JPS634450B2 - - Google Patents
Info
- Publication number
- JPS634450B2 JPS634450B2 JP896883A JP896883A JPS634450B2 JP S634450 B2 JPS634450 B2 JP S634450B2 JP 896883 A JP896883 A JP 896883A JP 896883 A JP896883 A JP 896883A JP S634450 B2 JPS634450 B2 JP S634450B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- film
- sputtering
- substrate
- anode electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 25
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 description 20
- 229910004298 SiO 2 Inorganic materials 0.000 description 16
- 239000002344 surface layer Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP896883A JPS59136131A (ja) | 1983-01-21 | 1983-01-21 | スパツタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP896883A JPS59136131A (ja) | 1983-01-21 | 1983-01-21 | スパツタリング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59136131A JPS59136131A (ja) | 1984-08-04 |
| JPS634450B2 true JPS634450B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-01-29 |
Family
ID=11707478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP896883A Granted JPS59136131A (ja) | 1983-01-21 | 1983-01-21 | スパツタリング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59136131A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0375321U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1989-11-24 | 1991-07-29 |
-
1983
- 1983-01-21 JP JP896883A patent/JPS59136131A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0375321U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1989-11-24 | 1991-07-29 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59136131A (ja) | 1984-08-04 |