JPS63291432A - Transfer device - Google Patents

Transfer device

Info

Publication number
JPS63291432A
JPS63291432A JP62127619A JP12761987A JPS63291432A JP S63291432 A JPS63291432 A JP S63291432A JP 62127619 A JP62127619 A JP 62127619A JP 12761987 A JP12761987 A JP 12761987A JP S63291432 A JPS63291432 A JP S63291432A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
transport
transfer
wafer
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62127619A
Other languages
Japanese (ja)
Other versions
JPH0581176B2 (en
Inventor
Fuminori Matsuoka
松岡 史憲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP62127619A priority Critical patent/JPS63291432A/en
Publication of JPS63291432A publication Critical patent/JPS63291432A/en
Publication of JPH0581176B2 publication Critical patent/JPH0581176B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Structure Of Belt Conveyors (AREA)
  • Intermediate Stations On Conveyors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To facilitate changing transfer parts and setting the distance between the transfer parts at a predetermined value by a method wherein the two transfer parts can be positioned by mating means and the distance between the two transfer parts is predetermined in accordance with the size of a semiconductor wafer. CONSTITUTION:A 1st transfer part 10 is fixed to a base 13 and a rubber belt 16 is moved by the rotation of 1st and 2nd pulleys 14 and 15 and a semiconductor wafer can be carried by placing it on the rubber belt 16. Protrusions 17 for positioning are provided on the base 13. The relative position between the transfer part 10 and a main part 12 is determined by mating the protrusions 17 with recesses 18 of the main part 12 which are so formed as to be mated with the protrusions 17. A transfer part 11 has the same construction as the transfer part 10. The transfer part 11 is also fixed to the main part 12 by mating the protrusions 17 with the recesses 18 of the main part 12 so as to select the distance between the transfer parts 10 and 11 corresponding to the size of a wafer carrier housing the semiconductor wafer to be conveyed, i.e., corresponding to the size of the semiconductor wafer.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は半導体ウェハの搬送装置に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a semiconductor wafer transport device.

(従来の技術) 半導体装置を製造する工程において、半導体ウェハを一
時的に貯蔵したり、次の工程に供給したりするに際し、
ウェハキャリアが使用されており、このウェハキャリア
はウェハ寸法の大小に対応して例えば、3インチ用、φ
100mm用、・・・、(fl 200mm用が選定さ
れる。
(Prior Art) In the process of manufacturing semiconductor devices, when semiconductor wafers are temporarily stored or supplied to the next process,
A wafer carrier is used, and this wafer carrier can be adjusted according to the size of the wafer, such as 3 inch, φ
For 100mm, ..., (fl for 200mm is selected.

そして、上記ウェハキャリアを使用して半導体ウェハを
搬送する装置例として第3図に示すように、例えばベル
トコンベアで構成された第1の搬送部1、第2の搬送部
2の間にウェハカセット3をセットし、このウェハカセ
ット3に半導体ウェハ4を収納したり、また半導体ウェ
ハ4を取り出したりするものである。
As shown in FIG. 3 as an example of a device for transporting semiconductor wafers using the above-mentioned wafer carrier, a wafer cassette is placed between a first transport section 1 and a second transport section 2, each of which is composed of a belt conveyor, for example. 3, and the semiconductor wafers 4 are stored in the wafer cassette 3 and the semiconductor wafers 4 are taken out.

ここで、第1の搬送部1の右端と第2の搬送部2の左端
間の間隔5は、ウェハカセット3の構成部分であるセン
ターリブ6のリブ巾7より僅かに広い程度に設定される
Here, the distance 5 between the right end of the first transport section 1 and the left end of the second transport section 2 is set to be slightly wider than the rib width 7 of the center rib 6 which is a component of the wafer cassette 3. .

そして、このセンターリブ6のリブ巾7は、通常ウェハ
キャリア3の大小により異なる寸法に製作されているの
で、上記ウェハキャリア3に対応した専用の、搬送装置
8が選定され、使用されている。
Since the rib width 7 of the center rib 6 is usually manufactured to different dimensions depending on the size of the wafer carrier 3, a dedicated transport device 8 corresponding to the wafer carrier 3 is selected and used.

なお、上述のものと類似の半導体ウェハの搬送装置例と
して、例えば特開昭54−114176号公報にて開示
されたものがある。
An example of a semiconductor wafer conveyance apparatus similar to the one described above is disclosed in, for example, Japanese Patent Laid-Open No. 114176/1983.

