JP2001195728A - Method for manufacturing glass substrate for magnetic disk - Google Patents

Method for manufacturing glass substrate for magnetic disk

Info

Publication number
JP2001195728A
JP2001195728A JP2000005204A JP2000005204A JP2001195728A JP 2001195728 A JP2001195728 A JP 2001195728A JP 2000005204 A JP2000005204 A JP 2000005204A JP 2000005204 A JP2000005204 A JP 2000005204A JP 2001195728 A JP2001195728 A JP 2001195728A
Authority
JP
Japan
Prior art keywords
glass substrate
storage frame
magnetic disk
chemical strengthening
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000005204A
Other languages
Japanese (ja)
Inventor
Michitoshi Asai
通利 浅井
Masatoshi Suzuki
正利 鈴木
Masashi Iwashita
正志 岩下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Techno Glass Co Ltd
Original Assignee
Asahi Techno Glass Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Techno Glass Corp filed Critical Asahi Techno Glass Corp
Priority to JP2000005204A priority Critical patent/JP2001195728A/en
Publication of JP2001195728A publication Critical patent/JP2001195728A/en
Withdrawn legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a glass substrate for a magnetic disk while preventing foreign materials from depositing onto the glass substrate. SOLUTION: This method for manufacturing the glass substrate for the magnetic disk comprises a chemical reinforcement step to chemically reinforcing the polished glass substrate by ion exchange while immersing it in a fused liquid for ion exchange in such a state that it is housed in a housing frame and a washing step to wash the chemically reinforced glass substrate in such a state that it is housed in another housing frame made of the material different from that used at the chemical reinforcement step. The housing frame is provided with plural glass substrate holding members 1 parallel to one another and plural glass substrate holding parts 2 each of which is positioned in the part opposite to each of the members 1 and has V-shaped grooves formed almost at even intervals correspondingly to each of the members 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は化学強化によって強
化された磁気ディスク用ガラス基板の製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a glass substrate for a magnetic disk strengthened by chemical strengthening.

【0002】[0002]

【従来の技術】従来、磁気ディスク装置の磁気ディスク
基板としては、アルミが用いられてきた。しかし、最近
では、磁気ディスク装置の高記録密度に伴ない、磁気ヘ
ッドと磁気ディスクとの間隔をより狭くするために、こ
れが可能なガラス基板を用いたものに置き換わるように
なった。
2. Description of the Related Art Conventionally, aluminum has been used as a magnetic disk substrate of a magnetic disk device. However, recently, as the recording density of the magnetic disk device has been increased, in order to make the distance between the magnetic head and the magnetic disk narrower, the magnetic disk device has been replaced with a device using a glass substrate capable of this.

【0003】磁気ディスク用のガラス基板は、磁気ヘッ
ドの浮上高さを低くすることが可能なように、高精度に
研磨加工され、しかも磁気ディスク装置での使用に十分
に耐える強度を有するように、化学強化によって強度を
高めて製造されている。
A glass substrate for a magnetic disk is polished with high precision so that the flying height of a magnetic head can be reduced, and has a strength enough to withstand use in a magnetic disk device. It is manufactured with increased strength by chemical strengthening.

【0004】しかしながら、このような従来技術には次
のような問題点がある。まず、高記録密度化によって、
磁気ディスク表面の高い平担度は必要不可欠であり、磁
気ディスク表面に突起があると、磁気へッドの走行に対
してトラブルが生じることになる。そして、磁気ヘッド
の浮上高さを小さくするために、磁気ディスク表面は高
い平担度と表面粗さを小さくする必要性がますます高ま
り、このため、高精度に研磨を行うことに加えて、ガラ
ス基板上に異物が付着して突起を生じたりしないように
することが重要な課題となっている。通常の洗浄では除
去できない極めて微小な異物がガラス基板上に付善した
状態で磁性膜を形成し、磁気ディスクにした場合、その
微小な突起であっても、最近の低いヘッド浮上高さの磁
気ディスク装置ではトラブルの原因となり得る。従って
このような微小な異物の付着を防止することが望まれて
いる。
However, such a conventional technique has the following problems. First, by increasing the recording density,
A high level of flatness on the surface of the magnetic disk is indispensable, and any protrusions on the surface of the magnetic disk will cause trouble in running the magnetic head. In order to reduce the flying height of the magnetic head, the surface of the magnetic disk is required to have a high flatness and a small surface roughness, and therefore, in addition to performing high-precision polishing, It is an important issue to prevent foreign matter from adhering to the glass substrate to form a projection. When a magnetic disk is formed on a glass substrate with extremely small foreign matter that cannot be removed by ordinary cleaning, and the magnetic film is formed on a magnetic disk, even the minute protrusions, even with the recent low head flying height, can be used. A disk device can cause trouble. Therefore, it is desired to prevent such minute foreign matter from adhering.

