JPS6329928B2 - - Google Patents
Info
- Publication number
- JPS6329928B2 JPS6329928B2 JP56130618A JP13061881A JPS6329928B2 JP S6329928 B2 JPS6329928 B2 JP S6329928B2 JP 56130618 A JP56130618 A JP 56130618A JP 13061881 A JP13061881 A JP 13061881A JP S6329928 B2 JPS6329928 B2 JP S6329928B2
- Authority
- JP
- Japan
- Prior art keywords
- lens
- magnetic pole
- objective lens
- pole piece
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005284 excitation Effects 0.000 claims description 22
- 230000005540 biological transmission Effects 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 description 21
- 238000010586 diagram Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 4
- 230000004075 alteration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
Description
【発明の詳細な説明】
本発明は試料面上に細く絞られた電子線を照射
し、試料面上の微小部分の分析を行うことのでき
る透過型電子顕微鏡に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a transmission electron microscope that can analyze minute portions on a sample surface by irradiating the sample surface with a narrowly focused electron beam.
透過型電子顕微鏡において、試料の透過像を観
察しながら試料を移動させ、分析しようとする部
分を透過像中の中央部に配置させた後、第２段の
収束レンズにより電子線を絞つて分析しようとす
る部分にのみ電子線を照射し、その際発生するＸ
線等を検出して分析を行うことがなされている
が、電子線を第２段の収束レンズにより絞り込む
過程において像中の分析しようとする部分に確実
に絞り込まれて行くことを確認しながら行うた
め、対物レンズは第１図ａに示すような結像条件
を満たすように励磁を固定したまま行つている。
但し第１図において、１は試料、２は対物レン
ズ、３は中間レンズ、４は中間レンズの物面、
EBは電子線である。 In a transmission electron microscope, the sample is moved while observing the transmitted image of the sample, the part to be analyzed is placed in the center of the transmitted image, and then the electron beam is narrowed down by the second stage converging lens for analysis. The electron beam is irradiated only on the part to be removed, and the X generated at that time is
Analysis is performed by detecting electron beams, etc., but this is done while making sure that the electron beam is focused on the part of the image to be analyzed in the process of narrowing down the electron beam using the second stage converging lens. Therefore, the excitation of the objective lens is kept fixed so as to satisfy the imaging conditions shown in FIG. 1a.
However, in Fig. 1, 1 is the sample, 2 is the objective lens, 3 is the intermediate lens, 4 is the object surface of the intermediate lens,
EB is an electron beam.
ところが、対物レンズを高分解能の透過像が得
られるように上述した励磁に設定した状態では、
第２図ａに示すように対物レンズの前方磁界
PREの縮小率が充分でないため第２段の収束レ
ンズ９を介して導かれた電子線EBの試料１上に
おける照射域の直径は数1000Åより小さくするこ
とはできず、試料面上の微小部分の分析を行うこ
とはできなかつた。 However, when the objective lens is set to the above-mentioned excitation to obtain a high-resolution transmission image,
As shown in Figure 2a, the forward magnetic field of the objective lens
Because the reduction ratio of PRE is not sufficient, the diameter of the irradiation area on the sample 1 of the electron beam EB guided through the second stage converging lens 9 cannot be made smaller than several thousand Å, and the diameter of the irradiation area on the sample 1 cannot be made smaller than a few thousand Å. It was not possible to conduct an analysis of
本発明はこのような従来装置の欠点を解決し、
分析する試料面上の電子線の直径を大幅に縮小し
微小部分の分析を行なうことができると共に、分
析しようとする部分の選択のための像観察の際に
良質な像を倍率を損うことなく観察することので
きる透過型電子顕微鏡を提供するもので、対物レ
ンズの内側ヨーク１１ｂの光軸Ｃ側に励磁コイル
１５を設けると共に、対物レンズの下磁極片１４
ｂの下側に該下磁極片１４ｂとの間にギヤツプＧ
を有して第三の磁極片１７を設け、前記励磁コイ
ル１５に励磁電流を供給した際に前記ギヤツプＧ
間に補助レンズが形成されるように構成したこと
を特徴としている。 The present invention solves the drawbacks of such conventional devices,
It is possible to significantly reduce the diameter of the electron beam on the surface of the sample to be analyzed, allowing analysis of microscopic parts, and at the same time, when observing images to select the part to be analyzed, it is possible to obtain a high-quality image without compromising the magnification. This provides a transmission electron microscope that allows observation without any interference, and an excitation coil 15 is provided on the optical axis C side of the inner yoke 11b of the objective lens, and a lower magnetic pole piece 14 of the objective lens is provided.
There is a gap G between the lower magnetic pole piece 14b and the lower side of b.
A third magnetic pole piece 17 is provided, and when an excitation current is supplied to the excitation coil 15, the gap G
It is characterized by a structure in which an auxiliary lens is formed in between.
以下、本発明において基本となつている考え方
を第１図の光線図に基づいて説明する。 The basic concept of the present invention will be explained below based on the ray diagram of FIG. 1.
対物レンズは従来においては最高の分解能が得
られるようにその励磁電流が設定されているが、
試料１の位置を下磁極片側に一定量移動させるこ
とにより、対物レンズの前方磁界による試料入射
電子線径の縮小率を格段に増大させることができ
る。しかしながら、このように試料位置を移動さ
せた場合、第１図ｂに示す光線図から明らかなよ
うに試料１の像は対物レンズ１の前方に虚像５と
して形成され、中間レンズ３の物面４には形成さ
れない。従つて透過像は観察できないため、電子
線照射域を試料の分析しようとする部分に絞り込
んで行く際に、これを確認しながら行うことはで
きない。そこで、対物レンズ２の後段に第１図ｃ
において６で示すような補助レンズを設け、補助
レンズ６によつて虚像５の像が中間レンズ３の物
面４に形成されるようにすれば、透過像を観察し
ながら絞り込みを行うことができる。尚、その際
補助レンズを対物レンズから離す程、電子線が補
助レンズに入射するまでに光軸から離れる程度が
大きくなり球面収差が大きくなると共に、観察倍
率が低下するが補助レンズ６の主面が対物レンズ
２の主面に可能な限り接近させるように構成すれ
ば、これらの影響を無くすことができ、そのた
め、本発明においては、対物レンズの下磁極片１
４ｂの下側に該下磁極片１４ｂとの間にギヤツプ
Ｇを有して第三の磁極片１７を設け、前記励磁コ
イル１５に励磁電流を供給した際に対物レンズの
下磁極片１４ｂが補助レンズの上磁極片として兼
用されてギヤツプＧ間に補助レンズが形成される
ように構成している。 Conventionally, the excitation current of the objective lens is set to obtain the highest resolution.
By moving the position of the sample 1 by a certain amount to one side of the lower magnetic pole, it is possible to significantly increase the reduction rate of the diameter of the electron beam incident on the sample due to the forward magnetic field of the objective lens. However, when the sample position is moved in this way, the image of the sample 1 is formed as a virtual image 5 in front of the objective lens 1, as is clear from the ray diagram shown in FIG. is not formed. Therefore, since the transmission image cannot be observed, it is not possible to narrow down the electron beam irradiation area to the part of the sample to be analyzed while checking this. Therefore, the rear stage of the objective lens 2 is
By providing an auxiliary lens as shown by 6 in , so that the image of the virtual image 5 is formed on the object plane 4 of the intermediate lens 3 by the auxiliary lens 6, it is possible to narrow down the image while observing the transmitted image. . In this case, as the auxiliary lens is moved away from the objective lens, the distance from the optical axis increases before the electron beam enters the auxiliary lens, increasing spherical aberration and decreasing observation magnification. These effects can be eliminated by making the lower magnetic pole piece 1 of the objective lens as close as possible to the main surface of the objective lens 2.
A third magnetic pole piece 17 is provided below the lower magnetic pole piece 14b with a gap G between it and the lower magnetic pole piece 14b, and when an excitation current is supplied to the excitation coil 15, the lower magnetic pole piece 14b of the objective lens assists. It is configured so that it is also used as the upper magnetic pole piece of the lens and an auxiliary lens is formed between the gap G.
以下、このような考えに基づく本発明の一実施
例を第３図を付して説明する。 An embodiment of the present invention based on this idea will be described below with reference to FIG.
第３図において７は電子銃、８，９は第１段、
第２段の収束レンズ、１０はその励磁電源であ
る。１１ａ，１１ｂは各々対物レンズの外側及び
内側ヨーク、１２は励磁コイルである。１３は対
物レンズの励磁電源であり、１４ａ，１４ｂは対
物レンズの上磁極片及び下磁極片である。内側ヨ
ーク１１ｂの光軸Ｃ側には補助レンズの励磁コイ
ル１５が備えられており、１６はその電源であ
る。対物レンズの下磁極片１４ｂの下側にはギヤ
ツプＧを有して下磁極片１４ｂに対向するように
第３の磁極片１７が配置されている。１８はヨー
クであり、励磁コイル１５を励磁することにより
ギヤツプＧ間に形成される磁界によつて補助レン
ズが形成される。３は中間レンズ、１９は投影レ
ンズ、２０は螢光板であり、１は試料であり、該
試料は通常の透過像を得る場合より、一定量下磁
極片１４ｂに近い側に配置されている。 In Fig. 3, 7 is an electron gun, 8 and 9 are first stage,
The second stage converging lens, 10, is its excitation power source. 11a and 11b are outer and inner yokes of the objective lens, respectively, and 12 is an excitation coil. 13 is an excitation power source for the objective lens, and 14a and 14b are upper and lower magnetic pole pieces of the objective lens. An auxiliary lens excitation coil 15 is provided on the optical axis C side of the inner yoke 11b, and 16 is a power source thereof. A third magnetic pole piece 17 is arranged below the lower magnetic pole piece 14b of the objective lens so as to have a gap G and face the lower magnetic pole piece 14b. 18 is a yoke, and an auxiliary lens is formed by the magnetic field formed between the gap G by exciting the excitation coil 15. 3 is an intermediate lens, 19 is a projection lens, 20 is a fluorescent plate, and 1 is a sample, which is placed a certain distance closer to the lower pole piece 14b than when obtaining a normal transmission image.
このような構成において電源１６より励磁コイ
ル１５に供給される電流を調整して補助レンズに
よつて第１図ｃに示すように虚像５の像が中間レ
ンズ３の物面４に形成されるようにする。 In such a configuration, the current supplied from the power source 16 to the excitation coil 15 is adjusted so that the image of the virtual image 5 is formed on the object surface 4 of the intermediate lens 3 by the auxiliary lens as shown in FIG. Make it.
さて、このような状態においては螢光板２０上
には試料の透過像が映し出されるため、この像を
観察しながら試料１を光軸と垂直方向に移動さ
せ、分析しようとする部分を観察像の中央に位置
させる。そこで、電源１０より第２段の収束レン
ズ９に供給される電流を変化させ、試料面上にお
ける電子線の照射域を縮小させて行く。これに伴
い、螢光板２０上に投影される像の径も縮小して
行くが、操作者はこのように縮小して行く像が分
析しようとする部分に向つて縮小して行くことを
確認しながらこの縮小を行うことができる。この
場合、試料の位置が通常の透過像を得る場合より
対物レンズの下磁極側に近づいているため、対物
レンズの前方磁界PREの試料入射電子線に対す
る縮小率が大きく、電子線の照射域を最も縮小さ
せた際の光線図は第２図ｂに示す如きものとな
り、試料面上における電子線照射域の直径は数10
Å程度まで小さくすることができる。従つて、こ
のような微小部分より発生したＸ線を図示外の検
出系により検出することにより、試料面上の微小
部分の分析を行うことができる。 Now, in such a state, a transmitted image of the sample is projected on the fluorescent plate 20, so while observing this image, move the sample 1 in the direction perpendicular to the optical axis and place the part to be analyzed on the observed image. Place it in the center. Therefore, the current supplied from the power source 10 to the second stage converging lens 9 is changed to reduce the irradiation area of the electron beam on the sample surface. Along with this, the diameter of the image projected on the fluorescent plate 20 also decreases, but the operator confirms that the image that decreases in this way decreases toward the part to be analyzed. This reduction can be done while In this case, the position of the sample is closer to the lower magnetic pole side of the objective lens than when obtaining a normal transmission image, so the reduction ratio of the forward magnetic field PRE of the objective lens with respect to the electron beam incident on the sample is large, and the irradiation area of the electron beam is The ray diagram when it is most reduced is as shown in Figure 2b, and the diameter of the electron beam irradiation area on the sample surface is several 10
It can be made as small as Å. Therefore, the minute portion on the sample surface can be analyzed by detecting the X-rays generated from such a minute portion using a detection system not shown.
更に又、本発明においては、対物レンズの下磁
極片１４ｂの下側に該下磁極片１４ｂとの間にギ
ヤツプＧを有して第三の磁極片１７を設け、前記
励磁コイル１５に励磁電流を供給した際に対物レ
ンズの下磁極片１４ｂが補助レンズの上磁極片と
して兼用されてギヤツプＧ間に補助レンズが形成
されるように構成しているため、補助レンズの位
置を対物レンズに最大限に近付けることができ、
そのため、
(1) 対物レンズを通過して補助レンズに入射する
電子線は軸外の電子線を殆んど含まないことか
ら、球面収差を小さくすることができ、それに
より分析すべき位置を選ぶために電子線の絞り
込みを行ないながら、電子顕微鏡像を観察する
際に良質の像を観察することができる。 Furthermore, in the present invention, a third magnetic pole piece 17 is provided below the lower magnetic pole piece 14b of the objective lens with a gap G between it and the lower magnetic pole piece 14b, and an exciting current is applied to the excitation coil 15. When supplying the objective lens, the lower magnetic pole piece 14b of the objective lens is also used as the upper magnetic pole piece of the auxiliary lens, and the auxiliary lens is formed between the gap G. can be brought close to the limit,
Therefore, (1) Since the electron beam that passes through the objective lens and enters the auxiliary lens contains almost no off-axis electron beams, spherical aberration can be reduced, and the position to be analyzed can be selected accordingly. Therefore, it is possible to observe a high-quality image when observing an electron microscope image while narrowing down the electron beam.