(発明が解決しようとする問題点) しかしながら、上述の従来装置では、搬送装置8が特定
ウェハサイズの専用装置であるため、他のサイズの半導
体ウェハには対応できない。
(Problems to be Solved by the Invention) However, in the above-described conventional apparatus, since the transport device 8 is a dedicated device for a specific wafer size, it cannot handle semiconductor wafers of other sizes.

例えば、φ100mm用の搬送装置8にφ200m+a
の半導体ウェハ4を搬送させようとすると、 φ200
mmのウェハキャリア3のセンターリブ巾6が広いので
搬送装置8の所定位置にセットできない。また、φ20
0mm用の搬送装置8にφIQO@IIの半導体ウェハ
4を搬送させようとすると、φ100m+aの半導体ウ
ェハ4の直径に対して間隔5が広すぎて、半導体ウェハ
4が搬送部1から搬送部2に移る際に落下したりする。
For example, in the conveying device 8 for φ100mm, φ200m+a
When trying to transport a semiconductor wafer 4 of φ200
Since the center rib width 6 of the wafer carrier 3 of mm is wide, it cannot be set in a predetermined position on the transfer device 8. Also, φ20
When trying to transport the semiconductor wafer 4 of φIQO@II to the transport device 8 for 0mm, the interval 5 is too wide for the diameter of the semiconductor wafer 4 of φ100m+a, and the semiconductor wafer 4 is transferred from the transport section 1 to the transport section 2. It may fall when moving.

また、特開昭54−114176号公報に開示された装
置では、上述装置の間隔5を可変設定可能にできるが、
機構、制御が複雑となりコスト高となるため工業上利用
が困難である。
Further, in the device disclosed in Japanese Patent Application Laid-Open No. 54-114176, the interval 5 of the above-mentioned device can be variably set.
It is difficult to use industrially because the mechanism and control are complicated and the cost is high.

本発明は上述の事情に対処してなされたもので、操作が
簡単で種々のウェハサイズに対応できるローコストの半
導体ウェハの搬送装置を提供しようとするものである。
The present invention has been made in response to the above-mentioned circumstances, and it is an object of the present invention to provide a low-cost semiconductor wafer transport device that is easy to operate and can handle various wafer sizes.

〔発明の構成〕[Structure of the invention]

(問題点を解決するための手段) すなわち本発明は、所定距離を移送する第1および第2
の搬送部を配置して半導体ウェハを搬送部 するに際し、上記各第1および第2の搬送部を換金手段
により位置決め可能な構造にし、上記半導体ウェハのサ
イズに応じて上記第1と第2の搬送部間の間隔を設定す
る手段を具備してなることを特徴とする。
(Means for solving the problem) That is, the present invention provides first and second
When the semiconductor wafer is transported by arranging the transport parts, each of the first and second transport parts has a structure that can be positioned by a cash exchange means, and the first and second transport parts are arranged according to the size of the semiconductor wafer. The present invention is characterized by comprising means for setting the interval between the conveying sections.

(作 用) 一本発明の搬送装置では、第1.第2の搬送部を簡単に
変更できるので、上記搬送部間の間隔を容易に設定値に
セットできる。
(Function) In the conveying device of the present invention, the first. Since the second conveying section can be easily changed, the interval between the aforementioned conveying sections can be easily set to a set value.

(実施例) 以下、本発明搬送装置の一実施例を図面を参照して説明
する。
(Embodiment) Hereinafter, one embodiment of the conveying device of the present invention will be described with reference to the drawings.

この搬送装置は、第1の搬送部(10)、第2の搬送部
(11)、本体(12)とから構成されている。
This conveyance device includes a first conveyance section (10), a second conveyance section (11), and a main body (12).

上記第1の搬送部(10)は、基台(13)に固定され
ている。上記第1の搬送部(10)は各々回転可能に離
間して第1および第2のプーリー(14) (15)が
上記基台(13)に固定され、上記第1および第2のプ
ーリー(14) (15)には0リング例えばゴムベル
ト(16)が張設されている。
The first transport section (10) is fixed to a base (13). The first conveying section (10) has first and second pulleys (14) (15) fixed to the base (13) rotatably apart from each other, and the first and second pulleys (15) are fixed to the base (13). 14) An O-ring such as a rubber belt (16) is stretched over (15).