【0005】[0005]

【発明が解決しようとする課題】本発明は、このような
従来技術における課題を解決するものであって、磁気デ
ィスク用ガラス基板の製造において、異物の付着を防止
した製造方法を提供し、例え従来は問題にしなかった微
小な異物であっても、その付着を防止するものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems in the prior art, and provides a method of manufacturing a glass substrate for a magnetic disk in which foreign matter is prevented from adhering. Even if it is a minute foreign matter which has not been a problem in the related art, the foreign matter is prevented from adhering.

【0006】[0006]

【課題を解決するための手段】本発明の磁気ディスク用
ガラス基板の製造方法は、表面研磨されたガラス基板を
収納枠に収納した状態でイオン交換用融解液に浸漬しイ
オン交換による化学強化処理を行う化学強化処理工程
と、化学強化処理された前記ガラス基板を収納枠に収納
した状態で洗浄する洗浄工程とを含む磁気ディスク用ガ
ラス基板の製造方法において、前記化学強化処理工程と
前記洗浄工程とで前記ガラス基板を収納する収納枠を異
なる材質で構成したことを特徴とするものである。
According to a method of manufacturing a glass substrate for a magnetic disk of the present invention, a glass substrate having a polished surface is housed in a housing frame and immersed in a melt for ion exchange, and chemically strengthened by ion exchange. And a cleaning step of cleaning the glass substrate that has been subjected to the chemical strengthening treatment in a storage frame, wherein the chemical strengthening treatment step and the cleaning step are performed. And the storage frame for storing the glass substrate is made of a different material.

【0007】本発明において、上記収納枠は、強化用の
場合も洗浄用の場合も、例えば図1の平面図(a)およ
び立面図(b)に示されるように、3本の平行するガラ
ス基板保持部材1を備え、各ガラス基板保持部材1の対
向部には、ほぼ等間隔で、かつ各ガラス基板保持部材1
で対応させて形成されたV字状の溝からなる複数のガラ
ス基板保持部2が形成されており、各ガラス基板保持部
材1の対応するガラス基板保持部2によりそれぞれガラ
ス基板が保持されるようになっている。図2(a)およ
び(b)には、ガラス基板保持部材1の数を多くした収
納枠の例を示す。
[0007] In the present invention, the above-mentioned storage frame is, for both reinforcement and cleaning, three parallel storage frames as shown in, for example, a plan view (a) and an elevation view (b) of FIG. A glass substrate holding member 1 is provided, and the glass substrate holding members 1
A plurality of glass substrate holders 2 each having a V-shaped groove formed in correspondence with each other are formed, and the glass substrates are held by the corresponding glass substrate holders 2 of the respective glass substrate holders 1. It has become. 2A and 2B show examples of the storage frame in which the number of the glass substrate holding members 1 is increased.

【0008】本発明においては、化学強化処理工程の収
納枠を金属製とし、洗浄工程の収納枠をプラスチック樹
脂製とすることが好ましい。
In the present invention, it is preferable that the storage frame in the chemical strengthening process is made of metal and the storage frame in the cleaning process is made of plastic resin.

【0009】化学強化処理工程の収納枠は、強化処理の
高温の溶解液に耐える金属が好ましく用いられ、金属材
料としては、耐食性および耐久性を考慮して、例えばS
US316,304,310などのステンレスが好まし
く用いられる。化学強化処理工程の収納枠をそのまま洗
浄工程に用いると、収納枠の洗浄を必要とすることにな
って大変な手間がかかるため、収納枠を交換することが
好ましい。洗浄工程の収納枠はガラスよりも硬度の低い
プラスチック樹脂が好ましく用いられる。そして洗浄液
の温度が通常50℃以上で洗浄になることを考慮して、
例えばポリアセタール樹脂などの耐熱性の材料が好まし
く用いられる。
The storage frame in the chemical strengthening process is preferably made of a metal that can withstand the high-temperature solution of the strengthening process, and the metal material may be, for example, S in consideration of corrosion resistance and durability.
Stainless steels such as US316, 304, 310 are preferably used. If the storage frame of the chemical strengthening process is used as it is in the cleaning step, cleaning of the storage frame is required, which takes a great deal of time. Therefore, it is preferable to replace the storage frame. A plastic resin having a lower hardness than glass is preferably used for the storage frame in the cleaning step. And, considering that the temperature of the cleaning liquid is usually 50 ° C. or higher, cleaning is performed,
For example, a heat-resistant material such as a polyacetal resin is preferably used.

【0010】また本発明においては、ガラス基板保持部
2の間隔をほぼ一定とされ、その間隔は3mm以上、2
0mm以下であることが好ましい。
In the present invention, the interval between the glass substrate holders 2 is substantially constant, and the interval is 3 mm or more.
It is preferably 0 mm or less.

【0011】ガラス基板保持部の間隔が3mm未満であ
ると、ガラス基板移し替え治具を使用してガラス基板を
収納枠から排出するときにガラス基板を持ち上げたとき
のガラス基板の揺れにより隣り合うガラス基板が接触し
てしまい、ガラス基板主表面に傷を付けてしまうおそれ
がある。また、ガラス基板保持部の間隔が20mmを越
えると、ガラス基板に直接あたる空気量が多くなり、強
化処理後及び洗浄処理後のガラス基板表面に付着した強
化液及び洗浄液の乾燥が速まって、反りなどの品質不良
を招いてしまうおそれがある。
If the distance between the glass substrate holding portions is less than 3 mm, the glass substrates are adjacent to each other due to the vibration of the glass substrates when the glass substrates are lifted up when the glass substrates are discharged from the storage frame using the glass substrate transfer jig. There is a possibility that the glass substrate comes into contact and the main surface of the glass substrate is scratched. Further, when the distance between the glass substrate holding portions exceeds 20 mm, the amount of air directly hitting the glass substrate increases, and the drying of the strengthening solution and the cleaning solution attached to the glass substrate surface after the strengthening process and the cleaning process is accelerated. There is a risk of causing poor quality such as warpage.

【0012】これら収納枠のガラス基板保持部2は、真
横から見てV字形状にすることが好ましく、V字形状の
角度を50゜以上、100゜以下が適している。
The glass substrate holding portion 2 of these storage frames is preferably formed in a V-shape when viewed from the side, and the angle of the V-shape is suitably 50 ° or more and 100 ° or less.

【0013】ガラス基板保持部をV字形状にするとガラ
ス基板保持部2とガラス基板が点接触し液と接触しにく
い部分が最小となるので良好な処理結果が得られる。
When the glass substrate holding portion is formed in a V-shape, a portion where the glass substrate holding portion 2 and the glass substrate are in point contact with each other and hardly contact with the liquid is minimized, so that a good processing result can be obtained.

【0014】また、V字形状の開角が50゜未満である
と、ガラス基板保持部2の開口部が狭くなるため、ガラ
ス基板移し替え治具で運ばれてくるガラス基板の全てを
同時にガラス基板保持部2に収納することが難しくな
り、ガラス基板保持部に収納されなかったガラス基板
が、隣り合うガラス基板と接触する可能性が高くなって
ガラス基板の主表面に傷を付けてしまうおそれが生じ
る。逆に、V字形状の開角が100°を越えてしまう
と、ガラス基板保持部2に収納されているガラス基板の
振れが大きくなるので、ガラス基板移し替え治具でガラ
ス基板を排出するとき、所望とするガラス基板載置部に
ガラス基板を載置できなくなる。したがって、次の工程
の収納枠または輸送用のカセットにガラス基板を傷つけ
ることなく収容することが困難になる。
If the opening angle of the V-shape is less than 50 °, the opening of the glass substrate holding portion 2 becomes narrower, so that all the glass substrates carried by the glass substrate transfer jig are simultaneously glass-coated. It is difficult to store the glass substrate in the substrate holding unit 2, and the possibility that the glass substrate that is not stored in the glass substrate holding unit comes into contact with an adjacent glass substrate increases, and the main surface of the glass substrate may be damaged. Occurs. Conversely, when the opening angle of the V-shape exceeds 100 °, the deflection of the glass substrate housed in the glass substrate holding unit 2 increases, so that the glass substrate transfer jig discharges the glass substrate. In addition, the glass substrate cannot be mounted on the desired glass substrate mounting portion. Therefore, it is difficult to house the glass substrate in the housing frame or the transport cassette in the next step without damaging the glass substrate.

【0015】また本発明の磁気ディスク用ガラス基板の
製造方法は、表面研磨されたガラス基板の複数枚を一定
間隔で平行させて化学強化処理用収納枠に収納した状態
でイオン交換用融解液に浸漬しイオン交換による化学強
化処理を行う化学強化処理工程と、化学強化処理された
前記ガラス基板の複数枚を一定間隔で平行させて洗浄用
収納枠に収納した状態で洗浄する洗浄工程とを含む磁気
ディスク用ガラス基板の製造方法において、前記化学強
化処理工程の終えた磁気ディスク用ガラス基板を、一定
間隔で平行させた状態でガラス基板移し替え治具によ
り、化学強化処理用収納枠から洗浄用ガラス基板収納枠
に移載することを特徴としている。
Further, in the method of manufacturing a glass substrate for a magnetic disk according to the present invention, a plurality of glass substrates whose surfaces have been polished are parallelly arranged at regular intervals and stored in a storage frame for chemical strengthening treatment to form a molten liquid for ion exchange. A chemical strengthening process of immersing and performing a chemical strengthening process by ion exchange, and a washing process of washing a plurality of chemically strengthened glass substrates in a state of being stored in a washing housing frame in parallel at regular intervals. In the method for manufacturing a glass substrate for a magnetic disk, the glass substrate for a magnetic disk after the chemical strengthening process is washed from a storage frame for the chemical strengthening process by a glass substrate transfer jig in a state where the glass substrate is paralleled at regular intervals. It is characterized by being transferred to a glass substrate storage frame.

