JPS6366720A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPS6366720A JPS6366720A JP21050286A JP21050286A JPS6366720A JP S6366720 A JPS6366720 A JP S6366720A JP 21050286 A JP21050286 A JP 21050286A JP 21050286 A JP21050286 A JP 21050286A JP S6366720 A JPS6366720 A JP S6366720A
- Authority
- JP
- Japan
- Prior art keywords
- film layer
- fine particles
- metal
- layer
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 37
- 239000002184 metal Substances 0.000 claims abstract description 37
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 24
- 239000010419 fine particle Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 9
- 239000000956 alloy Substances 0.000 claims abstract description 9
- 239000010409 thin film Substances 0.000 claims description 19
- 239000007789 gas Substances 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 8
- 150000002484 inorganic compounds Chemical class 0.000 claims description 8
- 229910010272 inorganic material Inorganic materials 0.000 claims description 8
- 229920000620 organic polymer Polymers 0.000 claims description 8
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 abstract description 6
- 239000002245 particle Substances 0.000 abstract description 6
- 229910000889 permalloy Inorganic materials 0.000 abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 abstract description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 239000010949 copper Substances 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 abstract description 2
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 239000010703 silicon Substances 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract 3
- 230000003247 decreasing effect Effects 0.000 abstract 2
- -1 'Permalloy(R)' Chemical class 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 29
- 238000007738 vacuum evaporation Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920006267 polyester film Polymers 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- NVIVJPRCKQTWLY-UHFFFAOYSA-N cobalt nickel Chemical compound [Co][Ni][Co] NVIVJPRCKQTWLY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 229910007277 Si3 N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007849 furan resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は強磁性金属薄膜層を磁気記録層とする磁気記
録媒体およびその製造方法に関し、さらに詳しくは摩擦
係数が小さくて走行性および耐久性に優れた前記の磁気
記録媒体およびその製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magnetic recording medium having a ferromagnetic metal thin film layer as a magnetic recording layer and a method for manufacturing the same, and more specifically relates to a magnetic recording medium having a small coefficient of friction, good running performance and durability. The present invention relates to the above-mentioned magnetic recording medium having excellent properties and a method for manufacturing the same.
強磁性金属薄膜層を磁気記録層とする磁気記録媒体は、
通常、金属もしくはそれらの合金などを真空蒸着、スパ
ッタリング等によって基体フィルム上に被着してつ(ら
れ、高密度記録に通した特性を有するが、反面磁気ヘッ
ドとの摩擦係数が大きくて走行性が悪く、摩耗や損傷を
受は易い。A magnetic recording medium whose magnetic recording layer is a ferromagnetic metal thin film layer is
Usually, metals or their alloys are deposited on a base film by vacuum evaporation, sputtering, etc., and have characteristics suitable for high-density recording. It has poor performance and is susceptible to wear and damage.
このため、従来から強磁性金属薄膜層上に種々の保護層
を設けるなどして走行性および耐久性を改善することが
行われており、たとえば、高級脂肪酸やフッ素系化合物
等の潤滑剤を被着させたりすることが行われている。(
特開昭53’−88704号、特開昭58−94130
号)
〔発明が解決しようとする問題点〕
ところが、これらの18I滑剤層は、磁気ヘッドとのt
J接によって比較的短時間で剥離、破壊して、ヘッド目
づまりの原因となる場合があり、未だ走行性および耐久
性は充分に改善されていない。For this reason, various protective layers have been conventionally provided on the ferromagnetic metal thin film layer to improve running performance and durability. There are also practices such as making people wear clothes. (
JP-A-53'-88704, JP-A-58-94130
(No.) [Problem to be solved by the invention] However, these 18I lubricant layers have a problem in contact with the magnetic head.
Due to J contact, it may peel off and break in a relatively short period of time, causing head clogging, and running performance and durability have not yet been sufficiently improved.