従って、上記第1および第2のプーリー(14)(15
)を回転することによりゴムベルト(16)が移動し、
このゴムベルト(16)上に半導体ウェハ(図示せず)
を載置することにより搬送可能となる如く構成されてい
る。
Therefore, the first and second pulleys (14) (15)
), the rubber belt (16) moves,
A semiconductor wafer (not shown) is placed on this rubber belt (16).
It is configured such that it can be transported by placing it thereon.

また、上記基台(13)には位置決め用の突起(17)
政 が設けられており、上記突起(17)が欽合する構造の
本体(12)の凹部(18)にはめこむことにより、搬
送部(10)と本体(12)との相対的位置決めを行う
ことができる。また、搬送部(10)のプーリー(14
)もしくは(15)と本体(1z)に設けられた駆動プ
ーリー(図示せず)をベルト掛は等の手段により連動可
能な構成にすることにより搬送部(10)が駆動される
ように構成されている。
In addition, the base (13) has a positioning protrusion (17).
The conveyor section (10) and the main body (12) are positioned relative to each other by being fitted into the recess (18) of the main body (12) with a structure in which the protrusion (17) is fitted. be able to. In addition, the pulley (14) of the conveyance section (10)
) or (15) and a driving pulley (not shown) provided on the main body (1z) can be configured to be interlocked by means such as a belt hook, so that the conveying section (10) is driven. ing.

なお、搬送部(11)は上述の搬送部(1o)と同一構
成のため、説明は省略する。
Note that the transport section (11) has the same configuration as the above-mentioned transport section (1o), so a description thereof will be omitted.

そして、搬送しようとする半導体ウエノ1(図示せず)
を収納するウェハキャリア(図示せず)のサイズ、つま
り上記半導体ウェハのサイズに対応した搬送部(10)
および(11)間の距離を選択する如く、突起(17)
を本体(1z)の凹部(18)にはめこむことにより本
体(12)にセットする。
Then, the semiconductor wafer 1 (not shown) to be transported
A transport unit (10) corresponding to the size of a wafer carrier (not shown) that stores the semiconductor wafer, that is, the size of the semiconductor wafer.
and (11) such that the distance between the protrusion (17) and (11) is selected.
is set in the main body (12) by fitting it into the recess (18) of the main body (1z).

上記間隔は半導体ウェハの場合、サイズの種類が判って
いるため、ウェハサイズに応じた間隔を予め記憶するこ
とにより1例えばロボット操作により自動的に上記操作
を実行することもできる。
In the case of semiconductor wafers, the type of size of the above-mentioned interval is known, so by storing the interval according to the wafer size in advance, the above-mentioned operation can be automatically executed by, for example, a robot operation.

搬送部(10)(11)の位置が決定したら、必要に応
じてボルト(図示せず)等により固定してもよい。
Once the positions of the transport parts (10) and (11) are determined, they may be fixed with bolts (not shown) or the like, if necessary.

、次に、搬送部(lO)および(11)のプーリー例え
ば(14)、 (20)と、本体(1z)の駆動プーリ
ーにベルト掛けして搬送可能状態に設定し、搬送部(1
0) (11)上にウェハキャリアをセットする。ここ
で、搬送部(10)と(11)の搬送部端間の間隔の決
め方について詳述する。
Next, the pulleys (14) and (20) of the transport unit (lO) and (11), for example, (14) and (20), and the drive pulley of the main body (1z) are hooked with belts to enable transport, and the transport unit (1
0) (11) Set the wafer carrier on top. Here, the method of determining the distance between the ends of the transport sections (10) and (11) will be described in detail.

第2図に示すように、搬送しようとする半導体ウェハ(
21)の半径をA、この半導体ウェハ(21)中心から
オリフラ部分までの最小寸法をBとする。
As shown in Figure 2, the semiconductor wafer (
21) is defined as A, and the minimum dimension from the center of this semiconductor wafer (21) to the orientation flat portion is defined as B.

また、プーリー(Is)、 (19)部分のゴムベルト
(16)、 (22)を含んだ半径をそれぞれC,Dと
し。
Also, let C and D be the radius including the rubber belts (16) and (22) of the pulley (Is) and (19), respectively.

ウェハキャリアのセンターリブ(23)巾をE、上記プ
ーリー(15)、 (19)中心間の距離をFとする。
Let E be the width of the center rib (23) of the wafer carrier, and F be the distance between the centers of the pulleys (15) and (19).

