JPS63291824A - Production of quartz glass transmitting short wavelength laser light - Google Patents

Production of quartz glass transmitting short wavelength laser light

Info

Publication number
JPS63291824A
JPS63291824A JP12541487A JP12541487A JPS63291824A JP S63291824 A JPS63291824 A JP S63291824A JP 12541487 A JP12541487 A JP 12541487A JP 12541487 A JP12541487 A JP 12541487A JP S63291824 A JPS63291824 A JP S63291824A
Authority
JP
Japan
Prior art keywords
gel
sol
quartz glass
alkyl silicate
raw material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12541487A
Other languages
Japanese (ja)
Inventor
Tetsuhiko Takeuchi
哲彦 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP12541487A priority Critical patent/JPS63291824A/en
Publication of JPS63291824A publication Critical patent/JPS63291824A/en
Pending legal-status Critical Current

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  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)

Abstract

PURPOSE:To form a quartz glass free from thermal strain, structural defect and refractive index distribution, by using an alkyl silicate as a main raw material, preparing a sol and a gel using a specific method and sintering the resultant wet gel after drying. CONSTITUTION:A quartz glass transmitting laser light having short wavelength is produced by the following process. (1) A wet gel is prepared by hydrolyzing an alkyl silicate in the presence of a basic catalyst to obtain a solution containing dispersed fine silica particles having uniform particle diameter, mixing the solution with a solution produced by the hydrolysis of an alkyl silicate in the presence of an acidic catalyst at a specific ratio and gelatinizing the resultant sol. (2) The wet gel is dried to form a dry gel. (3) The dry gel is sintered to produce a transparent glass. The above process is carried out by using fine silica particles having uniform diameter as a raw material and gelatinizing the sol under centrifugal force.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ゾル−ゲル法によるガラスの製造方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing glass by a sol-gel method.

〔従来の技術〕[Conventional technology]

従来からの石英ガラスの製造方法としては、溶融法ある
いは、CVD法がある。また、ゾル−ゲル法による製造
方法としては、原料としである程度ブロードな粒度分布
のシリカ微粒子を原料として用い通常はゾルを容器に注
入した後、静置した状聾でゲル化させていた。
Conventional methods for producing quartz glass include a melting method and a CVD method. In the sol-gel manufacturing method, silica fine particles with a somewhat broad particle size distribution are used as the raw material, and the sol is usually poured into a container and then allowed to stand still for gelation.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、従来の製造方法では、多少差があるものの、0
.2μmを下回る短波長レーザー光の透過率が、小さい
こと、および、バルクとして見た場合に、熱歪分布、屈
折率分布などが生じ均質でないという問題点を存する。
However, with conventional manufacturing methods, although there are some differences,
.. There are problems in that the transmittance of laser light with a short wavelength of less than 2 μm is small, and when viewed as a bulk, thermal strain distribution, refractive index distribution, etc. occur and the material is not homogeneous.

そこで、本発明は、前述の問題点を解決するもので、そ
の目的とするところは、ゾル−ゲル法による、均質、商
品質な石英ガラスの製造方法を提供するところにある。
SUMMARY OF THE INVENTION The present invention aims to solve the above-mentioned problems, and its purpose is to provide a method for producing homogeneous, commercially available quartz glass using a sol-gel method.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の短波長レーザー光透過石英ガラスの製造方法は
、アルキルシリケートを主原料とするゾル−ゲル法によ
るガラスの製造においてアルキルシリケートの塩基性触
媒下での加水分解反応生成物である均一な粒子径のシリ
カ微粒子が分散した溶液(第1液)とアルキルシリケー
トの酸性触媒による加水分解反応溶液(第2液)とを所
定割合にて混合し調製したゾルをゲル化させてウェット
ゲルを作製する工程、前記ウェットゲルを乾燥してドラ
イゲルを作製する工程、および前記ドライゲルを焼結し
て透明ガラス体を作製する工程からなり、均一な粒子径
のシリカ微粒子を原料として用い、該ゾルのゲル化を遠
心力下で行なうことを特徴とする。
The method for producing short-wavelength laser light-transmissive quartz glass of the present invention involves the production of glass by a sol-gel method using an alkyl silicate as a main raw material. A wet gel is prepared by gelling a sol prepared by mixing a solution in which silica fine particles of the same diameter are dispersed (first liquid) and a hydrolysis reaction solution of alkyl silicate using an acidic catalyst (second liquid) at a predetermined ratio. A process of drying the wet gel to produce a dry gel, and a process of sintering the dry gel to produce a transparent glass body, using silica fine particles of uniform particle size as a raw material to gel the sol. It is characterized by being carried out under centrifugal force.

