JPS63317654A - Method for inhibiting development of whisker in filament body of tinned or tin alloy-plated copper alloy - Google Patents
Method for inhibiting development of whisker in filament body of tinned or tin alloy-plated copper alloyInfo
- Publication number
- JPS63317654A JPS63317654A JP15299787A JP15299787A JPS63317654A JP S63317654 A JPS63317654 A JP S63317654A JP 15299787 A JP15299787 A JP 15299787A JP 15299787 A JP15299787 A JP 15299787A JP S63317654 A JPS63317654 A JP S63317654A
- Authority
- JP
- Japan
- Prior art keywords
- tin
- plating
- alloy
- plated copper
- whiskers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims abstract description 51
- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 title claims description 37
- 230000002401 inhibitory effect Effects 0.000 title 1
- 238000005452 bending Methods 0.000 claims abstract description 7
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 18
- 239000010949 copper Substances 0.000 claims description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 6
- 238000007747 plating Methods 0.000 description 67
- 238000012545 processing Methods 0.000 description 13
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 238000005282 brightening Methods 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 1
- BZOVBIIWPDQIHF-UHFFFAOYSA-N 3-hydroxy-2-methylbenzenesulfonic acid Chemical compound CC1=C(O)C=CC=C1S(O)(=O)=O BZOVBIIWPDQIHF-UHFFFAOYSA-N 0.000 description 1
- 229920001353 Dextrin Polymers 0.000 description 1
- 239000004375 Dextrin Substances 0.000 description 1
- 108010025568 Nucleophosmin Proteins 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 235000019425 dextrin Nutrition 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- HRKQOINLCJTGBK-UHFFFAOYSA-N dihydroxidosulfur Chemical compound OSO HRKQOINLCJTGBK-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229940044654 phenolsulfonic acid Drugs 0.000 description 1
- CICKVIRTJQTMFM-UHFFFAOYSA-N sulfuric acid;tin Chemical compound [Sn].OS(O)(=O)=O CICKVIRTJQTMFM-UHFFFAOYSA-N 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 1
- FAKFSJNVVCGEEI-UHFFFAOYSA-J tin(4+);disulfate Chemical compound [Sn+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O FAKFSJNVVCGEEI-UHFFFAOYSA-J 0.000 description 1
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 1
- YUOWTJMRMWQJDA-UHFFFAOYSA-J tin(iv) fluoride Chemical compound [F-].[F-].[F-].[F-].[Sn+4] YUOWTJMRMWQJDA-UHFFFAOYSA-J 0.000 description 1
- -1 zinc and cadmium Chemical compound 0.000 description 1
Landscapes
- Wire Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、錫または錫合金めっきを施した銅合金線条体
の表面に発生するウィスカを抑制する方法に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for suppressing whiskers generated on the surface of a copper alloy wire body plated with tin or a tin alloy.
[従来技術]
一般に、端子、コネクター等の電子部品には、当該電子
部品の耐食性およびはんだ付性を長期間維持する目的で
無光沢錫めっきあるいは光沢錫めっきが施されている。[Prior Art] Generally, electronic components such as terminals and connectors are coated with matte tin plating or bright tin plating for the purpose of maintaining the corrosion resistance and solderability of the electronic components for a long period of time.
また、このような錫めっきは、電子部品に加工した後に
めっきを行なういわゆるボストめフき方法により行なわ
れていた。Further, such tin plating has been carried out by a so-called post-muffing method in which plating is performed after processing into electronic parts.
しかしながら、近年、上記電子部品の製造工程を合理化
し、コストダウンを図る目的で、加工前の素材にあらか
じめ錫めっきを施すいわゆるブリ錫めっき方法が増加し
てきている。However, in recent years, for the purpose of streamlining the manufacturing process of electronic components and reducing costs, the so-called tin plating method, in which the material before processing is pre-plated with tin, has been increasing.
上記ブリ錫めっき方法によってめっきを施されたブリ錫
めっき材は、加工を加えられ電子部品となるが、当然の
ことながら加工性はもちろんのこと加工後の耐食性およ
びはんだ付性も、前述したボストめフき方法により得ら
れた電子部品と比較して劣る製品であってはならない。The tin-plated material plated by the above-mentioned tin plating method is processed to become an electronic component, but it goes without saying that the processability, as well as the corrosion resistance and solderability after processing, are affected by the above-mentioned boss. The product must not be inferior to electronic components obtained by the meshing method.
上記の製品の加工性および耐触性やはんだ付性は、ボス
トめっき方法によりめっきされた電子部品と比較して、
劣るものではないが、一般的に錫めっき表面には、ウィ
スカと呼ばれる錫単結晶からなる針状結晶が発生するこ
とが知られている。The processability, corrosion resistance, and solderability of the above products are compared to electronic parts plated using the Bost plating method.
Although not inferior, it is generally known that needle-shaped crystals made of tin single crystals called whiskers occur on tin-plated surfaces.
このウィスカは、通常太さ1〜5μm1長さ最大数mm
に達し、光沢剤を添加した光沢錫めっきに特に発生しや
すいものである。This whisker usually has a thickness of 1 to 5 μm and a maximum length of several mm.
This phenomenon is particularly likely to occur in bright tin plating to which brighteners have been added.
したがって、無光沢錫めっきや、特に光沢錫メッキを施
した電子部品においては、ウィスカが発生・成長すると
、電子回路中に使用されている電子部品、例えば、端子
同士が短絡したり、回路内で絶縁不良が起きるなどの問
題点があった。Therefore, when whiskers occur and grow on electronic components with matte tin plating or especially bright tin plating, it can cause short-circuits between electronic components used in electronic circuits, such as terminals, or short circuits within the circuit. There were problems such as poor insulation.
さらに、最近の電子回路は、小型化、高密度化ならびに
微弱電流化の傾向にあり、このような回路中に使用され
る電子部品でのウィスカの発生は、ますます、電子回路
の短絡障害を増加させている。Furthermore, recent electronic circuits are trending toward smaller size, higher density, and weaker current, and the occurrence of whiskers in electronic components used in such circuits is increasingly leading to short-circuit failures in electronic circuits. It is increasing.
上記ウィスカの発生原因としては、錫が亜鉛やカドミウ
ムなどと同様に比較的低温(20〜100℃)で原子が
移動し、再結晶しやすい低融点の金属であることがあげ
られる。また、錫めっき材の微細粒状の不純物などを含
有した部分、例えば、錫めっき時に吸蔵された高圧水素
部分につ゛イスカが発生しやすいことも発生原因として
あげられる。さらには、光沢剤を添加した光沢錫めっき
に特にウィスカの発生が多いのは、錫めっきと光沢剤が
共存して内部応力が大きくなったり、結晶粒子が小さい
ためにめっき皮膜中の格子欠陥密度が極めて高く、内部
歪みエネルギーが大きくなり、かつ、結晶粒界が多いた
め錫原子がこの結晶粒界に沿って拡散移動する、いわゆ
る、短回路拡散の通路が多いことがあげられる。The cause of the whiskers is that tin, like zinc and cadmium, is a low melting point metal whose atoms move at relatively low temperatures (20 to 100° C.) and are easily recrystallized. Another possible cause of the occurrence is that tin plating tends to occur in parts of the tin-plated material that contain fine particles of impurities, such as in high-pressure hydrogen parts that are occluded during tin plating. Furthermore, whiskers are particularly likely to occur in bright tin plating with a brightening agent added, because internal stress increases due to the coexistence of tin plating and brightening agent, or due to the density of lattice defects in the plating film due to small crystal grains. is extremely high, the internal strain energy is large, and since there are many grain boundaries, there are many so-called short-circuit diffusion paths in which tin atoms diffuse and move along the grain boundaries.
以上が、ウィスカの発生の原因と考えられているが、正
確なウィスカ発生の原因の究明はなされていないのが実
状である。Although the above is thought to be the cause of whisker generation, the actual situation is that the exact cause of whisker generation has not been investigated.
一方、錫めっきのウィスカ発生を防止する方法としては
、従来より以下に説明する方法が提案されている。On the other hand, as a method for preventing whisker generation in tin plating, the following method has been proposed.
すなわち、(1)錫めっき後、150〜180℃の温度
において1〜3時間加熱処理する方法、(2)錫めっき
後、真空中で電子線を照射する方法。(特公昭55−0
31196号公報)。(3)錫めっき後、陽極酸化皮膜
を形成する方法(特公昭52−053735号公報)。That is, (1) a method of heat-treating at a temperature of 150 to 180° C. for 1 to 3 hours after tin plating, and (2) a method of irradiating electron beam in vacuum after tin plating. (Tokuko Showa 55-0
31196). (3) A method of forming an anodic oxide film after tin plating (Japanese Patent Publication No. 52-053735).
(4)錫と鉛やニッケル等を合金めりきする方法、(5
)超音波エネルギーを与えて、めっきの水素吸蔵を軽減
する方法、などが提案されている。(4) Method of alloy-plating tin with lead, nickel, etc.; (5)
) Methods have been proposed to reduce hydrogen absorption in plating by applying ultrasonic energy.
しかしながら、以上説明した方法は、長尺の線、条を連
続的に処理する場合には、種々の問題点がある。However, the method described above has various problems when continuously processing long lines and stripes.
すなわち、(1)の方法は、加熱処理に長時間を要する
ために、連続処理が困難であり、さらには、光沢剤を添
加した光沢めっきでは、変色、火ぶくれ、亀裂等のめつ
き欠陥が生じる恐れがある。(2)の方法は真空中に保
持しなければならないため、連続処理に不向きであり、
また、照射装置や真空処理装置が高価で処理コストが高
くなる。(3)の方法は、連続処理に適するが、ブリ錫
めっきのようにめっき後に加工を行なうことは、加工時
に酸化皮膜が破壊される恐れがある。In other words, method (1) requires a long time for heat treatment, making continuous processing difficult, and furthermore, bright plating with brighteners added may cause plating defects such as discoloration, blisters, and cracks. may occur. Method (2) is not suitable for continuous processing because it must be maintained in a vacuum.
Furthermore, the irradiation equipment and vacuum processing equipment are expensive, increasing the processing cost. Method (3) is suitable for continuous processing, but if processing is performed after plating, such as in tin plating, the oxide film may be destroyed during processing.
す、めっきの耐触性、はんだ付性および電気特性等のめ
っき性能面に疑問がある。(5)の方法は、ウィスカの
発生・成・長がめつき時の水素吸蔵によってのみの原因
であるならば効果があるが、・少なくともウィスカの成
長については、添加剤、めっき浴、めっき条件等の他の
要因が多く関係していると考えられるので万全ではない
。There are doubts about the plating performance, such as the corrosion resistance, solderability, and electrical properties of the plating. Method (5) is effective if the generation, growth, and growth of whiskers is caused only by hydrogen absorption during plating. It is not possible to be sure, as many other factors are thought to be involved.
[発明が解決しようとする問題点]
本発明は、以上説明した従来技術の問題点をことごとく
解決した錫または錫合金のウィスカ抑制方法を提供する
目的でなされたものである。[Problems to be Solved by the Invention] The present invention has been made for the purpose of providing a method for suppressing tin or tin alloy whiskers, which solves all the problems of the prior art described above.
[問題点を解決するための手段]
本発明は、錫または′錫合金めっき銅合金線条体に伸び
率0.2〜5%を与える張力を加え、かつ、繰り返し曲
げ応力を加えることを特徴とする錫または錫めっき銅合
金線条体のウィスカ抑制方法に要旨を有するものである
。[Means for Solving the Problems] The present invention is characterized by applying a tension that gives an elongation rate of 0.2 to 5% to a tin or tin alloy plated copper alloy wire body, and repeatedly applying bending stress. The gist of the present invention is to provide a method for suppressing whiskers in tin or tin-plated copper alloy wire bodies.
[作用]
以下に、本発明の錫または錫合金のめっき方法について
説明する。[Function] The method for plating tin or tin alloy of the present invention will be described below.
通常、銅合金線条体によフては、Cu下地めっきを施す
場合と施さない場合があるが、Cu下地めっきを施す場
合について説明すれば、例えば、亜鉛含有銅合金線条体
には銅めっきが施されており、それは電子部品の耐食性
、はんだ付性を長期間維持し、かつ、経時変色やウィス
カ発生を防止するために、銅合金から亜鉛の拡散を抑制
する必要があり、そのためには、錫めっき層の下地とし
て、銅めっき層を施すことが不可欠だからである。Normally, copper alloy wires may or may not be plated with a Cu base plating, but if we explain the case where a Cu base plating is applied, for example, a zinc-containing copper alloy wire has copper Plating is applied, and it is necessary to suppress the diffusion of zinc from the copper alloy in order to maintain the corrosion resistance and solderability of electronic components for a long time, and to prevent discoloration and whisker formation over time. This is because it is essential to apply a copper plating layer as a base for the tin plating layer.
上記の銅めっきは、光沢銅下地めっきであり光沢銅下地
めっきであれば、微密な微細結晶が得られることから、
近年の電子部品の軽薄短小化に伴なうめっき層の厚さが
1μm前後と非常に薄くなって来ている実状に対応でき
るものである。この光沢銅めっき層の処理方法は、銅合
金線条体を常法によってアルカリ脱脂、水洗、陰極電解
脱脂、水洗、酸活性を行ない水洗後、光沢銅めっきを行
なう。The above copper plating is a bright copper base plating, and if it is a bright copper base plating, fine microcrystals can be obtained.
This can be applied to the actual situation where the thickness of the plating layer has become extremely thin, around 1 μm, as electronic components have become lighter, thinner, and shorter in recent years. The method for treating the bright copper plating layer is to perform alkaline degreasing, water washing, cathodic electrolytic degreasing, water washing, and acid activation of the copper alloy filament by conventional methods, and after washing with water, bright copper plating is performed.
上記の光沢銅めっき方法は、例えば、硫酸銅と硫酸とを
主成分とする硫酸銅浴に添加剤としてチオカルボニル(
C=S)のような光沢剤、デキストリン(C6H2゜0
.)・。のような平滑剤、ノニオンまたはアニオン活性
剤のような分散剤を適宜゛混合した浴で電気めっきを行
なう。なお、めっき方法は限定するものではい。In the above bright copper plating method, for example, thiocarbonyl (
Brighteners such as C=S), dextrin (C6H2゜0
.. )・. Electroplating is carried out in a bath suitably mixed with a leveling agent such as, and a dispersant such as a nonionic or anionic activator. Note that the plating method is not limited.
上記の光沢銅メッキの後、錫めっきを行なうが、光沢錫
めっきを施す場合には、光沢錫めっき層は、電子部品の
耐食性を高め、はんだ付性を長期間維持するために、通
常は0.5〜5μmの厚さに施す、しかし、最近では、
電子部品の軽薄短小化に伴ない1μm前後の薄いめっき
が最も多くなって来ている。この光沢錫めっき層を形成
する方法は、硫酸錫浴硼弗化錫浴、フェノールスルフォ
ン酸およびアルカリ性浴などに、光沢剤、平滑剤ならび
に分散剤としての添加剤を適宜混合した浴で電気めフき
を施す。After the above-mentioned bright copper plating, tin plating is performed. When bright tin plating is applied, the bright tin plating layer is usually zero in order to increase the corrosion resistance of electronic components and maintain solderability for a long period of time. It is applied to a thickness of .5 to 5 μm, but recently,
As electronic parts become lighter, thinner, shorter and smaller, thin plating of around 1 μm has become the most common. The method for forming this bright tin plating layer is to use an electroplating bath in which a tin sulfuric acid bath, a tin fluoride bath, a phenolsulfonic acid bath, an alkaline bath, etc. are appropriately mixed with additives as a brightening agent, a smoothing agent, and a dispersing agent. to give
なお、本発明においてはめっき方法を限定するものでは
なく、上記の方法以外の一般的な光沢錫めっき方法や、
無光沢めっき方法、半光沢錫めっき方法でもよい。Note that the present invention does not limit the plating method, and general bright tin plating methods other than the above methods,
A matte plating method or a semi-bright tin plating method may be used.
