JPS5832348A - Transmission-type electron microscope - Google Patents
Transmission-type electron microscopeInfo
- Publication number
- JPS5832348A JPS5832348A JP13061881A JP13061881A JPS5832348A JP S5832348 A JPS5832348 A JP S5832348A JP 13061881 A JP13061881 A JP 13061881A JP 13061881 A JP13061881 A JP 13061881A JP S5832348 A JPS5832348 A JP S5832348A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- objective lens
- lens
- pole piece
- magnetic pole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
Description
【発明の詳細な説明】
本錐明は#c′III##iとに細く絞られた電子線を
層射し、#cIII#函上の微小部分の分析を行うこと
のできる透過渥電子頴黴鏡に関する・
透過臘電子頴黴虜において、試料の透過像を観察しなが
ら試料を移動さぜ、分析しようとする部分を透過像中の
中央llf:配置させた後、1its段の収束レンズに
より電子線を紋、って分析しようとするS&にのみ電子
線を照射し、そのS発生するX線等を1IIL出して分
析を行うCとがなされているが、電子線をts2段の収
束レンズにより績り込む過−#Cおいて像中の分析しよ
うとする部分に確実に絞り込まれて行くことを確認しな
がら行うため、対物レンズは嬉1g4a)g:示tよう
な結像条件を満たすようにlkaを固定したまま行って
いる。但し第1g1KI&%で、1は試料、2は対物V
7ズ、6は中間レンズ、4は中間レンズの一面、JIB
は電子線である。DETAILED DESCRIPTION OF THE INVENTION The present invention is a transmission electron beam that can analyze minute portions on #cIII# boxes by irradiating finely focused electron beams onto #c'III#i. Regarding mold mirrors - In a transmission electron microscope, move the sample while observing the transmitted image of the sample, place the part to be analyzed at the center of the transmitted image, and then use a 1-its stage converging lens to C is a method in which the electron beam is irradiated only on the S& that is to be analyzed using an electron beam, and the X-rays etc. generated by the S are emitted for analysis. In order to make sure that the image is focused on the part of the image that is to be analyzed, the objective lens satisfies the imaging conditions shown below. This is done with lka fixed. However, in the 1st g1KI&%, 1 is the sample, 2 is the objective V
7z, 6 is the intermediate lens, 4 is one side of the intermediate lens, JIB
is an electron beam.
ところが、対物レンズを高分解能の透過像が得られるよ
うに1述した虐a#c設定した状−では、IsmflA
−に示すように対物レンズの−1磁界PBEの縮小率が
充分でないため711段の収束レンズ9を介して導かれ
た電子線MB(F)g%1Lにおける照射域の直径は数
toooλより小さくすることはで自ず、試料面上の償
小部分の分析を行うことはで11なかった0
本発明はこのような従来装置の欠点を解決し、分析する
試料面上の電子線の直径を大幅に縮小し微小部分の分析
を行うことので合る透過臘電子願黴鏡を提供するもので
、対物レンズの内側l−りの光軸llK励磁コイルを、
設けると共に、対物レンズの下磁極片の下側#C鋏下#
1極片との閾にギャップを有して新たに磁極片を設け、
III起励磁コイルを励磁した緑に−1ギャップ間に補
助レンズが形成されるようにSat、たことを轡黴とし
ている◎以下1本俺@において基本となっている考え方
* $IIfill (D 光m dil K aft
ツイテI! 明t 4 。However, when the objective lens is set as described above to obtain a high-resolution transmission image, IsmflA
As shown in -, since the reduction ratio of the -1 magnetic field PBE of the objective lens is not sufficient, the diameter of the irradiation area in the electron beam MB(F)g%1L guided through the 711-stage converging lens 9 is smaller than several tooλ. However, it was not possible to analyze the compensation portion on the sample surface.The present invention solves these drawbacks of the conventional device and makes it possible to reduce the diameter of the electron beam on the sample surface to be analyzed. This system provides a transmission electron microscope that can be greatly reduced to analyze minute parts.
At the same time, the lower part of the lower magnetic pole piece of the objective lens #C
A new magnetic pole piece is provided with a gap on the threshold from the single pole piece,
Sat so that an auxiliary lens is formed between the -1 gap in the green that excited the III excitation coil. m dil K aft
Tweet I! Light t 4.
