JPS63503023A - 複数のイオン化学種を放射するための液体金属イオンソース - Google Patents

複数のイオン化学種を放射するための液体金属イオンソース

Info

Publication number
JPS63503023A
JPS63503023A JP62503518A JP50351887A JPS63503023A JP S63503023 A JPS63503023 A JP S63503023A JP 62503518 A JP62503518 A JP 62503518A JP 50351887 A JP50351887 A JP 50351887A JP S63503023 A JPS63503023 A JP S63503023A
Authority
JP
Japan
Prior art keywords
arsenic
boron
source
ion source
liquid metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62503518A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0542095B2 (cg-RX-API-DMAC7.html
Inventor
クラーク，ウイリアム・エム・ジユニア
ウトラウト，マーク・ダブユ
ウイソツキ，ジヨセフ・エー
ベーレンス・ロバート・ジー
スズクラルズ，ユージン・ジー
ストームス，エドモンド・ケイ
スワンソン，リンウツド・ダブユ
ベル，アンソニー・イー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Government of the United States of America
Original Assignee
Government of the United States of America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Government of the United States of America filed Critical Government of the United States of America
Publication of JPS63503023A publication Critical patent/JPS63503023A/ja
Publication of JPH0542095B2 publication Critical patent/JPH0542095B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP62503518A 1986-04-14 1987-03-09 複数のイオン化学種を放射するための液体金属イオンソース Granted JPS63503023A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US851,755 1986-04-14
US06/851,755 US4670685A (en) 1986-04-14 1986-04-14 Liquid metal ion source and alloy for ion emission of multiple ionic species

Publications (2)

Publication Number Publication Date
JPS63503023A true JPS63503023A (ja) 1988-11-02
JPH0542095B2 JPH0542095B2 (cg-RX-API-DMAC7.html) 1993-06-25

Family

ID=25311600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62503518A Granted JPS63503023A (ja) 1986-04-14 1987-03-09 複数のイオン化学種を放射するための液体金属イオンソース

Country Status (5)

Country Link
US (1) US4670685A (cg-RX-API-DMAC7.html)
EP (1) EP0262219B1 (cg-RX-API-DMAC7.html)
JP (1) JPS63503023A (cg-RX-API-DMAC7.html)
IL (1) IL81956A (cg-RX-API-DMAC7.html)
WO (1) WO1987006390A2 (cg-RX-API-DMAC7.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0685309B2 (ja) * 1985-12-13 1994-10-26 株式会社日立製作所 液体金属イオン源
US4907422A (en) * 1988-09-30 1990-03-13 The Manitowoc Company, Inc. Harvest cycle refrigerant control system
US4994711A (en) * 1989-12-22 1991-02-19 Hughes Aircraft Company High brightness solid electrolyte ion source
US5447763A (en) * 1990-08-17 1995-09-05 Ion Systems, Inc. Silicon ion emitter electrodes
US5149976A (en) * 1990-08-31 1992-09-22 Hughes Aircraft Company Charged particle beam pattern generation apparatus and method
US6022258A (en) * 1996-03-27 2000-02-08 Thermoceramix, Llc ARC chamber for an ion implantation system
US5914494A (en) * 1996-03-27 1999-06-22 Thermoceramix, Llc Arc chamber for an ion implantation system
US5857889A (en) * 1996-03-27 1999-01-12 Thermoceramix, Llc Arc Chamber for an ion implantation system
US6239440B1 (en) 1996-03-27 2001-05-29 Thermoceramix, L.L.C. Arc chamber for an ion implantation system
FR2806527B1 (fr) 2000-03-20 2002-10-25 Schlumberger Technologies Inc Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique
US6914386B2 (en) * 2003-06-20 2005-07-05 Applied Materials Israel, Ltd. Source of liquid metal ions and a method for controlling the source
US9275823B2 (en) 2012-03-21 2016-03-01 Fei Company Multiple gas injection system
US9105438B2 (en) 2012-05-31 2015-08-11 Fei Company Imaging and processing for plasma ion source
JP6238978B2 (ja) 2012-06-29 2017-11-29 エフ・イ−・アイ・カンパニー 多種イオン源
US9899181B1 (en) 2017-01-12 2018-02-20 Fei Company Collision ionization ion source
US9941094B1 (en) 2017-02-01 2018-04-10 Fei Company Innovative source assembly for ion beam production

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4367429A (en) * 1980-11-03 1983-01-04 Hughes Aircraft Company Alloys for liquid metal ion sources
JPS59191225A (ja) * 1983-04-15 1984-10-30 Hitachi Ltd 液体金属イオン種合金

Also Published As

Publication number Publication date
EP0262219A1 (en) 1988-04-06
EP0262219B1 (en) 1990-04-25
US4670685A (en) 1987-06-02
WO1987006390A3 (en) 1987-11-05
WO1987006390A2 (en) 1987-10-22
IL81956A0 (en) 1987-10-20
JPH0542095B2 (cg-RX-API-DMAC7.html) 1993-06-25
IL81956A (en) 1990-11-29

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees