JPS6346485B2 - - Google Patents
Info
- Publication number
- JPS6346485B2 JPS6346485B2 JP55041494A JP4149480A JPS6346485B2 JP S6346485 B2 JPS6346485 B2 JP S6346485B2 JP 55041494 A JP55041494 A JP 55041494A JP 4149480 A JP4149480 A JP 4149480A JP S6346485 B2 JPS6346485 B2 JP S6346485B2
- Authority
- JP
- Japan
- Prior art keywords
- sio
- magnetic head
- glassy oxide
- gap
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 30
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 6
- 239000000696 magnetic material Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229910011255 B2O3 Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/23—Gap features
- G11B5/235—Selection of material for gap filler
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
本発明はヘツドギヤツプ面にSiO2層を蒸着し
た形式の磁気ヘツドおよびギヤツプ面で分割した
磁気ヘツド部材を熱圧着によつて突合せ接合して
前記磁気ヘツドを製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic head having two layers of SiO 2 deposited on the head gap surface, and a method for manufacturing the magnetic head by butt-joining magnetic head members divided at the gap surface by thermocompression bonding. .
磁気ヘツドの一般的な形状としては、磁性材の
コアに中空部を形成し、磁気記録媒体に対面する
コア前部に前記中空部までつながるギヤツプを設
けた形状を有する。ギヤツプは例えば1μ〜20μと
きわめて微細であるため、コアをギヤツプ中心面
で２体の磁気ヘツド部材に分割し、この磁気ヘツ
ド部材を突合せる際にギヤツプを形成するという
方法がとられる。この場合、SiO2いわゆるシリ
カガラスをギヤツプ面に蒸着し、このガラス層を
はさんで前記磁気ヘツド部材を突合せ圧着するこ
とにより、ガラス層で充填されたヘツドギヤツプ
が得られる。ギヤツプ材としてSiO2が使われる
のは主にSiO2以外に他の成分を含むいわゆるふ
つうのガラスを蒸着する場合に比べてSiO2の方
が硬度が高く摺動に強いためである。第１図ａ〜
ｃは、この方法による従来の磁気ヘツド製造工程
を概略的に示したものである。フエライトあるい
はセンダスト等の磁性材料の、ギヤツプ中心面で
分割された磁気ヘツド部材１，２の相対する面
（分割面）１ａ，２ａの一方もしくは両方の面に、
SiO2を真空蒸着し（第１図ｂ）、圧力を加えなが
ら1200℃程度の温度で熱圧着したのち、第１図ｃ
の破線で示すように、必要に応じてヘツド前部を
加工する。３，４はSiO2層、５はヘツド前部か
ら中空部６までのびたギヤツプである。このよう
に高い温度を必要とする理由は、主に圧着後の強
度上の問題からであるが、磁性材料の特性あるい
は熱処理装置等の面から言えば、できるだけ低い
温度で同様の効果が得られることが望まれてい
た。 The general shape of a magnetic head is such that a hollow portion is formed in a core made of a magnetic material, and a gap is provided at the front portion of the core facing the magnetic recording medium to connect to the hollow portion. Since the gap is very fine, for example, 1 to 20 microns, a method is used in which the core is divided into two magnetic head members at the center plane of the gap, and a gap is formed when the magnetic head members are butted together. In this case, a head gap filled with a glass layer can be obtained by depositing SiO 2 so-called silica glass on the gap surface and pressing the magnetic head member against each other with this glass layer sandwiched therebetween. The main reason why SiO 2 is used as a gap material is that SiO 2 has higher hardness and is more resistant to sliding compared to the case where so-called ordinary glass containing other components besides SiO 2 is vapor-deposited. Figure 1 a~
Fig. 3c schematically shows a conventional magnetic head manufacturing process using this method. On one or both of the opposing surfaces (divided surfaces) 1a and 2a of the magnetic head members 1 and 2 divided at the gap center plane, made of a magnetic material such as ferrite or sendust,
After vacuum evaporating SiO 2 (Fig. 1 b) and thermocompression bonding at a temperature of about 1200°C while applying pressure,
Machining the front part of the head as necessary, as shown by the dashed line. 3 and 4 are SiO 2 layers, and 5 is a gap extending from the front part of the head to the hollow part 6. The reason why such a high temperature is required is mainly due to strength problems after crimping, but from the viewpoint of the characteristics of the magnetic material or the heat treatment equipment, the same effect can be obtained at the lowest possible temperature. That was what was hoped for.
本発明は、このような問題に鑑みてなされたも
のであつて、充分な接合部強度をもち、且つ摺動
に強い特性をもつ突合せ型磁気ヘツドを提供する
ことを目的とする。 The present invention has been made in view of these problems, and an object of the present invention is to provide a butt-type magnetic head that has sufficient joint strength and is resistant to sliding.
本発明は、さらに、特性に影響を与えることな
く低い圧着温度で前記磁気ヘツドを容易に製造す
る方法を提供することを目的とする。 A further object of the present invention is to provide a method for easily manufacturing the magnetic head at a low compression temperature without affecting the properties.
本発明に係る磁気ヘツドは、ヘツド突合せ面お
よびギヤツプ面に、SiO2とSiO2以外の他のガラ
ス質酸化物との相互浸潤層を有することを特徴と
するものであり、これを製造するには、ギヤツプ
中心面で分割した２体の磁気ヘツド部材の少なく
とも一方の分割面に、SiO2とSiO2を含む他のガ
ラス質酸化物とを、該ガラス質酸化物が前記分割
面表面側にくるように、真空蒸着（スパツタリン
グを含む）し、前記２体の磁気ヘツド部材をその
分割面で突合せて、できるだけ低い温度例えば約
900℃で熱圧着し、その後必要に応じてヘツド前
部を所望形状に加工する。 The magnetic head according to the present invention is characterized in that it has a mutually infiltrated layer of SiO 2 and a glassy oxide other than SiO 2 on the head abutting surface and the gap surface. In this method, SiO 2 and another glassy oxide containing SiO 2 are placed on at least one of the split surfaces of two magnetic head members separated at the center plane of the gap, with the glassy oxide facing toward the surface of the split surface. The two magnetic head members are brought together at their split surfaces and heated to as low a temperature as possible, e.g.
The head is thermocompressed at 900°C, and then the front part of the head is processed into the desired shape if necessary.
以下、本発明を、図面を参照しながら、実施例
について説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第２図は、本発明に係る磁気ヘツドをギヤツプ
面に直交する面で裁断しかつ要部を拡大して模型
的に示した断面図である。ギヤツプ中心面で接合
したフエライト等の磁気ヘツド部材１，２の両接
合面近傍にSiO2層３，４が形成され、これらの
層の間に、SiO2と、SiO2以外の他の低融解ガラ
ス質酸化物例えばNa2O、K2O、MgO、SrO、
BaO、PbO、B2O3、Al2O3、TiO2、ZrO2などの
うち少なくとも１種類以上を含むガラス質酸化物
との相互浸潤層７が存在している。このガラス質
酸化物の１例を挙げれば、SiO2……60％、B2O3
……15％、CaO……８％、K2O……10％、Na2O
……７％である。これらのガラス質酸化物はいず
れも融解温度が低い。この相互浸潤層７を介して
その両側のSiO2層３，４が結合され、これによ
つて磅気ヘツド部材１，２は互いに強固に接合さ
れる。 FIG. 2 is a schematic cross-sectional view of the magnetic head according to the present invention, cut along a plane perpendicular to the gap plane and showing the main parts enlarged. SiO 2 layers 3 and 4 are formed near both bonding surfaces of the magnetic head members 1 and 2, such as ferrite, which are bonded at the center plane of the gap, and between these layers, SiO 2 and other low-melting materials other than SiO 2 are formed. Glassy oxides such as Na 2 O, K 2 O, MgO, SrO,
A mutually infiltrated layer 7 with a glassy oxide containing at least one of BaO, PbO, B2O3 , Al2O3 , TiO2 , ZrO2, etc. is present . An example of this glassy oxide is SiO 2 ...60%, B 2 O 3
...15%, CaO...8%, K2O ...10%, Na2O
...7%. All of these glassy oxides have low melting temperatures. The SiO 2 layers 3 and 4 on both sides are bonded through the mutually infiltrated layer 7, thereby firmly bonding the silicon head members 1 and 2 to each other.
第３図は、磁気ヘツド部材１，２を熱圧着する
前の状態で示したものである。この実施例では、
磁気ヘツド部材１，２の相対する分割面の両方の
面にSiO2を真空蒸着し、その後、一方の面の
SiO2層３上に前記ガラス質酸化物８を真空蒸着
し、この表面に他方の磁気ヘツド部材２を900℃
程度の温度で熱圧着する。このガラス質酸化物８
は融解温度が低いので、この程度の温度で前記ガ
ラス質酸化物は磁気ヘツド部材１，２の両方の
SiO2層３，４と相互に拡散し、第２図に示した
ような相互浸潤層が形成され、これによつて従来
と同等な接合強度がもたらされる。熱圧着後、ヘ
ツド前部を必要に応じて所望外形形状に研削加工
する。 FIG. 3 shows the magnetic head members 1 and 2 before they are bonded together by thermocompression. In this example,
SiO 2 is vacuum-deposited on both opposing dividing surfaces of the magnetic head members 1 and 2, and then SiO 2 is deposited on one side.
The glassy oxide 8 is vacuum-deposited on the SiO 2 layer 3, and the other magnetic head member 2 is deposited on this surface at 900°C.
Heat and press at a moderate temperature. This glassy oxide 8
Since the melting temperature is low, the glassy oxide melts into both magnetic head members 1 and 2 at this temperature.
It interdiffuses with the SiO 2 layers 3 and 4 to form a mutually infiltrated layer as shown in FIG. 2, thereby providing a bonding strength equivalent to that of the conventional one. After thermocompression bonding, the front part of the head is ground into a desired external shape as required.
本発明は上述の実施例に限定されるものでなく
種々の態様で実施可能である。例えば上述の実施
例では一方の分割面のSiO2層にのみ低融解ガラ
ス質酸化物を真空蒸着したが、両方の分割面の
SiO2層上に前記ガラス質酸化物を蒸着してもよ
い。また、一方または両方の分割面にSiO2層と
前記ガラス質酸化物の層とを交互に複数層蒸着
し、かつ最終的にガラス質酸化物層が表面に現わ
れるようにして両分割面を熱圧着するようにして
もよい。この場合は、ヘツド接合面にSiO2層と
SiO2およびガラス質酸化物の相互浸潤層とが交
互に複数積層された磁気ヘツドとなり、より高い
接合強度がもたらされる。 The present invention is not limited to the above-described embodiments, but can be implemented in various ways. For example, in the above example, low melting glassy oxide was vacuum-deposited only on the SiO 2 layer on one split surface, but on both split surfaces,
The glassy oxide may be deposited on the SiO 2 layer. In addition, multiple layers of SiO 2 and the glassy oxide layer are alternately deposited on one or both of the divided surfaces, and both divided surfaces are heated so that the glassy oxide layer finally appears on the surface. It may also be crimped. In this case, two layers of SiO are added to the head junction surface.
The magnetic head consists of a plurality of alternating layers of mutually infiltrated layers of SiO 2 and glassy oxide, resulting in higher bonding strength.
本発明は、上述のように、従来に比べて低い温
度で熱圧着できるので、磁性材料の特性劣化をき
たすことがなく、しかも従来と変わらない強度の
磁気ヘツドが得られる。その製造も、高温の熱処
理装置が不要であるので、従来と比べて容易に製
造できる利点がある。 As described above, in the present invention, thermocompression bonding can be carried out at a lower temperature than in the prior art, so that a magnetic head with the same strength as the conventional one can be obtained without deteriorating the characteristics of the magnetic material. The manufacturing process also has the advantage of being easier to manufacture than conventional methods, since no high-temperature heat treatment equipment is required.
第１図ａ，ｂ，ｃは従来の磁気ヘツドの製造工
程を示した図、第２図は本発明の実施例に係る磁
気ヘツドを部分的に拡大して模型的に示した縦断
面図、第３図は本発明に係る方法によつて磁気ヘ
ツドを製造する場合の熱圧着する前の状態を示し
た斜視図である。
１，２……磁気ヘツド部材、１ａ，２ａ……分
割面（接合面）、３，４……SiO2層、７……相互
浸潤層、８……ガラス質酸化物。
1a, b, and c are diagrams showing the manufacturing process of a conventional magnetic head, and FIG. 2 is a vertical sectional view schematically showing a partially enlarged magnetic head according to an embodiment of the present invention. FIG. 3 is a perspective view showing the state before thermocompression bonding when manufacturing a magnetic head by the method according to the present invention. DESCRIPTION OF SYMBOLS 1, 2... Magnetic head member, 1a, 2a... Divided surface (joint surface), 3, 4... SiO 2 layer, 7... Mutual infiltration layer, 8... Glassy oxide.
Claims (1)
の層とSiO2以外に他のガラス質酸化物を含む層
との相互浸潤層を有することを特徴とする磁気ヘ
ツド。 ２ ギヤツプ中心面で分割した２体の磁気ヘツド
部材の少なくとも一方の分割面に、SiO2層と
SiO2を含む他のガラス質酸化物層とを、該ガラ
ス質酸化物が前記分割面表面側にくるように、真
空蒸着（スパツタリングを含む）し、前記２体の
磁気ヘツド部材をその分割面で接合し熱圧着する
ことを特徴とする磁気ヘツドの製造方法。 ３ 前記磁気ヘツド部材の両分割面にSiO2層を
真空蒸着し、少なくとも一方の分割面にはSiO2
層と前記ガラス質酸化物とを２層以上交互に、か
つ該分割面表面に該ガラス質酸化物が現われるよ
うに真空蒸着することを特徴とする特許請求の範
囲第２項に記載した磁気ヘツドの製造方法。[Claims] 1. SiO 2 on the head abutment surface and gap surface.
A magnetic head characterized in that it has a mutually infiltrated layer with a layer containing a glassy oxide other than SiO 2 . 2 At least one of the two magnetic head members divided at the center plane of the gap is coated with two layers of SiO.
Another glassy oxide layer containing SiO 2 is vacuum deposited (including sputtering) so that the glassy oxide is on the surface side of the split surface, and the two magnetic head members are placed on the split surface. A method of manufacturing a magnetic head characterized by bonding and thermocompression bonding. 3 Vacuum-deposit a SiO 2 layer on both split surfaces of the magnetic head member, and deposit SiO 2 on at least one split surface.
