JPS63291824A - Production of quartz glass transmitting short wavelength laser light - Google Patents
Production of quartz glass transmitting short wavelength laser lightInfo
- Publication number
- JPS63291824A JPS63291824A JP12541487A JP12541487A JPS63291824A JP S63291824 A JPS63291824 A JP S63291824A JP 12541487 A JP12541487 A JP 12541487A JP 12541487 A JP12541487 A JP 12541487A JP S63291824 A JPS63291824 A JP S63291824A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- sol
- quartz glass
- alkyl silicate
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000000499 gel Substances 0.000 claims abstract description 12
- 239000002994 raw material Substances 0.000 claims abstract description 9
- 239000011521 glass Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 8
- 239000011240 wet gel Substances 0.000 claims abstract description 8
- -1 alkyl silicate Chemical compound 0.000 claims abstract description 7
- 239000002245 particle Substances 0.000 claims abstract description 7
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 239000003054 catalyst Substances 0.000 claims abstract description 4
- 238000001035 drying Methods 0.000 claims abstract description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 4
- 238000005245 sintering Methods 0.000 claims abstract description 4
- 230000002378 acidificating effect Effects 0.000 claims abstract description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000010419 fine particle Substances 0.000 claims description 5
- 238000003980 solgel method Methods 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims 1
- 230000007847 structural defect Effects 0.000 abstract description 2
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 230000003301 hydrolyzing effect Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 8
- 239000012528 membrane Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Landscapes
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ゾル−ゲル法によるガラスの製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing glass by a sol-gel method.
従来からの石英ガラスの製造方法としては、溶融法ある
いは、CVD法がある。また、ゾル−ゲル法による製造
方法としては、原料としである程度ブロードな粒度分布
のシリカ微粒子を原料として用い通常はゾルを容器に注
入した後、静置した状聾でゲル化させていた。Conventional methods for producing quartz glass include a melting method and a CVD method. In the sol-gel manufacturing method, silica fine particles with a somewhat broad particle size distribution are used as the raw material, and the sol is usually poured into a container and then allowed to stand still for gelation.
しかし、従来の製造方法では、多少差があるものの、0
.2μmを下回る短波長レーザー光の透過率が、小さい
こと、および、バルクとして見た場合に、熱歪分布、屈
折率分布などが生じ均質でないという問題点を存する。However, with conventional manufacturing methods, although there are some differences,
.. There are problems in that the transmittance of laser light with a short wavelength of less than 2 μm is small, and when viewed as a bulk, thermal strain distribution, refractive index distribution, etc. occur and the material is not homogeneous.
そこで、本発明は、前述の問題点を解決するもので、そ
の目的とするところは、ゾル−ゲル法による、均質、商
品質な石英ガラスの製造方法を提供するところにある。SUMMARY OF THE INVENTION The present invention aims to solve the above-mentioned problems, and its purpose is to provide a method for producing homogeneous, commercially available quartz glass using a sol-gel method.
本発明の短波長レーザー光透過石英ガラスの製造方法は
、アルキルシリケートを主原料とするゾル−ゲル法によ
るガラスの製造においてアルキルシリケートの塩基性触
媒下での加水分解反応生成物である均一な粒子径のシリ
カ微粒子が分散した溶液(第1液)とアルキルシリケー
トの酸性触媒による加水分解反応溶液(第2液)とを所
定割合にて混合し調製したゾルをゲル化させてウェット
ゲルを作製する工程、前記ウェットゲルを乾燥してドラ
イゲルを作製する工程、および前記ドライゲルを焼結し
て透明ガラス体を作製する工程からなり、均一な粒子径
のシリカ微粒子を原料として用い、該ゾルのゲル化を遠
心力下で行なうことを特徴とする。The method for producing short-wavelength laser light-transmissive quartz glass of the present invention involves the production of glass by a sol-gel method using an alkyl silicate as a main raw material. A wet gel is prepared by gelling a sol prepared by mixing a solution in which silica fine particles of the same diameter are dispersed (first liquid) and a hydrolysis reaction solution of alkyl silicate using an acidic catalyst (second liquid) at a predetermined ratio. A process of drying the wet gel to produce a dry gel, and a process of sintering the dry gel to produce a transparent glass body, using silica fine particles of uniform particle size as a raw material to gel the sol. It is characterized by being carried out under centrifugal force.
本発明によれば、原料として高純度な液体原料を選べる
ので金属イオン等の不純物や、ゴミなどの異物の混入が
ない限り、本質的には、純粋な石英ガラスを作製するこ
とができる。According to the present invention, since a highly pure liquid raw material can be selected as a raw material, essentially pure quartz glass can be produced as long as there is no contamination with impurities such as metal ions or foreign matter such as dust.
また、均一な粒子径のシリカ粒子を用い、更に遠心力下
でゲル化させることにより、シリカ粒子の濃度分布がな
く、規則正しくシリカ粒子が配列したウェットゲルの作
製が可能である。したがってバルクとして焼結速度が均
一となり、熱歪、構造欠陥、屈折率分布のない、均質な
石英ガラスが作製できるものである。Further, by using silica particles of uniform particle size and further gelling under centrifugal force, it is possible to produce a wet gel in which there is no concentration distribution of silica particles and silica particles are regularly arranged. Therefore, the sintering rate becomes uniform as a bulk material, and homogeneous quartz glass without thermal distortion, structural defects, or refractive index distribution can be produced.
(実施例〕
(り 蒸留精製したエチルシリケート、蒸留精製した
エタノール、超純水、および孔径0.2μmのメンブラ
ンフィルタ−により濾過した市販電子工業用の29%ア
ンモニア水を混合し、4時間激しく撹拌した後、冷暗所
にて一晩静置しシリカ微粒子を成長させた。このシリカ
微粒子分散液を濃縮した後pH値を調整し、安定化させ
、孔径10μmのメンブランフィルタ−により濾過精製
した第1液とした。調整した第1液中のシリカ微粒子は
粒子径0.24μmで、単分散であった。(Example) Distilled ethyl silicate, distilled ethanol, ultrapure water, and 29% ammonia water for commercial electronics industry filtered through a membrane filter with a pore size of 0.2 μm were mixed and stirred vigorously for 4 hours. After that, it was allowed to stand overnight in a cool dark place to grow silica particles. After concentrating this silica particle dispersion, the pH value was adjusted and stabilized, and the first liquid was purified by filtration using a membrane filter with a pore size of 10 μm. The silica fine particles in the prepared first liquid had a particle diameter of 0.24 μm and were monodisperse.
次ニ、蒸留精製したエチルシリケートを1孔径0.2μ
mのメンブランフィルタ−により濾過した0、02N−
HCJ2とを混合し、 漱しく撹拌し、加水分解反応を
行ない、第2液とした。Next, the ethyl silicate purified by distillation is made into a pore size of 0.2 μm.
0,02N filtered through a membrane filter of
A second liquid was obtained by mixing with HCJ2 and stirring gently to perform a hydrolysis reaction.
前記、第1液および第2液を混合し、濾過精製した後、
大きさ、30X30XE30cmの箱型容器に、27J
2.20cmφX40cmの円筒型容器に8ρ、それぞ
れ注入し、改造型の遠心分離機にセットし、遠心力をか
けながらゲル化させた。After mixing the first liquid and the second liquid and filtering and purifying the mixture,
27J in a box-shaped container measuring 30x30xE30cm
2. 8 ρ was poured into each cylindrical container measuring 20 cmφ×40 cm, set in a modified centrifugal separator, and gelated while applying centrifugal force.
ゲル化後、得られたウェットゲルを密閉状臼にて熟成し
た後、開放にし、室温から80°Cに昇温し以後この温
度に保持し乾燥したところ、それぞれ15日問および6
日間で、大気中に放置しても割れない安定なドライゲル
を得た。大きさはそれぞれ21X21X21cms 1
4cmφxiecmHであった。After gelation, the obtained wet gel was aged in a closed mortar, opened, heated from room temperature to 80°C, and then kept at this temperature for drying.
In a few days, a stable dry gel was obtained that did not crack even when left in the air. Each size is 21X21X21cm 1
It was 4 cmφxiecmH.
ここで得られたドライゲルを加熱焼結し、13601C
にて、透明ガラス体となった。大きさはそれぞれ15X
15X15cms 10cmφ×11.5cmHであっ
た。The dry gel obtained here was heated and sintered, and 13601C
It became a transparent glass body. Each size is 15X
It was 15×15cms 10cmφ×11.5cmH.
このガラス体の諸物性分析の結果は全て市販の石英ガラ
スのものに一致した。The results of physical property analysis of this glass body all agreed with those of commercially available quartz glass.
また、本実施例により作製した石英ガラス中には気泡な
ど異物は全く存在しなかった。さらに、熱歪、屈折率分
布もほとんどなく極めて高品質であることがわかった。Moreover, no foreign matter such as air bubbles was present in the quartz glass produced in this example. Furthermore, it was found to be of extremely high quality with almost no thermal distortion or refractive index distribution.
紫外、可視域での分光特性もフラットであり、IC製造
に用いられるフォトマスク基板、そして短波長レーザー
光用レンズとして使用可能な品質であった。The spectral characteristics in the ultraviolet and visible regions were also flat, and the quality was such that it could be used as a photomask substrate used in IC manufacturing and as a lens for short wavelength laser light.
このようにして本発明により製造される石英ガラスは、
半導体プロセスにおけるステッパーの光学系用として用
いることにより、更にICの大容量化が進むことが期待
される。The quartz glass thus produced according to the present invention is
It is expected that the capacity of ICs will further increase by using them for optical systems of steppers in semiconductor processes.
また、他の製造方法に比べ、低コストで製造できるため
、その用途は多方面に広がるものと考えられる。In addition, since it can be manufactured at a lower cost than other manufacturing methods, its uses are expected to expand in a wide range of fields.
以 上that's all
Claims (1)
によるガラスの製造において、アルキルシリケートの塩
基性触媒下での加水分解反応生成物である均一な粒子径
のシリカ微粒子が分散した溶液(以後第1液と記す)と
アルキルシリケートの酸性触媒による加水分解反応溶液
(以後第2液と記す)とを所定割合にて混合し調製した
ゾルをゲル化させてウェットゲルを作製する工程と、前
記ウェットゲルを乾燥してドライゲルを作製する工程、
および、前記ドライゲルを焼結し透明ガラス体を作製す
る工程からなり、均一な粒子径のシリカ微粒子を原料と
して用い該ゾルのゲル化を遠心力下で行なうことを特徴
とする短波長レーザー光透過石英ガラスの製造方法。(1) In the production of glass by the sol-gel method using alkyl silicate as the main raw material, a solution (hereinafter referred to as A step of preparing a wet gel by gelling a sol prepared by mixing a hydrolysis reaction solution of an alkyl silicate using an acidic catalyst (hereinafter referred to as a second solution) at a predetermined ratio; a step of drying the gel to produce a dry gel;
and short-wavelength laser light transmission, comprising the step of sintering the dry gel to produce a transparent glass body, and gelling the sol under centrifugal force using silica fine particles of uniform particle size as a raw material. Method for manufacturing quartz glass.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12541487A JPS63291824A (en) | 1987-05-22 | 1987-05-22 | Production of quartz glass transmitting short wavelength laser light |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12541487A JPS63291824A (en) | 1987-05-22 | 1987-05-22 | Production of quartz glass transmitting short wavelength laser light |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63291824A true JPS63291824A (en) | 1988-11-29 |
Family
ID=14909514
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12541487A Pending JPS63291824A (en) | 1987-05-22 | 1987-05-22 | Production of quartz glass transmitting short wavelength laser light |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63291824A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0558667A (en) * | 1991-08-30 | 1993-03-09 | Shinetsu Quartz Prod Co Ltd | Optical member |
-
1987
- 1987-05-22 JP JP12541487A patent/JPS63291824A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0558667A (en) * | 1991-08-30 | 1993-03-09 | Shinetsu Quartz Prod Co Ltd | Optical member |
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