JPS63291692A - Treatment of waste water containing high concentration tmah - Google Patents

Treatment of waste water containing high concentration tmah

Info

Publication number
JPS63291692A
JPS63291692A JP62123896A JP12389687A JPS63291692A JP S63291692 A JPS63291692 A JP S63291692A JP 62123896 A JP62123896 A JP 62123896A JP 12389687 A JP12389687 A JP 12389687A JP S63291692 A JPS63291692 A JP S63291692A
Authority
JP
Japan
Prior art keywords
tmah
concentration
tank
high concentration
waste water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62123896A
Other languages
Japanese (ja)
Inventor
Sumiko Hikami
氷上 澄子
Toshiyuki Nakamura
利幸 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Organo Corp
Original Assignee
Organo Corp
Japan Organo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Organo Corp, Japan Organo Co Ltd filed Critical Organo Corp
Priority to JP62123896A priority Critical patent/JPS63291692A/en
Publication of JPS63291692A publication Critical patent/JPS63291692A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00Technologies for wastewater treatment
    • Y02W10/10Biological treatment of water, waste water, or sewage

Landscapes

  • Biological Treatment Of Waste Water (AREA)

Abstract

PURPOSE:To decompose TMAH efficiently by treating waste water containing tetramethylammonium hydroxide (TMAH) of high concentration with the help of a device provided with fillers with aerobic microbes permitted to grow on their surface in a tank. CONSTITUTION:TMAH of waste water containing TMAH of high concentration is biologically decomposed in a tank containing fillers with aerobic microbes allowed to grow on their surface and an immersion filter bed biological treatment device provided in the tank, with the pH value of waste water maintained to 5.0-7.5. Application of this method allows the concentration of sludge in the tank, especially the concentration of TMAH decomposition bacteria to be maintained at a higher level than a conventional flotation activated sludge method. Subsequently, a TMAH load can be increased 3-5 times that of the conventional method. Further, the subject method allows direct treatment of waste water of high concentration such as 20,000-30,000mg/l of TMAH concentration.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、例えば半導体製造工場においてプリント基盤
の剥離剤として使用されている、難分解性のテトラメチ
ルアンモニウムハイドロオキサイド(以下略してTMA
Rという)を例えば20゜000〜30.000躍/l
という高濃度に含む廃水を浸漬濾床性生物学的処理装置
を用いて処理し、TMARを生物学的に効率よく酸化分
解する方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention is directed to the use of refractory tetramethylammonium hydroxide (hereinafter abbreviated as TMA), which is used as a remover for printed circuit boards in semiconductor manufacturing factories, for example.
For example, 20°000 to 30,000 leaps/l
The present invention relates to a method for biologically and efficiently oxidizing and decomposing TMAR by treating wastewater containing a high concentration of TMAR using a submerged filter biological treatment device.

〈従来の技術〉 TMAH((CH3)4N・OH)は、コリン系剥離剤
と並ぶを機アルカリ系剥離剤であって非常に優れた効果
を有するものであり、近年、半導体製造工場等において
プリント基盤の剥離剤として広く使用されている。プリ
ント基盤の剥離工程は、前工程においてその表面に回路
を光学的にプリントされたシリコンウェハー(プリント
基盤)を濃厚TMAH水溶液(TMAH濃度約3%)中
に浸漬して不要な部分を剥離除去する工程である。すな
わち、プリント基盤は先ず濃厚TMAH水溶液槽中に浸
漬され、次いで、当該槽から引き出された後界面活性剤
水溶液、超純水等で洗浄してプリント基盤上に付着して
いるTMAHやその他の不純物を除去し、その後次工程
に送られる。上記TMAH水溶液槽中のTMAH水溶液
は、所定量のプリント基盤を処理してその剥離性能が劣
化した場合には、その一部を抜き取って新しい液を補充
するか、あるいはその全量を廃棄して新しい液と交換す
る。従って、当該剥離工程からは、前記洗浄操作におい
て連続的に排出される、低濃度のTMAHを含む洗浄廃
水と、TMAH水溶液槽から間歇的に排出される使用済
の濃厚TMAH廃水との2種類の廃水が排出される。
<Prior art> TMAH ((CH3)4N・OH) is an alkaline stripping agent that is comparable to choline stripping agents and has very excellent effects, and has recently been used in semiconductor manufacturing factories and other places for printing. Widely used as a substrate stripper. In the process of peeling off the printed board, a silicon wafer (printed board) on which a circuit was optically printed in the previous process is immersed in a concentrated TMAH aqueous solution (TMAH concentration of about 3%) and unnecessary parts are peeled off. It is a process. That is, the printed substrate is first immersed in a concentrated TMAH aqueous solution tank, and then taken out from the tank and washed with a surfactant aqueous solution, ultrapure water, etc. to remove TMAH and other impurities that have adhered to the printed substrate. is removed and then sent to the next process. If the peeling performance of the TMAH aqueous solution in the TMAH aqueous solution tank deteriorates after processing a predetermined amount of printed substrates, a part of it should be extracted and replaced with new solution, or the entire amount should be discarded and a new one should be replaced. Replace with liquid. Therefore, from the stripping process, there are two types of wastewater: cleaning wastewater containing low concentration TMAH, which is continuously discharged in the cleaning operation, and used concentrated TMAH wastewater, which is intermittently discharged from the TMAH aqueous solution tank. Wastewater is discharged.

当該TMAHは、強い毒性を有する強アルカリ性物質で
あり、T M A Rを含有する上記廃水をそのまま排
出することは環境上好ましくない。しかしながら、TM
AHは化学的に非常に安定な物質であって、例えば塩素
、過酸化水素、オゾン、紫外線等の強力な酸化剤による
単独処理、あるいはこれらの併用処理等によっても全く
分解されず、また活性炭にも吸着されない非常に処理し
にくい物質である。現在のところ、TMAH含有廃水の
処理方法としては、イオン交換樹脂による吸着法、逆浸
透膜による濃縮法及び浮遊式活性汚泥法による生物学的
処理法などが提案されているが、イオン交換樹脂による
吸着法及び逆浸透膜による濃縮法は、TMAHを無害物
に分解する訳ではなく単に濃縮するのみであるから、濃
縮液の処置をどうするかという問題が残り実用的ではな
い。従って、現時点では好気性微生物を利用した浮遊式
活性汚泥法が最も実用的なTMAH含有廃水の処理方法
といえる。
The TMAH is a strongly alkaline substance with strong toxicity, and it is environmentally unfavorable to discharge the wastewater containing TMAR as it is. However, TM
AH is a chemically very stable substance, and it is not decomposed at all even when treated with strong oxidizing agents such as chlorine, hydrogen peroxide, ozone, and ultraviolet light, or in combination with these, and it is not degraded by activated carbon. It is a substance that is very difficult to treat and cannot be adsorbed. At present, proposed methods for treating TMAH-containing wastewater include adsorption using ion exchange resins, concentration using reverse osmosis membranes, and biological treatment using floating activated sludge. The adsorption method and the concentration method using a reverse osmosis membrane do not decompose TMAH into harmless substances, but simply concentrate them, so the problem remains as to how to treat the concentrated solution, which is not practical. Therefore, at present, the floating activated sludge method using aerobic microorganisms can be said to be the most practical method for treating TMAH-containing wastewater.

