JPS6333094B2 - - Google Patents

Info

Publication number
JPS6333094B2
JPS6333094B2 JP53104604A JP10460478A JPS6333094B2 JP S6333094 B2 JPS6333094 B2 JP S6333094B2 JP 53104604 A JP53104604 A JP 53104604A JP 10460478 A JP10460478 A JP 10460478A JP S6333094 B2 JPS6333094 B2 JP S6333094B2
Authority
JP
Japan
Prior art keywords
pattern
printed board
mask
width
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53104604A
Other languages
Japanese (ja)
Other versions
JPS5530872A (en
Inventor
Moritoshi Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10460478A priority Critical patent/JPS5530872A/en
Publication of JPS5530872A publication Critical patent/JPS5530872A/en
Publication of JPS6333094B2 publication Critical patent/JPS6333094B2/ja
Granted legal-status Critical Current

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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【発明の詳細な説明】 本発明はパターンの高さ、幅などを正確に検査
できるプリント板パターンの検査方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a printed board pattern inspection method that can accurately inspect the height, width, etc. of a pattern.

従来電子計算機用等のプリント板についてその
パターンを検査するとき第1図に示す方法が知ら
れている。即ちプラスチツク板1の上に幅数百ミ
クロン厚さ数十ミクロン程度の銅リード線2−
1,2−2……をプリント配線技術により互いに
平行に設けたプリント板に対し、扁平状の光束3
を略垂直に照射し、反射光を略45度の方向{矢印
4}において目視又はTVカメラによる観測をす
ることにより銅リードのパターン幅を測定しパタ
ーンについて欠陥を発見していた。このやり方で
はパターンからの反射強度のみを検出しているか
らパターン表面上の状態により反射光出力強度が
変動し、パターンのエツジ状況即ち銅リードの高
さ、幅に欠陥があつても、明確に検出することが
できなかつた。また銅リードの高さを顕微鏡で検
出することも行なわれているが操作が複雑であつ
て検査に長時間を必要としていた。
2. Description of the Related Art Conventionally, a method shown in FIG. 1 has been known for inspecting patterns of printed circuit boards for electronic computers and the like. That is, a copper lead wire 2- with a width of several hundred microns and a thickness of several tens of microns is placed on a plastic plate 1.
1, 2-2... are placed parallel to each other using printed wiring technology, and a flat light beam 3
The pattern width of the copper lead was measured by irradiating the copper lead approximately vertically and observing the reflected light visually or with a TV camera in the direction {arrow 4} of approximately 45 degrees, and defects in the pattern were discovered. Since this method detects only the reflected intensity from the pattern, the reflected light output intensity varies depending on the condition on the pattern surface, and even if there is a defect in the edge condition of the pattern, that is, the height or width of the copper lead, it can be clearly detected. could not be detected. The height of the copper lead has also been detected using a microscope, but the operation is complicated and the inspection requires a long time.

本発明の目的はレーザ光線を利用し比較的簡易
にパターンの高さ、幅などを検査する方法を提供
することにある。
An object of the present invention is to provide a relatively simple method of inspecting the height, width, etc. of a pattern using a laser beam.

第2図は本発明を原理的に説明するための図で
あつて、5はレーザ光線、6はレーザ光線反射光
の集光レンズでその焦点距離をFとすると検出す
べきパターンから2F離れた所に在る。7−1,
7−2はそれぞれ光検出器であつて、上下に接し
て置かれ且つレンス6より2F離れた所に在る。
レーザ光線5をプリント板パターンの長手方向に
直交して走査して行くとパターンのない所とパタ
ーンの在る所とは異なる光検出器からレーザ反射
光を検出することができる。即ち銅リードのパタ
ーンのない所では光検出器7−2より光検出器の
出力があり、パターンの在る所では光検出器7−
1より出力があるので各検出器出力を1個の演算
増幅器の正・負各端子に各別に印加するとその出
力からは零線の上下にパルス出力が得られる。そ
のため光線走査の速さが知られているとき零線を
クロスする時刻の差からパターンの幅を求めるこ
とができる。即ちパターンの幅を出力変化の時間
に換算していることになる。この方法によると正
出力の時間を調べてパターンの幅を正確に知るこ
とができる。そこでパターン長手方向に直交して
走査した或位置について検査ができたので、次に
長手方向に或距離動かして再び走査すれば所謂二
次元走査によりプリント板パターンを全部検査す
ることができる。
Figure 2 is a diagram for explaining the principle of the present invention, where 5 is a laser beam, 6 is a condensing lens for the reflected laser beam, and its focal length is F, which is 2F away from the pattern to be detected. be there. 7-1,
7-2 are photodetectors, which are placed vertically in contact with each other and are located 2F apart from the lens 6.
When the laser beam 5 is scanned perpendicularly to the longitudinal direction of the printed board pattern, laser reflected light can be detected by different photodetectors in areas where there is no pattern and areas where the pattern is present. That is, where there is no copper lead pattern, there is an output from the photodetector 7-2, and where there is a pattern, there is an output from the photodetector 7-2.
1, so if the outputs of each detector are separately applied to the positive and negative terminals of one operational amplifier, pulse outputs above and below the zero line are obtained from the outputs. Therefore, when the beam scanning speed is known, the width of the pattern can be determined from the difference in the times at which the beam crosses the zero line. In other words, the width of the pattern is converted into the time of output change. According to this method, the width of the pattern can be accurately determined by checking the time of positive output. Now that a certain position scanned perpendicular to the longitudinal direction of the pattern has been inspected, the entire printed board pattern can be inspected by so-called two-dimensional scanning by moving it a certain distance in the longitudinal direction and scanning again.

第3図は走査位置をパターン長手方向に動かし
た全走査回数とほぼ等しい数の光検知器7−3,
7−4……7−nを走査ピツチに対応して設けた
場合を示し、隣接する光検知器の出力を差動増幅
器の異なる極性の入力信号とすること(例えば演
算増幅器を利用すること)により走査位置が何処
になつつてもパターンの高さ・幅について明確に
検査することができる。しかしながら実際上は光
検知器として約数十ミクロンの幅のものを並べる
必要があるため、小さな窓の開いたマスクとそれ
に対する光検知器とを使用すると良い。
FIG. 3 shows a photodetector 7-3 whose number is approximately equal to the total number of times the scanning position is moved in the longitudinal direction of the pattern.
7-4...7-n is provided corresponding to the scanning pitch, and the outputs of adjacent photodetectors are used as input signals of different polarities to the differential amplifier (for example, by using an operational amplifier). This allows the height and width of the pattern to be clearly inspected no matter where the scanning position is. However, in practice, it is necessary to line up photodetectors with a width of about several tens of microns, so it is better to use a mask with a small window and a corresponding photodetector.

第4図は例えば正端子に接続される光検知と対
応する大きさの孔を穿つたマスクを示し、幅と間
隔とが約数十ミクロンとなつている。このマスク
は機械工作的に容易に作成できる。
FIG. 4 shows a mask with holes of a size corresponding to the photodetector connected to the positive terminal, for example, with widths and spacings of about a few tens of microns. This mask can be easily created mechanically.

第5図はこのマスク8を使つて得たパターンの
検査をする装置を示す。9は走査光束を得るため
の回転鏡を10は走査光用レンズを示している。
光束走査の結果第4図の光検知器のに相当する
場所はマスク8を透過して光検知器7−1に入射
する。またに相当する場所はマスク8から反射
し光検知器7−2に入射する。両光検知器7−
1,7−2の出力を比較すれば良い。
FIG. 5 shows an apparatus for inspecting a pattern obtained using this mask 8. Reference numeral 9 indicates a rotating mirror for obtaining a scanning light beam, and 10 indicates a lens for scanning light.
As a result of the beam scanning, the portion corresponding to the photodetector in FIG. 4 passes through the mask 8 and enters the photodetector 7-1. Further, the light is reflected from the mask 8 and enters the photodetector 7-2. Both photodetectors 7-
It is sufficient to compare the outputs of 1 and 7-2.

ここでマスク窓の大きさと数を計算して見る。
第6図に示すように光ビーム観測角=45゜とし
たとき銅リードパターンの高さHが反射光位置の
差hとなるからh=Hsin=H/√2である。
Here, calculate the size and number of mask windows.
As shown in FIG. 6, when the light beam observation angle is 45 degrees, the height H of the copper lead pattern is the difference h in the position of the reflected light, so h=Hsin=H/√2.

この差hだけ光ビームが移動したとき出力差が
最大となる場所が得られるのは差hと窓幅(ピツ
チ)wが等しいときである。したがつて窓幅とピ
ツチを共にhとする。
When the light beam moves by this difference h, the location where the output difference is maximum is obtained when the difference h and the window width (pitch) w are equal. Therefore, the window width and pitch are both h.

なお前記hが窓幅と等しいとき光ビームが窓の
境界から次の境界まで偏移することが起り得る。
このときは検知器に出力差が生じない。この場合
は窓を1/4ピツチずらしてもう1組設け第7図の
ようにすると特性が平均化する。第8図は第7図
のマスクを使用する場合のパターン検査装置を示
す図で集光レンズを6−1,6−2の2個、検知
器を7−11,7−12,7−21,7−22の
計4個を使用し、差動増幅器以降も2系列使用す
る。11は波形整形回路12は二値化回路、13
は長さ測定回路、14は基準値信号発生回路、1
5は比較回路、16は欠陥検知回路を示す。
Note that when h is equal to the window width, it is possible that the light beam shifts from one window boundary to the next.
At this time, there is no difference in output between the detectors. In this case, if you shift the windows by 1/4 pitch and install another set as shown in Figure 7, the characteristics will be averaged. Figure 8 is a diagram showing a pattern inspection device when using the mask shown in Figure 7, with two condenser lenses 6-1 and 6-2 and detectors 7-11, 7-12, and 7-21. , 7-22 are used in total, and two lines after the differential amplifier are also used. 11 is a waveform shaping circuit 12 is a binarization circuit, 13
14 is a length measuring circuit, 14 is a reference value signal generating circuit, and 1 is a length measuring circuit.
5 is a comparison circuit, and 16 is a defect detection circuit.

このようにして本発明によるとプリント板パタ
ーンの高さ・幅などの検査が明確にできる。光検
知器はマスクを使用することにより実質的に小型
アレイに相当するものが得られるので実用的な測
定器を構成することが容易である。
In this manner, according to the present invention, the height, width, etc. of a printed board pattern can be clearly inspected. By using a mask, a photodetector can be practically equivalent to a small array, so it is easy to construct a practical measuring device.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のプリント板パターンの検査方法
を示す図、第2図は本発明を原理的に説明する
図、第3図は全体走査のとき使用する光検知器の
構成を示す原理図、第4図は本発明を実施すると
き使用するマスクの斜視図、第5図はパターン検
査装置を示す図、第6図は第5図動作の説明図、
第7図はマスクの他の例を示す図、第8図は第5
図の他の例を示す図である。 1……プラスチツク板、2−1,2−2……銅
リード線、3……光束、5……レーザ光線、6,
6−1,6−2……集光レンズ、7−1,7−
2,7−11,7−12,7−21,7−22…
…光検知器、8……マスク、9……回転鏡、10
……レンズ。
Fig. 1 is a diagram showing a conventional method for inspecting printed board patterns, Fig. 2 is a diagram explaining the principle of the present invention, and Fig. 3 is a diagram showing the principle of the configuration of a photodetector used during overall scanning. FIG. 4 is a perspective view of a mask used when carrying out the present invention, FIG. 5 is a diagram showing a pattern inspection device, and FIG. 6 is an explanatory diagram of the operation shown in FIG.
FIG. 7 is a diagram showing another example of the mask, and FIG. 8 is a diagram showing another example of the mask.
It is a figure which shows the other example of a figure. 1... Plastic plate, 2-1, 2-2... Copper lead wire, 3... Luminous flux, 5... Laser beam, 6,
6-1, 6-2...Condensing lens, 7-1, 7-
2, 7-11, 7-12, 7-21, 7-22...
...Photodetector, 8...Mask, 9...Rotating mirror, 10
……lens.

Claims (1)

【特許請求の範囲】 1 プリント板パターンの長手方向に直交して光
束を照射し、且つ該光束を長手方向に走査してパ
ターン状況を検査するプリント板パターンの検査
方法において、 検査光としてレーザ光線を使用し、 プリント板パターンから反射した反射光を受光
する検知器と、 パターンのないプリント板から反射した反射光
を受光する検知器とを、 互いに接して一対の検知器対として設け、 前記検知器対の出力変動によりパターン状況を
検知すること を特徴とするプリント板パターンの検査方法。
[Scope of Claims] 1. A printed board pattern inspection method in which a light beam is irradiated orthogonally to the longitudinal direction of the printed board pattern and the pattern condition is inspected by scanning the light beam in the longitudinal direction, comprising: a laser beam as the inspection light; A detector for receiving reflected light reflected from a printed board pattern and a detector for receiving reflected light reflected from a printed board without a pattern are provided as a pair of detectors in contact with each other, and the above-mentioned detection A printed board pattern inspection method characterized by detecting pattern conditions based on output fluctuations of a pair of devices.
JP10460478A 1978-08-28 1978-08-28 Method of inspecting printed board pattern Granted JPS5530872A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10460478A JPS5530872A (en) 1978-08-28 1978-08-28 Method of inspecting printed board pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10460478A JPS5530872A (en) 1978-08-28 1978-08-28 Method of inspecting printed board pattern

Publications (2)

Publication Number Publication Date
JPS5530872A JPS5530872A (en) 1980-03-04
JPS6333094B2 true JPS6333094B2 (en) 1988-07-04

Family

ID=14385015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10460478A Granted JPS5530872A (en) 1978-08-28 1978-08-28 Method of inspecting printed board pattern

Country Status (1)

Country Link
JP (1) JPS5530872A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3204086A1 (en) * 1982-02-06 1983-08-11 Ibm Deutschland Gmbh, 7000 Stuttgart DEVICE FOR AUTOMATIC OPTICAL TEXTURE CHECK

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS528839A (en) * 1975-07-10 1977-01-24 Tokyo Optical Co Ltd Observation method regarding phase structural body

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5154683U (en) * 1974-10-24 1976-04-26
JPS5282859U (en) * 1975-12-18 1977-06-21

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS528839A (en) * 1975-07-10 1977-01-24 Tokyo Optical Co Ltd Observation method regarding phase structural body

Also Published As

Publication number Publication date
JPS5530872A (en) 1980-03-04

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