JPS63267419A - Silent discharge generating device and gas treatment - Google Patents
Silent discharge generating device and gas treatmentInfo
- Publication number
- JPS63267419A JPS63267419A JP62101067A JP10106787A JPS63267419A JP S63267419 A JPS63267419 A JP S63267419A JP 62101067 A JP62101067 A JP 62101067A JP 10106787 A JP10106787 A JP 10106787A JP S63267419 A JPS63267419 A JP S63267419A
- Authority
- JP
- Japan
- Prior art keywords
- silent discharge
- air
- gas
- electric field
- globular particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003989 dielectric material Substances 0.000 claims abstract description 9
- 239000011148 porous material Substances 0.000 claims description 10
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 230000005684 electric field Effects 0.000 abstract description 12
- 239000002245 particle Substances 0.000 abstract description 5
- 239000004020 conductor Substances 0.000 abstract description 4
- 238000011144 upstream manufacturing Methods 0.000 abstract description 4
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 abstract description 3
- 229910002113 barium titanate Inorganic materials 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 18
- 239000012798 spherical particle Substances 0.000 description 12
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 10
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 4
- 239000000443 aerosol Substances 0.000 description 3
- XKMRRTOUMJRJIA-UHFFFAOYSA-N ammonia nh3 Chemical compound N.N XKMRRTOUMJRJIA-UHFFFAOYSA-N 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、無声放電の発生スペースに空気等のガスを通
して一定のガス成分に所期の化学変化を起こさＵるだめ
のガス処理用の無声放電発生装置に１ｙＩする。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is a silent electric discharge generator for gas processing in a gas discharge chamber, which causes a desired chemical change in certain gas components by passing a gas such as air into a space where a silent discharge is generated. Apply 1yI to the discharge generator.
（従来の技術）
従来のこのような無声放電発生装置として、例えば第５
図に示すように、交流ＩＪ：ｔ１に接続された対の電極
２問に板ガラス等の絶縁体３をほぼ接Ｊる状態で挟んノ
ごものがある。この装置では、絶縁体３の介在により対
の電極２間にアーク放電を発生し青る空隙が存在しない
ため、所定の交流電圧を印加したとき電極２と絶縁体３
間で無声ｔｉｌ電が発生するようになっており、これに
よって例えば空気中にオゾン０３を生成するために利用
されている。(Prior art) As such a conventional silent discharge generator, for example, the fifth
As shown in the figure, an insulator 3 such as a plate glass is sandwiched between two electrodes of a pair connected to AC IJ:t1 in a state where they are almost in contact with each other. In this device, arc discharge occurs between the pair of electrodes 2 due to the presence of the insulator 3, and there is no blue gap, so when a predetermined AC voltage is applied, the electrode 2 and the insulator 3
Silent electricity is generated between the two, and is used to generate ozone 03 in the air, for example.
（発明が解決しようとする問題点）
しかし、上記の従来技術では無声放電発生スペースが極
めて狭いものとなるため、そのスペースに多量のガスを
通過さけることができず、ガス処理能力が低いという問
題があった。(Problems to be Solved by the Invention) However, in the above-mentioned conventional technology, the silent discharge generation space is extremely narrow, so a large amount of gas cannot pass through that space, resulting in a low gas processing capacity. was there.
そこで本発明は、対の電極間に、ガスが通過可能で、か
つ安定な無声放電が発生しているスベ゛−スを大きく設
定し得るようにすることを、その解決すべき技術的課題
とする。Therefore, the technical problem to be solved by the present invention is to make it possible to set a large space between a pair of electrodes in which gas can pass and stable silent discharge is generated. do.
（問題点を解決するための手段）
上記課題を解決Ｊ”るための技術的手段は、所定範囲の
比誘電率を示す誘電体から成る通気可能な小孔隙を多数
形成したガス透過用の構造体を構成し、この構造体の両
側には、前記誘導体の比誘電率と外部から前記誘電体に
印加される無声放電用電圧との二つの要因で定義された
無声放電安定領域において無声放電を発生さＶるための
放電用の交流電圧あるいはパルス電圧が印加される対の
電極をそれぞれ同＃４３！ｉ体にほぼ接するように設け
たことである。(Means for Solving the Problems) The technical means for solving the above problems is to create a structure for gas permeation in which a large number of small air-permeable pores made of a dielectric material exhibiting a relative dielectric constant within a predetermined range are formed. A silent discharge is formed on both sides of the structure in a silent discharge stable region defined by two factors: the dielectric constant of the dielectric and the silent discharge voltage applied to the dielectric from the outside. A pair of electrodes to which an AC voltage or a pulse voltage for discharge to generate V is applied are provided so as to be substantially in contact with the #43!i body.
（作 用）
対の電極間に設けたガス透過用の構造体が通気可能な多
数の小孔隙を有するので、十分な間のガスを通過させ得
る。(Function) Since the gas permeation structure provided between the pair of electrodes has a large number of small air-permeable pores, a sufficient amount of gas can pass through the structure.
構造体は比誘電率の高い誘電体から成るので、所定の交
流電圧あるいはパルス電圧を印加すると、それぞれの小
孔隙において安定な無塵放電が発生する。Since the structure is made of a dielectric material with a high relative permittivity, when a predetermined alternating voltage or pulse voltage is applied, a stable dust-free discharge is generated in each small pore gap.
（実施例）
次に本発明の第１実施例を第１図〜第３図に基づいて説
明する。(Example) Next, a first example of the present invention will be described based on FIGS. 1 to 3.
無声放電発生装置４は有害む一酸化窒素ＮＯを含む空気
を処理するためのものである。The silent discharge generator 4 is for treating air containing harmful nitrogen monoxide NO.
鉤状の装置ケース５は絶縁性のＩｎ（例えば、適当な種
類の合成樹脂材料）から成り、図示省略の適当な送風手
段によって上流側６から下流側７へ空気が流通されるに
うになっている。The hook-shaped device case 5 is made of insulating In (for example, an appropriate type of synthetic resin material), and is configured to allow air to flow from the upstream side 6 to the downstream side 7 by an appropriate blowing means (not shown). There is.
装置を−ス５の内部において、上流側には導体材料によ
り所定のメツシュの網状に形成された接地電極８が、ま
た下流側には導体４４ＦＩにより同じメツシュの網状に
形成された電界印加電極９が、それぞれ装置ケース５の
内周部全体を横１１１１ｉするように設けられている。Inside the device space 5, on the upstream side there is a grounding electrode 8 formed in the form of a predetermined mesh of a conductor material, and on the downstream side there is an electric field applying electrode 9 formed in the form of the same mesh of a conductor 44FI. are provided so as to extend horizontally 1111i across the entire inner peripheral portion of the device case 5.
次に、接地電極８と電界印加電極９との間にはガス透過
用の構造体１０が構成されている。構造体１０は、比誘
電率εＳが５０程麿、あるいはそれ以上である適当な種
類の誘電体材料（例えば、比誘電率εＳが約１５００で
あるチタン酸バリウム、又はこれを主成分とする組成物
）から成る多数の球状粒子１１を両電極８．９間に充填
することにより構成されている。球状粒子１１は網状の
電極８，９を通過しない径を有している。Next, a structure 10 for gas permeation is constructed between the ground electrode 8 and the electric field application electrode 9. The structure 10 is made of a suitable type of dielectric material having a dielectric constant εS of about 50 or more (for example, barium titanate having a dielectric constant εS of about 1500, or a composition mainly composed of barium titanate). It is constructed by filling a space between both electrodes 8 and 9 with a large number of spherical particles 11 made of a material. The spherical particles 11 have a diameter that does not allow them to pass through the mesh electrodes 8 and 9.
なお、前記の接地電極８は導Ｉ！１２を介して接地され
ており、また電界印加電極９はＩＩ！１ｌ１３を介して
交流電源１４に接続されている。Note that the ground electrode 8 is a conductor I! 12, and the electric field applying electrode 9 is connected to II! It is connected to the AC power supply 14 via 1l13.
また、装置ケース５の入口側６にはアンモニアＮＨ３を
定量的に供給し得る装ｆｆ１（図示省略）が設Ｇ′Ｊら
れている。Further, on the inlet side 6 of the device case 5, a device G'J is provided which can quantitatively supply ammonia NH3 (not shown).
本実施例は以上のように構成されたものであり、次のよ
うに使用される。This embodiment is constructed as described above and is used as follows.
まず電界印加電極９に電源１４から交流電圧を加えると
、電界印加電極９と接地電極８との間における誘電体の
球状粒子１１全体に外部電界が印加される。すると、個
々の球状粒子１１が分極を起こし、その表面に正゛極性
、及び負極性の電荷が現われる。その電荷により、隣り
合う球状粒子１１間の僅かな孔隙に電界が集中し、第２
図の斜線で示す孔隙部分１５において無声放電が発生す
る。First, when an AC voltage is applied to the electric field applying electrode 9 from the power supply 14, an external electric field is applied to the entire dielectric spherical particles 11 between the electric field applying electrode 9 and the ground electrode 8. Then, each spherical particle 11 is polarized, and charges of positive polarity and negative polarity appear on its surface. Due to the electric charge, an electric field is concentrated in the small pores between adjacent spherical particles 11, and the second
Silent discharge occurs in the hole portion 15 shown by diagonal lines in the figure.
このような無声放電において、第３図にグラフ化して示
すように、横軸の対数目盛で示す球状粒子１１の比誘電
率εＳと縦軸の目盛で示す交流印加電圧Ｖ ＬＡＣ（Ｋ
ｖ）の２つの要因で定義される無声放電安定領域１６
（第３図の斜線部分）の存在することが知られている。In such a silent discharge, as shown graphically in FIG.
Silent discharge stable region 16 defined by the two factors of v)
(The shaded area in FIG. 3) is known to exist.
従って、球状粒子１１の比誘電率εＳに対応して適正な
範囲の交流電圧を印加することにより、孔隙部分１５に
Ｊ３いて安定な無声放電を発生させ得る。また、球状粒
子１１の比誘電率が高いので、第３図より明らかなよう
に相対的に低い交Ｉ！圧の印加により安定した無声放電
を発生させ得る。Therefore, by applying an AC voltage in an appropriate range corresponding to the dielectric constant εS of the spherical particles 11, stable silent discharge can be generated in the pore portions 15. Furthermore, since the relative dielectric constant of the spherical particles 11 is high, as is clear from FIG. 3, the AC I! A stable silent discharge can be generated by applying pressure.
このような状態において、−酸化窒素ＮＯを含む被処理
空気を装置ケース５の上流側６より下流側７へ向って流
す。このとき、図示省略のアンモニア供給装置より一酸
化窒素Ｎｏと当量のアンモニアＮＨ３を被処理空気に混
入ざ往、かつ適当な手段で空気中に水分（水蒸気）を含
有させる。In such a state, the air to be treated containing -nitrogen oxide NO is caused to flow from the upstream side 6 to the downstream side 7 of the device case 5. At this time, ammonia NH3 in an amount equivalent to nitrogen monoxide No. is mixed into the air to be treated from an ammonia supply device (not shown), and moisture (steam) is caused to be contained in the air by an appropriate means.
被処理空気は構造体１０を透過りるに際し、球状粒′子
１１間に形成された多数の小孔隙を分散通過りるので、
多聞の被処理空気を流Ｊことができる。そして、被処理
空気が無声放電を発生している孔隙部分１５を通過する
とき、被処理空気中の酸素ガスＯ、水Ｈ２０からラジカ
ル状の酸素原子Ｏあるいは水Ｍ Ｉ Ｏ１１が発生する
ため、主として以下に示す反応式により二酸化窒素ＮＯ
２あるいはｌＩＩ′Ｉ酸ＨＮＯ３を生成する。When the air to be treated passes through the structure 10, it passes through a large number of small pores formed between the spherical particles 11.
It is possible to flow a large amount of air to be treated. When the air to be treated passes through the pore portion 15 where silent discharge is occurring, radical oxygen atoms O or water M I O11 are generated from the oxygen gas O and water H20 in the air to be treated. According to the reaction formula shown below, nitrogen dioxide NO
2 or lII'I acid HNO3 is produced.
ＮＯ−ト Ｏ→ Ｎ Ｏ２
Ｎｏ、＋ＯＨ→ＨＮＯ３
これらの二酸化窒素ＮＯ２や硝酸ＨＮＯ３は一酸化窒素
Ｎ Ｏに比し反応性が高く、前記した当量のアンモニア
ＮＨ３と反応して、水分の存在下に、＆ｒ１Ｍアンモニ
ウムＮ ＨＮ Ｏ３のエアロゾルを生する。そしてこの
エアロゾルは球状粒子１１の表面にイ」着することによ
り捕集される。上記の反応は球状粒子１１間の小孔隙内
で行なわれ、かつ多数の球状粒子１１の総表面積が極め
て大ぎいので、エアロゾルの捕集はほぼ完全に行なわれ
る。NO-TO O→ N O2 No, +OH→HNO3 These nitrogen dioxide NO2 and nitric acid HNO3 have higher reactivity than nitrogen monoxide NO, and react with the above equivalent amount of ammonia NH3 in the presence of moisture. , &r generate an aerosol of 1M ammonium N HN O3. This aerosol is then collected by landing on the surface of the spherical particles 11. The above reaction takes place in the small pores between the spherical particles 11, and since the total surface area of the large number of spherical particles 11 is extremely large, the aerosol is almost completely collected.
なお、本実施例において、誘電体の粒子の形状は球状の
ものに限らない。また、電界印加電極にはパルス電圧を
印加しても良い。In this example, the shape of the dielectric particles is not limited to spherical shapes. Further, a pulse voltage may be applied to the electric field applying electrode.
次に本発明の第２実施例を第４図に基づいて説明づる。Next, a second embodiment of the present invention will be explained based on FIG.
本実施例において、ガス透過用の構造体１７は（苧かむ
相互間隙をちって並夕１１状に複数配列された通気板１
８により構成されている。各通気板１８は第１実施例と
同様の誘電体材料を用いた海綿状の多孔質板体であって
、その多数の小孔隙より空気を透過さ１！得る。そして
、構造体１７に７９ｉ定の電圧が印加されたとぎ、各構
造体１７間の僅かな間隙１９にＪ３いて安定な無声放電
を発生・Ｊるにうになっている。他の点の構成及び作用
は第１実ＩＪＩ！！例と同様である。In this embodiment, the structure 17 for gas permeation is composed of (a plurality of ventilation plates 1 arranged in parallel 11 shapes with mutual gaps between each other).
8. Each ventilation plate 18 is a cavernous porous plate made of the same dielectric material as in the first embodiment, and allows air to pass through its numerous small pores. obtain. When a constant voltage of 79i is applied to the structures 17, a stable silent discharge is generated in the slight gap 19 between the structures 17. The structure and operation of other points are the first real IJI! ! Similar to the example.
上記の各実施例において、比誘電率εＳが１０程度ある
いはそれ以下の誘電体も使用し得る。しかし、この場合
には印加電圧を相当に高くする必要があることから、実
施し難い場合もある。In each of the embodiments described above, a dielectric material having a dielectric constant εS of about 10 or less may also be used. However, in this case, since the applied voltage needs to be considerably high, it may be difficult to implement.
なお、本発明の無声放電発生装置は上記のように一酸化
窒素Ｎｏを含む空気の処理用として用いられる他、無声
放電発生スペースに空気等のガスを通した際に行なわれ
るガス成分の各種の化学変化を利用する他種の用途、例
えば空気中にオゾン０３を発生さけるための装置として
、あるいは亜ｌｉｉ！ｌ酸ガスＳｏ を無水ＴｉＡ酸Ｓ
Ｏ３に変化さけてアルカリ等で吸着可能とする装置等
としても利用可能である。The silent discharge generator of the present invention can be used not only to treat air containing nitric oxide No. as described above, but also to treat various gas components when gas such as air is passed through the silent discharge generation space. Other types of applications that utilize chemical changes, such as devices to avoid generating ozone 03 in the air, or sublii! l acid gas So to anhydrous TiA acid S
It can also be used as a device that allows adsorption with alkali or the like without changing to O3.
さらに出願人が昭和６０年１０月３１日付の特許出願（
特願昭６０−２４４９６３号）で開示したようなゲス１
−荷電用のコロナ放電極を上記各実施例の構成に加える
ことにより、空気中のダストの電気的集塵をガス透過用
ｍ造体において合せ行ない得るＪ：うにしても良い。Furthermore, the applicant filed a patent application dated October 31, 1985 (
Guess 1 as disclosed in Japanese Patent Application No. 60-244963)
- By adding a charging corona discharge electrode to the configuration of each of the above embodiments, electrical collection of dust in the air may be performed in the gas permeable structure.
（発明の効果）
本発明は、ガスが通過し得る安定な無声放電発生スペー
スを大きく設定できるため、無声放電発生装置を各種有
害ガス成分の捕集、無害化等のだめに利用する際におい
て、その処理能力を大幅に向ＦさＵることができる。(Effects of the Invention) The present invention can set a large stable silent discharge generation space through which gas can pass, so when the silent discharge generation device is used for collecting various harmful gas components, making them harmless, etc. Processing capacity can be greatly increased.
第１図は本発明の第１実施例の断面図、第２図はぞの要
部拡大図、第３図は誘電体の比誘電率と無声放電用交流
電圧との要因で定義される無声放電安定領域を示すグラ
フ、第４図は本発明の第２実施例の断面図、第５図は従
来例を承り図である。
４・・・無声放電発生装置
５・・・装置ケース
８・・・接地電極
９・・・電界印加電極
１０・・・構造体
１１・・・球状粒子
出願人 和光化成工業株式会社
出願人 水 野 彰代理人 弁
理士 岡田英彦（外３名）４、無声族ｉ覧生殻！
５：＆！Ｌ’″ｆ−ス
８：擾旭電極
第１図
第４図
第５図Fig. 1 is a sectional view of the first embodiment of the present invention, Fig. 2 is an enlarged view of the main part, and Fig. 3 is a silent discharge defined by the relative dielectric constant of the dielectric material and the AC voltage for silent discharge. A graph showing the stable discharge region, FIG. 4 is a sectional view of the second embodiment of the present invention, and FIG. 5 is a cross-sectional view of the conventional example. 4...Silent discharge generator 5...Device case 8...Grounding electrode 9...Electric field application electrode 10...Structure 11...Spherical particle applicant Wako Kasei Kogyo Co., Ltd. applicant Mizuno Akira's agent Patent attorney Hidehiko Okada (3 others) 4. Silent tribe i-listening shell! 5:&! L'″f-s 8: Asahi electrode Fig. 1 Fig. 4 Fig. 5
Claims (1)
孔隙を多数形成したガス透過用の構造体を構成し、この
構造体の両側には、前記誘導体の比誘電率と外部から前
記誘電体に印加される無声放電用電圧との二つの要因で
定義された無声放電安定領域において無声放電を発生さ
せるための放電用の交流電圧あるいはパルス電圧が印加
される対の電極をそれぞれ同構造体にほぼ接するように
設けたことを特徴とするガス処理用の無声放電発生装置
。A structure for gas permeation is constituted by forming a large number of small ventilated pores made of a dielectric material exhibiting a relative permittivity within a predetermined range. A pair of electrodes to which an alternating current voltage or a pulse voltage for discharge is applied to generate a silent discharge in a stable region of silent discharge defined by two factors: the voltage for silent discharge applied to the body, and the voltage for silent discharge applied to the body are each of the same structure. A silent discharge generator for gas processing, characterized in that it is provided so as to be almost in contact with the .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62101067A JPH07110332B2 (en) | 1987-04-23 | 1987-04-23 | Silent discharge generator for gas processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62101067A JPH07110332B2 (en) | 1987-04-23 | 1987-04-23 | Silent discharge generator for gas processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63267419A true JPS63267419A (en) | 1988-11-04 |
| JPH07110332B2 JPH07110332B2 (en) | 1995-11-29 |
Family
ID=14290759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62101067A Expired - Fee Related JPH07110332B2 (en) | 1987-04-23 | 1987-04-23 | Silent discharge generator for gas processing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07110332B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01111423A (en) * | 1987-10-26 | 1989-04-28 | Akira Mizuno | Gas treatment equipment |
| WO2000014010A1 (en) * | 1998-09-09 | 2000-03-16 | The Victoria University Of Manchester | Air purification device |
| JP2002001116A (en) * | 2000-06-20 | 2002-01-08 | Kansai Research Institute | Method for treatment of gas or liquid containing malodorous harmful substance, catalyst device for oxidation-reduction reaction and catalyst for oxidation- reduction reaction |
| US6635996B1 (en) | 1999-03-26 | 2003-10-21 | Canon Kabushiki Kaisha | Plasma generating apparatus, plasma generating method and gas processing method by plasma reaction |
| JP2019017538A (en) * | 2017-07-13 | 2019-02-07 | 日本特殊陶業株式会社 | Plasma reactor, air cleaning machine |
| CN111228977A (en) * | 2020-03-19 | 2020-06-05 | 浙江嘉福新材料科技有限公司 | Sulfuric acid tail gas treatment device and treatment process |
-
1987
- 1987-04-23 JP JP62101067A patent/JPH07110332B2/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01111423A (en) * | 1987-10-26 | 1989-04-28 | Akira Mizuno | Gas treatment equipment |
| WO2000014010A1 (en) * | 1998-09-09 | 2000-03-16 | The Victoria University Of Manchester | Air purification device |
| AU759432B2 (en) * | 1998-09-09 | 2003-04-17 | University Of Manchester, The | Air purification device |
| US6635153B1 (en) | 1998-09-09 | 2003-10-21 | The Victoria University Of Manchester | Air purification device |
| AU759432C (en) * | 1998-09-09 | 2004-03-04 | University Of Manchester, The | Air purification device |
| US6635996B1 (en) | 1999-03-26 | 2003-10-21 | Canon Kabushiki Kaisha | Plasma generating apparatus, plasma generating method and gas processing method by plasma reaction |
| JP2002001116A (en) * | 2000-06-20 | 2002-01-08 | Kansai Research Institute | Method for treatment of gas or liquid containing malodorous harmful substance, catalyst device for oxidation-reduction reaction and catalyst for oxidation- reduction reaction |
| JP2019017538A (en) * | 2017-07-13 | 2019-02-07 | 日本特殊陶業株式会社 | Plasma reactor, air cleaning machine |
| CN111228977A (en) * | 2020-03-19 | 2020-06-05 | 浙江嘉福新材料科技有限公司 | Sulfuric acid tail gas treatment device and treatment process |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07110332B2 (en) | 1995-11-29 |
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