この発明はかかる現状に鑑み種々検討を行った結果なさ
れたもので、まず、基体上に金属または無機化合物もし
くは有機高分子化合物からなる微粒子を島状に分散析出
させた下地層を形成し、次いで、この上に金属もしくは
それらの合金からなる強磁性金属N膜層を設けることに
よって、島状に分散析出した微粒子の影響で強磁性金属
薄膜層の表面に凹凸を形成し、磁気ヘッド等との摺動の
際の真実接触面積を低減して、摩擦係数を充分に小さく
し、走行性および耐久性を充分に向上させたものである
。This invention was made as a result of various studies in view of the current situation. First, a base layer is formed on a substrate by dispersing and precipitating fine particles made of a metal, an inorganic compound, or an organic polymer compound in the form of islands. By providing a ferromagnetic metal N film layer made of metals or their alloys on top of this, unevenness is formed on the surface of the ferromagnetic metal thin film layer due to the influence of the fine particles dispersed and precipitated in the form of islands, making it difficult to interact with magnetic heads, etc. The actual contact area during sliding is reduced, the coefficient of friction is sufficiently reduced, and running performance and durability are sufficiently improved.
この発明において、基体上に微粒子を島状に分散析出し
て形成する下地層の形成材料としては、パーマロイ、ア
ルミニウム、銅、金、ニッケルークロム合金、チタン、
タングステン、β−タンタル等の金属またはこれらの合
金、またはシリコン、C,B5SiC,Si3 N4、
A1203% Sl 02 、T I C% W Cs
T I N % B N s T I B 2、Cr
B2 s ZrO2等の無機化合物、あるいはフッ素系
樹脂、シリコーン系樹脂、アミド系樹脂、イミド系樹脂
、フェノール系樹脂、アニリン系樹脂、メラミン系樹脂
、ホルマリン系樹脂、尿素系樹脂、フラン系樹脂、エポ
キシ系樹脂等の有機高分子化合物などが好適なものとし
て使用され、これらの金属、無機化合物、有機高分子化
合物等は、真空蒸着、スパッタリング、イオンブレーテ
ィング等の物理蒸着によって、基体上に分散析出され、
下地層が形成される。In this invention, materials for forming the base layer formed by dispersing and precipitating fine particles in the form of islands on the substrate include permalloy, aluminum, copper, gold, nickel-chromium alloy, titanium,
Metals such as tungsten and β-tantalum or alloys thereof, or silicon, C, B5SiC, Si3 N4,
A1203% Sl 02 , T I C% W Cs
T I N % B N s T I B 2, Cr
Inorganic compounds such as B2 s ZrO2, fluorine resin, silicone resin, amide resin, imide resin, phenol resin, aniline resin, melamine resin, formalin resin, urea resin, furan resin, epoxy Organic polymer compounds such as resins are preferably used, and these metals, inorganic compounds, organic polymer compounds, etc. can be dispersed and deposited on the substrate by physical vapor deposition such as vacuum evaporation, sputtering, and ion blating. is,
A base layer is formed.
このような真空蒸着、スパッタリング、イオンブレーテ
ィング等の物理蒸着は、不活性ガスまたは酸素ガスもし
くは窒素ガスあるいはこれらの混合ガス中で行うのが好
ましく、またこれらのガスのガス圧は、1×10トール
の範囲内とし、さらに5X10−2〜5トールの範囲内
にするの好ましく、lXl0−2より低くすると微粒子
が形成されずに薄膜化が進み、10トールより高くする
と微粒子が大きくなりすぎて電磁変換特性に悪影響を及
ぼす。Such physical vapor deposition such as vacuum evaporation, sputtering, and ion blating is preferably performed in an inert gas, oxygen gas, nitrogen gas, or a mixed gas thereof, and the gas pressure of these gases is 1×10 It is preferably within the range of 5X10-2 to 5 Torr. If it is lower than 1X10-2, fine particles will not be formed and the film will become thinner, and if it is higher than 10 Torr, the fine particles will become too large and electromagnetic It has a negative effect on the conversion characteristics.
このようにして基体上に分散析出される金属または無機
化合物もしくは有機高分子化合物からなる微粒子は、粒
子径が50〜500人の範囲内であることが好ましく、
50人より小さいと、次いでこの上に形成される強磁性
金属薄膜層の表面に良好な凹凸を形成して、摩擦係数を
充分に小さくすることができず、500人より大きくて
は、強磁性金属薄膜層の表面の凹凸が大きくなりすぎて
、電磁変換特性に悪影響を及ぼす。The fine particles made of metal, inorganic compound, or organic polymer compound dispersed and precipitated on the substrate in this way preferably have a particle size within the range of 50 to 500 particles,
If it is less than 50, it will not be possible to form good unevenness on the surface of the ferromagnetic metal thin film layer that is formed on top of the ferromagnetic metal thin film layer, and the coefficient of friction will not be sufficiently small. The unevenness on the surface of the metal thin film layer becomes too large, which adversely affects electromagnetic conversion characteristics.
このようにして、粒子径が50〜500人の金属または
無機化合物もしくは有機高分子化合物からなる微粒子を
、基体上に島状に分散析出して下地層を形成し、次いで
この上に強磁性金属薄膜層を形成すると、この微粒子の
凹凸に沿って強磁性金属薄膜層が形成され、この島状の
微粒子の影響によって強磁性金属薄膜層の表面に、中心
線平均粗さにして0.001 tJ m Raから0.
008#mRaの程度の凹凸が形成される。従って、磁
気ヘッド等との摺動の際の真実接触面積が低減され、摩
擦係数が充分に小さくなって走行性が充分に改善され、
耐久性が一段と向上される。In this way, fine particles made of a metal, inorganic compound, or organic polymer compound with a particle size of 50 to 500 are dispersed and precipitated in an island shape on the substrate to form a base layer, and then a ferromagnetic metal When the thin film layer is formed, a ferromagnetic metal thin film layer is formed along the irregularities of the fine particles, and due to the influence of these island-like fine particles, the surface of the ferromagnetic metal thin film layer has a center line average roughness of 0.001 tJ. m Ra to 0.
Asperities of the order of 008#mRa are formed. Therefore, the actual contact area during sliding with the magnetic head etc. is reduced, the coefficient of friction is sufficiently reduced, and the running performance is sufficiently improved.
Durability is further improved.
強磁性金属薄膜層の形成材料としては、Co、Fe5N
i、Co−Ni合金、Co−Cr合金、Co−P合金、
(:、o−Ni −P合金などの強磁性材が使用され、
これらの強磁性材からなる強磁性金属薄膜層は、真空蒸
着、イオンブレーティング、スパッタリング、メッキ等
の手段によって基体上に被着形成される。The material for forming the ferromagnetic metal thin film layer is Co, Fe5N.
i, Co-Ni alloy, Co-Cr alloy, Co-P alloy,
(:, ferromagnetic materials such as o-Ni-P alloy are used,
A ferromagnetic metal thin film layer made of these ferromagnetic materials is deposited on a substrate by means such as vacuum evaporation, ion blasting, sputtering, or plating.
また、磁気記録媒体としては、ポリエステルフィルム、
ポリイミドフィルムなどの合成樹脂フィルムを基体とす
る磁気テープ、合成樹脂フィルム、アルミニウム板およ
びガラス板等からなる円盤やドラムを基体とする磁気デ
ィスクや磁気ドラムなど、磁気ヘッドと摺接する構造の
種々の形態を包含する。In addition, as magnetic recording media, polyester film,
Various types of structures that come into sliding contact with magnetic heads, such as magnetic tapes based on synthetic resin films such as polyimide films, magnetic disks and magnetic drums based on disks and drums made of synthetic resin films, aluminum plates, glass plates, etc. includes.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例1
第1図に示す真空蒸着室を隣接した真空蒸着装置を使用
し、ポリエステルフィルムlを真空蒸着室2の原反ロー
ル3からガイドロール4を介して円筒状キャン5に摺接
させながら移動させ、ガイドロール6および隣接する真
空蒸着室7との連通部に配設した上下一対のガイドロー
ル8,8、さらに真空蒸着室7内に配設したガイドロー
ル9を介してさらに円筒状キャンlOに摺接させながら
移動させ、ガイドロール11を介して巻き取りロール1
2に巻き取るようにセットした。次いで、夏空蒸着室2
に取りつけたガス導入管工3から真空蒸着室2内にアル
ゴンガスを導入して、ガス圧をlX1O−Il−−ルに
