JPS63263627A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPS63263627A JPS63263627A JP9739087A JP9739087A JPS63263627A JP S63263627 A JPS63263627 A JP S63263627A JP 9739087 A JP9739087 A JP 9739087A JP 9739087 A JP9739087 A JP 9739087A JP S63263627 A JPS63263627 A JP S63263627A
- Authority
- JP
- Japan
- Prior art keywords
- film
- boron
- boric acid
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910052796 boron Inorganic materials 0.000 claims abstract description 23
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 20
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000004327 boric acid Substances 0.000 claims abstract description 15
- 230000001681 protective effect Effects 0.000 claims abstract description 6
- 239000002344 surface layer Substances 0.000 claims abstract 2
- 239000010408 film Substances 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 9
- 230000005294 ferromagnetic effect Effects 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000010410 layer Substances 0.000 claims 3
- 239000000314 lubricant Substances 0.000 abstract description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 239000013078 crystal Substances 0.000 abstract description 2
- 229910002804 graphite Inorganic materials 0.000 abstract description 2
- 239000010439 graphite Substances 0.000 abstract description 2
- 239000001257 hydrogen Substances 0.000 abstract description 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000010687 lubricating oil Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は金属磁性薄膜あるいは強磁性酸化物薄膜を記録
層とした磁気記録媒体及びその製造方法に係り、特に磁
気ヘッドとの摺動に対して優れた耐久力をもつ磁気ディ
スクや磁気テープなどの磁気記録媒体及びその製造方法
に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a magnetic recording medium having a recording layer made of a metal magnetic thin film or a ferromagnetic oxide thin film, and a method for manufacturing the same. The present invention relates to magnetic recording media such as magnetic disks and magnetic tapes that have excellent durability and a method for manufacturing the same.
強磁性金属簿膜あるいは金属酸化物簿膜を記録層とした
磁気記録媒体の保護膜としてホウ素膜を用いた例として
特願昭５９−２２１６８８がある。An example of using a boron film as a protective film for a magnetic recording medium having a ferromagnetic metal film or a metal oxide film as a recording layer is disclosed in Japanese Patent Application No. 59-221688.
ホウ素膜は硬度も高く緻密であることから、磁気ディス
クや磁気テープのように、磁気ヘッドと強く接触しなが
ら相対運動する磁気記録媒体の保護膜として優れた特性
をもっている。しかし膜の強度は強いものの、磁気ヘッ
ドとの摩擦係数が大きく、ヘッドと接触し動いてる時に
媒体とヘッドに対して過大な応力がかかり、媒体が破壊
されるとともに磁気ヘッドが摩耗するという問題点があ
った。Since the boron film has high hardness and is dense, it has excellent properties as a protective film for magnetic recording media, such as magnetic disks and magnetic tapes, which move relative to the magnetic head while being in strong contact. However, although the film is strong, it has a large coefficient of friction with the magnetic head, and when it moves in contact with the head, excessive stress is applied to the medium and the head, causing damage to the medium and wear of the magnetic head. was there.
本発明の目的は上記した問題点を解決し、ホウ素膜の強
度を維持したまま、その摩擦係数を低減せしめ、媒体と
ヘッドに対して過大な応力がかかることを防ぎ１両者の
寿命を延ばすことにある。The purpose of the present invention is to solve the above-mentioned problems, reduce the coefficient of friction of the boron film while maintaining its strength, and prevent excessive stress from being applied to the medium and the head, thereby prolonging the life of both. It is in.
上記目的は、ホウ素膜の表面を薄いホウ酸（ＨａＢＯａ
）の膜にすることにより、達成される。The above purpose was to coat the surface of the boron film with thin boric acid (HaBOa).
).
ホウ酸（ＨａＢＯａ）は三斜晶系の結晶構造を持ってお
り、ＨａＢＯａ分子同志が水素結合によって結ばれた層
状構造となっている。このように層状構造をもった物質
としてグラファイトがあるが。Boric acid (HaBOa) has a triclinic crystal structure, and has a layered structure in which HaBOa molecules are connected to each other by hydrogen bonds. Graphite is a material with such a layered structure.
それに代表されるように層状構造の物質は低い摩擦係数
をもつ優れた潤滑剤となる。したがってホウ素膜の最表
面を水蒸気の存在下において酸化するなどの方法でホウ
酸膜とすることにより媒体の摩擦係数を低下させ、媒体
と磁気ヘッドの寿命を延ばすことが可能となる。As typified by this, materials with a layered structure are excellent lubricants with a low coefficient of friction. Therefore, by forming the outermost surface of the boron film into a boric acid film by oxidizing it in the presence of water vapor, etc., it is possible to lower the friction coefficient of the medium and extend the life of the medium and the magnetic head.
以下、本発明の詳細を実施例によって説明する。 Hereinafter, the details of the present invention will be explained with reference to examples.
実施例１
第１図に示したようにポリイミドフィルム１上に厚さ０
．３μｍ 、 Ｃｒ濃度２０重量％のＣｏ−Ｃｒ膜２を
真空蒸着法で被着形成した後、その表面に厚さ３０膜ｍ
のホウ素膜３を形成した。なおこの時Ｇｏ−Ｃｒ、Ｂと
もに基板温度を１５０℃とした。これを真空槽から取出
し、次に水蒸気の絶対湿度が５％の空気雰囲気中で３０
０℃に加熱し２０分間表面の酸化を行なった。媒体の表
面は白色となり、反射Ｘ線回折からホウ酸４によって覆
われていることを確認した。Example 1 As shown in FIG.
．． After forming a Co-Cr film 2 of 3 μm in thickness and with a Cr concentration of 20% by weight by vacuum evaporation, a 30 m thick film was deposited on its surface.
A boron film 3 was formed. At this time, the substrate temperature was 150° C. for both Go-Cr and B. This was taken out from the vacuum chamber, and then placed in an air atmosphere with an absolute humidity of water vapor of 5% for 30 minutes.
The surface was oxidized by heating to 0° C. for 20 minutes. The surface of the medium became white, and it was confirmed from reflection X-ray diffraction that it was covered with boric acid 4.
次にこの試料を円板ディスク状に打ち抜き、以下の方法
で摩擦係数と、膜の摺動強度を測定した。Next, this sample was punched out into a disc shape, and the coefficient of friction and sliding strength of the film were measured using the following method.
試料のディスクをガラス円板上に貼りつけ、試料表面に
半経２０ｍ＋のアルミナの摺動子を荷重２０ｇで押し付
けた１次にこの円板を回転させ、アルミナ摺動子にかか
る接線力の大きさから摩擦係数を求めた。また接線力が
大きく変化し、ディスク媒体に傷が入いる時点までの総
回転数をもって媒体の摺動強度とした。A sample disk was pasted on a glass disk, and an alumina slider with a half diameter of 20m+ was pressed against the sample surface with a load of 20g.The disk was rotated to determine the magnitude of the tangential force applied to the alumina slider. The friction coefficient was then calculated. In addition, the total number of rotations up to the point where the tangential force changed significantly and scratched the disk medium was taken as the sliding strength of the medium.
このような方法で測定した媒体の摩擦係数と。and the coefficient of friction of the medium measured in this way.
摺動強度を第１表に示した。なお表には媒体表面に液体
潤滑剤（ＰＦＰＥ：ポリフロロポリエーテル系）を塗布
した場合と、何も塗布してない場合とについても記載し
た。The sliding strength is shown in Table 1. The table also shows cases in which a liquid lubricant (PFPE: polyfluoropolyether type) was applied to the surface of the medium and cases in which no liquid lubricant was applied.
実施例２
Ｃｏ −ＣｒとＢ膜を形成するまでは実施例１と全たく
同じ方法で行なった。その試料を酸素プラズマアッシャ
装置に入れ、２００Ｗの投入電力で１０分間ホウ素膜の
表面酸化を行なった。この時。Example 2 The same method as in Example 1 was used until the Co--Cr and B films were formed. The sample was placed in an oxygen plasma asher device, and the surface of the boron film was oxidized for 10 minutes with an input power of 200 W. At this time.
装置に流す酸素気流中には、５％の水蒸気を含ませるよ
うにしている。The oxygen stream flowing through the device contains 5% water vapor.
上記の方法で作製した試料の摩擦係数と摺動強度を、実
施例１と同じ方法で測定した。結果を第１表に示した。The friction coefficient and sliding strength of the sample prepared by the above method were measured in the same manner as in Example 1. The results are shown in Table 1.
比較例ｌ
Ｃｏ−Ｃｒと１３膜を形成するまでは実施例１と全たく
同じ方法で作製し、Ｂ膜の表面を酸化しなかった試料を
比較試料として摩擦係数と摺動強度を測定した。結果を
同様に第１表に示した。Comparative Example 1 A sample was prepared in exactly the same manner as in Example 1 until the Co--Cr and 13 films were formed, and the friction coefficient and sliding strength were measured using a sample in which the surface of the B film was not oxidized as a comparative sample. The results are also shown in Table 1.
比較例２
Ｃｏ −ＣｒとＢ膜を形成するまでは実施例１と同じで
あるが、Ｂ膜を熱酸化する時に、水蒸気が含まれない乾
燥空気を用いてＢ膜の表面を酸化した。このようにして
作製した試料を比較試料として、摩擦係数と摺動強度の
測定を行なった。結果を第１表に示す。Comparative Example 2 The process was the same as in Example 1 until the Co-Cr and B films were formed, but when the B film was thermally oxidized, the surface of the B film was oxidized using dry air that does not contain water vapor. Using the thus prepared sample as a comparison sample, the friction coefficient and sliding strength were measured. The results are shown in Table 1.
第 １ 表 潤滑剤の 摩擦係数 摺 動 強 度 有・無 （回） 実施例１ 無 ０・１５ ６７０ＸＬＯ。Table 1 Lubricant friction coefficient sliding strength Yes/No (times) Example 1 None 0.15 670XLO.
有 ０．１０ ２７８０ｘｌＯ３実施例２
有 ０．１１ ２５４０Ｘ１０”よ工、 ” ０．
３５ ４ｏｘ”°゛有 ０．２１ １４７０
Ｘ１０Ｂ第１表の実施例１と比較例１を較べると明らか
なように、Ｂ膜の表面をホウ酸によって被覆した実施例
１においては１Ｍ擦係数が著しく低下し。Yes 0.10 2780xlO3 Example 2
Yes 0.11 2540X10" 0.
35 4ox”° Yes 0.21 1470
As is clear from comparing Example 1 and Comparative Example 1 in Table 1 of X10B, in Example 1 in which the surface of the B film was coated with boric acid, the 1M friction coefficient was significantly lowered.
媒体とヘッドの滑らかな走行が確保されていることが分
かる。また、摺動強度もＢ膜の表面を、ホウ酸で被覆し
た方が優れており、特に潤滑剤を用いていない場合に、
ホウ酸被覆膜の効果がはっきり現われている。It can be seen that smooth running of the medium and head is ensured. In addition, the sliding strength is better when the surface of the B film is coated with boric acid, especially when no lubricant is used.
The effect of the boric acid coating film is clearly visible.
ホウ酸膜の作製法は実施例１と２からも明らかなように
、熱酸化法でもプラズマアッシャ法のような低温形成法
でもよいことが分かる。また、比較例２から分かるよう
に、酸化過程においては水蒸気が必要であり、単にホウ
素の酸化物を形成しただけでは逆に摩擦係数も大きくな
り、摺動強度も弱くなることが分かる。As is clear from Examples 1 and 2, the method for producing the boric acid film can be a thermal oxidation method or a low-temperature formation method such as a plasma asher method. Moreover, as can be seen from Comparative Example 2, water vapor is necessary in the oxidation process, and it can be seen that simply forming an oxide of boron would conversely increase the friction coefficient and weaken the sliding strength.
本発明によれば、ホウ素保護膜の摩擦係数を低減するこ
とが可能となり、磁気ヘッドと磁気媒体の滑らかな走行
を確保し、耐摺動強度を向上させる上に大きな効果があ
る。According to the present invention, it is possible to reduce the coefficient of friction of the boron protective film, which is highly effective in ensuring smooth running of the magnetic head and magnetic medium and improving the sliding strength.
なお１本実施例においては磁性膜としてＣｏ−Ｃｒ１ｌ
々の例を上げて、発明の詳細な説明したが、Ｃｏ−Ｎｉ
膜、γ−ＦｅｚＯｓ膜等の表面に保護膜としてＢ膜を形
成した場合にも同様に効果があることは言うまでもない
。Note that in this example, Co-Cr11 is used as the magnetic film.
Although the invention has been explained in detail by giving various examples, Co-Ni
It goes without saying that a similar effect can be obtained when a B film is formed as a protective film on the surface of a γ-FezOs film or the like.
第１図は本発明の磁気記録媒体の断面図である。
１・・・基体、２・・・強磁性薄膜、３・・・ホウ素膜
、４・・・ホウ酸膜。FIG. 1 is a sectional view of the magnetic recording medium of the present invention. DESCRIPTION OF SYMBOLS 1...Substrate, 2...Ferromagnetic thin film, 3...Boron film, 4...Boric acid film.
Claims (1)
強磁性体の金属薄膜又は酸化物薄膜を配置し、さらにそ
の表面にホウ素の保護膜を配置した磁気記録媒体におい
て、ホウ素の最表面層がホウ酸によって被覆されている
ことを特徴とする磁気記録媒体。 ２、特許請求の範囲第１項記載の磁気記録媒体において
、ホウ素膜の厚さが１０〜２００ｎｍであり、ホウ酸膜
の厚さが５〜１００ｎｍであることを特徴とする磁気記
録媒体。 ３、所定の形状を有する非磁性基体上に、記録層として
強磁性体の金属薄膜又は酸化物薄膜を形成し、さらにそ
の表面にホウ素膜を形成した後、ホウ素膜の表面を酸化
しホウ酸膜とすることを特徴とする磁気記録媒体の製造
方法。 ４、特許請求の範囲第３項記載の磁気記録媒体の製造方
法において、水蒸気と酸素が存在する雰囲気中で、ホウ
素膜の最表面層をプラズマ酸化もしくは熱酸化すること
によりホウ素膜を酸化することを特徴とする磁気記録媒
体の製造方法。[Claims] 1. A magnetic recording medium in which a ferromagnetic metal thin film or oxide thin film is disposed as a recording layer on a nonmagnetic substrate having a predetermined shape, and a boron protective film is further disposed on the surface of the ferromagnetic metal thin film or oxide thin film. A magnetic recording medium characterized in that the outermost surface layer of boron is coated with boric acid. 2. The magnetic recording medium according to claim 1, wherein the boron film has a thickness of 10 to 200 nm, and the boric acid film has a thickness of 5 to 100 nm. 3. After forming a ferromagnetic metal thin film or oxide thin film as a recording layer on a non-magnetic substrate having a predetermined shape, and further forming a boron film on the surface thereof, the surface of the boron film is oxidized with boric acid. A method for manufacturing a magnetic recording medium, characterized in that it is a film. 4. In the method for manufacturing a magnetic recording medium according to claim 3, the boron film is oxidized by plasma oxidation or thermal oxidation of the outermost layer of the boron film in an atmosphere containing water vapor and oxygen. A method of manufacturing a magnetic recording medium characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9739087A JPS63263627A (en) | 1987-04-22 | 1987-04-22 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9739087A JPS63263627A (en) | 1987-04-22 | 1987-04-22 | Magnetic recording medium and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63263627A true JPS63263627A (en) | 1988-10-31 |
Family
ID=14191189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9739087A Pending JPS63263627A (en) | 1987-04-22 | 1987-04-22 | Magnetic recording medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63263627A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102963902A (en) * | 2012-11-14 | 2013-03-13 | 陕西科技大学 | Method for preparing lamellar-form borate crystal material |
-
1987
- 1987-04-22 JP JP9739087A patent/JPS63263627A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102963902A (en) * | 2012-11-14 | 2013-03-13 | 陕西科技大学 | Method for preparing lamellar-form borate crystal material |
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