. In a device that measures film thickness,
This film thickness measuring device is provided with a reset means for changing the reset time of an image sensor.

[実施例] 第1図は、この発明の一実施例を示す構成説明図である
[Embodiment] FIG. 1 is a configuration explanatory diagram showing an embodiment of the present invention.

図において、1は、光源で、光源1からの光は、レンズ
2によりハーフミラ−3を介してフィルムのような被測
定対象4に投光され、被測定対象4を透過または反射し
た光は、この図ではハーフミラ−3、レンズ5、しぼり
7、レンズ8を介して回折格子等の分光手段9で分光さ
れ、レンズ10を介して一次元CODのようなリセット
機能を有するイメージセンサ11に入射する。このイメ
ージセンサ11の各素子には分光手段9で分光された各
波長に対応した光が入射し、干渉縞パターンの強度か検
出される。イメージセンサ11の出力は増幅器12で増
幅され、メモリ等を含む演算手段13で所定の演算がな
され、被測定対象4の膜厚dが演算される。また、イメ
ージセンサ11にリセットパルスを発生してリセットを
行うリセット手段6が設けられている。
In the figure, 1 is a light source, and the light from the light source 1 is projected by a lens 2 through a half mirror 3 onto an object to be measured 4 such as a film, and the light transmitted or reflected from the object to be measured 4 is as follows. In this figure, the light is separated by a spectroscopic means 9 such as a diffraction grating via a half mirror 3, a lens 5, an aperture 7, and a lens 8, and enters an image sensor 11 having a reset function like a one-dimensional COD via a lens 10. . Light corresponding to each wavelength separated by the spectrometer 9 is incident on each element of the image sensor 11, and the intensity of the interference fringe pattern is detected. The output of the image sensor 11 is amplified by an amplifier 12, and a predetermined calculation is performed by a calculation means 13 including a memory, etc., to calculate the film thickness d of the object to be measured 4. Further, a reset means 6 is provided which generates a reset pulse to the image sensor 11 to reset it.

第2図で示すように、光源からの平行光線L1、L2は
、膜厚(厚さ)d、屈折率nの被測定対象4の表面およ
び裏面で反射し、両光線Ll 、L2は、光学的光路差
2 nd/CO3θ′をもち、この光路差が光の波長の
整数倍のとき干渉して第4図のような干渉縞を形成する
As shown in FIG. 2, parallel light rays L1 and L2 from the light source are reflected on the front and back surfaces of the object to be measured 4 having a film thickness (thickness) d and a refractive index n, and both light rays L1 and L2 are optically When this optical path difference is an integral multiple of the wavelength of light, interference occurs to form interference fringes as shown in FIG. 4.

第4図で示すような干渉縞パターンが得られたとし、測
定領域の極値を与える最小波長λ1、最大波長λ2につ
いて、干渉の各次数をm十N、mとし、次式が成り立つ
Assuming that an interference fringe pattern as shown in FIG. 4 is obtained, and for the minimum wavelength λ1 and maximum wavelength λ2 that give the extreme values of the measurement region, the following equation holds, assuming that the orders of interference are m+N and m.

(m+N)λ+ =2nd/cosθ′   (1)m
λ2 = 2 nd/cosθ′   (2)(2)式
よりmを求め(1)式に代入して整理すると となる。被測定対象4に垂直に投光するθ′=0のとき
はcosθ′=1で(3)式は d=N  λ1λ2       (4)2n  λ2
−λ1 となる。このように、波長λ1、λ2、極値の次数差N
、既知の屈折率nから、被測定対象4の膜厚が(3)、
(4)式より求まる。
(m+N)λ+ =2nd/cosθ' (1)m
λ2 = 2 nd/cos θ' (2) Find m from equation (2) and substitute it into equation (1) to organize it. When θ' = 0, when the light is projected perpendicularly to the object to be measured 4, cos θ' = 1, and equation (3) is d = N λ1λ2 (4) 2n λ2
−λ1. In this way, the wavelengths λ1, λ2, the order difference between the extreme values N
, from the known refractive index n, the film thickness of the measured object 4 is (3),
It can be found from equation (4).

つまり、あらかじめ、分光手段9によりイメージセンサ
]1の各素子に入射する波長は決まっているので、イメ
ージセンサ11の各素子番号と波長との関係を演算手段
13のメモリに記憶しておく。
That is, since the wavelength incident on each element of the image sensor 1 is determined in advance by the spectroscopy means 9, the relationship between each element number of the image sensor 11 and the wavelength is stored in the memory of the calculation means 13.

そして、測定時、イメージセンサ11の各素子の出力を
順次読み出し、第4図で示すように、測定範囲内で極値
を与える素子番号からメモリを利用して波長λ1、λ2
を求め、極値の数の差から次数差Nを求め、メモリ等に
格納された屈折率nを用い、(3)、(4)式のような
演算を行って被測定対象4の膜厚dを求める。
During measurement, the output of each element of the image sensor 11 is read out sequentially, and as shown in FIG.
, calculate the order difference N from the difference in the number of extreme values, use the refractive index n stored in a memory, etc., perform calculations such as equations (3) and (4), and calculate the film thickness of the object to be measured 4. Find d.

