JPS63255821A - Method for preventing discoloration of substrate for magnetic disk - Google Patents

Method for preventing discoloration of substrate for magnetic disk

Info

Publication number
JPS63255821A
JPS63255821A JP9013787A JP9013787A JPS63255821A JP S63255821 A JPS63255821 A JP S63255821A JP 9013787 A JP9013787 A JP 9013787A JP 9013787 A JP9013787 A JP 9013787A JP S63255821 A JPS63255821 A JP S63255821A
Authority
JP
Japan
Prior art keywords
substrate
polishing
soln
water
magnetic disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9013787A
Other languages
Japanese (ja)
Inventor
Shoshi Koga
詔司 古賀
Masahiro Kawaguchi
雅弘 川口
Hideyoshi Usui
碓井 栄喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP9013787A priority Critical patent/JPS63255821A/en
Publication of JPS63255821A publication Critical patent/JPS63255821A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To permit importation of excellent resistance to discoloration to a substrate formed with an electroless Ni-Cu-P plating film by keeping the above-mentioned substrate immersed and stored in a prescribed aq. soln. during the time after polishing to a specular surface before drying. CONSTITUTION:The substrate subjected to an underlying treatment by the electroless Ni-Cu-P plating on an aluminum alloy substrate is kept immersed and stored in the aq. weak alkaline soln. during the time after the polishing to the specular surface before the drying via rinsing. The aq. weak alkaline soln. is exemplified by an aq. sodium carbonate soln., aq. sodium phosphate soln., etc. No discolorations are thereby admitted at all on the surface and exactly the same surface as the surface subjected to rinsing and drying right after polishing to a specular surface and slurry removal is obtd.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気ディスク用基盤の製造技術に係り、より詳
細には、アルミニウム合金基盤上にメッキ処理を施した
下地処理サブストレートが鏡面研磨後の水洗浄により変
色するのを防止し得る方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a manufacturing technology for a magnetic disk substrate, and more specifically, the present invention relates to a manufacturing technology for a magnetic disk substrate, and more specifically, the present invention relates to a manufacturing technology for a magnetic disk substrate. This invention relates to a method for preventing discoloration due to washing with water.

(従来の技術) 一般に磁気ディスク用基盤としては、アルミニウム合金
等の金属製ディスク用基盤上に磁性薄膜媒体を形成して
製造されるが、近年、記録密度の高密度化、高信頼性化
の要求に伴って磁気ディスク用基盤と磁気ヘッドとの間
隔を小さくするべくますます厳しくなり、0.1μm程
度まで狭くするよう要請されてきている。
(Prior art) Generally, magnetic disk substrates are manufactured by forming a magnetic thin film medium on a metal disk substrate such as an aluminum alloy. In line with the demand, it has become increasingly strict to reduce the distance between the magnetic disk substrate and the magnetic head, and it has been requested to reduce the distance to about 0.1 .mu.m.

このため、磁気ディスク用基盤の平滑度が重要な特性と
なり、具体的には、基盤表面の欠陥はできるだけ小さく
、かつ、その表面精度もできるだけ高いこと等が要求さ
れるようになった。
For this reason, the smoothness of the magnetic disk substrate has become an important characteristic, and specifically, it has become necessary to have as few defects as possible on the substrate surface and to have as high a surface precision as possible.

一方、薄膜媒体についても、従来の金属メッキ膜、金属
スパッタ膜に代わり、γ−Fe、O,スパッタ膜が開発
されており、それに伴って磁気ディスク用基盤の製造技
術面でも新たな問題が幾つか生じてきている。
On the other hand, regarding thin film media, γ-Fe, O, and sputtered films have been developed in place of conventional metal plating films and metal sputtering films, and with this, new problems have arisen in terms of manufacturing technology for magnetic disk substrates. It's starting to happen.

例えば、γ−Fe、O,スパッタ膜の成膜プロセスにお
いては300℃以上での熱処理が必要であるが、この熱
処理に際しては従来のNi−Pメッキ皮膜では非磁性を
保つことができないため、これを下地メッキ基盤として
使用することができなくなる。そこで、300’C以上
での熱処理でも非磁性であるNi−Cu−Pメッキ皮膜
を下地として用いることが検討されている。
For example, in the process of forming γ-Fe, O, and sputtered films, heat treatment at 300°C or higher is required, but conventional Ni-P plating films cannot maintain nonmagnetic properties during this heat treatment. cannot be used as a base plating base. Therefore, it is being considered to use a Ni--Cu--P plating film, which is nonmagnetic even when heat treated at 300'C or more, as a base.

