JPS63278234A - Silica glass solution feeder - Google Patents
Silica glass solution feederInfo
- Publication number
- JPS63278234A JPS63278234A JP9216887A JP9216887A JPS63278234A JP S63278234 A JPS63278234 A JP S63278234A JP 9216887 A JP9216887 A JP 9216887A JP 9216887 A JP9216887 A JP 9216887A JP S63278234 A JPS63278234 A JP S63278234A
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- tube
- valve
- silica
- pinching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 55
- 239000007788 liquid Substances 0.000 claims description 35
- 238000007599 discharging Methods 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 12
- 229920001296 polysiloxane Polymers 0.000 abstract description 5
- 230000007547 defect Effects 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 239000004743 Polypropylene Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
Landscapes
- Formation Of Insulating Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、半導体を製造する際に用いるシリカガラス
液吐出装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a silica glass liquid discharging device used in manufacturing semiconductors.
第２図は従来のシリカガラス液吐出装置を示す図であり
、図において、１はエアーオペレートバルブ、２はサッ
クバックバルブ、３はポリプロピレンチューブ、４はシ
リカガラス液、５は薬液加圧口、６はシリカ液塗布用の
カップである。FIG. 2 is a diagram showing a conventional silica glass liquid discharging device. In the figure, 1 is an air operated valve, 2 is a suckback valve, 3 is a polypropylene tube, 4 is a silica glass liquid, 5 is a chemical liquid pressurizing port, 6 is a cup for applying silica liquid.
次に動作について説明する。加圧口５からの加圧により
、シリカ液４はポリプロピレンチューブ３を通って塗布
用カップ６へ送られる。その際、シリカ液４の液流をエ
アーオペレートバルブ１によって制御し、サックバック
バルブ２によって液だれを防止している。Next, the operation will be explained. By applying pressure from the pressurizing port 5, the silica liquid 4 is sent to the application cup 6 through the polypropylene tube 3. At this time, the flow of the silica liquid 4 is controlled by an air operated valve 1, and a suckback valve 2 is used to prevent liquid dripping.
従来のシリカガラス液吐出装置は以上のように構成され
ているので、シリカ液４を入れるビンの口部、エアーオ
ペレートバルブ１．サックバックバルブ２にてエアーだ
まり等が生じ、シリカ液４の同化が発生し、その固化し
た異物がカップ６内で塗布され、欠陥発生を引き起こす
などの問題があった。The conventional silica glass liquid discharging device is constructed as described above, and includes a mouth portion of the bottle containing the silica liquid 4, an air operated valve 1. There were problems such as air pockets etc. occurring in the suckback valve 2, assimilation of the silica liquid 4, and solidified foreign matter being applied within the cup 6, causing defects.
この発明は上記のような問題点を解消するためになされ
たもので、エアーだまりの発生を抑えることができ、低
欠陥のシリカ膜を製造することのできるシリカガラス液
吐出装置を得ることを目的とする。This invention was made to solve the above-mentioned problems, and its purpose is to provide a silica glass liquid discharging device that can suppress the occurrence of air pockets and produce a silica film with low defects. shall be.
この発明に係るシリカガラス液吐出装置は、その内部を
シリカガラス液が流れ該シリカガラス液を吐出するため
の配管を伸縮可能なもので構成し、この配管をピンチバ
ルブにより直接はさんで開閉するようにしたものである
。The silica glass liquid discharging device according to the present invention has a pipe for discharging the silica glass liquid through which the silica glass liquid flows, which is extendable and retractable, and the pipe is opened and closed by directly pinching the pipe with a pinch valve. This is how it was done.
この発明においては、シリカガラス液が流れる伸縮可能
な配管をピンチバルブにより開閉することにより、配管
系のエアーオペレートバルブ等の接続部、非連続部をな
くすことができ、そこでのエアーだまりや異物発生を抑
えることができる。In this invention, by opening and closing the expandable piping through which the silica glass liquid flows using a pinch valve, connections such as air operated valves in the piping system and discontinuous parts can be eliminated, and air pockets and foreign matter can occur there. can be suppressed.
以下、この発明の一実施例を図について説明する。第１
図において、４はシリカガラス液、５はシリカガラス液
４を加圧するための加圧口、６はシリカガラス液４の塗
布用カップ、７はピンチバルブ、８は配管であるシリコ
ンチューブである。An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, 4 is a silica glass liquid, 5 is a pressurizing port for pressurizing the silica glass liquid 4, 6 is a cup for applying the silica glass liquid 4, 7 is a pinch valve, and 8 is a silicon tube which is piping.
本実施例では、加圧口５からのＮ２加圧により加圧され
たシリカ液４は、シリコンチューブ８内を流れて塗布用
カップ６へ送られる。その際、ピンチバルブ７によって
シリコンチューブ８をはさみ込むことにより、シリカ液
４の液流を開閉制御する。これにより、従来のようなエ
アーオペレートバルブは不要となり、また、ピンチバル
ブ７によってシリコンチューブ８をはさむことにより液
だれを防ぐサックバルブ機構も生じるため、専用のサッ
クバンクバルブを取り付ける必要もない。In this embodiment, the silica liquid 4 pressurized by N2 pressure from the pressurizing port 5 flows through the silicon tube 8 and is sent to the coating cup 6. At this time, by pinching the silicone tube 8 with the pinch valve 7, the opening and closing of the liquid flow of the silica liquid 4 is controlled. This eliminates the need for a conventional air operated valve, and also creates a suck valve mechanism that prevents liquid dripping by pinching the silicone tube 8 with the pinch valve 7, so there is no need to install a dedicated suck bank valve.
従って、配管系でのエアーだまりやシリカガラスの固化
、リーク等を防止できる。Therefore, it is possible to prevent air pockets, solidification of silica glass, leakage, etc. in the piping system.
なお、上記実施例では配管にシリコンチューブを用いた
が、これは同様の伸縮性を持つ他のチューブを用いても
よい。In the above embodiment, a silicon tube was used for the piping, but other tubes having similar elasticity may be used.
以上のように、この発明に係るシリカガラス液吐出装置
によれば、その内部にシリカガラス液が流れ該シリカガ
ラス液を吐出するための配管を伸縮可能なもので構成し
、この配管をピンチバルブにより開閉するようにしたの
で、配管系でのエアーだまりやシリカガラスの固化、リ
ーク等を防止でき、低欠陥のシリカ膜を得ることができ
る。As described above, according to the silica glass liquid discharging device according to the present invention, the silica glass liquid flows inside the silica glass liquid discharging device, and the piping for discharging the silica glass liquid is configured to be expandable and retractable, and this piping is connected to the pinch valve. Since the pipe is opened and closed by the opening and closing method, air pockets in the piping system, solidification of silica glass, leakage, etc. can be prevented, and a silica film with low defects can be obtained.
第１図はこの発明の一実施例によるシリカガラス液吐出
装置を示す系統図、第２図は従来のシリカガラス液吐出
装置を示す系統図である。
１はエアーオペレートバルブ、２はサックバックバルブ
、３はポリプロピレンチューブ、４はシリカガラス液、
５は加圧口、６は塗布カップ、７はピンチバルブ、８は
シリコンチューブ。
なお図中同一符号は同−又は相当部分を示す。FIG. 1 is a system diagram showing a silica glass liquid discharging device according to an embodiment of the present invention, and FIG. 2 is a system diagram showing a conventional silica glass liquid discharging device. 1 is an air operated valve, 2 is a suck back valve, 3 is a polypropylene tube, 4 is a silica glass liquid,
5 is a pressure port, 6 is an applicator cup, 7 is a pinch valve, and 8 is a silicone tube. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (2)
おいて、 加圧系によってその内部にシリカガラス液が流され該シ
リカガラス液を吐出するための伸縮可能な配管と、 該配管を直接はさんで開閉するピンチバルブとを備えた
ことを特徴とするシリカガラス液吐出装置。(1) In a silica glass liquid dispensing device used in the manufacture of semiconductors, a silica glass liquid is flowed into the inside of the device by a pressurizing system, and an expandable pipe for discharging the silica glass liquid is directly sandwiched between the pipe. A silica glass liquid discharging device characterized by comprising a pinch valve that opens and closes.
とを特徴とする特許請求の範囲第１項記載のシリカガラ
ス液吐出装置。(2) The silica glass liquid discharging device according to claim 1, wherein the expandable/contractable pipe is a silicon tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9216887A JPS63278234A (en) | 1987-04-15 | 1987-04-15 | Silica glass solution feeder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9216887A JPS63278234A (en) | 1987-04-15 | 1987-04-15 | Silica glass solution feeder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63278234A true JPS63278234A (en) | 1988-11-15 |
Family
ID=14046902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9216887A Pending JPS63278234A (en) | 1987-04-15 | 1987-04-15 | Silica glass solution feeder |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63278234A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006272335A (en) * | 2006-07-10 | 2006-10-12 | Fujitsu Ltd | Dispenser |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51132972A (en) * | 1975-04-28 | 1976-11-18 | Ibm | Method of etching |
| JPS61228876A (en) * | 1985-04-01 | 1986-10-13 | 呉羽化学工業株式会社 | Subcataneous stay catheter |
| JPS61278148A (en) * | 1985-06-01 | 1986-12-09 | Nippon Gakki Seizo Kk | Forming method for glass coating |
-
1987
- 1987-04-15 JP JP9216887A patent/JPS63278234A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51132972A (en) * | 1975-04-28 | 1976-11-18 | Ibm | Method of etching |
| JPS61228876A (en) * | 1985-04-01 | 1986-10-13 | 呉羽化学工業株式会社 | Subcataneous stay catheter |
| JPS61278148A (en) * | 1985-06-01 | 1986-12-09 | Nippon Gakki Seizo Kk | Forming method for glass coating |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006272335A (en) * | 2006-07-10 | 2006-10-12 | Fujitsu Ltd | Dispenser |
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