JPWO2008078528A1 - Holding jig, method for manufacturing glass substrate for recording medium using the holding jig, glass substrate for recording medium, and recording medium - Google Patents

Holding jig, method for manufacturing glass substrate for recording medium using the holding jig, glass substrate for recording medium, and recording medium Download PDF

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JPWO2008078528A1
JPWO2008078528A1 JP2008551018A JP2008551018A JPWO2008078528A1 JP WO2008078528 A1 JPWO2008078528 A1 JP WO2008078528A1 JP 2008551018 A JP2008551018 A JP 2008551018A JP 2008551018 A JP2008551018 A JP 2008551018A JP WO2008078528 A1 JPWO2008078528 A1 JP WO2008078528A1
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glass substrate
holding jig
support member
recording medium
groove
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太 石田
太 石田
賢一 佐々木
賢一 佐々木
浩明 澤田
浩明 澤田
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Konica Minolta Opto Inc
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Konica Minolta Opto Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739Magnetic recording media substrates
    • G11B5/73911Inorganic substrates
    • G11B5/73921Glass or ceramic substrates

Abstract

ガラス基板にひびやキズ、割れの生じない保持治具、該保持治具を用いた記録媒体用ガラス基板の製造方法、記録媒体用ガラス基板及び記録媒体を提供する。ガラス基板を支持する側部支持部材の断面形状が互いに平行な平坦部を有する保持治具を用いた記録媒体用ガラス基板の製造方法である。There are provided a holding jig that does not cause cracks, scratches and cracks in a glass substrate, a method for producing a glass substrate for a recording medium using the holding jig, a glass substrate for a recording medium, and a recording medium. This is a method for manufacturing a glass substrate for a recording medium using a holding jig having flat portions in which the cross-sectional shapes of the side support members that support the glass substrate are parallel to each other.

Description

本発明は、保持治具、該保持治具を用いた記録媒体用ガラス基板の製造方法、記録媒体用ガラス基板及び記録媒体に関する。   The present invention relates to a holding jig, a method for manufacturing a glass substrate for a recording medium using the holding jig, a glass substrate for a recording medium, and a recording medium.

従来、記録媒体用基板としては、デスクトップ用コンピュータやサーバなどの据え置き型の情報機器にはアルミニウム合金が使用され、ノート型コンピュータやモバイル型コンピュータなどの携帯型の情報機器にはガラス基板が一般に使用されていた。アルミニウム合金は変形しやすく、また硬さが不十分であるため研磨後の基板表面の平滑性が十分とは言えなかった。さらに、記録用ヘッドが機械的に磁気ディスクに接触する際、磁性膜が基板から剥離しやすいという問題もあった。そこで、変形が少なく、平滑性が良好で、かつ機械的強度の大きいガラス基板が、携帯型のみならず据え置き型の情報機器やその他のテレビ等の家庭用機器にも今後広く使用されていくものと予測されている。   Conventionally, as a recording medium substrate, aluminum alloys are used for stationary information devices such as desktop computers and servers, and glass substrates are generally used for portable information devices such as notebook computers and mobile computers. It had been. Since the aluminum alloy is easily deformed and has insufficient hardness, the smoothness of the substrate surface after polishing cannot be said to be sufficient. Further, when the recording head mechanically contacts the magnetic disk, there is a problem that the magnetic film is easily peeled off from the substrate. Therefore, glass substrates with little deformation, good smoothness, and high mechanical strength will be widely used not only for portable devices but also for home-use devices such as stationary information devices and other televisions in the future. It is predicted.

記録媒体用ガラス基板の機械的強度を向上させるために、化学強化処理が従来から広く行われている。この化学強化処理は、化学強化処理槽内に貯留された化学強化液中にガラス基板を浸漬させて、ガラス基板表面のアルカリ金属イオンを、そのアルカリ金属イオンよりも大きなイオン径のアルカリ金属イオンと置換することにより圧縮歪みを発生させ、機械的強度を向上させるものである。   In order to improve the mechanical strength of the glass substrate for recording media, chemical strengthening treatment has been widely performed. In this chemical strengthening treatment, a glass substrate is immersed in a chemical strengthening solution stored in a chemical strengthening treatment tank, and alkali metal ions on the surface of the glass substrate are mixed with alkali metal ions having an ion diameter larger than the alkali metal ions. By replacing, compressive strain is generated, and mechanical strength is improved.