ところで、第4図A、Bで示すように、被測定対象4の
膜厚のバラツキにより干渉縞パターンがずれて重なり、
弱い部分が生じることがある。これを避けるため、極大
値と極小値との差が所定の値以上のときの極値について
の出力から上記のように膜厚を測定するようにする。こ
のことにより、不確実で、弱い干渉縞を拾うことなく、
強い確実な干渉縞から被測定対象4の膜厚dを測定でき
る。
By the way, as shown in FIGS. 4A and 4B, interference fringe patterns shift and overlap due to variations in the film thickness of the object to be measured 4,
There may be weak areas. In order to avoid this, the film thickness is measured as described above from the output for the extreme value when the difference between the local maximum value and the local minimum value is greater than or equal to a predetermined value. This avoids picking up uncertain and weak interference fringes.
The film thickness d of the object to be measured 4 can be measured from strong and reliable interference fringes.

また、イメージセンサ11に電荷蓄積型Wi像素子CO
Dを用いると、被測定対象4が移動していて、その厚さ
等がずれると、やや異った干渉縞パターンがイメージセ
ンサ11の各素子に一走査周期内に入射して合成され、
全体としてコントラストが悪くなる。
In addition, a charge storage type Wi image element CO is provided in the image sensor 11.
When D is used, if the object to be measured 4 is moving and its thickness etc. deviate, slightly different interference fringe patterns will be incident on each element of the image sensor 11 within one scanning period and will be synthesized.
Overall contrast deteriorates.

このため、リセット手段6によりリセットをかけるよう
にしてイメージセンサ11の蓄積時間を制限し、つまり
一走査内の測定時間を制限し、イメージセンサ11への
入射光の変動の影響を少くし、干渉縞のコントラストが
悪くなるのを防止し、測定を確実なものとする。第3図
で示すように、イメージセンサ11の各画素出力は、所
定時間Tごとに転送され、その間各画素に電荷が蓄積さ
れるのであるが、リセット手段6により時間t1だけリ
セットすると、その間各画素には電荷は蓄積されず、リ
セット解除後の蓄積時間12分だけの電荷が各画素に蓄
積されることになる。このリセット時間t1は最適な値
と任意になるよう変化させて設定できる。
For this reason, by applying a reset using the reset means 6, the accumulation time of the image sensor 11 is limited, that is, the measurement time within one scan is limited, thereby reducing the influence of fluctuations in the incident light on the image sensor 11, and reducing the interference. To prevent deterioration of stripe contrast and ensure reliable measurement. As shown in FIG. 3, the output of each pixel of the image sensor 11 is transferred every predetermined time T, during which charge is accumulated in each pixel. However, when the reset means 6 resets the output for time t1, each pixel output during that time is transferred. No charges are accumulated in the pixels, and charges corresponding to the accumulation time of 12 minutes after reset release are accumulated in each pixel. This reset time t1 can be changed and set to an optimal value as desired.

[発明の効果] 以上述へたように、この発明は、リセット手段によりイ
メージセンサの電荷蓄積時間を制限し、所定時間毎に測
定しているので、十分な干渉縞のコントラストが得られ
、安定した高精度の膜厚測定が可能となる。
[Effects of the Invention] As described above, in the present invention, the charge accumulation time of the image sensor is limited by the reset means and measurement is performed at predetermined intervals, so that sufficient contrast of interference fringes can be obtained and stability can be achieved. This makes it possible to measure film thickness with high precision.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は、この発明の一実施例を示す構成説明
図、第3図は、信号の説明図、第4図は、干渉縞の説明
図である。
1 and 2 are configuration explanatory diagrams showing one embodiment of the present invention, FIG. 3 is an explanatory diagram of signals, and FIG. 4 is an explanatory diagram of interference fringes.

Claims (1)

【特許請求の範囲】[Claims] 1、光源からの光を被測定対象に投光し、その透過光ま
たは反射光を分光して干渉縞をイメージセンサで検出し
、被測定対象の膜厚を測定する装置において、前記イメ
ージセンサのリセット時間を変化させるリセット手段を
設けたことを特徴とする膜厚測定装置。
1. In an apparatus that projects light from a light source onto an object to be measured, spectrally transmits the transmitted light or reflected light, detects interference fringes with an image sensor, and measures the film thickness of the object to be measured. A film thickness measuring device characterized by being provided with a reset means for changing a reset time.
JP31349486A 1986-12-25 1986-12-25 Apparatus for measuring thickness of film Granted JPS63163104A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31349486A JPS63163104A (en) 1986-12-25 1986-12-25 Apparatus for measuring thickness of film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31349486A JPS63163104A (en) 1986-12-25 1986-12-25 Apparatus for measuring thickness of film

Publications (2)

Publication Number Publication Date
JPS63163104A true JPS63163104A (en) 1988-07-06
JPH0444202B2 JPH0444202B2 (en) 1992-07-21

Family

ID=18041985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31349486A Granted JPS63163104A (en) 1986-12-25 1986-12-25 Apparatus for measuring thickness of film

Country Status (1)

Country Link
JP (1) JPS63163104A (en)

Also Published As

Publication number Publication date
JPH0444202B2 (en) 1992-07-21

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