設定するとともに、円筒状キャン5の下方に配設したる
つぼ14内にパーマロイ15をセットして加熱蒸発させ
、ポリエステルフィルム1上にパーマロイからなる粒子
径が160人の島状の微粒子を分散析出して下地層を形
成した。さらに蒸着室7に取りつけたガス導入管16か
ら酸素ガスを導入してガス圧をlXl0−5トールに設
定し、蒸着室7内の円筒状キャン10の下方に配設した
るつぼ17内にコバルト−ニッケル合金(重量比、80
:20)18をセットして加熱蒸発させ、厚さが150
0人のコバルト−ニッケル合金からなる強磁性金属′g
t膜層を形成した。しかる後、所定の幅に裁断して、第
2図に示すように分散析出した微粒子からなる下地層2
1および強磁性金属薄膜層22をポリエステルフィルム
1上に積層形成した磁気テープAをつくった、なお、図
中19および20はそれぞれ真空蒸着室2および7内を
減圧するための排気系である。Example 1 Using a vacuum evaporation apparatus adjacent to the vacuum evaporation chamber shown in FIG. The cylindrical can is moved through a pair of upper and lower guide rolls 8, 8 disposed in a communication section with the guide roll 6 and the adjacent vacuum deposition chamber 7, and further through a guide roll 9 disposed within the vacuum deposition chamber 7. The take-up roll 1 is moved through the guide roll 11 while being in sliding contact with the lO.
I set it to wind up at 2. Next, Natsora vapor deposition chamber 2
Argon gas is introduced into the vacuum evaporation chamber 2 from the gas introduction pipework 3 attached to the cylindrical can 5, and the gas pressure is set to lX1O-Il--. Permalloy 15 was set and heated to evaporate, and island-shaped fine particles made of Permalloy having a particle diameter of 160 were dispersed and precipitated on polyester film 1 to form a base layer. Furthermore, oxygen gas is introduced from the gas introduction pipe 16 attached to the deposition chamber 7, the gas pressure is set to lXl0-5 torr, and cobalt- Nickel alloy (weight ratio, 80
:20) Set 18 and heat and evaporate to a thickness of 150.
A ferromagnetic metal consisting of a cobalt-nickel alloy
A t-film layer was formed. Thereafter, it is cut into a predetermined width, and as shown in FIG. 2, a base layer 2 made of dispersed and precipitated fine particles is formed.
Magnetic tape A was prepared by laminating ferromagnetic metal thin film layer 1 and ferromagnetic metal thin film layer 22 on polyester film 1. Reference numerals 19 and 20 in the figure are exhaust systems for reducing the pressure in vacuum deposition chambers 2 and 7, respectively.
実施例2〜7
実施例1における下地層の形成において、アルゴンガス
のガス圧を下記第1表に示すように種々に変更した以外
は、実施例1と同様にしてポリエステルフィルム1上に
、粒子径が下記第1表に示すように種々に異なる島状の
パーマロイ微粒子を分散析□出して下地層を形成し、さ
らに強磁性金属薄膜層を形成して磁気テープAをつくっ
た。Examples 2 to 7 In forming the base layer in Example 1, particles were formed on polyester film 1 in the same manner as in Example 1, except that the gas pressure of argon gas was variously changed as shown in Table 1 below. Magnetic tape A was prepared by dispersing and separating island-shaped permalloy fine particles having various diameters as shown in Table 1 below to form an underlayer, and further forming a ferromagnetic metal thin film layer.
第1表
比較例1
実施例1において、島状の微粒子からなる下地層の形成
を省いた以外は実施例1と同様にして磁気テープをつく
った。Table 1 Comparative Example 1 A magnetic tape was produced in the same manner as in Example 1 except that the formation of the underlayer made of island-shaped fine particles was omitted.
各実施例および各比較例で得られた磁気テープについて
、摩擦係数を測定し、またスチル試験機で常温スチル寿
命を測定した。Regarding the magnetic tapes obtained in each Example and each Comparative Example, the coefficient of friction was measured, and the still life at room temperature was measured using a still tester.
下記第2表はその結果である。Table 2 below shows the results.
第2表
〔発明の効果〕
上表から明らかなように、この発明で得られた磁気テー
プ(実施例工ないし7)は、いずれも比較例1で得られ
た磁気テープに比し、■擦係数が小さくて、常温スチル
寿命が長く、このことがらこの発明によれば一段と走行
性が良好で耐久性に優れた磁気記録媒体が得られること
がわかる。Table 2 [Effects of the Invention] As is clear from the above table, all of the magnetic tapes obtained by the present invention (Example Works to 7) had less friction than the magnetic tape obtained in Comparative Example 1. The coefficient is small and the normal temperature still life is long, which shows that according to the present invention, a magnetic recording medium with even better running properties and excellent durability can be obtained.
第1図は真空蒸着装置の1例を示す概略断面図、第2図
はこの発明によって得られた磁気テープの部分拡大断面
図である。
1・・・ポリエステルフィルム(基体)、21・・・下
地層、22・・・強磁性金属薄膜層、A・・・磁気テー
プ(磁気記録媒体)
特許出願人 日立マクセル株式会社
第2図FIG. 1 is a schematic sectional view showing an example of a vacuum evaporation apparatus, and FIG. 2 is a partially enlarged sectional view of a magnetic tape obtained by the present invention. DESCRIPTION OF SYMBOLS 1... Polyester film (substrate), 21... Base layer, 22... Ferromagnetic metal thin film layer, A... Magnetic tape (magnetic recording medium) Patent applicant Hitachi Maxell, Ltd. Figure 2
Claims (1)
子化合物からなる微粒子を島状に分散析出させた下地層
を形成し、この上に金属もしくはそれらの合金からなる
強磁性金属薄膜層を設けて、強磁性金属薄膜層の表面に
凹凸を形成したことを特徴とする磁気記録媒体 2、基体上に、不活性ガスまたは酸素ガスもしくは窒素
ガスあるいはこれらの混合ガス中で、ガス圧が1×10
^−^2〜10トールの雰囲気下に、金属または無機化
合物もしくは有機高分子化合物を物理蒸着させて、金属
または無機化合物もしくは有機高分子化合物からなる微
粒子を島状に分散析出させた下地層を形成し、次いで、
この上に金属もしくはそれらの合金からなる強磁性金属
薄膜層を形成することを特徴とする磁気記録媒体の製造
方法。[Scope of Claims] 1. A base layer is formed on a substrate, in which fine particles made of a metal, an inorganic compound, or an organic polymer compound are dispersed and precipitated in an island shape, and a ferromagnetic layer made of a metal or an alloy thereof is formed on this base layer. A magnetic recording medium 2 characterized in that a metal thin film layer is provided and irregularities are formed on the surface of the ferromagnetic metal thin film layer, on a substrate in an inert gas, oxygen gas, nitrogen gas, or a mixed gas thereof, Gas pressure is 1×10
^-^ Under an atmosphere of 2 to 10 torr, a metal, an inorganic compound, or an organic polymer compound is physically vapor deposited to form a base layer in which fine particles of the metal, inorganic compound, or organic polymer compound are dispersed and precipitated in the form of islands. form, then
A method for manufacturing a magnetic recording medium, which comprises forming a ferromagnetic metal thin film layer made of metal or an alloy thereof thereon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21050286A JPS6366720A (en) | 1986-09-06 | 1986-09-06 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21050286A JPS6366720A (en) | 1986-09-06 | 1986-09-06 | Magnetic recording medium and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6366720A true JPS6366720A (en) | 1988-03-25 |
Family
ID=16590427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21050286A Pending JPS6366720A (en) | 1986-09-06 | 1986-09-06 | Magnetic recording medium and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6366720A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0620958A (en) * | 1992-04-10 | 1994-01-28 | Internatl Business Mach Corp <Ibm> | Formation of rough silicon surface and its application |
JP2002310456A (en) * | 2001-04-11 | 2002-10-23 | Daikin Ind Ltd | Outdoor unit for air conditioner |
-
1986
- 1986-09-06 JP JP21050286A patent/JPS6366720A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0620958A (en) * | 1992-04-10 | 1994-01-28 | Internatl Business Mach Corp <Ibm> | Formation of rough silicon surface and its application |
JP2002310456A (en) * | 2001-04-11 | 2002-10-23 | Daikin Ind Ltd | Outdoor unit for air conditioner |
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