この化学強化処理を行う際に記録媒体用ガラス基板を保持する保持治具として、特許文献1に記載されているものが知られている。この保持治具は、3つの穴が形成された板状の側板に、ソロバン玉状の複数の突部を有する3本の軸状体が固定されたものである。これらの軸状体に形成される突部の間には、V字状の谷底部が形成され、これらの谷底部はガラス基板の外周部を支持することができる。そして、これらの軸状体はガラス基板の外周部の3箇所を支持することによってガラス基板の側面が軸状体の軸線方向と直交するように複数のガラス基板を保持できるようになっている。   As a holding jig for holding a glass substrate for a recording medium when performing this chemical strengthening treatment, one described in Patent Document 1 is known. In this holding jig, three shaft-like bodies having a plurality of abacus ball-like projections are fixed to a plate-like side plate in which three holes are formed. Between the protrusions formed on these shaft-shaped bodies, V-shaped valley bottoms are formed, and these valley bottoms can support the outer periphery of the glass substrate. And these shaft-shaped bodies can hold | maintain a some glass substrate so that the side surface of a glass substrate may be orthogonal to the axial direction of a shaft-shaped body by supporting three places of the outer peripheral part of a glass substrate.

このような保持治具を用いて、ガラス基板を化学強化する際には、例えば、次のような方法が用いられる。複数のガラス基板を保持した保持治具を予め300℃に加熱し、400℃の化学強化処理液の入った化学強化処理槽に約3時間浸漬する。この後、ガラス基板を保持した保持治具を化学強化処理液から取りだし、20℃の水槽に浸漬して急冷し約10分間維持することでガラス基板表面の化学強化を行うことができる。
特開2001−195728号公報
When chemically strengthening a glass substrate using such a holding jig, for example, the following method is used. A holding jig holding a plurality of glass substrates is heated in advance to 300 ° C. and immersed in a chemical strengthening treatment bath containing a chemical strengthening treatment liquid at 400 ° C. for about 3 hours. Thereafter, the glass substrate surface can be chemically strengthened by taking out the holding jig holding the glass substrate from the chemical strengthening treatment liquid, immersing it in a 20 ° C. water bath, rapidly cooling it, and maintaining it for about 10 minutes.
JP 2001-195728 A

しかし、特許文献1における保持治具の形状では、ガラス基板の側部2カ所を支持する支持部がV字状の形状となっている。この状態で化学強化され、化学強化処理液から取り出されると、保持治具の収縮によりガラス基板を側部2カ所で挟まれることがあり、ひびやキズ、割れが発生するという問題があった。   However, in the shape of the holding jig in Patent Document 1, the supporting portions that support the two side portions of the glass substrate are V-shaped. When chemically strengthened in this state and taken out from the chemical strengthening treatment solution, the glass substrate may be sandwiched between the two side portions due to contraction of the holding jig, and there is a problem that cracks, scratches, and cracks occur.

従って、本発明が解決しようとする技術課題は、ガラス基板にひびやキズ、割れの生じない保持治具、該保持治具を用いた記録媒体用ガラス基板の製造方法、記録媒体用ガラス基板及び記録媒体を提供することである。   Therefore, the technical problem to be solved by the present invention is a holding jig that does not cause cracks or scratches on the glass substrate, a method of manufacturing a glass substrate for recording medium using the holding jig, a glass substrate for recording medium, and It is to provide a recording medium.

上記の課題を解決するために、本発明は以下の特徴を有するものである。   In order to solve the above problems, the present invention has the following features.

1.
ガラス基板を化学強化液に浸漬し化学強化を行う工程で用いる前記ガラス基板を保持する保持治具において、
前記保持治具は、複数の支持部材と、該支持部材を取り付ける一対の固定部材とを有し、前記複数の支持部材は、前記ガラス基板を支持するための複数の溝を備えた、前記ガラス基板の下部を支持する下部支持部材と、前記ガラス基板の側部を支持する側部支持部材とからなり、
前記側部支持部材の溝の断面形状が互いに平行な平坦部を有することを特徴とする保持治具。
1.
In the holding jig for holding the glass substrate used in the process of chemical strengthening by immersing the glass substrate in the chemical strengthening liquid,
The holding jig includes a plurality of support members and a pair of fixing members to which the support members are attached, and the plurality of support members include a plurality of grooves for supporting the glass substrate. A lower support member that supports the lower part of the substrate, and a side support member that supports the side part of the glass substrate,
A holding jig having flat portions in which the cross-sectional shapes of the grooves of the side support members are parallel to each other.

2.
前記側部支持部材の溝の入り口が面取りした形状であることを特徴とする1に記載の保持治具。
2.
2. The holding jig according to 1, wherein an entrance of a groove of the side support member is chamfered.

3.
前記側部支持部材の溝の互いに平行な平坦部の間隔が1〜2mmであることを特徴とする1又は2に記載の保持治具。
3.
3. The holding jig according to 1 or 2, wherein a distance between flat portions parallel to each other in the groove of the side support member is 1 to 2 mm.

4.
前記側部支持部材の溝の互いに平行な平坦部の何れか一方と、前記ガラス基板の側部との重なる領域が、0.5〜5mmであることを特徴とする1乃至3の何れか1項に記載の保持治具。
4).
Any one of 1 to 3, wherein a region where any one of the flat portions parallel to each other of the groove of the side support member and the side portion of the glass substrate overlap is 0.5 to 5 mm. The holding jig according to the item.

5.
互いに対向配置された2本の前記側部支持部材間の前記ガラス基板の側部を指示する内側の間隔Lと、前記ガラス基板の外径Gとが、0.2mm≦L−G≦5.0mmの関係にあることを特徴とする1乃至4の何れか1項に記載の保持治具。
5).
An inner distance L indicating the side of the glass substrate between the two side support members arranged opposite to each other and an outer diameter G of the glass substrate are 0.2 mm ≦ LG ≦ 5. The holding jig according to any one of 1 to 4, wherein the holding jig has a relationship of 0 mm.

6.
前記側部支持部材の溝の断面形状がコの字状であることを特徴とする1乃至5の何れか1項に記載の保持治具。
6).
6. The holding jig according to any one of 1 to 5, wherein a cross-sectional shape of the groove of the side support member is a U-shape.

7.
前記下部支持部材の溝の断面形状がV字状であり、前記ガラス基板の外周端部の2カ所が面取り加工されており、該面取り加工後の2つの加工面のなす角度をθ2とした時、前記V字状の角度θ1が下記式の範囲であることを特徴とする1乃至6の何れか1項に記載の保持治具。
7).
When the cross-sectional shape of the groove of the lower support member is V-shaped, the outer peripheral end of the glass substrate is chamfered at two locations, and the angle formed by the two processed surfaces after chamfering is θ2. The holding jig according to any one of 1 to 6, wherein the V-shaped angle θ1 is within the range of the following formula.

θ2<θ1<170°
8.
前記下部支持部材の溝の断面形状がV字状であり、前記ガラス基板の外周端部がラウンド加工がされており、前記V字状の角度θ1が90°〜170°であることを特徴とする1乃至6の何れか1項に記載の保持治具。
θ2 <θ1 <170 °
8).
The cross-sectional shape of the groove of the lower support member is V-shaped, the outer peripheral end of the glass substrate is rounded, and the V-shaped angle θ1 is 90 ° to 170 °. The holding jig according to any one of 1 to 6.

9.
前記下部支持部材の溝の断面形状が円弧状であり、前記ガラス基板の外周端部の2カ所が面取り加工されており、前記ガラス基板の面取り加工された面取り部の外端が、前記溝の断面と接触することを特徴とする1乃至6の何れか1項に記載の保持治具。
9.
A cross-sectional shape of the groove of the lower support member is an arc shape, two outer peripheral end portions of the glass substrate are chamfered, and an outer end of the chamfered portion of the glass substrate is chamfered. The holding jig according to any one of 1 to 6, wherein the holding jig is in contact with a cross section.

10.
前記下部支持部材の溝の断面形状が曲率半径R1の円弧状であり、前記ガラス基板の外周端部がラウンド加工がされており、該外周端部の曲率半径をR2とした時、R1がR2よりも大きいことを特徴とする1乃至6の何れか1項に記載の保持治具。
10.
The cross-sectional shape of the groove of the lower support member is an arc shape with a radius of curvature R1, the outer peripheral end of the glass substrate is rounded, and when the radius of curvature of the outer peripheral end is R2, R1 is R2. The holding jig according to any one of 1 to 6, wherein the holding jig is larger.

11.
ガラス基板を化学強化する工程を有する記録媒体用ガラス基板の製造方法において、
1乃至10の何れか1項の保持治具を用いて製造することを特徴とする記録媒体用ガラス基板の製造方法。
11.
In the manufacturing method of the glass substrate for recording media which has the process of chemically strengthening a glass substrate,
1. A method for producing a glass substrate for a recording medium, which is produced using the holding jig according to any one of 1 to 10.

12.
11に記載の記録媒体用ガラス基板の製造方法をもちいて製造されることを特徴とする記録媒体用ガラス基板。
12
A glass substrate for a recording medium, which is produced using the method for producing a glass substrate for a recording medium according to 11.

13.
12に記載の記録媒体用ガラス基板の表面に磁性膜を有することを特徴とする記録媒体。
13.
13. A recording medium comprising a magnetic film on the surface of the glass substrate for recording medium according to item 12.

本発明によれば、保持治具の側部支持部材の溝の断面形状が互いに平行な平坦部を有する構成としたので、化学強化工程における温度変化に伴い、側部支持部材間の距離が収縮しても、ガラス基板にひびやキズ、割れを発生することがない。   According to the present invention, since the cross-sectional shape of the groove of the side support member of the holding jig has a flat portion parallel to each other, the distance between the side support members shrinks with the temperature change in the chemical strengthening process. Even so, the glass substrate is not cracked, scratched or cracked.

記録媒体用ガラス基板の製造工程の例を示すフロー図である。It is a flowchart which shows the example of the manufacturing process of the glass substrate for recording media. 図1における化学強化処理工程の内容を示すフロー図である。It is a flowchart which shows the content of the chemical strengthening process process in FIG. (a)はガラス基板を収納し保持する一例の保持治具の上面、(b)はガラス基板を収納し保持する一例の保持治具の断面図である。(A) is the upper surface of an example holding jig which accommodates and hold | maintains a glass substrate, (b) is sectional drawing of an example holding jig which accommodates and hold | maintains a glass substrate. 従来の側部支持部材の溝形状とガラス基板を支持した状態を示す模式図である。It is a schematic diagram which shows the state which supported the groove shape of the conventional side part support member, and the glass substrate. 本発明に係る側部支持部材の溝形状とガラス基板を支持した状態を示す模式図である。It is a schematic diagram which shows the state which supported the groove shape and glass substrate of the side part supporting member which concerns on this invention. 本発明に係る下部支持部材の溝の断面形状がV字状で、外周端部の2カ所が面取り加工されたガラス基板を支持した状態を示す模式図である。It is a schematic diagram which shows the state which supported the glass substrate by which the cross-sectional shape of the groove | channel of the lower support member which concerns on this invention was V-shaped, and two places of the outer peripheral edge part were chamfered. ガラス基板の面取り部と記録面との境界部で下部支持部材の溝とガラス基板が接触している状態を示す模式図である。It is a schematic diagram which shows the state which the groove | channel of a lower supporting member and the glass substrate are contacting in the boundary part of the chamfering part and recording surface of a glass substrate. 下部支持部材のV字状の角度が、170°以上の時にガラス基板が横にずれやすくなる状態を示す模式図である。It is a schematic diagram which shows the state which a glass substrate becomes easy to slip | deviate sideways when the V-shaped angle of a lower support member is 170 degrees or more. 本発明に係る下部支持部材の溝の断面形状がV字状で、外周端部がラウンド加工がされたガラス基板を支持した状態を示す模式図である。It is a schematic diagram which shows the state which supported the glass substrate by which the cross-sectional shape of the groove | channel of the lower support member which concerns on this invention was V shape, and the outer peripheral edge part was round-processed. 本発明に係る下部支持部材の溝の断面形状が円弧状で、外周端部の2カ所が面取り加工されたガラス基板を支持した状態を示す模式図である。It is a schematic diagram which shows the state which supported the glass substrate by which the cross-sectional shape of the groove | channel of the lower support member which concerns on this invention was circular arc shape, and two places of outer peripheral edge parts were chamfered. 本発明に係る下部支持部材の溝の断面形状が円弧状で、外周端部がラウンド加工されたガラス基板を支持した状態を示す模式図である。It is a schematic diagram which shows the state which supported the glass substrate by which the cross-sectional shape of the groove | channel of the lower supporting member which concerns on this invention was circular arc shape, and the outer peripheral edge part was round-processed. 磁気ディスクの部分断面を含む斜視図である。It is a perspective view containing the partial cross section of a magnetic disc.

符号の説明Explanation of symbols

1 記録媒体用ガラス基板
2 磁性膜
DI 磁気ディスク
30 保持治具
31 ガラス基板
32a 側部支持部材
32b 下部支持部材
34a、34b 溝
36 固定部材
DESCRIPTION OF SYMBOLS 1 Glass substrate for recording media 2 Magnetic film DI Magnetic disk 30 Holding jig 31 Glass substrate 32a Side support member 32b Lower support member 34a, 34b Groove 36 Fixing member

本発明を図示の実施の形態に基づいて説明するが、本発明は該実施の形態に限らない。   Although the present invention will be described based on the illustrated embodiment, the present invention is not limited to the embodiment.

(製造工程)
記録媒体用ガラス基板の製造方法について説明する。図1に、記録媒体用ガラス基板の製造工程の例をフロー図で示す。まず、ガラス素材を溶融し(ガラス溶融工程)、溶融ガラスを下型に流し込み、上型によってプレス成形して円盤状のガラス基板前駆体を得る(プレス成形工程)。なお、円盤状のガラス基板前駆体は、プレス成形によらず、例えばダウンドロー法やフロート法で形成したシートガラスを研削砥石で切り出して作製してもよい。
プレス成形されたガラス基板前駆体には、必要によりコアドリル等で中心部に孔が開けられる(コアリング工程)。
次に、ガラス基板の両表面が研磨加工され、ガラス基板の全体形状、すなわちガラス基板の平行度、平坦度および厚みが予備調整される(第1ラッピング工程)。
次に、ガラス基板の両表面が再び研磨加工されて、ガラス基板の平行度、平坦度および厚みが微調整される(第2ラッピング工程)
次に、ガラス基板の外周端面および内周端面が研削され、外周端部及び内周端部が面取りされて、ガラス基板の外径寸法および真円度、孔の内径寸法、並びにガラス基板と孔との同心度が微調整される(内・外径加工工程)。その後、ガラス基板の内周端面が研磨されて微細なキズ等が除去され(内周端面加工工程)、次に、ガラス基板の外周端面が研磨されて微細なキズ等が除去される(外周端面加工工程)。
(Manufacturing process)
The manufacturing method of the glass substrate for recording media is demonstrated. FIG. 1 is a flowchart showing an example of a manufacturing process of a recording medium glass substrate. First, a glass material is melted (glass melting process), molten glass is poured into a lower mold, and press molding is performed with an upper mold to obtain a disk-shaped glass substrate precursor (press molding process). Note that the disk-shaped glass substrate precursor may be produced by cutting a sheet glass formed by, for example, a downdraw method or a float method with a grinding stone, without using press molding.
In the press-molded glass substrate precursor, if necessary, a hole is formed in the central portion with a core drill or the like (coring step).
Next, both surfaces of the glass substrate are polished, and the overall shape of the glass substrate, that is, the parallelism, flatness, and thickness of the glass substrate are preliminarily adjusted (first lapping step).
Next, both surfaces of the glass substrate are polished again to finely adjust the parallelism, flatness and thickness of the glass substrate (second lapping step).
Next, the outer peripheral end surface and the inner peripheral end surface of the glass substrate are ground, and the outer peripheral end portion and the inner peripheral end portion are chamfered, so that the outer diameter and roundness of the glass substrate, the inner diameter of the hole, and the glass substrate and the hole And the concentricity are finely adjusted (inner / outer diameter machining process). Thereafter, the inner peripheral end face of the glass substrate is polished to remove fine scratches (inner peripheral end face processing step), and then the outer peripheral end face of the glass substrate is polished to remove fine scratches (outer peripheral end face). Processing step).

次に、ガラス基板が洗浄された後、後述の化学強化液にガラス基板を浸漬してガラス基板に化学強化層を形成する(化学強化工程)。この後、ガラス基板の表面を精密に仕上げる研磨加工を行う(ポリッシング工程)。そして洗浄及び検査が行われ、製品としての記録媒体用ガラス基板が完成する。尚、化学強化層を形成する化学強化工程後、研磨加工を行うポリッシング工程があるが、この研磨加工前後においてのガラス基板の強度はほとんど変わらない。   Next, after the glass substrate is washed, the glass substrate is immersed in a chemical strengthening solution described later to form a chemical strengthening layer on the glass substrate (chemical strengthening step). Thereafter, polishing is performed to precisely finish the surface of the glass substrate (polishing process). Then, cleaning and inspection are performed, and a glass substrate for recording medium as a product is completed. In addition, although there exists a polishing process which polishes after a chemical strengthening process which forms a chemical strengthening layer, the intensity | strength of the glass substrate before and behind this polishing process hardly changes.