〔イ乍用〕[For use]

本発明によれば、原料として高純度な液体原料を選べる
ので金属イオン等の不純物や、ゴミなどの異物の混入が
ない限り、本質的には、純粋な石英ガラスを作製するこ
とができる。
According to the present invention, since a highly pure liquid raw material can be selected as a raw material, essentially pure quartz glass can be produced as long as there is no contamination with impurities such as metal ions or foreign matter such as dust.

また、均一な粒子径のシリカ粒子を用い、更に遠心力下
でゲル化させることにより、シリカ粒子の濃度分布がな
く、規則正しくシリカ粒子が配列したウェットゲルの作
製が可能である。したがってバルクとして焼結速度が均
一となり、熱歪、構造欠陥、屈折率分布のない、均質な
石英ガラスが作製できるものである。
Further, by using silica particles of uniform particle size and further gelling under centrifugal force, it is possible to produce a wet gel in which there is no concentration distribution of silica particles and silica particles are regularly arranged. Therefore, the sintering rate becomes uniform as a bulk material, and homogeneous quartz glass without thermal distortion, structural defects, or refractive index distribution can be produced.

(実施例〕 (り  蒸留精製したエチルシリケート、蒸留精製した
エタノール、超純水、および孔径0.2μmのメンブラ
ンフィルタ−により濾過した市販電子工業用の29%ア
ンモニア水を混合し、4時間激しく撹拌した後、冷暗所
にて一晩静置しシリカ微粒子を成長させた。このシリカ
微粒子分散液を濃縮した後pH値を調整し、安定化させ
、孔径10μmのメンブランフィルタ−により濾過精製
した第1液とした。調整した第1液中のシリカ微粒子は
粒子径0.24μmで、単分散であった。
(Example) Distilled ethyl silicate, distilled ethanol, ultrapure water, and 29% ammonia water for commercial electronics industry filtered through a membrane filter with a pore size of 0.2 μm were mixed and stirred vigorously for 4 hours. After that, it was allowed to stand overnight in a cool dark place to grow silica particles. After concentrating this silica particle dispersion, the pH value was adjusted and stabilized, and the first liquid was purified by filtration using a membrane filter with a pore size of 10 μm. The silica fine particles in the prepared first liquid had a particle diameter of 0.24 μm and were monodisperse.

次ニ、蒸留精製したエチルシリケートを1孔径0.2μ
mのメンブランフィルタ−により濾過した0、02N−
HCJ2とを混合し、 漱しく撹拌し、加水分解反応を
行ない、第2液とした。
Next, the ethyl silicate purified by distillation is made into a pore size of 0.2 μm.
0,02N filtered through a membrane filter of
A second liquid was obtained by mixing with HCJ2 and stirring gently to perform a hydrolysis reaction.

前記、第1液および第2液を混合し、濾過精製した後、
大きさ、30X30XE30cmの箱型容器に、27J
2.20cmφX40cmの円筒型容器に8ρ、それぞ
れ注入し、改造型の遠心分離機にセットし、遠心力をか
けながらゲル化させた。
After mixing the first liquid and the second liquid and filtering and purifying the mixture,
27J in a box-shaped container measuring 30x30xE30cm
2. 8 ρ was poured into each cylindrical container measuring 20 cmφ×40 cm, set in a modified centrifugal separator, and gelated while applying centrifugal force.

ゲル化後、得られたウェットゲルを密閉状臼にて熟成し
た後、開放にし、室温から80°Cに昇温し以後この温
度に保持し乾燥したところ、それぞれ15日問および6
日間で、大気中に放置しても割れない安定なドライゲル
を得た。大きさはそれぞれ21X21X21cms 1
4cmφxiecmHであった。
After gelation, the obtained wet gel was aged in a closed mortar, opened, heated from room temperature to 80°C, and then kept at this temperature for drying.
In a few days, a stable dry gel was obtained that did not crack even when left in the air. Each size is 21X21X21cm 1
It was 4 cmφxiecmH.