〈発明が解決しようとする問題点〉 しかしながら、TMAHは生物処理可能な物質ではある
が極めて生物的に難分解性物質であって、TMAH含有
廃水を従来の浮遊式活性汚泥法で処理する場合には、T
MAHを特異的に分解する菌(以下、TMAH分解菌と
いう)の順養に1〜2力月という長期間を必要とする上
、例えば0.1 kgTMAH/n(・日収下というよ
うな非常な低負荷でないと処理出来ない。また、浮遊式
活性汚泥法によって処理可能なT M A H濃度は、
高(でも2゜000■/l程度までで、安定した処理を
行うためにはT M A H濃度を約200■/l以下
にして処理することが必要であった。従って、プリント
基盤の剥離工程から排出される廃水のうち、洗浄廃水の
ようにTMAH濃度の低い廃水は処理可能であるが、T
MAH水溶液槽の更新時に排出される2 0,000〜
30,000■/lというTMAHfM度の高い廃水を
処理する場合には大量の希釈水と大容量の処理装置を必
要とするという問題点があり、実際には、当該濃厚廃水
の処理を、高額な費用でもって廃棄物処理業者に委託し
ているのが現状である。
<Problems to be solved by the invention> However, although TMAH is a biologically treatable substance, it is extremely difficult to decompose biologically. is, T
Bacteria that specifically degrade MAH (hereinafter referred to as TMAH-degrading bacteria) require a long period of 1 to 2 months to acclimatize, and in addition, for example, 0.1 kg TMAH/n The TMA H concentration that can be treated by the floating activated sludge method is as follows:
However, in order to perform stable processing, it was necessary to lower the TMA H concentration to about 200 μ/l or less. Of the wastewater discharged from the process, wastewater with a low concentration of TMAH, such as washing wastewater, can be treated, but T
20,000~ discharged when renewing MAH aqueous solution tank
When treating wastewater with a high TMAHfM concentration of 30,000 μ/l, there is a problem that a large amount of dilution water and large-capacity treatment equipment are required. Currently, waste disposal is outsourced to waste disposal companies at a reasonable cost.

また、浮遊式活性汚泥法で処理する場合であっても、上
述のようにTMAR負荷を極めて低くしなければ処理出
来ず、従って汚泥の増殖速度、特にTMAH分解菌の増
殖速度が遅く、がっ、曝気槽からの当該分解菌の流出(
ウォッシュアウト)も厳しいので、槽内汚泥濃度、特に
TMAH分解菌の濃度を高く維持することが出来ない。
Furthermore, even when treatment is carried out using the floating activated sludge method, the TMAR load cannot be treated unless it is extremely low as mentioned above, and therefore the growth rate of sludge, especially the growth rate of TMAH-degrading bacteria, is slow, resulting in , outflow of the decomposing bacteria from the aeration tank (
Washout) is also severe, making it impossible to maintain a high sludge concentration in the tank, especially the concentration of TMAH-degrading bacteria.

そのため、TMAH含有廃水の安定処理が難しく、また
、槽内汚泥濃度を高く維持するために補助栄養源として
他の有機物を多量に添加しなければならないという問題
点がある。
Therefore, it is difficult to stably treat TMAH-containing wastewater, and there are also problems in that a large amount of other organic matter must be added as a supplementary nutrient source in order to maintain a high sludge concentration in the tank.

本発明は、半導体製造工場等におけるプリント基盤の剥
離工程から排出されるTMAH含有廃水の処理における
上述のような問題点に鑑みてなされたもので、特に従来
高額な費用でもって外部委託処理がなされていた高濃度
TMAH含有廃水を、生物学的に効率よく酸化分解する
方法を提供することを目的とする。
The present invention has been made in view of the above-mentioned problems in the treatment of TMAH-containing wastewater discharged from the peeling process of printed circuit boards in semiconductor manufacturing factories, etc., and in particular, treatment has traditionally been outsourced at a high cost. The purpose of the present invention is to provide a method for biologically and efficiently oxidizing and decomposing wastewater containing high concentration TMAH.

く問題点を解決するための手段〉 本発明は、TMAHを高濃度に含む廃水を、好気性微生
物をその表面に着生させた充填物を槽内に充填してなる
浸漬濾床性生物学的処理装置を用いて、槽内水のpHを
5.0〜7.5の条件下で生物学的に処理することを特
徴とするものである。
Means for Solving the Problems> The present invention is an immersed filter biological system in which wastewater containing high concentration of TMAH is filled in a tank with a filling material on which aerobic microorganisms are grown. It is characterized by biologically treating the water in the tank under conditions of pH 5.0 to 7.5 using a biological treatment device.

本発明に使用する浸漬濾床法生物学的処理装置(以下、
浸漬濾床装置という)は、人工石、砂利、砕石、ラシヒ
リング、活性炭等の無機系充填材等の充填材を槽内に充
填し、当該充填材層の上部または下部から有機物を含む
被処理水を流入し、一方、空気等の酸素含有ガスを充填
材層の下部から供給し、前記充填材層に着生させた好気
性微生物の働きによって被処理水中の有機物を生物学的
に分解除去するもので、従来公知のものである。なお、
使用する充填材は被処理水中で浮上するものであっても
沈降するものであってもどちらでもよい。
Submerged filter bed method biological treatment device (hereinafter referred to as
In a submerged filter bed device, a tank is filled with a filler such as artificial stone, gravel, crushed stone, Raschig ring, or inorganic filler such as activated carbon, and the water to be treated containing organic matter is poured from the top or bottom of the filler layer. On the other hand, oxygen-containing gas such as air is supplied from the bottom of the filler layer, and organic matter in the water to be treated is biologically decomposed and removed by the action of aerobic microorganisms grown on the filler layer. This is a conventionally known method. In addition,
The filler used may either float or settle in the water to be treated.

く作用〉 例えば、槽内に砂利等の水中で沈降する充填材を充填し
てなる浸漬濾床装置の下部から被処理水及び曝気用の空
気を供給し、槽上部からオーバーフロ一方式で処理水を
取り出す方式の、上昇流式浸漬濾床装置を用いて高濃度
TMAH含有廃水を処理する場合について、以下に詳細
に説明する。
For example, water to be treated and air for aeration are supplied from the bottom of a submerged filter bed device, which is made by filling a tank with filler such as gravel that settles in water, and overflow is performed from the top of the tank. The case of treating high concentration TMAH-containing wastewater using an upflow type submerged filter device of the water extraction type will be described in detail below.

TMAHは前述の如く強アルカリ性物質であるため、例
えば半導体製造工場のプリント基盤剥離工程から排出さ
れる、使用済の高濃度TMAH水溶液(高濃度TMAR
含有廃水、TMAH濃度約20.000〜30,000
■/N)は、pH13位の強アルカリ性を呈する。従っ
て、当該廃水を浸漬濾床装置で処理する場合には、先ず
当該廃水に酸を添加して中和を行う。また、当該廃水中
にはTMAH以外の有機物がほとんど存在しないので、
処理を安定して行うために、肉エキス、ペプトン、グル
コース、コーンスチープリカー等の有機物を、補助栄養
源として当該廃水に添加する。
As mentioned above, TMAH is a strongly alkaline substance, so for example, used high-concentration TMAH aqueous solution (high-concentration TMAR
Containing wastewater, TMAH concentration approximately 20,000 to 30,000
■/N) exhibits strong alkalinity with a pH of 13. Therefore, when the wastewater is treated with a submerged filter apparatus, an acid is first added to the wastewater to neutralize it. In addition, since there are almost no organic substances other than TMAH in the wastewater,
In order to stabilize the treatment, organic substances such as meat extract, peptone, glucose, corn steep liquor are added to the wastewater as supplementary nutritional sources.

但し、その添加量は後述の実施例で示す如く、従来の浮
遊式活性汚泥法による処理の場合よりも少なくてよい。
However, as shown in Examples below, the amount added may be smaller than in the case of treatment by the conventional floating activated sludge method.

なお、従来の浮遊式活性汚泥法では、当該高濃度TMA
R含有廃水を直接処理することが出来ず、前述のように
T M A H濃度が200mg/l以下となるように
希釈して処理していたが、本発明においてはT M A
 H濃度2,000〜30゜000■/lの高濃度のも
のをそのまま処理することが出来るので、上述のように
T M A HtH度が20.000〜30,000■
/l程度の廃水であれば希釈することなく直接処理する
ことが可能である。
In addition, in the conventional floating activated sludge method, the high concentration TMA
R-containing wastewater cannot be treated directly, and as mentioned above, it has been treated by diluting it so that the TMA H concentration is 200 mg/l or less, but in the present invention, TMA
Since it is possible to directly process high-concentration materials with a H concentration of 2,000 to 30°,000/l, as mentioned above, the TMA HtH degree is 20,000 to 30,000/l.
/l of wastewater can be treated directly without dilution.

中和及び補助栄養源の添加を施した高濃度TMAH含有
廃水を、予め順養によってTMAH分解菌をその表面に
着生させた充填材からなる充填材層の下部から供給し、
一方、同じく当該層下部から空気を供給して曝気を行う
。供給した高濃度TMAR含有廃水は、当該充填材層を
通過する間にTMAH分解菌を主体とする好気性微生物
の働きによって酸化分解され、廃水中のTMAHはNH
Highly concentrated TMAH-containing wastewater that has been neutralized and supplemented with a supplementary nutrient source is supplied from the bottom of a filler layer made of a filler on which TMAH-degrading bacteria have grown on the surface through acclimatization,
On the other hand, aeration is also performed by supplying air from the lower part of the layer. The supplied wastewater containing high concentration TMAR is oxidized and decomposed by the action of aerobic microorganisms, mainly TMAH-degrading bacteria, while passing through the packing material layer, and TMAH in the wastewater is converted into NH
.

−Nに、あるいは更に酸化されてNo3−N、N02−
Nに変化する。この際、本発明においては、従来の浮遊
式活性汚泥法の場合と異なり、TMAH分解菌を主体と
した好気性微生物を充填材の表面に固着させるので、T
MAH分解菌の流出がほとんどなく、当該充填材の表面
にTMAH分解菌を高濃度に保持することが出来る。従
って、槽全体としてもTMAH分解菌を、従来の浮遊式
のものに比べて高濃度に保持することが出来、よってT
MAH負荷を従来法の3〜5倍と高くすることが可能と
なる。
-N, or further oxidized to No3-N, N02-
Changes to N. At this time, in the present invention, unlike the conventional floating activated sludge method, aerobic microorganisms mainly consisting of TMAH-degrading bacteria are adhered to the surface of the filler, so T
There is almost no outflow of MAH-degrading bacteria, and TMAH-degrading bacteria can be retained at a high concentration on the surface of the filler. Therefore, the tank as a whole can hold TMAH-degrading bacteria at a higher concentration compared to conventional floating types, and therefore the T
It is possible to increase the MAH load by 3 to 5 times that of the conventional method.

また、本発明者等は、処理に際して槽内水のpHを5.
0〜7.5の範囲、すなわち中性からやや酸性側に調整
すると処理が良好に行われ、槽内水のpHが5.0〜7
.5の範囲を逸脱した場合には処理性能が悪化すること
を見出した。これについては後述の実施例に示す。なお
、槽内水のpH調整は、浸漬濾床装置に供給するTMA
H含有廃水の中和の際に添加する酸の量をコントロール
することによって行うことが出来る。
In addition, the present inventors adjusted the pH of the water in the tank to 5.0 during treatment.
If the pH of the water in the tank is adjusted to the pH range of 0 to 7.5, that is, neutral to slightly acidic, the treatment will be performed well, and the pH of the water in the tank will be 5.0 to 7.
.. It has been found that processing performance deteriorates when the value is outside the range of 5. This will be explained in the examples described later. The pH of the water in the tank is adjusted using TMA supplied to the immersion filter device.
This can be done by controlling the amount of acid added during neutralization of H-containing wastewater.

上述のようにしてTMAHを分解された処理水は、浸漬
濾床装置の上部からオーバーフロ一方式によって槽外へ
排出される。処理水は必要に応じて硝化、脱窒などの後
処理を行い、放流すればよい。
The treated water in which TMAH has been decomposed as described above is discharged from the upper part of the immersion filter device to the outside of the tank by an overflow method. The treated water may be subjected to post-treatments such as nitrification and denitrification as necessary, and then released.

〈効果〉 以上説明した如く、本発明においては槽内に微生物付着
用の充填材を充填してなる浸漬濾床装置を用いて、高濃
度TMAH含有廃水を処理するので、槽内汚泥濃度、特
にTMAH分解菌の濃度を従来の浮遊式活性汚泥法の場
合よりも高く保持することが出来、T M A H負荷
を従来法の3〜5倍に高めることが出来る。従って、装
置容量を従来法の173〜115とコンパクトにするこ
とが出来る。
<Effects> As explained above, in the present invention, high concentration TMAH-containing wastewater is treated using a submerged filter bed device in which the tank is filled with a filler for microbial adhesion, so that the sludge concentration in the tank, especially The concentration of TMAH-degrading bacteria can be maintained higher than in the conventional floating activated sludge method, and the TMAH load can be increased 3 to 5 times as much as in the conventional method. Therefore, the device capacity can be made compact to 173 to 115 of the conventional method.

また、本発明方法によって、従来法では希釈を行わなけ
れば処理困難であった、T M A H濃度2゜000
〜30,000■/lというような高濃度廃水を直接処
理することが出来るので、従来法に比べて希釈水を大幅
に削減することが出来、場合によっては希釈水を全(必
要としないという利点を有する。
In addition, the method of the present invention has a TMA H concentration of 2°000, which was difficult to process without dilution in the conventional method.
Since it is possible to directly treat wastewater with a high concentration of ~30,000 μ/l, the amount of dilution water can be significantly reduced compared to conventional methods, and in some cases, it is possible to completely eliminate the need for dilution water. has advantages.

更に、当該高濃度T M A H含有廃水の処理を、従
来のように高額な費用でもって外部委託することもなく
なり、また、添加する補助栄養源としての有機物の量も
後述の実施例で示す如く、従来法に比べて少なくて済む
ので、経費削減の点でも優れている。
Furthermore, the treatment of the high concentration TMA H-containing wastewater no longer needs to be outsourced at a high cost as in the past, and the amount of organic matter added as a supplementary nutrient source is also shown in the examples below. As compared to the conventional method, it requires less, so it is also superior in terms of cost reduction.

なお、本発明を、前記洗浄廃水等TMAR濃度の低い廃
水に適用した場合にも、優れた効果を発揮することはい
うまでもないことである。
It goes without saying that even when the present invention is applied to wastewater with a low TMAR concentration, such as the above-mentioned cleaning wastewater, excellent effects are exhibited.

〈実施例〉 以下に、本発明の効果をより明確にするために実施例を
説明する。
<Examples> Examples will be described below to further clarify the effects of the present invention.

粒径5〜20m、比重1.2〜1.3のほぼ球形の人工
石を充填材とし、これを内径8I1mのアクリル製カラ
ムに52充填(充填層簡約1m)した浸漬濾床装置を用
いて、半導体製造工場のプリント基盤剥離工程から排出
された高濃度TMAH含有廃水(TMAH濃度21,0
00■/l、pH=12.8)を適当な濃度に希釈した
後、あるいは希釈せず直接処理した結果を第1表に示す
A submerged filter bed device was used in which 52 approximately spherical artificial stones with a particle size of 5 to 20 m and a specific gravity of 1.2 to 1.3 were packed into an acrylic column with an inner diameter of 8I1 m (packed bed approximately 1 m). , high-concentration TMAH-containing wastewater discharged from the printed circuit board stripping process of a semiconductor manufacturing factory (TMAH concentration 21.0
Table 1 shows the results of diluting 00 μl/l, pH=12.8) to an appropriate concentration or directly treating it without diluting it.

なお、処理に際しては中和剤として塩酸を、補助有機栄
養源として肉エキスを添加し、また、リン源としてN 
a z HP O4を必要量添加した。また、TMAH
濃度は、イオンクロマト分析法によって求めた。
During the treatment, hydrochloric acid was added as a neutralizing agent, meat extract was added as a supplementary organic nutritional source, and N was added as a phosphorus source.
The required amount of az HP O4 was added. Also, TMAH
The concentration was determined by ion chromatography.

比較のため、浮遊式活性汚泥装置(曝気部及び沈殿部が
一体となった複合槽、曝気部容量51)を用いて、上記
廃水を適当な濃度に希釈した後に処理した結果を同じく
第1表に示す。
For comparison, the above wastewater was diluted to an appropriate concentration using a floating activated sludge system (composite tank with aeration section and settling section integrated, aeration section capacity: 51), and the results are also shown in Table 1. Shown below.

第1表の比較例−1、比較例−3及び比較例−4に示し
た如く、従来法においてはTMAH負荷を約0.1kg
/ryr・目位とすると良好な処理が行えるが、TMA
H負荷を0.24kg/イ・日まで高めた比較例−2に
おいては、TMAH除去性能が悪化している。また、処
理すべき原水中のTMAH濃度に関しては、TMAH濃
度が1.500■/l以下である比較例−1、比較例−
3、比較例−4では問題なく処理されているが、T M
 A H>74度が2.0OOff1r/j!である比
較例−5においては、TMAH負荷0.09kg/rr
1日という低負荷で、かつ処理水pH(換言すれば槽内
水pH)も適正な範囲内であるにもかかわらず、TMA
H除去性能の悪化が見られる。
As shown in Comparative Example-1, Comparative Example-3, and Comparative Example-4 in Table 1, in the conventional method, the TMAH load was approximately 0.1 kg.
Good processing can be achieved with the /ryr/grain level, but TMA
In Comparative Example 2 in which the H load was increased to 0.24 kg/day, the TMAH removal performance deteriorated. Regarding the TMAH concentration in the raw water to be treated, Comparative Example-1 and Comparative Example-
3. Comparative Example-4 was processed without any problem, but T M
A H>74 degrees is 2.0OOff1r/j! In Comparative Example-5, the TMAH load was 0.09 kg/rr.
Despite the low load of one day and the pH of the treated water (in other words, the pH of the tank water) being within the appropriate range, TMA
Deterioration of H removal performance is observed.

これに対し、本発明の実施例においては、TMAH濃度
500〜21.000 (無希釈の場合)■/lの広い
範囲に渡って、TMAH負荷0.3〜0、4 kg/ 
n?・日という高負荷処理が可能であった。
On the other hand, in the embodiment of the present invention, the TMAH concentration ranged from 500 to 21.000 (undiluted) ■/l, and the TMAH load ranged from 0.3 to 0,4 kg/l.
n?・It was possible to process a high load of 1 day.

(実施例−1、実施例−2、実施例−4、実施例−6及
び実施例−7) また、本発明においては、処理水pHが5.0〜7.5
の範囲内であれば良好な処理が行われているが、処理水
pHがこの範囲を逸脱した実施例−3(処理水pH4,
5)、実施例−5(処理水p H8゜0)及び実施例−
8(処理水p H4,6)においては、いずれもTMA
H除去性能が悪化している。
(Example-1, Example-2, Example-4, Example-6, and Example-7) In addition, in the present invention, the pH of the treated water is 5.0 to 7.5.
If the pH of the treated water is within this range, the treatment is good, but Example 3 where the pH of the treated water deviates from this range (treated water pH 4,
5), Example-5 (treated water pH 8°0) and Example-
8 (treated water pH 4, 6), both TMA
H removal performance has deteriorated.

更に補助有機栄養源としての肉エキスの添加量に関して
も、本発明においては実施例−7に示した如く、原水T
MAH濃度21,000■/1という高濃度の場合にも
肉エキス添加量500■/2で良好な処理が行われるの
に対し、従来法では、例えば比較例−4に示す如く原水
TMAH濃度を1.500■/lに希釈し、希釈後の原
水に対して500■/lの肉エキスを添加しなければな
らず、従って、単位重量のTMAHを処理するのにの添
加量で済むことになる。
Furthermore, regarding the amount of meat extract added as a supplementary organic nutrient source, in the present invention, as shown in Example 7, raw water T
Even when the MAH concentration is as high as 21,000 μ/1, good treatment can be achieved with the addition amount of meat extract of 500 μ/2, whereas in the conventional method, for example, as shown in Comparative Example 4, the raw water TMAH concentration is The meat extract must be diluted to 1.500 μ/l and 500 μ/l of meat extract must be added to the diluted raw water. Therefore, the amount added is sufficient to treat a unit weight of TMAH. Become.

手続補正書(自発) 昭和63年8月15日 特許庁長官  吉 1)文 毅 殿 1、事件の表示 昭和62年特許願第123896号 2、発明の名称 高濃度TMAH含有廃水の処理方法 3、補正をする者 事件との関係 特許出願人 住 所  東京都文京区本郷5丁目5番16号名 称 
 (440)  オルガノ株式会社代表者   前  
1) 容  克 4、代理人〒113 置、812〜5151 5、補正の対象 明細書中の下記事項を訂正願います。
Procedural amendment (voluntary) August 15, 1988 Director General of the Japan Patent Office Yoshi 1) Moon Takeshi 1, Indication of the case 1988 Patent Application No. 123896 2, Name of the invention Method for treating wastewater containing high concentration TMAH 3, Relationship with the case of the person making the amendment Patent applicant address 5-5-16 Hongo, Bunkyo-ku, Tokyo Name
(440) Organo Co., Ltd. Representative
1) Rong Ke 4, Agent Address: 113, 812-5151 5. Please correct the following matters in the specification subject to amendment.

1、第5真下から9行目に「厳しいので」とあるのを「
激しいので」と訂正する。
1. In the 9th line from the bottom of the 5th line, change the phrase ``because it's tough'' to ``
It’s intense,” he corrected.

2、第6真下から8行目に「活性炭等の無機系充填材等
」とあるのを「活性炭等の無機系充填材、あるいは網状
体、ハニカムチューブ等のプラスチック製充填材等」と
訂正する。
2. In the 8th line from the bottom of the 6th line, "Inorganic fillers such as activated carbon" should be corrected to "Inorganic fillers such as activated carbon, or plastic fillers such as nets, honeycomb tubes, etc." .

以上that's all

Claims (1)

【特許請求の範囲】[Claims] テトラメチルアンモニウムハイドロオキサイド(TMA
H)を高濃度に含む廃水を、好気性微生物をその表面に
着生させた充填材を槽内に充填してなる浸漬濾床法生物
学的処理装置を用いて、槽内水のpHを5.0〜7.5
の条件下で生物学的に処理することを特徴とする高濃度
TMAH含有廃水の処理方法。
Tetramethylammonium hydroxide (TMA
Wastewater containing a high concentration of H) is treated by using a submerged filter biological treatment device in which a tank is filled with a filler on which aerobic microorganisms have grown, and the pH of the water in the tank is adjusted. 5.0-7.5
A method for treating wastewater containing high concentration TMAH, characterized by biologically treating it under the following conditions.
JP62123896A 1987-05-22 1987-05-22 Treatment of waste water containing high concentration tmah Pending JPS63291692A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62123896A JPS63291692A (en) 1987-05-22 1987-05-22 Treatment of waste water containing high concentration tmah

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62123896A JPS63291692A (en) 1987-05-22 1987-05-22 Treatment of waste water containing high concentration tmah

Publications (1)

Publication Number Publication Date
JPS63291692A true JPS63291692A (en) 1988-11-29

Family

ID=14872020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62123896A Pending JPS63291692A (en) 1987-05-22 1987-05-22 Treatment of waste water containing high concentration tmah

Country Status (1)

Country Link
JP (1) JPS63291692A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013015128A1 (en) * 2011-07-22 2013-01-31 栗田工業株式会社 Biological treatment method and treatment device for amine-containing waste water

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013015128A1 (en) * 2011-07-22 2013-01-31 栗田工業株式会社 Biological treatment method and treatment device for amine-containing waste water
JP2013022536A (en) * 2011-07-22 2013-02-04 Kurita Water Ind Ltd Biological treatment method for amine-containing wastewater and treatment equipment
CN103648989A (en) * 2011-07-22 2014-03-19 栗田工业株式会社 Biological treatment method and treatment device for amine-containing waste water

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