JPS63277592A - Production unit for single crystal - Google Patents
Production unit for single crystalInfo
- Publication number
- JPS63277592A JPS63277592A JP10977587A JP10977587A JPS63277592A JP S63277592 A JPS63277592 A JP S63277592A JP 10977587 A JP10977587 A JP 10977587A JP 10977587 A JP10977587 A JP 10977587A JP S63277592 A JPS63277592 A JP S63277592A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- single crystal
- jig
- liquid
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000007788 liquid Substances 0.000 claims abstract description 19
- 239000000565 sealant Substances 0.000 claims abstract description 10
- 239000000155 melt Substances 0.000 claims abstract description 4
- 238000012544 monitoring process Methods 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 7
- 238000002425 crystallisation Methods 0.000 abstract 1
- 230000008025 crystallization Effects 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- ZEMPKEQAKRGZGQ-AAKVHIHISA-N 2,3-bis[[(z)-12-hydroxyoctadec-9-enoyl]oxy]propyl (z)-12-hydroxyoctadec-9-enoate Chemical compound CCCCCCC(O)C\C=C/CCCCCCCC(=O)OCC(OC(=O)CCCCCCC\C=C/CC(O)CCCCCC)COC(=O)CCCCCCC\C=C/CC(O)CCCCCC ZEMPKEQAKRGZGQ-AAKVHIHISA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910008403 Li-V Inorganic materials 0.000 description 1
- 229910007058 Li—V Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はGaAs 、 InP等の厘−v族化合物半導
体及びZn5e、 Cd’l’e等の1−Vl族化合物
半導体を液体封止チョクラルスキー法により製造する装
置に関する。Detailed Description of the Invention [Industrial Field of Application] The present invention is a liquid-sealed liquid-encapsulation method for manufacturing Li-V group compound semiconductors such as GaAs and InP and 1-Vl group compound semiconductors such as Zn5e and Cd'l'e. This invention relates to a device manufactured by the ski method.
従来の液体封止チョクラルスキー法によル単結晶製造装
置を第5図に示す。FIG. 5 shows an apparatus for producing single crystals using the conventional liquid-sealed Czochralski method.
図中、下軸6に支持された〃ツボ5には原料融液1及び
液体封止剤2が収容されておシ、ルツボ3の周囲に配設
したヒータ9によりルツボ内収容物は加熱溶融される。In the figure, a raw material melt 1 and a liquid sealant 2 are stored in a crucible 5 supported by a lower shaft 6, and the contents in the crucible are heated and melted by a heater 9 disposed around the crucible 3. be done.
一方、種結晶4を下端に取〕付けた上軸5を下降し、種
結晶4を原料融液1に十分接触させた後、徐々に単結晶
7を引上げる。なお10は断熱材である。On the other hand, the upper shaft 5 with the seed crystal 4 attached to its lower end is lowered to bring the seed crystal 4 into sufficient contact with the raw material melt 1, and then the single crystal 7 is gradually pulled up. Note that 10 is a heat insulating material.
この単結晶育成状態をモニターする手段として、ルツボ
の上方より観察する窓13を設けたものと、ルツボ側面
よりX線11を照射して透過像を検知する検出器12を
設けたものとがある。後者は、結晶の固液界面8の様子
を直接観察することができ、有力であった。As means for monitoring this single crystal growth state, there are two methods: one is equipped with a window 13 for observing the crucible from above, and the other is equipped with a detector 12 that irradiates X-rays 11 from the side of the crucible and detects the transmitted image. . The latter method was effective because it allowed the state of the solid-liquid interface 8 of the crystal to be directly observed.
しかし、X線検出器を設けた従来装置では、X線が液体
封止剤2を透過する間に減衰するために、検出器12に
致達するX線量は微弱となシ、透過像を鮮明に見ること
ができず、固液界面の状態を正確にモニターすることが
困難であった。However, in conventional devices equipped with an X-ray detector, the X-rays are attenuated while passing through the liquid sealant 2, so the amount of X-rays reaching the detector 12 is weak and the transmitted image cannot be clearly seen. It was difficult to accurately monitor the state of the solid-liquid interface.
本発明は、上記欠点を解消し、液体封止剤によるX線の
減衰をできるだけ小さくシ、透過像を鮮明にして固液界
面を正確にモニターしながら単結晶の製造を可能とした
製造装置を提供しようとするものである。The present invention eliminates the above-mentioned drawbacks, and provides a manufacturing apparatus that makes it possible to manufacture a single crystal while minimizing the attenuation of X-rays by the liquid sealant, making the transmission image clear, and accurately monitoring the solid-liquid interface. This is what we are trying to provide.
本発明は、原料融液と液体封止剤を収容するルツボと、
種結晶を下端に取り付け昇降可能な上軸と、ルツボの周
囲に配設したヒータと、ルツボの側面に設けた結晶O固
液界面の形状モニター用のX線検出装置とを有する単結
晶の製造装置において、比較的肉厚の薄い材料で構成し
た環状治具であって、ルツボ内融液に浮かせるときに、
該治具の内側底部が原料融液面より下方に位置するよう
に調節された治具を用す、該治具の中央の原料融液面よ
り単結晶を引上げるようにしたことを特徴とする単結晶
の製造装置である。The present invention includes a crucible containing a raw material melt and a liquid sealant;
Production of a single crystal that has a seed crystal attached to the lower end and an upper shaft that can be raised and lowered, a heater placed around the crucible, and an X-ray detection device installed on the side of the crucible to monitor the shape of the crystal O solid-liquid interface. In the device, it is an annular jig made of a relatively thin material, and when it is floated on the melt inside the crucible,
The single crystal is pulled up from the raw material melt surface in the center of the jig, using a jig adjusted such that the inner bottom of the jig is located below the raw material melt surface. This is a single crystal manufacturing device.
なお、環状治具はBN、 PBN、カーボン、Al40
s *Zr01. ”O*んα、 SiC等のセラミッ
クスで作ることができ、断面形状は環状治具が原料融液
に浮くものであれば形状は問わないが、例えばU字状又
は0字状とすることもできる。また、X線の減衰を小さ
くするために、治具を材質の許す限υ薄い板材で構成す
ることが望まれる。Note that the annular jig is made of BN, PBN, carbon, Al40.
s *Zr01. It can be made from ceramics such as ``O*nα, SiC, etc., and the cross-sectional shape does not matter as long as the annular jig floats in the raw material melt, but for example, it can be U-shaped or 0-shaped. In addition, in order to reduce the attenuation of X-rays, it is desirable that the jig be made of a plate as thin as the material allows.
第1図は本発明の1つの具体例である単結晶O製造装置
の断面図である。第5図の従来装置に、本発明の特徴と
なる環状治具を適用したものである。第1図において、
第3図と同じ部材に対しては同じ番号を付したので、説
明は省略する。環状治具14は第2図に見みように断面
U字状のものであり、重量を調節することKより、環状
治具の内側底部15を固液界面8より下方に位置するよ
うにした。FIG. 1 is a sectional view of a single-crystal O manufacturing apparatus which is one specific example of the present invention. The annular jig, which is a feature of the present invention, is applied to the conventional device shown in FIG. 5. In Figure 1,
The same members as in FIG. 3 have been given the same numbers, so their explanations will be omitted. The annular jig 14 has a U-shaped cross section as shown in FIG. 2, and by adjusting the weight, the inner bottom 15 of the annular jig is positioned below the solid-liquid interface 8.
上記の関係におくことにより、ルツボ5の側面より照射
するX線11は液体封止剤2を透過する代シにその大半
は環状治具14の空洞部を透過することになり、液体封
止剤2によるX線の減衰を回避することができた。その
結果、固液界面付近の結晶状態を鮮明なコントラストで
モニターすることができ、従来装置に比べて単結晶の育
成、制御が極めて容易となった。By establishing the above relationship, most of the X-rays 11 irradiated from the side surface of the crucible 5 pass through the liquid sealant 2, but instead pass through the hollow part of the annular jig 14, and the liquid sealant Attenuation of X-rays due to Agent 2 could be avoided. As a result, the crystal state near the solid-liquid interface can be monitored with clear contrast, making it extremely easy to grow and control single crystals compared to conventional equipment.
第1図の装置を用いてGaAs5単結晶を製造した。 A GaAs5 single crystal was manufactured using the apparatus shown in FIG.
4インチ径の石英ルツボにHB法で得九〇aAs多結晶
体を投入し、B10mを200f入れた。A 90a As polycrystal obtained by the HB method was placed in a quartz crucible with a diameter of 4 inches, and 200f of B10m was placed therein.
環状治具は肉厚2■のPBN板材を用い外壁O半径を9
51、内壁の半径を40m、高さを50mとした。この
環状治具をルツボに浮かべると、その底面が原料融液表
面よυ上になるので、カーボン製の重k)2oatを環
状治具に載せた。The annular jig is made of PBN plate material with a wall thickness of 2cm, and the outer wall O radius is 9cm.
51, the radius of the inner wall was 40 m and the height was 50 m. When this annular jig was floated on the crucible, its bottom surface would be above the surface of the raw material melt, so a carbon weight k)2oat was placed on the annular jig.
X線は80KV、2mAのタングステンターゲットを用
いた。A tungsten target of 80 KV and 2 mA was used for the X-rays.
環状治具を用いずに、上記X線を照射するときには)0
.にほとんど吸収され、結晶の固液界面付近の透過像を
実質的に観察することができなかった。When irradiating the above X-rays without using a ring jig) 0
.. It was almost impossible to observe the transmission image near the solid-liquid interface of the crystal.
一方、上記環状治具を用いたときには固液界面のGaA
s結晶形状を鮮明なコントラストでモニターすることが
でき、再現性のよい単結晶の製造を可能とした。On the other hand, when the above-mentioned annular jig is used, GaA at the solid-liquid interface
The shape of the s-crystal can be monitored with clear contrast, making it possible to manufacture single crystals with good reproducibility.
〔発明の効果〕
本発明は、上記構成管採用することにより、X@O減衰
を@避し、コントラストの良い透過像を検知するととが
でき、固液界面の状況を正確に把握しながら、最適な結
晶育成条件の選択を可能とし、良質の単結晶を製造する
ことができるようになった。[Effects of the Invention] By employing the above-mentioned component tube, the present invention can avoid X@O attenuation and detect a transmitted image with good contrast, while accurately grasping the situation at the solid-liquid interface. This makes it possible to select the optimal crystal growth conditions and produce high-quality single crystals.
表口面の簡単な説明
第1図は本発明の1つの具体例である単結晶の製造装置
の断面図であり、第2図は第1図の装置で使用する環状
治具の拡大斜視図、第3図は従来の単結晶の製造装置の
断面図である。Brief description of the front surface FIG. 1 is a cross-sectional view of a single crystal manufacturing apparatus that is a specific example of the present invention, and FIG. 2 is an enlarged perspective view of an annular jig used in the apparatus shown in FIG. 1. , FIG. 3 is a sectional view of a conventional single crystal manufacturing apparatus.
Claims (3)
晶を下端に取り付け昇降可能な上軸と、ルツボの周囲に
配設したヒータと、ルツボの側面に設けた結晶の固液界
面の形状モニター用のX線検出装置とを有する単結晶の
製造装置において、比較的肉厚の薄い材料で構成した環
状治具であつて、ルツボ内融液に浮かせるときに、該治
具の内側底部が原料融液面より下方に位置するように調
節された治具を用い、該治具の中央の原料融液面より単
結晶を引上げるようにしたことを特徴とする単結晶の製
造装置。(1) A crucible that accommodates the raw material melt and liquid sealant, an upper shaft with a seed crystal attached to its lower end that can be raised and lowered, a heater placed around the crucible, and a solid-liquid crystal placed on the side of the crucible. In a single crystal manufacturing apparatus equipped with an X-ray detection device for monitoring the shape of the interface, the jig is an annular jig made of a relatively thin material, and when the jig is floated on the melt in the crucible, Production of a single crystal, characterized in that the single crystal is pulled up from the raw material melt surface in the center of the jig using a jig whose inner bottom is adjusted to be located below the raw material melt surface. Device.
_3、ZrO_2、MgO、AlN、SiC等のセラミ
ックスで構成することを特徴とする特許請求の範囲第1
項記載の単結晶の製造装置。(2) Annular jig made of BN, PBN, carbon, Al_2O
_3, ZrO_2, MgO, AlN, SiC, or other ceramics.
The apparatus for producing a single crystal as described in 1.
とを特徴とする特許請求の範囲第1項又は第2項記載の
単結晶の製造装置。(3) The single crystal manufacturing apparatus according to claim 1 or 2, wherein the annular jig has a U-shaped or O-shaped cross section.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10977587A JPS63277592A (en) | 1987-05-07 | 1987-05-07 | Production unit for single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10977587A JPS63277592A (en) | 1987-05-07 | 1987-05-07 | Production unit for single crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63277592A true JPS63277592A (en) | 1988-11-15 |
Family
ID=14518911
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10977587A Pending JPS63277592A (en) | 1987-05-07 | 1987-05-07 | Production unit for single crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63277592A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7959732B1 (en) * | 2005-06-17 | 2011-06-14 | Saint-Gobain Ceramics & Plastics, Inc. | Apparatus and method for monitoring and controlling crystal growth |
-
1987
- 1987-05-07 JP JP10977587A patent/JPS63277592A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7959732B1 (en) * | 2005-06-17 | 2011-06-14 | Saint-Gobain Ceramics & Plastics, Inc. | Apparatus and method for monitoring and controlling crystal growth |
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