JPS6346094B2 - - Google Patents

Info

Publication number
JPS6346094B2
JPS6346094B2 JP61071262A JP7126286A JPS6346094B2 JP S6346094 B2 JPS6346094 B2 JP S6346094B2 JP 61071262 A JP61071262 A JP 61071262A JP 7126286 A JP7126286 A JP 7126286A JP S6346094 B2 JPS6346094 B2 JP S6346094B2
Authority
JP
Japan
Prior art keywords
resist
resist film
resist material
ionizing radiation
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP61071262A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62227929A (ja
Inventor
Yasuhiro Yoneda
Kazumasa Saito
Yoko Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP61071262A priority Critical patent/JPS62227929A/ja
Publication of JPS62227929A publication Critical patent/JPS62227929A/ja
Publication of JPS6346094B2 publication Critical patent/JPS6346094B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP61071262A 1986-03-31 1986-03-31 レジスト材料 Granted JPS62227929A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61071262A JPS62227929A (ja) 1986-03-31 1986-03-31 レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61071262A JPS62227929A (ja) 1986-03-31 1986-03-31 レジスト材料

Publications (2)

Publication Number Publication Date
JPS62227929A JPS62227929A (ja) 1987-10-06
JPS6346094B2 true JPS6346094B2 (oth) 1988-09-13

Family

ID=13455632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61071262A Granted JPS62227929A (ja) 1986-03-31 1986-03-31 レジスト材料

Country Status (1)

Country Link
JP (1) JPS62227929A (oth)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2608429B2 (ja) * 1987-11-09 1997-05-07 東レ・ダウコーニング・シリコーン株式会社 パターン形成用材料およびパターン形成方法
JP2628597B2 (ja) * 1988-02-29 1997-07-09 富士通株式会社 シリコーン化合物
JP2692209B2 (ja) * 1988-12-19 1997-12-17 富士通株式会社 レジストパターンの形成方法
US5491203A (en) * 1994-09-08 1996-02-13 Showa Denko K. K. Polyorganosiloxane and process for producing the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5859222A (ja) * 1981-10-03 1983-04-08 Japan Synthetic Rubber Co Ltd オルガノポリシルセスキオキサン及びその製造方法

Also Published As

Publication number Publication date
JPS62227929A (ja) 1987-10-06

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