JPS6332361B2 - - Google Patents

Info

Publication number
JPS6332361B2
JPS6332361B2 JP15801680A JP15801680A JPS6332361B2 JP S6332361 B2 JPS6332361 B2 JP S6332361B2 JP 15801680 A JP15801680 A JP 15801680A JP 15801680 A JP15801680 A JP 15801680A JP S6332361 B2 JPS6332361 B2 JP S6332361B2
Authority
JP
Japan
Prior art keywords
grating
photoreceptor
exposure
relief
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15801680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5781214A (en
Inventor
Juzo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP15801680A priority Critical patent/JPS5781214A/ja
Publication of JPS5781214A publication Critical patent/JPS5781214A/ja
Publication of JPS6332361B2 publication Critical patent/JPS6332361B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP15801680A 1980-11-10 1980-11-10 Production of blazed grating Granted JPS5781214A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15801680A JPS5781214A (en) 1980-11-10 1980-11-10 Production of blazed grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15801680A JPS5781214A (en) 1980-11-10 1980-11-10 Production of blazed grating

Publications (2)

Publication Number Publication Date
JPS5781214A JPS5781214A (en) 1982-05-21
JPS6332361B2 true JPS6332361B2 (enrdf_load_stackoverflow) 1988-06-29

Family

ID=15662422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15801680A Granted JPS5781214A (en) 1980-11-10 1980-11-10 Production of blazed grating

Country Status (1)

Country Link
JP (1) JPS5781214A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62141794A (ja) * 1985-12-16 1987-06-25 Toshiba Corp 半導体レ−ザ装置
US7175773B1 (en) 2004-06-14 2007-02-13 Carl Zeiss Laser Optics Gmbh Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed grating

Also Published As

Publication number Publication date
JPS5781214A (en) 1982-05-21

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