JPS6336105A - 膜厚測定装置 - Google Patents

膜厚測定装置

Info

Publication number
JPS6336105A
JPS6336105A JP17914586A JP17914586A JPS6336105A JP S6336105 A JPS6336105 A JP S6336105A JP 17914586 A JP17914586 A JP 17914586A JP 17914586 A JP17914586 A JP 17914586A JP S6336105 A JPS6336105 A JP S6336105A
Authority
JP
Japan
Prior art keywords
film thickness
base
light
thin film
phase angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17914586A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0431522B2 (enrdf_load_stackoverflow
Inventor
Kazuo Sano
和夫 佐野
Takao Miyazaki
宮崎　孝雄
Yoshiro Yamada
善郎 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
NKK Corp
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NKK Corp, Nippon Kokan Ltd filed Critical NKK Corp
Priority to JP17914586A priority Critical patent/JPS6336105A/ja
Priority to US07/062,242 priority patent/US4850711A/en
Priority to DE87108476T priority patent/DE3787320T2/de
Priority to EP87108476A priority patent/EP0249235B1/en
Publication of JPS6336105A publication Critical patent/JPS6336105A/ja
Publication of JPH0431522B2 publication Critical patent/JPH0431522B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
JP17914586A 1986-06-13 1986-07-30 膜厚測定装置 Granted JPS6336105A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP17914586A JPS6336105A (ja) 1986-07-30 1986-07-30 膜厚測定装置
US07/062,242 US4850711A (en) 1986-06-13 1987-06-11 Film thickness-measuring apparatus using linearly polarized light
DE87108476T DE3787320T2 (de) 1986-06-13 1987-06-12 Schichtdickenmessgerät mit linearpolarisiertem Licht.
EP87108476A EP0249235B1 (en) 1986-06-13 1987-06-12 Film thickness-measuring apparatus using linearly polarized light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17914586A JPS6336105A (ja) 1986-07-30 1986-07-30 膜厚測定装置

Publications (2)

Publication Number Publication Date
JPS6336105A true JPS6336105A (ja) 1988-02-16
JPH0431522B2 JPH0431522B2 (enrdf_load_stackoverflow) 1992-05-26

Family

ID=16060756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17914586A Granted JPS6336105A (ja) 1986-06-13 1986-07-30 膜厚測定装置

Country Status (1)

Country Link
JP (1) JPS6336105A (enrdf_load_stackoverflow)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5311285A (en) * 1991-08-29 1994-05-10 Nkk Corporation Measuring method for ellipsometric parameter and ellipsometer
US5335066A (en) * 1991-08-29 1994-08-02 Nkk Corporation Measuring method for ellipsometric parameter and ellipsometer
US5438415A (en) * 1991-01-30 1995-08-01 Nkk Corporation Ellipsometer and method of controlling coating thickness therewith
JPH08193813A (ja) * 1994-12-20 1996-07-30 Korea Electron Telecommun 金属有機物の化学蒸着による膜のモニタリング装置
JP2006145305A (ja) * 2004-11-18 2006-06-08 Topcon Corp 表面検査装置
JP2007040930A (ja) * 2005-08-05 2007-02-15 Ebara Corp 膜厚測定方法及び基板処理装置
KR100870132B1 (ko) * 2007-05-21 2008-11-25 한국과학기술원 음향광학 변조 필터를 이용한 분광타원해석기 및 이를이용한 타원 해석방법
JP4920087B2 (ja) * 2008-02-14 2012-04-18 三菱電機株式会社 コントロールセンタ
JP4950309B2 (ja) * 2008-02-14 2012-06-13 三菱電機株式会社 コントロールセンタ
JP5008729B2 (ja) * 2008-02-14 2012-08-22 三菱電機株式会社 コントロールセンタ
US9899809B2 (en) 2016-03-16 2018-02-20 Lsis Co., Ltd. Motor control center unit

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5438415A (en) * 1991-01-30 1995-08-01 Nkk Corporation Ellipsometer and method of controlling coating thickness therewith
US5311285A (en) * 1991-08-29 1994-05-10 Nkk Corporation Measuring method for ellipsometric parameter and ellipsometer
US5335066A (en) * 1991-08-29 1994-08-02 Nkk Corporation Measuring method for ellipsometric parameter and ellipsometer
JPH08193813A (ja) * 1994-12-20 1996-07-30 Korea Electron Telecommun 金属有機物の化学蒸着による膜のモニタリング装置
JP2006145305A (ja) * 2004-11-18 2006-06-08 Topcon Corp 表面検査装置
JP2007040930A (ja) * 2005-08-05 2007-02-15 Ebara Corp 膜厚測定方法及び基板処理装置
KR100870132B1 (ko) * 2007-05-21 2008-11-25 한국과학기술원 음향광학 변조 필터를 이용한 분광타원해석기 및 이를이용한 타원 해석방법
JP4920087B2 (ja) * 2008-02-14 2012-04-18 三菱電機株式会社 コントロールセンタ
JP4950309B2 (ja) * 2008-02-14 2012-06-13 三菱電機株式会社 コントロールセンタ
JP5008729B2 (ja) * 2008-02-14 2012-08-22 三菱電機株式会社 コントロールセンタ
US9899809B2 (en) 2016-03-16 2018-02-20 Lsis Co., Ltd. Motor control center unit

Also Published As

Publication number Publication date
JPH0431522B2 (enrdf_load_stackoverflow) 1992-05-26

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees