JPS6327056B2 - - Google Patents
Info
- Publication number
- JPS6327056B2 JPS6327056B2 JP15555483A JP15555483A JPS6327056B2 JP S6327056 B2 JPS6327056 B2 JP S6327056B2 JP 15555483 A JP15555483 A JP 15555483A JP 15555483 A JP15555483 A JP 15555483A JP S6327056 B2 JPS6327056 B2 JP S6327056B2
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- chlorosilane
- sih
- disproportionation
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003054 catalyst Substances 0.000 claims description 32
- 238000007323 disproportionation reaction Methods 0.000 claims description 24
- 239000005046 Chlorosilane Substances 0.000 claims description 21
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 21
- 150000003512 tertiary amines Chemical class 0.000 claims description 13
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 11
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 7
- 239000005052 trichlorosilane Substances 0.000 description 7
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000007517 lewis acids Chemical class 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- -1 silicon hydride compounds Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- JDEUUKYNTHHAQH-UHFFFAOYSA-N 2,2-dimethylbutanamide Chemical compound CCC(C)(C)C(N)=O JDEUUKYNTHHAQH-UHFFFAOYSA-N 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- IPSDYDNAPDFVQB-UHFFFAOYSA-N N-butyl-N-octyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(CCCC)CCCCCCCC IPSDYDNAPDFVQB-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NHLUVTZJQOJKCC-UHFFFAOYSA-N n,n-dimethylhexadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCN(C)C NHLUVTZJQOJKCC-UHFFFAOYSA-N 0.000 description 1
- OUFURFNVXWPZKP-UHFFFAOYSA-N n-butyl-3-methyl-n-(3-methylbutyl)butan-1-amine Chemical compound CCCCN(CCC(C)C)CCC(C)C OUFURFNVXWPZKP-UHFFFAOYSA-N 0.000 description 1
- AAYBEEVEVAWXAI-UHFFFAOYSA-N n-butyl-n-dodecyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(CCCC)CCCCCCCCCCCC AAYBEEVEVAWXAI-UHFFFAOYSA-N 0.000 description 1
- BIQZXMMUGUJHNJ-UHFFFAOYSA-N n-butyl-n-hexylhexan-1-amine Chemical compound CCCCCCN(CCCC)CCCCCC BIQZXMMUGUJHNJ-UHFFFAOYSA-N 0.000 description 1
- VORBAKHNTVKJNK-UHFFFAOYSA-N n-butyl-n-hexyloctan-1-amine Chemical compound CCCCCCCCN(CCCC)CCCCCC VORBAKHNTVKJNK-UHFFFAOYSA-N 0.000 description 1
- RCIGOSUMVYRJEC-UHFFFAOYSA-N n-butyl-n-octyloctan-1-amine Chemical compound CCCCCCCCN(CCCC)CCCCCCCC RCIGOSUMVYRJEC-UHFFFAOYSA-N 0.000 description 1
- JTRJYFZORBIJMZ-UHFFFAOYSA-N n-hexyl-n-octyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCC)CCCCCCCC JTRJYFZORBIJMZ-UHFFFAOYSA-N 0.000 description 1
- BERZUQRTWMYWKV-UHFFFAOYSA-N n-tert-butyl-n-octyloctan-1-amine Chemical compound CCCCCCCCN(C(C)(C)C)CCCCCCCC BERZUQRTWMYWKV-UHFFFAOYSA-N 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012970 tertiary amine catalyst Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Catalysts (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15555483A JPS6048144A (ja) | 1983-08-25 | 1983-08-25 | クロルシラン不均化触媒 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15555483A JPS6048144A (ja) | 1983-08-25 | 1983-08-25 | クロルシラン不均化触媒 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6048144A JPS6048144A (ja) | 1985-03-15 |
| JPS6327056B2 true JPS6327056B2 (de) | 1988-06-01 |
Family
ID=15608596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15555483A Granted JPS6048144A (ja) | 1983-08-25 | 1983-08-25 | クロルシラン不均化触媒 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6048144A (de) |
-
1983
- 1983-08-25 JP JP15555483A patent/JPS6048144A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6048144A (ja) | 1985-03-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4276424A (en) | Methods for the production of organic polysilanes | |
| JPS5988492A (ja) | モノマ−またはオリゴマ−のアルコキシシランの連続的製造方法 | |
| CN110799458B (zh) | 用于制备锗-硅-层的三苯基甲锗烷基甲硅烷和三氯甲硅烷基-三氯甲锗烷及其制备方法 | |
| US4610858A (en) | Chlorosilane disproportionation catalyst and method for producing a silane compound by means of the catalyst | |
| JPS6052760B2 (ja) | ＳｉＯＣ基を有するシラン又はＳｉＯＣ基を有するポリシロキサンの連続的製造方法 | |
| US4542005A (en) | Process for preparing silicon hydrides | |
| US5177236A (en) | Process for the preparation of 3-chloropropyl-silanes | |
| US20190337968A1 (en) | Method for producing halosilane compounds | |
| CN1027508C (zh) | 直接法合成烷氧基硅烷 | |
| US4958040A (en) | Process for the preparation of diorganohalogenosilanes | |
| CN109384233B (zh) | 一种用于处理硅聚合物的方法 | |
| JPS6327056B2 (de) | ||
| JPS6333423B2 (de) | ||
| JPS6333422B2 (de) | ||
| JPH0471008B2 (de) | ||
| Gilbert et al. | Alkylchlorosilanes. Reduction of Alkylchlorosilenes by Sodium Hydride and Hydrogen-Chlorine Interchange in Chlorosilanes | |
| JPS6327055B2 (de) | ||
| US4810482A (en) | Process for producing silanes | |
| US4447631A (en) | Redistribution of tetramethylsilane/dimethyldichlorosilane into trimethylchlorosilane | |
| JPH052379B2 (de) | ||
| JPH0472764B2 (de) | ||
| CN118852233A (zh) | 二甲基乙烯基氯硅烷及其制备方法 | |
| EP0213215B2 (de) | Katalysator zur Disproportionierung von Chlorosilanen und Verfahren zur Herstellung von Silanverbindungen mittels des Katalysators | |
| JP2584775B2 (ja) | トリアルコキシシランの分離精製法 | |
| CN118834230A (zh) | 四甲基二乙烯基二硅氮烷及其制备方法 |