上記の化学強化工程の内容を図2のフロー図に示す。洗浄されたガラス基板は、予め加熱された(予熱工程)後、化学強化液に浸漬される(化学強化液浸漬工程)。化学強化液から取り出されたガラス基板は、水にて洗浄され(水浸漬工程)、乾燥(乾燥工程)される。   The contents of the chemical strengthening step are shown in the flowchart of FIG. The cleaned glass substrate is preheated (preheating step) and then immersed in a chemical strengthening solution (chemical strengthening solution soaking step). The glass substrate taken out from the chemical strengthening solution is washed with water (water immersion process) and dried (drying process).

化学強化工程において、一連の予熱工程から乾燥工程までの各工程を実際に行う場合、例えば、以下のようにする。まず、複数枚のガラス基板を保持した保持治具を準備し、ガラス基板を保持治具とともに順次、予熱炉に投入し、化学強化液槽に浸漬し、洗浄槽に浸漬し、乾燥炉に投入することで、化学強化の一連の処理をすることができる。   In the chemical strengthening process, when each process from the series of preheating process to drying process is actually performed, for example, the following process is performed. First, prepare a holding jig that holds multiple glass substrates, put the glass substrates together with the holding jig, sequentially into the preheating furnace, soak in the chemical strengthening liquid bath, soak in the cleaning bath, and put into the drying oven By doing so, a series of processes of chemical strengthening can be performed.

複数枚のガラス基板を保持する保持治具の例を図3に示す。   An example of a holding jig for holding a plurality of glass substrates is shown in FIG.

図3(a)は、ガラス基板31を収納する側から保持治具30を見た図である。図3(b)は、ガラス基板31を溝34を設けている支持部材32が保持している様子を示している。図3の保持治具30は、ガラス基板31の配列方向に等間隔で溝34を複数個形成した2本の側部支持部材32aと1本の下部支持部材32bの3本を、一対の固定部材36で連結して構成している。この保持治具30において、複数のガラス基板は、各ガラス基板が3本の支持部材32a、32bの同一平面内にある溝34a、34bによって3カ所を支持して保持し、支持部材32の延在する方向に複数枚配列する。   FIG. 3A is a view of the holding jig 30 as viewed from the side where the glass substrate 31 is accommodated. FIG. 3B shows a state where the glass substrate 31 is held by the support member 32 provided with the grooves 34. The holding jig 30 shown in FIG. 3 has a pair of three side support members 32a and one lower support member 32b each having a plurality of grooves 34 formed at equal intervals in the arrangement direction of the glass substrates 31. The members 36 are connected to each other. In the holding jig 30, the plurality of glass substrates are held by supporting the three portions by the grooves 34 a and 34 b in the same plane of the three support members 32 a and 32 b. Arrange multiple sheets in the existing direction.

また、支持部材32a、32bの本数は3本に限定はしないが、ガラス基板31に接触する部分が少なく、且つ、安定して保持できることから3本とすることが好ましい。   Further, the number of the support members 32a and 32b is not limited to three, but it is preferable that the number of the support members 32a and 32b be three because there are few portions in contact with the glass substrate 31 and they can be stably held.

各工程でガラス基板31及びこれ保持する保持治具30に加わる温度は、ガラス基板材料、化学強化液等により異なるが、例えば、おおよそ以下となる。予熱工程での予熱炉においては200℃から600℃、化学強化液浸漬工程での化学強化液槽においては280℃から660℃、水浸漬工程での洗浄槽においては35℃から100℃、乾燥炉においては100℃から150℃である。また、各工程の間では、保持治具30を上記の各炉また槽の間で室温下の空気中を移動させる必要がある。従って、ガラス基板31及び保持治具30は、上記の例から室温と600℃程度といった急激な大きな温度差に晒されることになる。   The temperature applied to the glass substrate 31 and the holding jig 30 that holds the glass substrate 31 in each step varies depending on the glass substrate material, the chemical strengthening solution, and the like, but is approximately the following, for example. 200 ° C. to 600 ° C. in the preheating furnace in the preheating process, 280 ° C. to 660 ° C. in the chemical strengthening liquid tank in the chemical strengthening liquid immersion process, 35 ° C. to 100 ° C. in the cleaning tank in the water immersion process, and the drying furnace The temperature is from 100 ° C to 150 ° C. Moreover, between each process, it is necessary to move the holding jig 30 in the air at room temperature between the furnaces or tanks. Therefore, the glass substrate 31 and the holding jig 30 are exposed to a large temperature difference such as room temperature and about 600 ° C. from the above example.