ここで得られたドライゲルを加熱焼結し、13601C
にて、透明ガラス体となった。大きさはそれぞれ15X
15X15cms 10cmφ×11.5cmHであっ
た。
The dry gel obtained here was heated and sintered, and 13601C
It became a transparent glass body. Each size is 15X
It was 15×15cms 10cmφ×11.5cmH.

このガラス体の諸物性分析の結果は全て市販の石英ガラ
スのものに一致した。
The results of physical property analysis of this glass body all agreed with those of commercially available quartz glass.

また、本実施例により作製した石英ガラス中には気泡な
ど異物は全く存在しなかった。さらに、熱歪、屈折率分
布もほとんどなく極めて高品質であることがわかった。
Moreover, no foreign matter such as air bubbles was present in the quartz glass produced in this example. Furthermore, it was found to be of extremely high quality with almost no thermal distortion or refractive index distribution.

紫外、可視域での分光特性もフラットであり、IC製造
に用いられるフォトマスク基板、そして短波長レーザー
光用レンズとして使用可能な品質であった。
The spectral characteristics in the ultraviolet and visible regions were also flat, and the quality was such that it could be used as a photomask substrate used in IC manufacturing and as a lens for short wavelength laser light.

〔発明の効果〕〔Effect of the invention〕

このようにして本発明により製造される石英ガラスは、
半導体プロセスにおけるステッパーの光学系用として用
いることにより、更にICの大容量化が進むことが期待
される。
The quartz glass thus produced according to the present invention is
It is expected that the capacity of ICs will further increase by using them for optical systems of steppers in semiconductor processes.

また、他の製造方法に比べ、低コストで製造できるため
、その用途は多方面に広がるものと考えられる。
In addition, since it can be manufactured at a lower cost than other manufacturing methods, its uses are expected to expand in a wide range of fields.

以  上that's all

Claims (1)

【特許請求の範囲】[Claims] (1)アルキルシリケートを主原料とするゾル−ゲル法
によるガラスの製造において、アルキルシリケートの塩
基性触媒下での加水分解反応生成物である均一な粒子径
のシリカ微粒子が分散した溶液(以後第1液と記す)と
アルキルシリケートの酸性触媒による加水分解反応溶液
(以後第2液と記す)とを所定割合にて混合し調製した
ゾルをゲル化させてウェットゲルを作製する工程と、前
記ウェットゲルを乾燥してドライゲルを作製する工程、
および、前記ドライゲルを焼結し透明ガラス体を作製す
る工程からなり、均一な粒子径のシリカ微粒子を原料と
して用い該ゾルのゲル化を遠心力下で行なうことを特徴
とする短波長レーザー光透過石英ガラスの製造方法。
(1) In the production of glass by the sol-gel method using alkyl silicate as the main raw material, a solution (hereinafter referred to as A step of preparing a wet gel by gelling a sol prepared by mixing a hydrolysis reaction solution of an alkyl silicate using an acidic catalyst (hereinafter referred to as a second solution) at a predetermined ratio; a step of drying the gel to produce a dry gel;
and short-wavelength laser light transmission, comprising the step of sintering the dry gel to produce a transparent glass body, and gelling the sol under centrifugal force using silica fine particles of uniform particle size as a raw material. Method for manufacturing quartz glass.
JP12541487A 1987-05-22 1987-05-22 Production of quartz glass transmitting short wavelength laser light Pending JPS63291824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12541487A JPS63291824A (en) 1987-05-22 1987-05-22 Production of quartz glass transmitting short wavelength laser light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12541487A JPS63291824A (en) 1987-05-22 1987-05-22 Production of quartz glass transmitting short wavelength laser light

Publications (1)

Publication Number Publication Date
JPS63291824A true JPS63291824A (en) 1988-11-29

Family

ID=14909514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12541487A Pending JPS63291824A (en) 1987-05-22 1987-05-22 Production of quartz glass transmitting short wavelength laser light

Country Status (1)

Country Link
JP (1) JPS63291824A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0558667A (en) * 1991-08-30 1993-03-09 Shinetsu Quartz Prod Co Ltd Optical member

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0558667A (en) * 1991-08-30 1993-03-09 Shinetsu Quartz Prod Co Ltd Optical member

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