(発明が解決しようとする問題点) ところで、アルミニウム合金製の基盤を製造する場合、
該基盤上に無電解NiCu−Pメッキ皮膜を形成した後
、鏡面研磨を行い、次いで薄膜媒体の形成を行うが、鏡
面研磨後、スラリーの除去のために中性洗剤による洗浄
及び仕上洗浄作業を実施する必要がある。この洗浄作業
においては、該下地Ni−Cu−Pメツキ基盤を少しで
も水中に浸漬しておくと、鏡面研磨後の表面が変色を起
こすと共に酸化物が生成し、そのため、薄膜媒体形成時
にスパッタ膜の付着にムラができ易く、精度不良、特性
エラーが発生し易くなり、商品としての価値がなくなる
等の問題がある。
(Problems to be solved by the invention) By the way, when manufacturing an aluminum alloy base,
After forming an electroless NiCu-P plating film on the substrate, mirror polishing is performed, and then a thin film medium is formed. After mirror polishing, cleaning with a neutral detergent and final cleaning are performed to remove the slurry. It is necessary to implement it. In this cleaning process, if the underlying Ni-Cu-P plating substrate is immersed in water even for a little while, the mirror-polished surface will discolor and oxides will be generated. There are problems such as uneven adhesion, poor accuracy and characteristic errors, and loss of value as a product.

この点、鏡面研磨後の水洗浄時の変色を防止する方法と
しては、鏡面研磨後のスラリー除去のための中性洗剤に
よる洗浄を行った後、素早く水洗浄し、しかもIPA、
フロン等で直ちに乾燥する等、水中に浸漬しておく時間
を極力短くすることが必要である。
In this regard, a method to prevent discoloration during water washing after mirror polishing is to wash with a neutral detergent to remove slurry after mirror polishing, and then quickly wash with water.
It is necessary to shorten the time immersed in water as much as possible, such as by immediately drying with Freon or the like.

しかし乍ら、実際の鏡面研磨作業では、ディスクサイズ
にもよるが、少なくとも5〜40枚程度を同時に研磨し
、次いでこれらを洗浄することになるが、上記の如くこ
れらを同時に洗浄、乾燥することは実際には難しいので
、どうしても水中に数分〜数十分は浸漬したまま保管し
ておくことになる。
However, in actual mirror polishing work, at least 5 to 40 disks are polished at the same time, depending on the disk size, and then they are cleaned. In practice, it is difficult to do this, so it is necessary to store it immersed in water for several minutes to several tens of minutes.

本発明は、か\る状況に鑑みてなされたものであって、
磁気ディスク用アルミニウム合金基盤上に無電解Ni−
Cu−Pメッキを施した下地Ni −Cu−P基盤につ
き、鏡面研磨後の洗浄処理中に基盤表面が変色するのを
防止し得る新規で実際的な保管方法を提供することを目
的とするものである。
The present invention was made in view of the above situation, and
Electroless Ni- on aluminum alloy substrate for magnetic disks
The purpose of the present invention is to provide a new and practical storage method for a Ni-Cu-P base plated with Cu-P, which can prevent the surface of the base from discoloring during cleaning treatment after mirror polishing. It is.

(問題点を解決するための手段) 上記目的を達成するため、本発明者は、アルミニウム合
金基盤上に無電解Ni−Cu−Pメッキを施した下地処
理サブストレートを鏡面研磨機保管する方法について検
討を重ねた結果、鏡面研磨と水洗浄、乾燥との間に該基
盤を特定の水溶液中に浸漬保管しておけば、該基盤表面
の変色防止が可能であることを見い出したものである。
(Means for Solving the Problems) In order to achieve the above object, the present inventor has proposed a method for storing a surface-treated substrate formed by electroless Ni-Cu-P plating on an aluminum alloy substrate in a mirror polisher. As a result of repeated studies, we have discovered that discoloration of the surface of the substrate can be prevented by storing the substrate immersed in a specific aqueous solution between mirror polishing, water washing, and drying.

すなわち、本発明に係る磁気ディスク用基盤の変色防止
法は、アルミニウム合金基盤上に無電解Ni−Cu−P
メッキによる下地処理を施したサブストレートにつき、
鏡面研磨後、水洗浄を経て、乾燥するまでの間において
、弱アルカリ水溶液中に浸漬して保管することを特徴と
するものである。
That is, the method for preventing discoloration of a magnetic disk substrate according to the present invention includes electroless Ni-Cu-P on an aluminum alloy substrate.
For substrates that have been treated with plating,
After mirror polishing, washing with water, and drying, the product is immersed in a weak alkaline aqueous solution for storage.

以下に本発明を実施例に基づいて詳細に説明する。The present invention will be explained in detail below based on examples.

本発明法が対象とする磁気ディスク用基盤は、従来と同
様にして適宜材質のアルミニウム合金製基盤を製造し、
これに無電解Ni−Cu−Pメッキを施したものであり
、特にその製造条件、メッキ条件等々には制限されない
The magnetic disk substrate targeted by the method of the present invention is produced by manufacturing an aluminum alloy substrate of an appropriate material in the same manner as in the past.
This is subjected to electroless Ni--Cu--P plating, and the manufacturing conditions, plating conditions, etc. are not particularly limited.

また、該サブストレートに対する鏡面研磨も、従来と同
様、市販の研磨剤メディポールN08(不二見研磨剤工
業(株)、商品名)などを使用し、両面研磨盤により研
磨を行えばよく、特に研磨条件等には制限されない。
In addition, mirror polishing of the substrate can be performed using a double-sided polishing machine using a commercially available polishing agent such as Medipole N08 (Fujimi Abrasive Industry Co., Ltd., trade name), as in the past. There are no restrictions on polishing conditions, etc.

か−る鏡面研磨を施したサブストレートは1本発明では
、研磨後において、スラリー除去のための中性洗剤によ
る洗浄と水洗浄、乾燥するまでの間で保管すべきときに
、弱アルカリ水溶液中に浸漬して保管しておくのである
。したがって、研磨後に引き続いてスラリー除去洗浄を
行うときはスラリー除去洗浄後、上記の如くして保管し
、その後水洗浄、乾燥すればよく、また研磨後或いはス
ラリー除去洗浄後保管する必要があるときは、その都度
上記方法により保管すればよい等、様々な態様が可能で
ある。勿論、複数枚のサブストレートのうち、何枚かの
みを保管すればよいときは、該当するサブストレートの
みを上記方法で保管すればよく、必ずすべての枚数を保
管しなければならないものではない、保管に際しては、
研磨、スラリー除去洗浄或いは水洗浄等の処理加工後、
直ちに或いは速やかに保管するのが望ましい。
In the present invention, the mirror-polished substrate is washed with a neutral detergent to remove slurry, washed with water, and then stored in a weak alkaline aqueous solution before being dried. It is stored by soaking it in water. Therefore, when performing slurry removal cleaning after polishing, it is sufficient to store the product as described above, and then wash it with water and dry it, and if it is necessary to store it after polishing or slurry removal cleaning Various embodiments are possible, such as storing the data each time using the above method. Of course, if you only need to store some of the multiple substrates, you only need to store the relevant substrates using the above method, and it is not always necessary to store all the substrates. When storing,
After processing such as polishing, slurry removal cleaning or water cleaning,
It is desirable to store it immediately or promptly.

弱アルカリ水溶液としては、炭酸ナトリウム水溶液、リ
ン酸ナトリウム水溶液などを挙げることができるが、特
にこれらに制限されるものではない。
Examples of the weak alkaline aqueous solution include a sodium carbonate aqueous solution and a sodium phosphate aqueous solution, but are not particularly limited thereto.

なお、研磨後に行う中性洗剤によるスラリー除去洗浄、
水洗浄、乾燥、或いは薄膜媒体形成プロセス等々は、本
発明の保管方法を採用しても何ら変更されることはない
In addition, slurry removal cleaning with a neutral detergent after polishing,
Water washing, drying, thin film media forming processes, etc. are not changed in any way by adopting the storage method of the present invention.

(実施例) 次に本発明の実施例を示す。(Example) Next, examples of the present invention will be shown.

実施例1 5インチサイズのアルミニウム合金基盤上に常法により
無電解N i −Cu −Pメッキ皮膜を形成した後、
両面研磨機により5枚を同時に鏡面研磨した。
Example 1 After forming an electroless Ni-Cu-P plating film on a 5-inch aluminum alloy substrate by a conventional method,
Five sheets were mirror-polished at the same time using a double-sided polisher.

これらを試料とし、鏡面研磨後、ベルクリン布と中性洗
剤によりスラリー除去を行い、イオン交換水による仕上
洗浄が終了した順に、IPA、フロンによる乾燥を行う
までの間中(最初の試料で約1時間)、1%炭酸ナトリ
ウム水溶液中に浸漬し、保管しておいた。
These were used as samples, and after mirror polishing, the slurry was removed using a Belklin cloth and a neutral detergent. time), immersed in a 1% aqueous sodium carbonate solution and stored.

次いで全部の試料の水洗浄が終了した時点で全試料を炭
酸ナトリウム水溶液中から取り出し、上記乾燥を行った
Then, when all the samples had been washed with water, they were taken out of the aqueous sodium carbonate solution and dried as described above.

ス」[剋堅− 実施例1と同様の方法で下地メッキ、鏡面研磨した試料
について、中性洗剤によるスラリー除去後、イオン交換
水による仕上洗浄が終了した順に、IPA、フロンによ
る乾燥を行うまでの間中(最初の試料で約1時間)、1
%リン酸ナトリウム水溶液中に浸漬し、保管しておいた
Samples were plated and mirror-polished in the same manner as in Example 1. After removing the slurry with a neutral detergent, the final cleaning with ion-exchanged water was completed, and then the samples were dried with IPA and CFC. for the entire time (approximately 1 hour for the first sample), 1
% sodium phosphate aqueous solution and stored.

次いで、全部の試料の水洗浄が終了した時点で全試料を
リン酸ナトリウム水溶液中から取り出し、上記乾燥を行
った。
Next, when all the samples had been washed with water, they were taken out of the aqueous sodium phosphate solution and dried as described above.

比較例 比較のため、実施例1と同様の方法で下地メッキ、鏡面
研磨した試料について、中性洗剤によるスラリー除去後
、IPA、フロンによる乾燥を行うまでの間、イオン交
換水に浸漬し、保管しておいた。
Comparative Example For comparison, samples were plated undercoat and mirror-polished in the same manner as in Example 1. After removing the slurry with a neutral detergent, the samples were immersed in ion-exchanged water and stored until drying with IPA and Freon. I kept it.

次いで、全部の試料の洗浄が終了した段階で全試料をイ
オン交換水中より取り出し、上記乾燥を行った。
Next, when all the samples had been washed, they were taken out of the ion exchange water and dried as described above.

以上の各実施例及び比較例で得られた試料について、水
洗浄後の時間経過に伴う表面変色状況を調べた。その結
果を第1表に示す。なお、同表中、洗浄順番Nαは最初
の試料Nα1から順に洗浄した順位を示す。
Regarding the samples obtained in each of the above Examples and Comparative Examples, the state of surface discoloration over time after washing with water was investigated. The results are shown in Table 1. In the same table, the cleaning order Nα indicates the order in which the samples were washed starting from the first sample Nα1.

第1表よりわかるように、イオン交換水に浸漬し保管し
ておいた比較例の場合、鏡面研磨直後に水洗浄、乾燥を
行った最後の試料Nα5には変色が認められないが、先
にイオン交換水により水洗浄し、同じイオン交換水中に
浸漬、保管しておいたものは、乾燥後の時間の経過と共
に表面の変色がひどくなる。
As can be seen from Table 1, in the case of the comparative example that was immersed in ion-exchanged water and stored, no discoloration was observed in the last sample Nα5, which was washed with water and dried immediately after mirror polishing, but Items that have been washed with ion-exchanged water, immersed in the same ion-exchanged water, and stored will become more discolored on the surface as time passes after drying.

これに対し、水洗浄後、乾燥するまでの間中、炭酸ナト
リウム水溶液又はリン酸ナトリウム水溶液中に浸漬し保
管しておいた本発明例では、1時間経過後においても表
面に変色が認められず、鏡面研磨、スラリー除去直後に
水洗浄し乾燥したものと全く同じ表面のものが得られた
On the other hand, in the example of the present invention, which was kept immersed in a sodium carbonate aqueous solution or a sodium phosphate aqueous solution after washing with water until drying, no discoloration was observed on the surface even after 1 hour had passed. Immediately after mirror polishing and slurry removal, water washing and drying yielded the same surface.

なお、これらの各試料に対して常法によりC。In addition, each of these samples was treated with C using a conventional method.

−Ni磁性薄膜媒体をスパッター法にて形成し、媒体特
性について調査したところ、本発明例のものはエラー発
生が少なく、安定した特性が得られていたことを確認し
た。
A -Ni magnetic thin film medium was formed by a sputtering method and the medium characteristics were investigated, and it was confirmed that the inventive example had few errors and stable characteristics were obtained.

【以下余白1 (発明の効果) 以上詳述したように、本発明によれば、磁気ディスク用
基盤上に無電解Ni−Cu−Pメッキ皮膜を形成したサ
ブストレートを、鏡面研磨後、乾燥するまでの間、所定
の水溶液中に浸漬し保管しておくので、極めて優れた耐
変色性を付与することができる。したがって、その後の
磁性薄膜媒体の形成性が良く、特性エラー発生の防止等
を可能にするものである。更に、本発明法は簡易で実際
的な方法であるので、他の処理加工作業に何ら支障を来
たすことなく可能である。
[Margin 1 (Effects of the Invention) As detailed above, according to the present invention, a substrate in which an electroless Ni-Cu-P plating film is formed on a magnetic disk substrate is mirror-polished and then dried. Since it is immersed and stored in a predetermined aqueous solution until then, extremely excellent color fastness can be imparted. Therefore, the subsequent formation of the magnetic thin film medium is good, and it is possible to prevent characteristic errors from occurring. Furthermore, since the method of the present invention is a simple and practical method, it can be carried out without any hindrance to other processing operations.

Claims (1)

【特許請求の範囲】[Claims] アルミニウム合金基盤上に無電解Ni−Cu−Pメッキ
による下地処理を施したサブストレートにつき、鏡面研
磨後、水洗浄を経て、乾燥するまでの間において、弱ア
ルカリ水溶液中に浸漬して保管することを特徴とする磁
気ディスク用基盤の変色防止法。
Substrates that have been subjected to surface treatment using electroless Ni-Cu-P plating on an aluminum alloy base are stored by immersing them in a weak alkaline aqueous solution after mirror polishing, washing with water, and until drying. A method for preventing discoloration of a magnetic disk substrate, characterized by:
JP9013787A 1987-04-13 1987-04-13 Method for preventing discoloration of substrate for magnetic disk Pending JPS63255821A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9013787A JPS63255821A (en) 1987-04-13 1987-04-13 Method for preventing discoloration of substrate for magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9013787A JPS63255821A (en) 1987-04-13 1987-04-13 Method for preventing discoloration of substrate for magnetic disk

Publications (1)

Publication Number Publication Date
JPS63255821A true JPS63255821A (en) 1988-10-24

Family

ID=13990120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9013787A Pending JPS63255821A (en) 1987-04-13 1987-04-13 Method for preventing discoloration of substrate for magnetic disk

Country Status (1)

Country Link
JP (1) JPS63255821A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03192520A (en) * 1989-12-21 1991-08-22 Fuji Electric Co Ltd Production of thin film magnetic recording medium
WO2000020663A1 (en) * 1998-10-05 2000-04-13 Ebara Corporation Substrate plating device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03192520A (en) * 1989-12-21 1991-08-22 Fuji Electric Co Ltd Production of thin film magnetic recording medium
WO2000020663A1 (en) * 1998-10-05 2000-04-13 Ebara Corporation Substrate plating device
US6495004B1 (en) 1998-10-05 2002-12-17 Ebara Corporation Substrate plating apparatus

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