本発明においては、錫めっきまたは錫合金めっき層を施
した後加工応力を加えるが、加工応力を加える方法は特
に限定するものではないが、通常銅合金線条体に伸び率
0゜2〜5%を与える張力を加えながら第1図に示すよ
うなレベラーに通板する。第1図において、1は銅合金
線条体であり、2はロールである。なお、レベラーのロ
ール数は3段以上とする。In the present invention, processing stress is applied after applying the tin plating or tin alloy plating layer, but the method of applying processing stress is not particularly limited, but usually the elongation rate is 0°2 to 5. The plate is passed through a leveler as shown in Fig. 1 while applying a tension of %. In FIG. 1, 1 is a copper alloy wire body, and 2 is a roll. Note that the number of rolls of the leveler shall be three or more stages.
上記の伸び率およびロール数の限定理由を以下に説明す
ると、錫めっきまたは錫合金めっきを施した銅合金線条
体の伸び率が0.2%未満では、加工応力が小さいため
めフき層内の応力分散が小さく、ウィスカ抑制効果が小
さい。また伸び率が5%を超えると銅合金線条体は、塑
性変形が大きくなり、また、錫または錫合金めフきの光
沢が低下するので好ましくない。したがって、伸び率0
.2〜5%を与える張力とした。The reasons for limiting the elongation rate and the number of rolls mentioned above are explained below. The stress dispersion within is small, and the whisker suppression effect is small. Moreover, if the elongation rate exceeds 5%, the copper alloy filament will undergo large plastic deformation and the gloss of the tin or tin alloy wipe will decrease, which is not preferable. Therefore, the elongation rate is 0
.. The tension was set to be 2 to 5%.
次にレベラーのロール数を3段以上としたのは、ロール
数が3段未満では、繰り返し曲げ応力の負荷が不十分と
なり、ウィスカの抑制効果が得られないからである。Next, the reason why the number of rolls of the leveler is set to three or more is that if the number of rolls is less than three, the load of repeated bending stress becomes insufficient and the effect of suppressing whiskers cannot be obtained.
以上のように、本発明・は、錫または錫合金めっきを施
した銅合金線条体に引張り応力と繰り返し曲げ応力を加
えることにより、錫または錫合金めっきのウィスカの生
長を抑制するものであり、その抑制機構は、錫めっきま
たは錫合金めっきの結晶変形に伴なうめっき応力の分散
および素材、錫めっき、錫合金めっき各層間の応力バラ
ンスの変化によりウィスカの生長が抑制されるものと推
定して、本発明を完成したものである。As described above, the present invention suppresses the growth of tin or tin alloy plating whiskers by applying tensile stress and repeated bending stress to a copper alloy wire body coated with tin or tin alloy plating. The suppression mechanism is assumed to be that the growth of whiskers is suppressed by dispersion of plating stress due to crystal deformation of tin plating or tin alloy plating, and changes in stress balance between each layer of the material, tin plating, and tin alloy plating. Thus, the present invention was completed.
[実施例]
以下に本発明に係る錫または錫合金めっき銅合金線条体
のウィスカ抑制方法について、実施例をあげて説明する
。[Example] The method for suppressing whiskers in a tin or tin alloy plated copper alloy wire body according to the present invention will be described below with reference to Examples.
JISC−2600()OCu−30Zn)板厚:0.
25mm、幅:150mmの条を供試材として、常法に
より前処理を行なった後、硫酸銅めっき浴(CuSO4
’ 5H20:
190g/1.H2SO2: 50g/u。JISC-2600 ()OCu-30Zn) Plate thickness: 0.
A strip with a width of 25 mm and a width of 150 mm was pretreated using a conventional method, and then treated in a copper sulfate plating bath (CuSO4).
'5H20: 190g/1. H2SO2: 50g/u.
CJl:50mg/j2、光沢剤:10g/j2)を用
いて、電流密度:3A/drn’、温度:20℃の条件
下でめっき厚0.8μmの銅下地めっきを行なった後、
水洗し、次いで10%H2So4水溶液で活性化処理を
行なう。After performing copper base plating with a plating thickness of 0.8 μm using CJl: 50 mg/j2, brightener: 10 g/j2), current density: 3 A/drn', temperature: 20 ° C.
It is washed with water and then activated with a 10% H2So4 aqueous solution.