A magnetic head according to claim 2, characterized in that two or more layers of the glassy oxide and the glassy oxide are vacuum-deposited alternately so that the glassy oxide appears on the surface of the split surface. manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4149480A JPS56137517A (en) | 1980-03-31 | 1980-03-31 | Magnetic head and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4149480A JPS56137517A (en) | 1980-03-31 | 1980-03-31 | Magnetic head and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56137517A JPS56137517A (en) | 1981-10-27 |
| JPS6346485B2 true JPS6346485B2 (en) | 1988-09-16 |
Family
ID=12609902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4149480A Granted JPS56137517A (en) | 1980-03-31 | 1980-03-31 | Magnetic head and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56137517A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59146426A (en) * | 1983-02-10 | 1984-08-22 | Matsushita Electric Ind Co Ltd | Magnetic head |
| JPS6020306A (en) * | 1983-07-15 | 1985-02-01 | Hitachi Ltd | Production of magnetic head |
| JPS6063705A (en) * | 1983-09-19 | 1985-04-12 | Sanyo Electric Co Ltd | Magnetic head |
| EP0138580B1 (en) * | 1983-10-12 | 1990-04-25 | Matsushita Electric Industrial Co., Ltd. | Alloy magnetic recording head |
| JPS60146908U (en) * | 1984-03-12 | 1985-09-30 | 三洋電機株式会社 | magnetic head |
| JPS60231905A (en) * | 1984-04-30 | 1985-11-18 | Nec Kansai Ltd | Production of magnetic head |
| JPH0714112A (en) * | 1993-06-22 | 1995-01-17 | Citizen Watch Co Ltd | Production of magnetic head |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4811294U (en) * | 1971-06-22 | 1973-02-08 | ||
| JPS4865916A (en) * | 1971-12-10 | 1973-09-10 | ||
| JPS5027520A (en) * | 1973-07-09 | 1975-03-20 | ||
| JPS5085322A (en) * | 1973-11-28 | 1975-07-09 | ||
| JPS52126212A (en) * | 1976-04-14 | 1977-10-22 | Matsushita Electric Ind Co Ltd | Magnetic head magnetic gap shaping |
| JPS5446021A (en) * | 1977-09-19 | 1979-04-11 | Matsushita Electric Ind Co Ltd | Magnetic head and production of the same |
-
1980
- 1980-03-31 JP JP4149480A patent/JPS56137517A/en active Granted
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4811294U (en) * | 1971-06-22 | 1973-02-08 | ||
| JPS4865916A (en) * | 1971-12-10 | 1973-09-10 | ||
| JPS5027520A (en) * | 1973-07-09 | 1975-03-20 | ||
| JPS5085322A (en) * | 1973-11-28 | 1975-07-09 | ||
| JPS52126212A (en) * | 1976-04-14 | 1977-10-22 | Matsushita Electric Ind Co Ltd | Magnetic head magnetic gap shaping |
| JPS5446021A (en) * | 1977-09-19 | 1979-04-11 | Matsushita Electric Ind Co Ltd | Magnetic head and production of the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56137517A (en) | 1981-10-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1291329A1 (en) | Glass composition, sealing glass for magnetic head and magnetic head | |
| US4048714A (en) | Glass bonding of manganese-zinc ferrite | |
| JPS6346485B2 (en) | ||
| US4544974A (en) | Alumina glass composition and magnetic head incorporating same | |
| US4392167A (en) | Magnetic head, method of producing the magnetic head | |
| JPH0462408B2 (en) | ||
| JPH0152808B2 (en) | ||
| WO2004037736A1 (en) | Gap bonding glass for magnetic heads and magnetic head | |
| JPS6221176B2 (en) | ||
| DE2655480A1 (en) | PROCEDURE FOR PERMANENTLY JOINING MAGNETIC CERAMICS | |
| JPH0465443B2 (en) | ||
| JP3151855B2 (en) | Magnetic head | |
| JPH0439731B2 (en) | ||
| JPH0437627A (en) | Glass and magnetic head | |
| JPH0263245B2 (en) | ||
| JPH0548242Y2 (en) | ||
| JPS60145514A (en) | Magnetic head | |
| JPS62288133A (en) | Production of magnetic head | |
| JPH0480446B2 (en) | ||
| KR0147167B1 (en) | Magnetic head for vcr | |
| JPS59146431A (en) | Magnetic head | |
| JPH04254908A (en) | Production of magnetic head | |
| JPH05143923A (en) | Production of magnetic head | |
| JPS60170011A (en) | Magnetic head | |
| JPS59121614A (en) | Composite magnetic head and its production |