周吻レンズは従来においては蛾高の分解能が得られるよ
うにその励磁電流が欽定されているが、試141の位置
を下1に@片側に一定赦移−させることにより、対物レ
ンズのll11.IF磁界による試料入射電子線径の縮
小率を格JRc増大させることがで會る◎しかしながら
、このように試料位置を移動させた場合、$11 di
l Ik’) K示す光m図から明らかなように試料1
の像は対物レンズ1の一方に虚像5として形成され、中
間レンズ6の物@i4には形成されない。従って透過像
は観察できないため、電子―照射域を試料の分析しよう
とする部分に絞り込んで行<Ilに、それをIIIIシ
ながら行うことはできない口そこで、対物レンズ2の後
段に嬉1dll切g:おいて6で示すような補助レンズ
を設け、補助レンズ6g:よって虚像5の像が中間レン
ズ6の物@4に形fi&されるようにすれば、透過像を
観察しながら絞り込みを行うことができる◎尚、その−
補助レンズを対物レンズから離す楢、電子線が補助レン
ズに入射するまでに光軸から離れるS直が大i(なり球
鋼収差が大会くなると共に、観察倍率が低下するが補助
レンズ6の主−が対物レンズ2の主#に可能な臓り接近
させるように構成すれば、これらの影響を無くす乙とが
できる0以下、このような考えに基づく本発明の一実施
例を#I3−を付してII!嘴する。Conventionally, the excitation current of the circumferential lens is determined so that a moth-height resolution can be obtained, but by shifting the position of the sample 141 to the bottom 1 @ one side by a certain amount, it is possible to increase the excitation current of the objective lens. This is achieved by increasing the reduction rate of the diameter of the electron beam incident on the sample due to the IF magnetic field. However, when the sample position is moved in this way, the reduction rate is $11 di
l Ik') As is clear from the light m diagram shown in K, sample 1
The image is formed as a virtual image 5 on one side of the objective lens 1, and is not formed on the object @i4 of the intermediate lens 6. Therefore, since a transmission image cannot be observed, it is impossible to narrow down the electron irradiation area to the part of the sample to be analyzed. If an auxiliary lens as shown by 6 is provided at 6g, and the image of the virtual image 5 is formed into the object of the intermediate lens 6 @4, the aperture can be narrowed down while observing the transmitted image. You can do it◎In addition, that-
When the auxiliary lens is separated from the objective lens, the S angle that the electron beam leaves the optical axis before it enters the auxiliary lens is large (as a result, the ball steel aberration increases and the observation magnification decreases, but the main focus of the auxiliary lens 6 is If - is configured so that #I3- is brought close to the main # of objective lens 2, these effects can be eliminated. Attached to II! Beak.
第3図において7は電子銃、8.9は嬉1段。In Figure 3, 7 is the electron gun, and 8.9 is the 1st stage.
11142tRの収束レンズ、10はそのm磁電源であ
る。11142tR converging lens, 10 is its m magnetic power source.
11、、llbは各々対物レンズの外側及び内側−一り
、12は励磁コイルである◎16は対物レンズの**電
源であり、14..14bは対物レンズの上am片及び
下磁極片である。内側1−り11bの光軸Cllには補
助レンズの励磁コイル1sが備えられており、16はそ
の電源である◎対物レンズの下磁極片14)の下側には
ギャップGを有しτ下a極片14eに対向するように嬉
3の磁極片17が配置されている018はa−りであり
、amコイル15をJII磁することによりギャップ0
間に形成される磁界によって補助レンズが形成される◎
6は中間レンズ、19は投影レンズ、20は螢光板であ
り、1は試料であり、該試料は通常の透過像を得る場合
より、一定鍬下a極片14kに近い偶に配置されている
。11, llb are the outer and inner sides of the objective lens, 12 is an excitation coil, ◎16 is the objective lens** power supply, 14. .. 14b is an upper am piece and a lower magnetic pole piece of the objective lens. The excitation coil 1s of the auxiliary lens is provided on the optical axis Cll of the inner side 11b, and 16 is its power supply. ◎There is a gap G below the lower magnetic pole piece 14) of the objective lens. 018 where the magnetic pole piece 17 of 3 is arranged so as to face the a pole piece 14e is a-ri, and by magnetizing the am coil 15 with JII, the gap is 0.
An auxiliary lens is formed by the magnetic field formed between◎
6 is an intermediate lens, 19 is a projection lens, 20 is a fluorescent plate, and 1 is a sample, which is arranged evenly closer to the pole piece 14k under a certain distance than when obtaining a normal transmitted image. .
このような構成において電源16より#磁コイル15g
:供、給される電流をget、、て補助レンズによって
JIIIIg14c)に示すように虚像5の像が中間レ
ンズ6の物114に形成されるようにする。In such a configuration, the #magnetic coil 15g is connected to the power supply 16.
: Supply and get the supplied current, so that the image of the virtual image 5 is formed on the object 114 of the intermediate lens 6 by the auxiliary lens as shown in JIIIg14c).
さて、このような状11に&iいては螢光板20上には
試料の透過像が映し出されるため、この像をm談しなが
ら試料1を光軸と垂直方向に移動させ、分析しようとす
るS#−を観察像の中央に位置させる口そこで、電源1
0よりJI2&の収束レンズ9に供給される電流を変化
させ、試料向上における電子線の照射域を縮小させて行
く。これに伴い、螢光板20上に投影される像の儀も縮
小して行くが、操作者はこのように縮小して行く僚が分
析しようとするS分に肉って縮小して行くことを確−し
ながらこの縮小を行う仁とが′できる◎この場合、試料
の1位置が通常の透過像を得る場合より対物レンズの下
#I&Ilに近づいているため、対物レンズの一方磁界
FBIの試料入射電子線に対する縮小率が大きく、電子
線の照射域を最も縮小させた―の光−一は第2図1m)
)に示す如自ものとなり、試料向上6c&tける電子#
[射城の直径は゛欽10ム掘度まで小さくすることがで
きる。従って、このような微小部分より発生したXIs
をl示外の検出Sにより検出することにより、試料向上
の微小I1分の分析を行うことができる・Now, in such a state 11, a transmitted image of the sample is projected on the fluorescent plate 20, so the sample 1 is moved in a direction perpendicular to the optical axis while observing this image, and the S Place #- in the center of the observation image, then turn on power supply 1.
The current supplied to the converging lens 9 of JI2& is changed from 0 to reduce the irradiation area of the electron beam on the specimen. Along with this, the image projected on the fluorescent plate 20 is also reduced in size, but the operator must keep in mind that the image projected on the fluorescent plate 20 will be reduced by the amount S that the operator is trying to analyze. ◎In this case, one position of the sample is closer to #I & Il below the objective lens than when obtaining a normal transmission image, so one of the magnetic fields of the objective lens The light beam 1 has a large reduction ratio with respect to the incident electron beam, and the irradiation area of the electron beam is reduced the most (Fig. 2, 1m).
), and the sample improves 6c&t electron #
[The diameter of the shooting castle can be reduced to a depth of 10 mm. Therefore, XIs generated from such minute parts
By detecting this using the extra-indication detection S, it is possible to perform analysis of minute I1 minutes of sample improvement.
慕1gは補助レンズの作用をell@するための図、嬉
8図は従来及び本実@におけるjll物レンズの一方磁
界の電子線径縮小率の差を比較して示すための図、JI
s#!Jは本発明の一実施例を示すための図である◎
1:試料、2:対物レンズ、iI:中間レンズ、4:吻
鋼、5:虚像、6:補助レンズ、7:電子銃、8.9:
収束レンズ、10:@磁電源、11゜:外側a−p、1
1b:内側ヨーク、12:励磁コイル、14.16:@
磁電源、14m、141e:上、下磁極片、I5:補助
励磁コイル、G:ギャップ、17:磁極片、18:*−
タ、19:投影レンズ、20:螢光板。
特許出願人
日本電子株式会社
代表者加勢忠雄
!″′pFigure 1g is a diagram to explain the effect of the auxiliary lens, figure 8 is a diagram to compare and show the difference in electron beam diameter reduction rate of one magnetic field between conventional and real lenses, JI
s#! J is a diagram showing an embodiment of the present invention◎ 1: sample, 2: objective lens, iI: intermediate lens, 4: snout steel, 5: virtual image, 6: auxiliary lens, 7: electron gun, 8 .9:
Convergent lens, 10: @ magnetic power source, 11°: outer a-p, 1
1b: Inner yoke, 12: Excitation coil, 14.16: @
Magnetic power supply, 14m, 141e: Upper and lower magnetic pole pieces, I5: Auxiliary excitation coil, G: Gap, 17: Magnetic pole piece, 18: *-
19: Projection lens, 20: Fluorescent plate. Patent applicant JEOL Ltd. representative Tadao Kase! ″′p
Claims (1)
けると共に、対物レンズの下a極片の下側に該下a極片
との間にギャップを舊して第三のIlk極片を設け、、
―起励磁コイルに励磁電藏を供給した際に鍵配ギャップ
間に補助レンズが形成されるようg:#I成したことを
特徴とする透過麿電子顕做鏡〇An excitation coil is provided on the optical axis Il of the objective lens, and a third Ilk pole piece is provided below the lower a pole piece of the objective lens with a gap between the lower a pole piece and the lower a pole piece. Set up...