上記の後、水洗し、硫酸錫めっき浴
(SnSO4:60g/J2.H2SO4:t o o
g7x、クレゾールスルフォン酸:30 g/J2、
ホルマリン:5mj2/J!、光沢剤:10m1/11
、分散剤20g/J2)を用いて電流密度:3A/dt
n”、温度:20℃の条件下でめっき厚1.2μmの光
沢錫めっきを行なった。After the above, wash with water, tin sulfate plating bath (SnSO4: 60g/J2.H2SO4: to o
g7x, cresol sulfonic acid: 30 g/J2,
Formalin: 5mj2/J! , brightener: 10m1/11
, current density: 3A/dt using dispersant 20g/J2)
Bright tin plating was performed at a plating thickness of 1.2 μm under conditions of 20° C. and temperature: 20° C.
次に、上記光沢錫めっきを行なった銅合金の条に張力を
与えながら、レベラーに通板し、レベラーロールは上側
3本、下側4本、および、上側11木、下側12本とし
、伸び率0.1%。Next, while applying tension to the bright tin-plated copper alloy strip, it is passed through a leveler, and the leveler rolls are 3 on the upper side and 4 on the lower side, and 11 on the upper side and 12 on the lower side, Elongation rate 0.1%.
0.2%、1%、5%、10%を与える張力を加えた。Tensions were applied to give 0.2%, 1%, 5%, and 10%.
また、比較として伸び率0.1%を与える張力を加えた
錫めっき条を作製した。In addition, as a comparison, a tin-plated strip was prepared under tension to give an elongation rate of 0.1%.
以上のそれぞれの張力を加えた条から長さ100mm、
幅50mmのウィスカ調査用試験片を作製した。A length of 100 mm from each of the above tensioned strips,
A test piece for whisker investigation with a width of 50 mm was prepared.
ウィスカ試験方法は、以下の要領で行なった。The whisker test method was performed as follows.
すなわち、第2図に示すような、内幅94mmの断面凹
型治具21内に試験片22に圧縮応力を負荷させ、室内
に設置した。That is, compressive stress was applied to the test piece 22 in a jig 21 having a concave cross section with an inner width of 94 mm as shown in FIG. 2, and the test piece 22 was placed indoors.
ウィスカ測定は、圧縮応力面B:20mmX50mm内
に発生するウィスカを実態顕微鏡により観察した。For whisker measurement, whiskers generated within compressive stress surface B: 20 mm x 50 mm were observed using a stereoscopic microscope.
第1表は、以上説明した伸び率0.1〜10%を得る張
力を加え、レベラーに通板した条の反射率変化、および
、これらの条から作製した試験片のウィスカ試験による
3ヶ月、1年後のウィスカ発生状況を示すものである。Table 1 shows the change in reflectance of the strips that were passed through a leveler under tension to achieve the elongation rate of 0.1 to 10% as explained above, and the whisker test of test pieces made from these strips over a period of 3 months. This shows the whisker generation status after one year.
No、1〜No、4は、本発明の実施例であり、伸び率
を0.2〜5%の範囲内にしており、顕著な反射率の変
化はなく、目視できる外観変化はなかった。さらに、N
091〜NO63では、レベラーのロール本数を上側1
1木、下側12木としており、No、4では上側3本、
下側4本であり、本発明の必須要件を満たしており、3
ヶ月後、および、1年後においてもウィスカ発生、ノジ
ュールの発生はなかった。No. 1 to No. 4 are Examples of the present invention, in which the elongation rate was within the range of 0.2 to 5%, there was no significant change in reflectance, and there was no visible change in appearance. Furthermore, N
For 091 to NO63, the number of rolls of the leveler is set to 1 on the upper side.
There are 1 tree and 12 trees on the lower side, and for No. 4, there are 3 trees on the upper side,
There are 4 on the lower side, which meet the essential requirements of the present invention, and 3
Even after one month and one year, no whiskers or nodules were generated.
