JPS63299122A - 露光装置の位置合せ方法 - Google Patents

露光装置の位置合せ方法

Info

Publication number
JPS63299122A
JPS63299122A JP62131077A JP13107787A JPS63299122A JP S63299122 A JPS63299122 A JP S63299122A JP 62131077 A JP62131077 A JP 62131077A JP 13107787 A JP13107787 A JP 13107787A JP S63299122 A JPS63299122 A JP S63299122A
Authority
JP
Japan
Prior art keywords
latent image
exposure
alignment
alignment mark
shot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62131077A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0437574B2 (enrdf_load_stackoverflow
Inventor
Takanaga Shiozawa
崇永 塩澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62131077A priority Critical patent/JPS63299122A/ja
Publication of JPS63299122A publication Critical patent/JPS63299122A/ja
Priority to US07/742,535 priority patent/US5140366A/en
Publication of JPH0437574B2 publication Critical patent/JPH0437574B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62131077A 1987-05-29 1987-05-29 露光装置の位置合せ方法 Granted JPS63299122A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62131077A JPS63299122A (ja) 1987-05-29 1987-05-29 露光装置の位置合せ方法
US07/742,535 US5140366A (en) 1987-05-29 1991-08-08 Exposure apparatus with a function for controlling alignment by use of latent images

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62131077A JPS63299122A (ja) 1987-05-29 1987-05-29 露光装置の位置合せ方法

Publications (2)

Publication Number Publication Date
JPS63299122A true JPS63299122A (ja) 1988-12-06
JPH0437574B2 JPH0437574B2 (enrdf_load_stackoverflow) 1992-06-19

Family

ID=15049448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62131077A Granted JPS63299122A (ja) 1987-05-29 1987-05-29 露光装置の位置合せ方法

Country Status (1)

Country Link
JP (1) JPS63299122A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144429A (ja) * 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
JPS61201427A (ja) * 1985-03-04 1986-09-06 Nippon Kogaku Kk <Nikon> 位置ずれ検出方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144429A (ja) * 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
JPS61201427A (ja) * 1985-03-04 1986-09-06 Nippon Kogaku Kk <Nikon> 位置ずれ検出方法

Also Published As

Publication number Publication date
JPH0437574B2 (enrdf_load_stackoverflow) 1992-06-19

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term