- A transmission electron microscope characterized in that an auxiliary lens is formed between the key gaps when excitation electricity is supplied to the excitation coil.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13061881A JPS5832348A (en) | 1981-08-20 | 1981-08-20 | Transmission-type electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13061881A JPS5832348A (en) | 1981-08-20 | 1981-08-20 | Transmission-type electron microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5832348A true JPS5832348A (en) | 1983-02-25 |
JPS6329928B2 JPS6329928B2 (en) | 1988-06-15 |
Family
ID=15038527
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13061881A Granted JPS5832348A (en) | 1981-08-20 | 1981-08-20 | Transmission-type electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5832348A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006344533A (en) * | 2005-06-09 | 2006-12-21 | Kawasaki Heavy Ind Ltd | Photoelectric transfer type imaging tube for x-rays |
EP2590205A3 (en) * | 2011-11-02 | 2014-11-05 | Jeol Ltd. | Transmission electron microscope and method of observing TEM images |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5150650A (en) * | 1974-10-30 | 1976-05-04 | Hitachi Ltd | Denshisensochino hitenshusahoseisochi |
-
1981
- 1981-08-20 JP JP13061881A patent/JPS5832348A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5150650A (en) * | 1974-10-30 | 1976-05-04 | Hitachi Ltd | Denshisensochino hitenshusahoseisochi |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006344533A (en) * | 2005-06-09 | 2006-12-21 | Kawasaki Heavy Ind Ltd | Photoelectric transfer type imaging tube for x-rays |
EP2590205A3 (en) * | 2011-11-02 | 2014-11-05 | Jeol Ltd. | Transmission electron microscope and method of observing TEM images |
Also Published As
Publication number | Publication date |
---|---|
JPS6329928B2 (en) | 1988-06-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7385197B2 (en) | Electron beam apparatus and a device manufacturing method using the same apparatus | |
US7939801B2 (en) | Electron beam observation device using pre-specimen magnetic field as image-forming lens and specimen observation method | |
KR102277431B1 (en) | Electron beam imaging with dual wien-filter monochromator | |
JP2015069831A (en) | Electron microscope | |
JP2002237272A (en) | Phase plate lens system for transmission electron microscope and transmission electron microscope | |
US7612336B2 (en) | Scanning electron microscope having a monochromator | |
US4633085A (en) | Transmission-type electron microscope | |
JPS5832348A (en) | Transmission-type electron microscope | |
JP2000228162A (en) | Electron beam device | |
JP5452722B2 (en) | Aberration correction apparatus and charged particle beam apparatus using the same | |
JPS5832347A (en) | Transmission-type electron microscope | |
JP2839683B2 (en) | Foucault electron microscope | |
JP4150568B2 (en) | electronic microscope | |
US3869611A (en) | Particle-beam device of the raster type | |
JPS6328518Y2 (en) | ||
JPS605503Y2 (en) | Transmission scanning electron microscope | |
JPH06283128A (en) | Electron microscope | |
JPH11126573A (en) | Electron beam device equipped with sample height measuring means | |
JPS61193349A (en) | Method of irradiating electron ray in electron microscope | |
JP2014032943A (en) | Scanning electron microscope for irradiating sample with electron beams having small energy width | |
JPS586267B2 (en) | scanning electron microscope | |
JPH0234142B2 (en) | ||
JP2005310512A (en) | Electron optical system and electron microscope | |
JPH0261093B2 (en) | ||
JPH07161332A (en) | Electron beam radiating analyzer |