(2) 又、分析すべき位置を選ぶために電子線の絞
り込みを行ないながら、観察倍率が低下しない
から充分な倍率で像を観察できる。(2) Furthermore, since the observation magnification does not decrease while narrowing down the electron beam to select the position to be analyzed, images can be observed at sufficient magnification.
第１図は補助レンズの作用を説明するための
図、第２図は従来及び本発明における対物レンズ
の前方磁界の電子線径縮小率の差を比較して示す
ための図、第３図は本発明の一実施例を示すため
の図である。
１：試料、２：対物レンズ、３：中間レンズ、
４：物面、５：虚像、６：補助レンズ、７：電子
銃、８，９：収束レンズ、１０：励磁電源、１１
ａ：外側ヨーク、１１ｂ：内側ヨーク、１２：励
磁コイル、１３，１６：励磁電源、１４ａ，１４
ｂ：上、下磁極片、１５：補助励磁コイル、Ｇ：
ギヤツプ、１７：磁極片、１８：ヨーク、１９：
投影レンズ、２０：螢光板。
Fig. 1 is a diagram for explaining the action of the auxiliary lens, Fig. 2 is a diagram for comparing and showing the difference in the electron beam diameter reduction rate of the forward magnetic field of the objective lens in the conventional and the present invention, and Fig. 3 is a diagram for explaining the effect of the auxiliary lens. FIG. 1 is a diagram showing an embodiment of the present invention. 1: Sample, 2: Objective lens, 3: Intermediate lens,
4: Object surface, 5: Virtual image, 6: Auxiliary lens, 7: Electron gun, 8, 9: Converging lens, 10: Excitation power source, 11
a: outer yoke, 11b: inner yoke, 12: excitation coil, 13, 16: excitation power supply, 14a, 14
b: Upper and lower magnetic pole pieces, 15: Auxiliary excitation coil, G:
Gap, 17: Magnetic pole piece, 18: Yoke, 19:
Projection lens, 20: Fluorescent plate.
Claims (1)
励磁コイル１５を設けると共に、対物レンズの下
磁極片１４ｂの下側に該下磁極片１４ｂとの間に
ギヤツプＧを有して第三の磁極片１７を設け、前
記励磁コイル１５に励磁電流を供給した際に前記
ギヤツプＧ間に補助レンズが形成されるように構
成したことを特徴とする透過型電子顕微鏡。1. An excitation coil 15 is provided on the optical axis C side of the inner yoke 11b of the objective lens, and a third magnetic pole is provided with a gap G between the lower magnetic pole piece 14b and the lower magnetic pole piece 14b of the objective lens. A transmission electron microscope characterized in that a piece 17 is provided so that an auxiliary lens is formed between the gap G when an excitation current is supplied to the excitation coil 15.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13061881A JPS5832348A (en) | 1981-08-20 | 1981-08-20 | Transmission-type electron microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13061881A JPS5832348A (en) | 1981-08-20 | 1981-08-20 | Transmission-type electron microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5832348A JPS5832348A (en) | 1983-02-25 |
| JPS6329928B2 true JPS6329928B2 (en) | 1988-06-15 |
Family
ID=15038527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13061881A Granted JPS5832348A (en) | 1981-08-20 | 1981-08-20 | Transmission-type electron microscope |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5832348A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006344533A (en) * | 2005-06-09 | 2006-12-21 | Kawasaki Heavy Ind Ltd | Photoelectric transfer type imaging tube for x-rays |
| JP2013096900A (en) * | 2011-11-02 | 2013-05-20 | Jeol Ltd | Transmission electron microscope and observation method of transmission electron micrographic image |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5150650A (en) * | 1974-10-30 | 1976-05-04 | Hitachi Ltd | Denshisensochino hitenshusahoseisochi |
-
1981
- 1981-08-20 JP JP13061881A patent/JPS5832348A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5150650A (en) * | 1974-10-30 | 1976-05-04 | Hitachi Ltd | Denshisensochino hitenshusahoseisochi |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5832348A (en) | 1983-02-25 |
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