先ず、8寸法がE寸法より短いと半導体ウェハ(21)
が右下りに傾き移送がスムーズに行なわれない可能性が
あるので、F<Bでなければならない。
First, if the 8 dimension is shorter than the E dimension, the semiconductor wafer (21)
Since there is a possibility that the transfer will not be carried out smoothly due to a downward slope to the right, F<B must be satisfied.

また、センターリブ(23)は搬送部(10)と(11
)の間にセットされるので、C+D+E<Fでなければ
ならない。
Moreover, the center rib (23) is connected to the conveying section (10) and (11).
), so it must be C+D+E<F.

従って、C+D+E<F<Bが成り立つように搬送装置
(10)および(11)を構成する。
Therefore, the transport devices (10) and (11) are configured so that C+D+E<F<B holds.

例えば、半導体ウェハ(21)がφ200mmの場合に
、C= D = 10mm、 E =50ma+、 B
 =95.5mmとすれば。
For example, when the semiconductor wafer (21) has a diameter of 200 mm, C=D=10 mm, E=50 ma+, B
=95.5mm.

70< F <95.5となるFの値1例えばF=IS
Ommとなるように搬送部(10)、 (11)を構成
する。ここで、上記φ200m+a用の搬送部(10)
、 (11)構成のものに、例えば半導体ウェハ(21
)がφ100m+aのものを搬送させようとすると、 
φ100mmの場合、 B =46.5no++である
ので、条件FIBを満足できず、このφ100mmの半
導体ウェハ(21)は搬送部(10)から搬送部(11
)へ移送されない6 したがって、半導体ウェハ(21)が φ100mmの
場合には、C= D = 10mm、 E = 20m
m、 B =46.5mmとすると、40< F <4
6.5となるFの値2例えばF=4511II11とな
るように搬送部(10)、 (11)を構成する。
The value of F1 such that 70<F<95.5, for example, F=IS
The conveying sections (10) and (11) are configured so that the distance is 0 mm. Here, the conveyance section (10) for the above φ200m+a
, (11) configuration, for example, a semiconductor wafer (21
) is trying to transport something with a diameter of 100m+a,
In the case of φ100mm, B = 46.5no++, so the condition FIB cannot be satisfied, and this φ100mm semiconductor wafer (21) is transferred from the transfer unit (10) to the transfer unit (11
) 6 Therefore, if the semiconductor wafer (21) has a diameter of 100 mm, C = D = 10 mm, E = 20 m
m, B = 46.5mm, 40<F<4
The conveyance units (10) and (11) are configured so that the value of F2 is 6.5, for example, F=4511II11.

なお、この時φ200II+mの半導体ウェハ(21)
を搬送しようとする場合、移送は可能であるがφ200
mm用のウェハキャリアのセンターリブ巾E=50mm
であるので、ウェハキャリアがセットできないので対応
は不可能である。
In addition, at this time, the semiconductor wafer (21) of φ200II+m
If you are trying to transport a
Center rib width E of wafer carrier for mm = 50mm
Therefore, since the wafer carrier cannot be set, it is impossible to deal with this problem.

したがって、搬送しようとする半導体ウェハ(21)に
対応して凹部(18)の位置を予め設定しておき、この
凹部(18)に嵌合させるように搬送部(1o)(11
)を構成する必要がある。
Therefore, the position of the recess (18) is set in advance in accordance with the semiconductor wafer (21) to be transported, and the transport section (1o) (11) is fitted in the recess (18).
) must be configured.

〔発明の効果〕〔Effect of the invention〕

本発明搬送装置によれば、搬送部を簡単に確実に変更で
きるので、各サイズの半導体ウェハの搬送に対応するこ
とが可能で、しかも搬送装置本体は共通使用できるので
設備のコストダウンを実現することもできる。
According to the transport device of the present invention, the transport section can be changed easily and reliably, so it is possible to handle the transport of semiconductor wafers of various sizes.Furthermore, the main body of the transport device can be used in common, reducing equipment costs. You can also do that.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明搬送装置の一実施例を示す構成図、第2
図は第1図の主要部の説明図、第3図は従来例を示す構
成図である。 10・・・第1の搬送部、 11・・・第2の搬送部、
12・・・本体、    15,19・・・プーリー、
17・・・突起、     18・・・凹部、21・・
・半導体ウェハ、 23・・・センターリブ。 特許出願人 東京エレクトロン株式会社第1図 第2図
Fig. 1 is a configuration diagram showing one embodiment of the conveying device of the present invention;
The figure is an explanatory diagram of the main part of FIG. 1, and FIG. 3 is a configuration diagram showing a conventional example. 10...First conveyance section, 11...Second conveyance section,
12...Main body, 15,19...Pulley,
17... Protrusion, 18... Recess, 21...
- Semiconductor wafer, 23...center rib. Patent applicant Tokyo Electron Ltd. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 所定距離を移送する第1および第2の搬送部を配置して
半導体ウェハを搬送するに際し、上記各第1および第2
の搬送部を嵌合手段により位置決め可能な構造にし、上
記半導体ウェハのサイズに応じて上記第1と第2の搬送
部間の間隔を設定する手段を具備してなることを特徴と
する搬送装置。
When the semiconductor wafer is transported by arranging the first and second transport units that transport the predetermined distance, each of the first and second transport units described above is
A transport device having a structure in which the transport section can be positioned by a fitting means, and comprising means for setting a distance between the first and second transport sections according to the size of the semiconductor wafer. .
JP62127619A 1987-05-25 1987-05-25 Transfer device Granted JPS63291432A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62127619A JPS63291432A (en) 1987-05-25 1987-05-25 Transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62127619A JPS63291432A (en) 1987-05-25 1987-05-25 Transfer device

Publications (2)

Publication Number Publication Date
JPS63291432A true JPS63291432A (en) 1988-11-29
JPH0581176B2 JPH0581176B2 (en) 1993-11-11

Family

ID=14964566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62127619A Granted JPS63291432A (en) 1987-05-25 1987-05-25 Transfer device

Country Status (1)

Country Link
JP (1) JPS63291432A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0581176B2 (en) * 1987-05-25 1993-11-11 Tokyo Electron Ltd
CN102030190A (en) * 2010-11-09 2011-04-27 华映视讯(吴江)有限公司 Glass substrate transmitting device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5777101A (en) * 1980-10-29 1982-05-14 Anelva Corp Conveyor for substrate
JPS611731U (en) * 1984-06-12 1986-01-08 日産自動車株式会社 Fluid-filled vibration isolator
JPS61183614A (en) * 1985-02-08 1986-08-16 Olympus Optical Co Ltd Wafer inspecting microscope device
JPS6293115A (en) * 1985-10-21 1987-04-28 Hitachi Ltd Sample conveyor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291432A (en) * 1987-05-25 1988-11-29 Tokyo Electron Ltd Transfer device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5777101A (en) * 1980-10-29 1982-05-14 Anelva Corp Conveyor for substrate
JPS611731U (en) * 1984-06-12 1986-01-08 日産自動車株式会社 Fluid-filled vibration isolator
JPS61183614A (en) * 1985-02-08 1986-08-16 Olympus Optical Co Ltd Wafer inspecting microscope device
JPS6293115A (en) * 1985-10-21 1987-04-28 Hitachi Ltd Sample conveyor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0581176B2 (en) * 1987-05-25 1993-11-11 Tokyo Electron Ltd
CN102030190A (en) * 2010-11-09 2011-04-27 华映视讯(吴江)有限公司 Glass substrate transmitting device

Also Published As

Publication number Publication date
JPH0581176B2 (en) 1993-11-11

Similar Documents

Publication Publication Date Title
KR100351570B1 (en) Overhead conveying device and overhead conveying vehicle
US20050004701A1 (en) Alignment of semiconductor wafers and other articles
JPH0533529B2 (en)
JPH11288988A (en) Alignment high-speed processing mechanism
JPS6160509A (en) Conveying device
JPS63291432A (en) Transfer device
JPH01251734A (en) Semiconductor manufacturing apparatus
KR20220097144A (en) Transfer apparatus
JP2000103507A (en) Rotating device for coil
JPS6317713A (en) Conveying device
JPS63219134A (en) Wafer handling device of diffusion furnace
JPH01209216A (en) Turning around transport device
JPS60188205A (en) Storage device
TWI714472B (en) Wafer carrier transfer system
JPH04327417A (en) Plate reversing device
JP6924815B2 (en) Transport device
JPH04295704A (en) Apparatus for detecting central position of wafer
JPH04171187A (en) Gripping device for conveying mask or the like
JPS63128637A (en) Device for manufacturing semiconductor device
JPH03225847A (en) Wafer cassette stocker
JPH01247311A (en) Semiconductor manufacturing device
JPH0311100B2 (en)
JP3434014B2 (en) Stacker robot
JPS6212547A (en) Semiconductor substrate conveying mechanism
JPS63250130A (en) Treatment device for semiconductor wafer