JPS6328520B2 - - Google Patents

Info

Publication number
JPS6328520B2
JPS6328520B2 JP56209607A JP20960781A JPS6328520B2 JP S6328520 B2 JPS6328520 B2 JP S6328520B2 JP 56209607 A JP56209607 A JP 56209607A JP 20960781 A JP20960781 A JP 20960781A JP S6328520 B2 JPS6328520 B2 JP S6328520B2
Authority
JP
Japan
Prior art keywords
region
layer
semiconductor layer
active layer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56209607A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58114476A (ja
Inventor
Katsuyuki Uko
Kazuo Sakai
Shigeyuki Akiba
Juichi Matsushima
Yukitoshi Kushiro
Yukio Noda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KDDI Corp
Original Assignee
Kokusai Denshin Denwa KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Denshin Denwa KK filed Critical Kokusai Denshin Denwa KK
Priority to JP56209607A priority Critical patent/JPS58114476A/ja
Publication of JPS58114476A publication Critical patent/JPS58114476A/ja
Publication of JPS6328520B2 publication Critical patent/JPS6328520B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/125Distributed Bragg reflector [DBR] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1028Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
    • H01S5/1032Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1053Comprising an active region having a varying composition or cross-section in a specific direction
    • H01S5/1064Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • H01S5/2275Buried mesa structure ; Striped active layer mesa created by etching

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
JP56209607A 1981-12-28 1981-12-28 半導体レ−ザ Granted JPS58114476A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56209607A JPS58114476A (ja) 1981-12-28 1981-12-28 半導体レ−ザ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56209607A JPS58114476A (ja) 1981-12-28 1981-12-28 半導体レ−ザ

Publications (2)

Publication Number Publication Date
JPS58114476A JPS58114476A (ja) 1983-07-07
JPS6328520B2 true JPS6328520B2 (ko) 1988-06-08

Family

ID=16575603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56209607A Granted JPS58114476A (ja) 1981-12-28 1981-12-28 半導体レ−ザ

Country Status (1)

Country Link
JP (1) JPS58114476A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105826812A (zh) * 2015-01-27 2016-08-03 华为技术有限公司 可调激光器和调谐激光器的方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5119460A (en) * 1991-04-25 1992-06-02 At&T Bell Laboratories Erbium-doped planar optical device
FR2684823B1 (fr) * 1991-12-04 1994-01-21 Alcatel Alsthom Cie Gle Electric Composant optique semi-conducteur a mode de sortie elargi et son procede de fabrication.
CN1214499C (zh) * 1994-02-24 2005-08-10 英国电讯有限公司 半导体器件
US5844929A (en) * 1994-02-24 1998-12-01 British Telecommunications Public Limited Company Optical device with composite passive and tapered active waveguide regions
US5574742A (en) * 1994-05-31 1996-11-12 Lucent Technologies Inc. Tapered beam expander waveguide integrated with a diode laser
US6381380B1 (en) * 1998-06-24 2002-04-30 The Trustees Of Princeton University Twin waveguide based design for photonic integrated circuits
KR100958338B1 (ko) * 2007-12-18 2010-05-17 한국전자통신연구원 광 증폭기가 집적된 슈퍼루미네슨트 다이오드 및 이를이용한 외부 공진 레이저

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57183091A (en) * 1981-05-08 1982-11-11 Toshiba Corp Manufacture of optical integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57183091A (en) * 1981-05-08 1982-11-11 Toshiba Corp Manufacture of optical integrated circuit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105826812A (zh) * 2015-01-27 2016-08-03 华为技术有限公司 可调激光器和调谐激光器的方法
CN105826812B (zh) * 2015-01-27 2020-04-21 华为技术有限公司 可调激光器和调谐激光器的方法

Also Published As

Publication number Publication date
JPS58114476A (ja) 1983-07-07

Similar Documents

Publication Publication Date Title
US4665528A (en) Distributed-feedback semiconductor laser device
CA1100216A (en) Mode control of heterojunction injection lasers and method of fabrication
US6198863B1 (en) Optical filters
JPH04243216A (ja) 光導波路の製造方法ならびに光集積素子及びその製造方法
US4622674A (en) Single longitudinal mode semiconductor laser
JPH11220212A (ja) 光素子、光素子の駆動方法及び半導体レーザ素子
US4575851A (en) Double channel planar buried heterostructure laser with periodic structure formed in guide layer
US5319661A (en) Semiconductor double heterostructure laser device with InP current blocking layer
KR100582114B1 (ko) 반도체 디바이스 제작 방법 및 반도체 광 디바이스
US4618959A (en) Double heterostructure semiconductor laser with periodic structure formed in guide layer
JPH04397B2 (ko)
JPS6328520B2 (ko)
JPWO2005074047A1 (ja) 光半導体素子およびその製造方法
JPH0461514B2 (ko)
US4644552A (en) Semiconductor laser
JP2950302B2 (ja) 半導体レーザ
JP4151043B2 (ja) 光半導体装置の製造方法
JP2014090097A (ja) 光半導体装置
JP2907234B2 (ja) 半導体波長可変装置
WO2021148121A1 (en) Dfb laser with angled central waveguide section
JPH0449274B2 (ko)
JPH09307179A (ja) 位相シフト型分布帰還半導体レーザ
EP1309050A1 (en) Laser device and method therefor
JPH07202316A (ja) 選択成長導波型光制御素子
JP2023020996A (ja) 半導体光デバイス