JPS63290265A - 電子銃装置 - Google Patents

電子銃装置

Info

Publication number
JPS63290265A
JPS63290265A JP62124548A JP12454887A JPS63290265A JP S63290265 A JPS63290265 A JP S63290265A JP 62124548 A JP62124548 A JP 62124548A JP 12454887 A JP12454887 A JP 12454887A JP S63290265 A JPS63290265 A JP S63290265A
Authority
JP
Japan
Prior art keywords
sample
substrate
thin film
electron
electron gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62124548A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0576539B2 (enExample
Inventor
Kazunori Kato
一則 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP62124548A priority Critical patent/JPS63290265A/ja
Publication of JPS63290265A publication Critical patent/JPS63290265A/ja
Publication of JPH0576539B2 publication Critical patent/JPH0576539B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP62124548A 1987-05-21 1987-05-21 電子銃装置 Granted JPS63290265A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62124548A JPS63290265A (ja) 1987-05-21 1987-05-21 電子銃装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62124548A JPS63290265A (ja) 1987-05-21 1987-05-21 電子銃装置

Publications (2)

Publication Number Publication Date
JPS63290265A true JPS63290265A (ja) 1988-11-28
JPH0576539B2 JPH0576539B2 (enExample) 1993-10-22

Family

ID=14888201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62124548A Granted JPS63290265A (ja) 1987-05-21 1987-05-21 電子銃装置

Country Status (1)

Country Link
JP (1) JPS63290265A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6169963A (ja) * 1984-09-14 1986-04-10 Anelva Corp 蒸着用電子銃装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6169963A (ja) * 1984-09-14 1986-04-10 Anelva Corp 蒸着用電子銃装置

Also Published As

Publication number Publication date
JPH0576539B2 (enExample) 1993-10-22

Similar Documents

Publication Publication Date Title
AU746645B2 (en) Method and apparatus for deposition of biaxially textured coatings
JP3481953B2 (ja) 基板をコーティングするための装置
JPS63290265A (ja) 電子銃装置
CN101563479A (zh) 真空处理装置
JPS57155369A (en) High vacuum ion plating method and apparatus
JP3298180B2 (ja) 薄膜形成装置
JP2674995B2 (ja) 基板処理方法およびその装置
JP3406769B2 (ja) イオンプレーティング装置
US5034590A (en) Electron gun arrangement for use in the electron beam evaporation process
JP3961158B2 (ja) 電子ビーム蒸発装置
JPH05295526A (ja) 蒸着方法および蒸着装置
JPH0762240B2 (ja) 電子ビーム蒸着用電子銃
JP4515158B2 (ja) 電子ビームガンおよびプラズマ装置
JP3464998B2 (ja) イオンプレーティング装置及びイオンプレーティングによる蒸着膜の膜厚と組成分布を制御する方法
JPH11241158A (ja) 電子線を用いた真空蒸着装置
JPH10330935A (ja) スパッタ装置
JPH0575826B2 (enExample)
KR930001231B1 (ko) 다중극 자장억류 원리를 이용한 대용량 이온플레이팅 방법 및 그장치
JP3901365B2 (ja) スパッタ装置
JPH0551948U (ja) 薄膜形成装置
JPH0368764A (ja) 薄膜形成用プラズマ処理装置
JPS6230315A (ja) 電子銃装置
JPH11335837A (ja) 磁気媒体製造装置
JPS621863A (ja) 金属蒸発装置
JPH02133571A (ja) 薄膜形成装置

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees