JPS6348330B2 - - Google Patents

Info

Publication number
JPS6348330B2
JPS6348330B2 JP19911686A JP19911686A JPS6348330B2 JP S6348330 B2 JPS6348330 B2 JP S6348330B2 JP 19911686 A JP19911686 A JP 19911686A JP 19911686 A JP19911686 A JP 19911686A JP S6348330 B2 JPS6348330 B2 JP S6348330B2
Authority
JP
Japan
Prior art keywords
resist
film
pattern
etching
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19911686A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6356655A (ja
Inventor
Shuzo Ooshio
Koichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP61199116A priority Critical patent/JPS6356655A/ja
Publication of JPS6356655A publication Critical patent/JPS6356655A/ja
Publication of JPS6348330B2 publication Critical patent/JPS6348330B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61199116A 1986-08-27 1986-08-27 パタ−ン形成方法 Granted JPS6356655A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61199116A JPS6356655A (ja) 1986-08-27 1986-08-27 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61199116A JPS6356655A (ja) 1986-08-27 1986-08-27 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6356655A JPS6356655A (ja) 1988-03-11
JPS6348330B2 true JPS6348330B2 (enExample) 1988-09-28

Family

ID=16402398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61199116A Granted JPS6356655A (ja) 1986-08-27 1986-08-27 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6356655A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2551632B2 (ja) * 1988-07-11 1996-11-06 株式会社日立製作所 パターン形成方法および半導体装置製造方法

Also Published As

Publication number Publication date
JPS6356655A (ja) 1988-03-11

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