上記のような大きな温度差に晒される保持治具30は、高温の時に比べ低温になると熱収縮を起こす。固定部材36も収縮することで側部支持部材32aの2本の軸の間隔が縮まる。この時、図4に示す従来例では、側部支持部材32aの溝34aがV字状の溝であり、溝34aの端面とガラス基板の外周端部のエッジ部分と接触点Aが熱収縮とともにスムーズに移動せず、ガラス基板31に応力がかかり、割れやカケが発生するときがあった。   The holding jig 30 exposed to a large temperature difference as described above undergoes thermal contraction when the temperature becomes lower than when the temperature is high. By contracting the fixing member 36 as well, the distance between the two shafts of the side support member 32a is reduced. At this time, in the conventional example shown in FIG. 4, the groove 34a of the side support member 32a is a V-shaped groove, and the end surface of the groove 34a, the edge portion of the outer peripheral end of the glass substrate, and the contact point A are accompanied by thermal contraction. In some cases, the glass substrate 31 does not move smoothly, stress is applied to the glass substrate 31, and cracking or chipping occurs.

そこで、このような問題を解決するために、保持治具30の側部支持部材32aの溝34aの形状を図5(a)、(b)に示すようにする。図5(a)は、ガラス基板を支持した状態の側部支持部材32aを上方から見た図であり、図5(b)は、側部支持部材32aの断面形状である。   Therefore, in order to solve such a problem, the shape of the groove 34a of the side support member 32a of the holding jig 30 is as shown in FIGS. 5 (a) and 5 (b). Fig.5 (a) is the figure which looked at the side part supporting member 32a of the state which supported the glass substrate from upper direction, FIG.5 (b) is a cross-sectional shape of the side part supporting member 32a.

図5(b)に示すように側部支持部材32aの溝34aの断面形状が互いに平行な平坦部を有する形状であり、ガラス基板31を挿入する溝の入り口が面取りした形状となっている。このような形状とすることで、固定部材36が熱収縮し、2本の支持部材32aの軸間距離が縮んでも(図5(a)の矢印S)、ガラス基板31の外周端部のエッジ部分が溝34aの側面に引っかかることがない。よって、ガラス基板31に応力がかかることがなく、ひびやキズ、割れ等の発生を抑制することができる。また、ガラス基板31の外周端部が平面状に面取りしたり、曲率を持たせたラウンド加工等を行っていても、同じような効果を得ることができる。   As shown in FIG. 5B, the cross-sectional shape of the groove 34a of the side support member 32a is a shape having flat portions parallel to each other, and the entrance of the groove into which the glass substrate 31 is inserted is chamfered. By adopting such a shape, even when the fixing member 36 is thermally contracted and the distance between the axes of the two support members 32a is reduced (arrow S in FIG. 5A), the edge of the outer peripheral end portion of the glass substrate 31 is obtained. The portion is not caught on the side surface of the groove 34a. Therefore, no stress is applied to the glass substrate 31, and the occurrence of cracks, scratches, cracks, and the like can be suppressed. The same effect can be obtained even if the outer peripheral end of the glass substrate 31 is chamfered flat or rounded with a curvature.

また、側部支持部材32aの溝34aの断面形状の互いの平坦部の間隔Dは、1〜2mmが好ましい。1mm未満になるとガラス基板を挿入しにくくなり、ガラス基板31の外周端部にキズを付けやすくなるため、作業効率が悪くなる。また、2mmを越えるとガラス基板31のがたつきが大きくなり、隣り合うガラス基板同士で接触し、キズが発生しやすくなる。   The distance D between the flat portions of the cross-sectional shape of the groove 34a of the side support member 32a is preferably 1 to 2 mm. If the thickness is less than 1 mm, it becomes difficult to insert the glass substrate, and the outer peripheral end portion of the glass substrate 31 is easily scratched. On the other hand, when the thickness exceeds 2 mm, the rattling of the glass substrate 31 increases, and the adjacent glass substrates come into contact with each other, and scratches are likely to occur.