N005〜No、8は、本発明実施例に対する比較例で
あり、No、5は、張力およびレベラーへの通板をしな
かった比較例であって、3ヶ月後にはノジュールの発生
がみられ、1ヶ年後には、長さ100μmのウィスカ発
生がみられた。No. 005 to No. 8 are comparative examples to the examples of the present invention, and No. 5 is a comparative example in which no tension was applied and the plate was not passed through the leveler, and nodules were observed to occur after 3 months. After one year, whiskers with a length of 100 μm were observed.
N006では、伸び率を0.1%としたために、3ヶ月
後にはノジュールの発生がみられ、1ヶ年後には、長さ
100μmのウィスカの発生がみられた。In N006, since the elongation rate was set to 0.1%, nodules were observed to appear after 3 months, and whiskers with a length of 100 μm were observed to occur after 1 year.
No、7においては、レベラーのロール数を上側1本、
下側1本としたため、繰り返し曲げ応力が働かず、3ケ
月後には、ノジュールおよびウィスカの発生がみられた
。For No. 7, the number of rolls of the leveler is one on the upper side,
Since there was only one on the lower side, repeated bending stress did not work, and nodules and whiskers were observed to occur after 3 months.
NO38は、伸び率を10%としており、反射率の変化
は11%と高いものとなり、目視可能な外観変化がみら
れ、また、3ヶ月後には、ノジュールおよびウィスカの
発生が見られた。For NO38, the elongation rate was 10%, and the change in reflectance was as high as 11%, visible changes in appearance were observed, and nodules and whiskers were observed to occur after 3 months.
[発明の効果]
以上説明したように、本発明によれば、端子・コネクタ
ー等の電子部品材料として、ウィスカの発生を抑制した
信頼性の高い錫または錫合金めっき銅合金線条体を提供
することができ、さらには、従来にないより簡便なウィ
スカ抑制方法を提供することができる。[Effects of the Invention] As explained above, the present invention provides a highly reliable tin or tin alloy plated copper alloy wire body that suppresses the generation of whiskers and is used as a material for electronic components such as terminals and connectors. Furthermore, it is possible to provide a simpler whisker suppression method than ever before.
第1図は、レベラーの説明断面図であり、第2図は、ウ
ィスカ試験方法の説明図である。
1・・・錫または錫合金めっき銅合金線条体、2・・・
ロール、21・・・試験片、22・・・金属治具、A・
・・圧縮応力面、B・・・ウィスカ測定部。FIG. 1 is an explanatory sectional view of a leveler, and FIG. 2 is an explanatory diagram of a whisker test method. 1... Tin or tin alloy plated copper alloy wire body, 2...
Roll, 21... Test piece, 22... Metal jig, A.
... Compressive stress surface, B... Whisker measurement part.
Claims (2)
2〜5%を与える張力を加え、かつ、繰り返し曲げ応力
を加えることを特徴とする錫または錫めっき銅合金線条
体のウィスカ抑制方法。(1) Tin or tin alloy plated copper alloy wire with an elongation rate of 0.
A method for suppressing whiskers in a tin or tin-plated copper alloy wire, the method comprising applying a tension of 2 to 5% and repeatedly applying bending stress.
ールを有するレベラーに錫または錫合金めっき銅合金線
条体を通板する特許請求の範囲第1項に記載の錫または
錫合金めっき銅合金線条体のウィスカ抑制方法。(2) The tin or tin alloy plated copper according to claim 1, wherein the tin or tin alloy plated copper alloy wire is passed through a leveler having three or more rolls in order to apply repeated bending stress. A method for suppressing whiskers in alloy striata.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15299787A JPS63317654A (en) | 1987-06-18 | 1987-06-18 | Method for inhibiting development of whisker in filament body of tinned or tin alloy-plated copper alloy |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15299787A JPS63317654A (en) | 1987-06-18 | 1987-06-18 | Method for inhibiting development of whisker in filament body of tinned or tin alloy-plated copper alloy |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63317654A true JPS63317654A (en) | 1988-12-26 |
Family
ID=15552696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15299787A Pending JPS63317654A (en) | 1987-06-18 | 1987-06-18 | Method for inhibiting development of whisker in filament body of tinned or tin alloy-plated copper alloy |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63317654A (en) |
-
1987
- 1987-06-18 JP JP15299787A patent/JPS63317654A/en active Pending
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