【0016】ガラス基板移し替え治具11は、複数のガ
ラス基板を一度に強化用、洗浄用の収納枠に収納及び排
出するもので、例えば図3に示すように、棒状部材11
に、ガラス基板保持部材1のガラス基板保持部2と同一
の間隔で円形の溝、即ちガラス基板載置部12を形成さ
せたものである。
The glass substrate transfer jig 11 stores and discharges a plurality of glass substrates in a storage frame for strengthening and cleaning at one time. For example, as shown in FIG.
Further, a circular groove, that is, a glass substrate mounting portion 12 is formed at the same interval as the glass substrate holding portion 2 of the glass substrate holding member 1.

【0017】このガラス基板移し替え治具11は、ドー
ナツ状のガラス基板の中央の孔に挿通して各ガラス基板
載置部12ごとにガラス基板を引っ掛けて、この状態で
各ガラス基板を収納枠の基板保持部に載置させた後、ガ
ラス基板の中央の孔から引き抜くことにより、一度に多
数のガラス基板を収納枠に収納することができる。
The glass substrate transfer jig 11 is inserted into the center hole of a donut-shaped glass substrate and hooks the glass substrate on each of the glass substrate mounting portions 12. After being placed on the substrate holding portion, the glass substrate is pulled out from the center hole of the glass substrate, whereby a large number of glass substrates can be stored in the storage frame at one time.

【0018】収納枠からガラス基板を脱着させる場合に
は、収納枠に載置されている各ガラス基板の中央の穴
に、このガラス基板移し替え治具11を挿通してその各
ガラス基板載置部12ごとにガラス基板を引っ掛けた
後、持ち上げることにより、一度に全部のガラス基板を
収納枠から取り出すことができる。
When detaching the glass substrates from the storage frame, the glass substrate transfer jig 11 is inserted into the center hole of each glass substrate placed on the storage frame, and After the glass substrates are hooked and lifted for each part 12, all the glass substrates can be taken out of the storage frame at a time.

【0019】化学強化処理用収納枠から洗浄用ガラス基
板収納枠にガラス基板を移載する場合にも同様にして行
うことができる。
The transfer of the glass substrate from the storage frame for chemical strengthening treatment to the storage frame for cleaning glass substrate can be performed in the same manner.

【0020】このガラス基板移し替え治具11のガラス
基板載置部12もV字形状の溝とすることが好ましく、
V字形状の溝の開角は50゜以上、100゜以下である
ことが好ましい。
The glass substrate mounting portion 12 of the glass substrate transfer jig 11 is also preferably formed as a V-shaped groove.
The opening angle of the V-shaped groove is preferably 50 ° or more and 100 ° or less.

【0021】このガラス基板移し替え治具11のV字形
状の溝の開角を50゜以上、100゜以下とする理由
は、収納枠のガラス基板保持部2のV字形状の角度を5
0゜以上、100゜以下とする理由と同じである。
The reason why the opening angle of the V-shaped groove of the glass substrate transfer jig 11 is not less than 50 ° and not more than 100 ° is that the V-shaped angle of the glass substrate holding portion 2 of the storage frame is 5 °.
This is the same as the reason for setting the angle between 0 ° and 100 °.

【0022】[0022]

【発明の実施の形態】(実施例1)以下の工程により、
磁気ディスク用ガラス基板を作製した。
(Embodiment 1) By the following steps,
A glass substrate for a magnetic disk was manufactured.

【0023】1次ラップ工程:まず、プレス成形したガ
ラス母材を、砥粒径30μmで研磨し、板厚0.9mm
以下に仕上げた。なお、この母材は、フロート法で成形
したものでもよい。
First lapping step: First, a pressed glass base material is polished with an abrasive particle size of 30 μm, and the plate thickness is 0.9 mm.
Finished below. The base material may be formed by a float method.

【0024】形状加工工程:次に、円筒状の砥石でガラ
ス基板の中央部に孔をあけた後、内外周研削を行い、所
定の外径寸法および内径寸法に仕上げた。この後、ブラ
シ研磨により、ガラス基板を回転させながらガラス基板
の端面を鏡面状に研磨することにより、後の工程でのチ
ッピング発生による研磨キズや破片の付着を防止した。
Shape processing step: Next, a hole was made in the center of the glass substrate with a cylindrical grindstone, and then the inner and outer circumferences were ground to finish to predetermined outer and inner diameter dimensions. Thereafter, the end surface of the glass substrate was polished to a mirror-like shape while rotating the glass substrate by brush polishing, thereby preventing polishing flaws and adhesion of debris due to chipping in a later step.

【0025】2次ラッブ工程:次に、1次ラッブと形状
加工で発生したキズやピットを除去するために、砥粒径
10μm以下で研磨した。この研磨後、ガラス基板を薬
液と純水に順次浸けて研磨材を洗い落として乾燥させ
た。
Secondary rubbing step: Next, in order to remove scratches and pits generated in the primary rubbing and shape processing, polishing was performed with an abrasive particle size of 10 μm or less. After this polishing, the glass substrate was sequentially immersed in a chemical solution and pure water to wash off the abrasive and dry.

【0026】1次ポリッシユ:次に、1次ポリッシュを
行った。この工程は、内外周の端部形状を作り込むこと
を目的とし、研磨時間を60分かけて30μmを除去し
た。
Primary polishing: Next, primary polishing was performed. The purpose of this step is to form the inner and outer peripheral end portions, and the polishing time was 60 minutes to remove 30 μm.

【0027】この工程を終えたガラス基板を3槽の洗浄
機で研磨材を洗い落とした後に、スピン乾燥させた。
The glass substrate after this step was washed off the abrasive with a three-tank washer and then spin-dried.

【0028】2次ポリッシュ:次に、平担性と表面粗さ
の良好なガラス基板表面を得ることを目的とし、研磨条
件として、圧力50g/cm2 、下定盤回転数50rp
m、研磨時間20分で5μmの除去を行った。
Secondary polishing: Next, for the purpose of obtaining a glass substrate surface having good flatness and surface roughness, the polishing conditions were a pressure of 50 g / cm 2 and a lower platen rotation speed of 50 rpm.
m, and removal of 5 μm was performed in a polishing time of 20 minutes.

【0029】この工程を終えたガラス基板を酸洗剤、ア
ルカリ洗剤、純水、IPAの各槽に順次浸けて研磨材を
洗い落とした。なお、各槽では、揺動させながら超音液
を印加した。
After the completion of this step, the glass substrate was sequentially immersed in a bath of an acid detergent, an alkaline detergent, pure water and IPA to wash off the abrasive. In each tank, the supersonic liquid was applied while rocking.

【0030】移し替え工程:次に、化学強化を行うため
の、ステンレス製の収納枠に、ガラス基板をガラス基板
載置部を備えた自動移し替え装置によって移し替えた。
なお、この収納枠は、ガラス基板の保持をガラス基板保
持部が複数形成されたガラス基板保持部材で行ってお
り、このガラス基板保持部材は図1に示すように収納枠
3本具備されている。
Transfer step: Next, the glass substrate was transferred to a stainless steel storage frame for chemical strengthening by an automatic transfer device having a glass substrate mounting portion.
In this storage frame, the glass substrate is held by a glass substrate holding member on which a plurality of glass substrate holding portions are formed, and the glass substrate holding member is provided with three storage frames as shown in FIG. .

【0031】化学強化工程:次に、ガラス基板の強度を
高める化学強化を行った。化学強化は、予熱したガラス
基板を化学強化処理液を温度コントロールできる処理槽
の中に入れ自動搬送で強化槽にガラス基板を所定時間浸
けた後、徐冷を行った。
Chemical strengthening step: Next, chemical strengthening was performed to increase the strength of the glass substrate. The chemical strengthening was performed by placing a preheated glass substrate in a processing bath capable of controlling the temperature of the chemical strengthening processing solution, immersing the glass substrate in the strengthening bath for a predetermined time by automatic conveyance, and then gradually cooling the glass substrate.

【0032】移し替え工程:次いで、洗浄を行うため
に、強化液の付着した化学強化用の収納枠を洗浄槽に持
ち込まないようにするため、ガラス基板を洗浄専用のフ
ッ素樹脂製の収納枠に移し替えた。なお、この収納枠
は、ガラス基板の保持をガラス基板保持部が複数形成さ
れたガラス基板保持部材で行なっており、このガラス基
板保持部材は図1に示すように収納枠に3本具備されて
いる。
Transfer step: Next, in order to prevent the storage frame for chemical strengthening with the strengthening solution from being carried into the cleaning tank in order to perform cleaning, the glass substrate is placed in a storage frame made of fluororesin dedicated to cleaning. Transferred. In addition, in this storage frame, the glass substrate is held by a glass substrate holding member in which a plurality of glass substrate holding portions are formed. As shown in FIG. 1, three glass substrate holding members are provided in the storage frame. I have.

【0033】洗浄工程:次に、化学強化された、ガラス
基板の表面粗さを改善するために、この工程を終えたガ
ラス基板を酸洗剤、アルカリ洗剤、純水、IPAの各槽
に順次浸けて、付着物を洗い落とした。なお、各槽で
は、揺動させながら超音波を印加した。
Cleaning step: Next, in order to improve the surface roughness of the chemically strengthened glass substrate, the glass substrate after this step is sequentially immersed in a bath of an acid detergent, an alkaline detergent, pure water and IPA. To remove the deposits. In each tank, ultrasonic waves were applied while being rocked.

【0034】上記の工程を経て得られたガラス基板の主
表面の表面粗さRaは0.5nm以下であった。さら
に、グライドハイト影響を及ぼす付着物は認められず、
特に、3μm以下の付着物も認められなかった。
The surface roughness Ra of the main surface of the glass substrate obtained through the above steps was 0.5 nm or less. Furthermore, no deposits affecting glide height were found,
In particular, no deposits of 3 μm or less were observed.

【0035】なお、以上の結果は、ガラス基板のサイズ
が3.0インチであっても3.5インチであっても、ま
た、板厚を変えても同様の結果が得られた。
The above results were obtained regardless of whether the size of the glass substrate was 3.0 inches or 3.5 inches and the thickness was changed.

【0036】(実施例2〜8、比較例1〜4)アルミノ
シリケートガラス母材とし用い、直径67mm、厚さ
1.4mmにプレス加工した素材を、まず両面研磨機を
用いて#400のアルミナ砥粒で表裏面のラッピング加
工を行つた。次に内周の下孔をあけ、内外周加工機を用
いて、内周面および外周面側面に所定の面取り加工を行
った。
(Examples 2 to 8 and Comparative Examples 1 to 4) A material which was used as an aluminosilicate glass base material and was pressed to a diameter of 67 mm and a thickness of 1.4 mm was firstly subjected to # 400 alumina using a double-side polishing machine. Wrapping of the front and back surfaces was performed with abrasive grains. Next, a prepared hole was formed on the inner periphery, and a predetermined chamfering process was performed on the inner peripheral surface and the outer peripheral surface side surface using an inner and outer peripheral processing machine.

【0037】次いで両面研磨機を用い、#1000のア
ルミナ砥粒を用いて表裏面のラッピング処理を行った。
引き続いて研磨材として酸化セリウムを用いて1次ポリ
ッシュを行った。更に、酸化セリウムと軟質ポリッシャ
を用いて最終ポリッシュを行った。
Next, using a double-side polishing machine, lapping treatment was performed on the front and back surfaces using # 1000 alumina abrasive grains.
Subsequently, primary polishing was performed using cerium oxide as an abrasive. Further, final polishing was performed using cerium oxide and a soft polisher.

【0038】その後、化学強化処理前に予め基板の平坦
度を測定し検査によってキズの無いことを確認した後、
収納枠にガラス基板を保持し、320℃で20分間予熱
した後400℃の化学強化処理液に60分浸漬し化学強
化処理を行った。ここで本発明の実施例の収納枠の基板
間距離として6mm、9mm、12mmおよび15mm
の4種類を試み、また比較例として2mmおよび50m
mを試みた。
After that, before the chemical strengthening treatment, the flatness of the substrate was measured in advance, and it was confirmed by inspection that there was no flaw.
The glass substrate was held in a storage frame, preheated at 320 ° C. for 20 minutes, and then immersed in a chemical strengthening treatment solution at 400 ° C. for 60 minutes to perform a chemical strengthening treatment. Here, 6 mm, 9 mm, 12 mm, and 15 mm were set as the distance between the substrates of the storage frame of the embodiment of the present invention.
Of 4 mm, and 2 mm and 50 m as comparative examples
m.

【0039】その後、350℃に保たれた徐冷炉に保持
されたガラス基板を入れ、40分徐冷を行い、取出した
基板の平坦度を測定し、強化前との平坦度の変化量を調
べた。ガラス基板載置部の溝の深さは2mm未満では隣
のガラスと接触し易く、8mmを超えると深すぎて少し
の揺れでガラス主表面が冶具にあたり易くなることか
ら、2mmないし8mmとした。なお平坦度は、レーザ
ー干渉計(FUJINON (株)社製;F601 )を用いて測定
した。また、その後基板の洗浄を行った後、20万ルク
スの光源を用いて取り扱いによるキズ、ディスクの接触
によるキズについて検査を行った。この結果を表1に示
す。
Thereafter, the glass substrate held in the annealing furnace kept at 350 ° C. was put into the furnace, and cooled slowly for 40 minutes, and the flatness of the taken-out substrate was measured, and the change in the flatness before reinforcement was examined. . When the depth of the groove of the glass substrate mounting portion is less than 2 mm, it is easy to make contact with the adjacent glass, and when it exceeds 8 mm, it is too deep and the main surface of the glass easily hits the jig with a little shaking. The flatness was measured using a laser interferometer (F601, manufactured by FUJINON Corporation). In addition, after the substrate was washed, inspection was performed using a light source of 200,000 lux for scratches due to handling and scratches due to contact with the disk. Table 1 shows the results.

【0040】[0040]

【表1】 [Table 1]

【0041】この結果、表1に示すように、基板間隔が
2ないし15mmのものは、化学強化工程の前後での平
坦度の変化量は絶対値で平均0.5ないし0.7μmで
あるのに対し、基板間隔が50mmの場合は平坦度の変
化量が3.6mmと大きくなる。またディスクに発生す
るキズについては、基板間隔が2mmの比較例では発生
率が24%と大きく、他はいずれも3%以内と良好であ
った。
As a result, as shown in Table 1, when the distance between the substrates is 2 to 15 mm, the change in flatness before and after the chemical strengthening step is 0.5 to 0.7 μm on average in absolute value. On the other hand, when the substrate interval is 50 mm, the flatness change amount is as large as 3.6 mm. As for the flaws generated on the disc, the rate of occurrence was as large as 24% in the comparative example in which the distance between the substrates was 2 mm, and the others were as good as 3% or less.

【0042】以上の結果から明らかなように、本発明に
より最終ポリッシュ後の化学強化処理及び徐冷工程を行
う際に、ガラス基板の収納枠の距離をある一定の範囲内
で等間隔に保つことにより、従来困難であった化学強化
処理による平坦度の変化量の低減を可能にしながら、キ
ズの発生が少なく、高歩留でガラス基板の製造を行うこ
とができる。
As is apparent from the above results, when performing the chemical strengthening treatment and the slow cooling step after the final polishing according to the present invention, the distance between the storage frames of the glass substrates is kept at regular intervals within a certain range. Accordingly, it is possible to reduce the amount of change in flatness due to the chemical strengthening process, which has been difficult in the past, to reduce scratches, and to manufacture a glass substrate with a high yield.

【0043】[0043]

【発明の効果】以上のように、本発明のガラス基板の製
造方法によれば、ガラス基板上に異物の付着が防止でき
るので、表面性の優れた磁気ディスク用ガラス基板が製
造でき、低い磁気ヘッド浮上高さで高密度記録を行う磁
気ディスク装置に用いる磁気ディスク媒体に使用するこ
とができる。
As described above, according to the method for manufacturing a glass substrate of the present invention, it is possible to prevent foreign substances from adhering to the glass substrate, so that a glass substrate for a magnetic disk having excellent surface properties can be manufactured and a low magnetic property can be obtained. The present invention can be used for a magnetic disk medium used in a magnetic disk device that performs high-density recording at a head flying height.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は、本発明の一実施例におけるガラス基
板を収納する収納枠模式的に示す平面図。(b)は、本
発明の一実施例におけるガラス基板を収納する収納枠模
式的に示す立面図。
FIG. 1A is a plan view schematically showing a storage frame for storing a glass substrate according to an embodiment of the present invention. (B) is an elevation view which shows typically the storage frame which stores the glass substrate in one Example of this invention.

【図2】(a)は、本発明の他の一実施例におけるガラ
ス基板を収納する収納枠を示す模式的平面図。(b)
は、本発明の他の一実施例におけるガラス基板を収納す
る収納枠を示す模式的立面図。
FIG. 2A is a schematic plan view showing a storage frame for storing a glass substrate according to another embodiment of the present invention. (B)
FIG. 4 is a schematic elevation view showing a storage frame for storing a glass substrate in another embodiment of the present invention.

【図3】本発明の一実施例におけるガラス基板移し変え
冶具の棒状部材の要部を模式的に示す平面図。
FIG. 3 is a plan view schematically showing a main part of a rod-shaped member of a glass substrate transfer jig according to one embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1……ガラス基板保持部材、 2……ガラス基板保持
部、 11……棒状部材、 12……ガラス基板載
置部。
DESCRIPTION OF SYMBOLS 1 ... Glass substrate holding member, 2 ... Glass substrate holding part, 11 ... Bar-shaped member, 12 ... Glass substrate mounting part.

フロントページの続き (72)発明者 岩下 正志 静岡県榛原郡吉田町川尻3583番地の5 旭 テクノグラス株式会社内 Fターム(参考) 5D112 AA02 AA24 BA03 GA08 GA26 KK01 Continuation of the front page (72) Inventor Masashi Iwashita 5358 Kawajiri, Yoshida-cho, Haibara-gun, Shizuoka Prefecture F-term in Asahi Techno Glass Co., Ltd. 5D112 AA02 AA24 BA03 GA08 GA26 KK01

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 表面研磨されたガラス基板を収納枠に収
納した状態でイオン交換用融解液に浸漬しイオン交換に
よる化学強化処理を行う化学強化処理工程と、化学強化
処理された前記ガラス基板を収納枠に収納した状態で洗
浄する洗浄工程とを含む磁気ディスク用ガラス基板の製
造方法において、 前記化学強化処理工程と前記洗浄工程とで前記ガラス基
板を収納する収納枠を異なる材質で構成したことを特徴
とする磁気ディスク用ガラス基板の製造方法。
1. A chemical strengthening process in which a glass substrate whose surface is polished is immersed in a melt for ion exchange in a state of being stored in a storage frame to perform chemical strengthening by ion exchange; and A method for manufacturing a glass substrate for a magnetic disk, comprising: a cleaning step of cleaning while being stored in a storage frame, wherein the storage frame for storing the glass substrate is made of a different material in the chemical strengthening treatment step and the cleaning step. A method for producing a glass substrate for a magnetic disk.
【請求項2】 前記化学強化処理工程で使用する収納枠
を金属製とし、前記洗浄工程で使用する収納枠をプラス
チック製としたことを特徴とする請求項1記載の磁気デ
ィスク用ガラス基板の製造方法。
2. The manufacturing of a glass substrate for a magnetic disk according to claim 1, wherein the storage frame used in the chemical strengthening process is made of metal, and the storage frame used in the washing process is made of plastic. Method.
【請求項3】 前記収納枠が、それぞれガラス基板を保
持可能な複数のガラス基板保持部を有し、各ガラス基板
保持部の間隔が一定とされていることを特徴とする請求
項1または2記載の磁気ディスク用ガラス基板の製造方
法。
3. The storage frame has a plurality of glass substrate holders each capable of holding a glass substrate, and a distance between the respective glass substrate holders is constant. A method for producing a glass substrate for a magnetic disk as described above.
【請求項4】 前記収納枠のガラス基板保持部の間隔が
3mm以上、20mm以下であることを特徴とする請求
項3記載の磁気ディスク用ガラス基板の製造方法。
4. The method of manufacturing a glass substrate for a magnetic disk according to claim 3, wherein an interval between the glass substrate holding portions of the storage frame is 3 mm or more and 20 mm or less.
【請求項5】 前記収納枠のガラス基板保持部が収納枠
の平行する複数の基板保持部材にほぼ等間隔で形成され
たV字形状の溝からなることを特徴とする請求項1ない
し4のいずれか1項記載の磁気ディスク用ガラス基板の
製造方法。
5. The storage frame according to claim 1, wherein the glass substrate holding portion of the storage frame comprises V-shaped grooves formed at substantially equal intervals in a plurality of substrate holding members parallel to the storage frame. A method for producing a glass substrate for a magnetic disk according to any one of the preceding claims.
【請求項6】 前記V字形状の溝の角度が50゜以上、
100゜以下であることを特徴とする請求項5記載の磁
気ディスク用ガラス基板の製造方法。
6. The angle of the V-shaped groove is 50 ° or more,
6. The method for manufacturing a glass substrate for a magnetic disk according to claim 5, wherein the angle is 100 [deg.] Or less.
【請求項7】 表面研磨されたガラス基板の複数枚を一
定間隔で平行させて化学強化処理用収納枠に収納した状
態でイオン交換用融解液に浸漬しイオン交換による化学
強化処理を行う化学強化処理工程と、化学強化処理され
た前記ガラス基板の複数枚を一定間隔で平行させて洗浄
用収納枠に収納した状態で洗浄する洗浄工程とを含む磁
気ディスク用ガラス基板の製造方法において、 前記化学強化処理工程の終えた磁気ディスク用ガラス基
板を、一定間隔で平行させた状態でガラス基板移し替え
治具により、化学強化処理用収納枠から洗浄用ガラス基
板収納枠に移載することを特徴とする磁気ディスク用ガ
ラス基板の製造方法。
7. A chemical strengthening process in which a plurality of glass substrates whose surfaces have been polished are immersed in an ion-exchange melt while being stored in a storage frame for chemical strengthening treatment in parallel at regular intervals, and subjected to chemical strengthening treatment by ion exchange. A method for manufacturing a glass substrate for a magnetic disk, comprising: a processing step; and a cleaning step of cleaning a plurality of the glass substrates subjected to the chemical strengthening treatment in a state of being stored in a cleaning storage frame in parallel at regular intervals. The glass substrate for magnetic disk after the tempering process is transferred from the storage frame for chemical strengthening process to the glass frame for cleaning by using a glass substrate transfer jig with the glass substrate transfer jig kept in parallel at regular intervals. Of manufacturing a magnetic disk glass substrate.
JP2000005204A 2000-01-05 2000-01-05 Method for manufacturing glass substrate for magnetic disk Withdrawn JP2001195728A (en)

Priority Applications (1)

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Publication Number Publication Date
JP2001195728A true JP2001195728A (en) 2001-07-19

Family

ID=18533889

Family Applications (1)

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Country Status (1)

Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007102845A (en) * 2005-09-30 2007-04-19 Hoya Glass Disk Thailand Ltd Tool for holding disk
JP2008171502A (en) * 2007-01-11 2008-07-24 Hoya Corp Manufacturing method of glass substrate for magnetic disk, manufacturing method of magnetic disk, and glass substrate holder
JPWO2008078528A1 (en) * 2006-12-26 2010-04-22 コニカミノルタオプト株式会社 Holding jig, method for manufacturing glass substrate for recording medium using the holding jig, glass substrate for recording medium, and recording medium
JP2011119007A (en) * 2009-12-07 2011-06-16 Showa Denko Kk Substrate alignment tool and transfer method of substrate
CN110156307A (en) * 2019-04-27 2019-08-23 江西晶阳光电科技有限公司 A kind of full-automatic glass cover board tempering machine

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007102845A (en) * 2005-09-30 2007-04-19 Hoya Glass Disk Thailand Ltd Tool for holding disk
JPWO2008078528A1 (en) * 2006-12-26 2010-04-22 コニカミノルタオプト株式会社 Holding jig, method for manufacturing glass substrate for recording medium using the holding jig, glass substrate for recording medium, and recording medium
JP2008171502A (en) * 2007-01-11 2008-07-24 Hoya Corp Manufacturing method of glass substrate for magnetic disk, manufacturing method of magnetic disk, and glass substrate holder
JP2011119007A (en) * 2009-12-07 2011-06-16 Showa Denko Kk Substrate alignment tool and transfer method of substrate
CN110156307A (en) * 2019-04-27 2019-08-23 江西晶阳光电科技有限公司 A kind of full-automatic glass cover board tempering machine

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