JPS6328203Y2 - - Google Patents

Info

Publication number
JPS6328203Y2
JPS6328203Y2 JP1984028171U JP2817184U JPS6328203Y2 JP S6328203 Y2 JPS6328203 Y2 JP S6328203Y2 JP 1984028171 U JP1984028171 U JP 1984028171U JP 2817184 U JP2817184 U JP 2817184U JP S6328203 Y2 JPS6328203 Y2 JP S6328203Y2
Authority
JP
Japan
Prior art keywords
heat shield
cryopump
vacuum
shield plate
cryopanel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1984028171U
Other languages
English (en)
Japanese (ja)
Other versions
JPS60140758U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984028171U priority Critical patent/JPS60140758U/ja
Publication of JPS60140758U publication Critical patent/JPS60140758U/ja
Application granted granted Critical
Publication of JPS6328203Y2 publication Critical patent/JPS6328203Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP1984028171U 1984-02-27 1984-02-27 真空作業装置 Granted JPS60140758U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984028171U JPS60140758U (ja) 1984-02-27 1984-02-27 真空作業装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984028171U JPS60140758U (ja) 1984-02-27 1984-02-27 真空作業装置

Publications (2)

Publication Number Publication Date
JPS60140758U JPS60140758U (ja) 1985-09-18
JPS6328203Y2 true JPS6328203Y2 (enExample) 1988-07-29

Family

ID=30525807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984028171U Granted JPS60140758U (ja) 1984-02-27 1984-02-27 真空作業装置

Country Status (1)

Country Link
JP (1) JPS60140758U (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1127954A1 (en) * 2000-02-24 2001-08-29 Applied Materials, Inc. Method and apparatus for shielding a device from a semiconductor wafer process chamber

Also Published As

Publication number Publication date
JPS60140758U (ja) 1985-09-18

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