JPS6336047Y2 - - Google Patents
Info
- Publication number
- JPS6336047Y2 JPS6336047Y2 JP5685286U JP5685286U JPS6336047Y2 JP S6336047 Y2 JPS6336047 Y2 JP S6336047Y2 JP 5685286 U JP5685286 U JP 5685286U JP 5685286 U JP5685286 U JP 5685286U JP S6336047 Y2 JPS6336047 Y2 JP S6336047Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode plate
- gas
- glassy carbon
- plasma etching
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910021397 glassy carbon Inorganic materials 0.000 claims description 9
- 238000001020 plasma etching Methods 0.000 claims description 8
- 239000007789 gas Substances 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 5
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000012798 spherical particle Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007849 furan resin Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5685286U JPS6336047Y2 (enExample) | 1986-04-17 | 1986-04-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5685286U JPS6336047Y2 (enExample) | 1986-04-17 | 1986-04-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62170762U JPS62170762U (enExample) | 1987-10-29 |
| JPS6336047Y2 true JPS6336047Y2 (enExample) | 1988-09-26 |
Family
ID=30886035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5685286U Expired JPS6336047Y2 (enExample) | 1986-04-17 | 1986-04-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6336047Y2 (enExample) |
-
1986
- 1986-04-17 JP JP5685286U patent/JPS6336047Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62170762U (enExample) | 1987-10-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4383710B2 (ja) | 燃料電池スタック用双極極板 | |
| JPH0160938B2 (enExample) | ||
| TW405149B (en) | Etching method | |
| JPH02234419A (ja) | プラズマ電極 | |
| JP3252330B2 (ja) | プラズマエッチング用電極板 | |
| JPS6336047Y2 (enExample) | ||
| JPS62252942A (ja) | プラズマエツチング用電極板 | |
| JPH07114198B2 (ja) | プラズマエッチング用電極板 | |
| JPH06128762A (ja) | プラズマエッチング用電極板 | |
| JPH03162593A (ja) | プラズマエツチング用電極板及びその製造法 | |
| JPH09289198A (ja) | プラズマ処理装置及びプラズマ処理装置用保護部材 | |
| JPS6013298B2 (ja) | 半導体製造用拡散洗滌兼用治具 | |
| JPH05304114A (ja) | プラズマエッチング用電極板 | |
| JPH08148471A (ja) | プラズマエッチング装置 | |
| JP2003023002A (ja) | チャンバー内壁保護部材及びプラズマ処理装置 | |
| JPS59172236A (ja) | 反応性イオンエツチング装置 | |
| JP2707886B2 (ja) | プラズマエッチング用電極板 | |
| JPH0722385A (ja) | Ｒｉｅ用電極およびその製造方法 | |
| JPS6355939A (ja) | ドライエツチング装置 | |
| JPH0387388A (ja) | プラズマエッチング用電極 | |
| JPS5887276A (ja) | ドライエツチング後処理方法 | |
| JPH02218126A (ja) | エッチング装置 | |
| JPH034025Y2 (enExample) | ||
| JPS6327023A (ja) | ドライエツチング装置 | |
| JPH06260471A (ja) | 半導体ウェーハ製造用器具 |