JPS6338317U - - Google Patents
Info
- Publication number
- JPS6338317U JPS6338317U JP12947186U JP12947186U JPS6338317U JP S6338317 U JPS6338317 U JP S6338317U JP 12947186 U JP12947186 U JP 12947186U JP 12947186 U JP12947186 U JP 12947186U JP S6338317 U JPS6338317 U JP S6338317U
- Authority
- JP
- Japan
- Prior art keywords
- lid
- reaction tube
- basket
- disk
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 3
- 235000012431 wafers Nutrition 0.000 claims 3
- 239000000112 cooling gas Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12947186U JPS6338317U (enExample) | 1986-08-27 | 1986-08-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12947186U JPS6338317U (enExample) | 1986-08-27 | 1986-08-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6338317U true JPS6338317U (enExample) | 1988-03-11 |
Family
ID=31026068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12947186U Pending JPS6338317U (enExample) | 1986-08-27 | 1986-08-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6338317U (enExample) |
-
1986
- 1986-08-27 JP JP12947186U patent/JPS6338317U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3069412B2 (ja) | 半導体ウエハの処理装置および方法 | |
| JPH03224217A (ja) | 熱処理装置及び熱処理方法 | |
| JPH02271529A (ja) | 半導体ウエハーの処理方法と装置 | |
| KR20090037808A (ko) | 열처리장치, 열처리방법 및 기억매체 | |
| JPS6338317U (enExample) | ||
| JPS61208218A (ja) | 縦型拡散炉装置 | |
| JP2002305189A (ja) | 縦型熱処理装置およびその強制空冷方法 | |
| JPS627685B2 (enExample) | ||
| JPS61227169A (ja) | スパツタリング装置 | |
| JPH0271513A (ja) | 半導体製造装置 | |
| JP2003045808A (ja) | 縦型熱処理装置および縦型熱処理方法 | |
| JP2002025995A (ja) | 縦型熱処理装置 | |
| JP2974032B2 (ja) | 縦型熱処理装置 | |
| JPH0445031Y2 (enExample) | ||
| JP3468562B2 (ja) | 熱処理装置 | |
| JPH0330259U (enExample) | ||
| JPS60262924A (ja) | 回転炉床式コイル加熱炉 | |
| JPS61161711A (ja) | 半導体の熱処理方法及び熱処理装置 | |
| JPH09306857A (ja) | 縦型熱処理装置 | |
| JP2536994Y2 (ja) | 半導体製造装置のボート搬送装置 | |
| JPH0350325U (enExample) | ||
| JPH044749B2 (enExample) | ||
| JPS6217481Y2 (enExample) | ||
| JPH0512717Y2 (enExample) | ||
| JPS62152432U (enExample) |