JPS6339665B2 - - Google Patents

Info

Publication number
JPS6339665B2
JPS6339665B2 JP58137286A JP13728683A JPS6339665B2 JP S6339665 B2 JPS6339665 B2 JP S6339665B2 JP 58137286 A JP58137286 A JP 58137286A JP 13728683 A JP13728683 A JP 13728683A JP S6339665 B2 JPS6339665 B2 JP S6339665B2
Authority
JP
Japan
Prior art keywords
film
nbn
substrate
target
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58137286A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6029463A (ja
Inventor
Masahiko Naoe
Shozo Ishibashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP13728683A priority Critical patent/JPS6029463A/ja
Publication of JPS6029463A publication Critical patent/JPS6029463A/ja
Publication of JPS6339665B2 publication Critical patent/JPS6339665B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP13728683A 1983-07-26 1983-07-26 窒化ニオブ膜の形成方法 Granted JPS6029463A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13728683A JPS6029463A (ja) 1983-07-26 1983-07-26 窒化ニオブ膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13728683A JPS6029463A (ja) 1983-07-26 1983-07-26 窒化ニオブ膜の形成方法

Publications (2)

Publication Number Publication Date
JPS6029463A JPS6029463A (ja) 1985-02-14
JPS6339665B2 true JPS6339665B2 (en:Method) 1988-08-05

Family

ID=15195130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13728683A Granted JPS6029463A (ja) 1983-07-26 1983-07-26 窒化ニオブ膜の形成方法

Country Status (1)

Country Link
JP (1) JPS6029463A (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240143537A (ko) * 2023-03-24 2024-10-02 옵티시스 주식회사 다수의 발광 소자를 포함하는 발광 유닛

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6483659A (en) * 1987-09-24 1989-03-29 Semiconductor Energy Lab Sputtering device for producing oxide superconductive material

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5485214A (en) * 1977-12-21 1979-07-06 Suwa Seikosha Kk Armor for personal watch
JPS5867865A (ja) * 1981-09-23 1983-04-22 オボニック・シンセティック・マティリアルズ・カンパニ−・インコ−ポレ−テッド コ−テイング組成物及び方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240143537A (ko) * 2023-03-24 2024-10-02 옵티시스 주식회사 다수의 발광 소자를 포함하는 발광 유닛

Also Published As

Publication number Publication date
JPS6029463A (ja) 1985-02-14

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