また、側部支持部材32aの溝34aの互いに平行な平坦部の何れか一方と、ガラス基板の側部との重なる領域(図5(a)のd)が、0.5〜5mmであることが好ましい。   Moreover, the area | region (d of FIG. 5 (a)) with which either one of the parallel flat parts of the groove | channel 34a of the side part supporting member 32a and the side part of a glass substrate overlap is 0.5-5 mm. Is preferred.


下部支持部材34bが1本の場合、ガラス基板31が側部支持部材32aのどちらかに偏ることがある。この時の図5(a)の重なる領域dは、側部支持部材32aの平坦部の長さd0となる。この重なる領域dが0.5mmより小さい場合は、保持治具30でガラス基板31を搬送する時の揺れによってガラス基板31が溝32aから外れやすくなり、ガラス基板31の端面にキズが入る可能性がある。また、重なる領域dが5mmより大きい場合は、化学強化液浸漬工程でガラス基板と保持治具の側部支持部材32aとの重なる領域に残存する化学強化液を、水浸漬工程で除去するのが困難になる場合がある。
また、側部支持部材32aの溝34aの断面形状は、コの字状であることが好ましい。コの字状にすることにより、ガラス基板31の外周端部のエッジと溝34aとが強く接触しても、ガラス基板端部のひびやキズ、割れの発生を抑制することが出来る。コの字状における互いに平行な平坦部以外の底部の形状は、図5(b)では、平坦な形状をしているが、側部支持部材32aの中心軸方向に凹形状でも良く、また、凸形状でも良い。また、底部は、V字状、円弧状でも良い。
また、図5(a)における2本の側部支持部材32aの内側距離Lとガラス基板31の外径Gは、0.2mm≦L−G≦5.0mmの関係にあることが好ましい。0.2mm未満だと、ガラス基板31の外周端部と側部支持部材32aとの隙間が狭いため、ガラス基板31を32a間に挿入するとき、強い圧力がガラス基板31にかかる場合があり、ガラス基板31の端部にひびやキズ、割れを生じる恐れがある。また、5.0mmを越えると、ガラス基板31と側部支持部材32aとの間隔が広すぎるため、安定してガラス基板を保持できなくなる恐れがある。

When the number of the lower support members 34b is one, the glass substrate 31 may be biased to one of the side support members 32a. At this time, the overlapping region d in FIG. 5A is the length d0 of the flat portion of the side support member 32a. When the overlapping region d is smaller than 0.5 mm, the glass substrate 31 is likely to be detached from the groove 32a due to shaking when the glass substrate 31 is conveyed by the holding jig 30, and the end surface of the glass substrate 31 may be scratched. There is. When the overlapping region d is larger than 5 mm, the chemical strengthening solution remaining in the overlapping region between the glass substrate and the side support member 32a of the holding jig in the chemical strengthening solution soaking step may be removed in the water soaking step. It can be difficult.
Moreover, it is preferable that the cross-sectional shape of the groove | channel 34a of the side part support member 32a is a U-shape. By making it U-shaped, even if the edge of the outer peripheral end of the glass substrate 31 and the groove 34a are in strong contact, the occurrence of cracks, scratches and cracks at the end of the glass substrate can be suppressed. The shape of the bottom portion other than the flat portions parallel to each other in the U-shape is a flat shape in FIG. 5B, but may be a concave shape in the direction of the central axis of the side support member 32a. It may be convex. The bottom may be V-shaped or arc-shaped.
Moreover, it is preferable that the inner distance L of the two side part support members 32a in FIG. 5A and the outer diameter G of the glass substrate 31 have a relationship of 0.2 mm ≦ LG ≦ 5.0 mm. If it is less than 0.2 mm, the gap between the outer peripheral end of the glass substrate 31 and the side support member 32a is narrow, so when inserting the glass substrate 31 between 32a, a strong pressure may be applied to the glass substrate 31. There is a risk of causing cracks, scratches, or cracks at the ends of the glass substrate 31. On the other hand, if it exceeds 5.0 mm, the distance between the glass substrate 31 and the side support member 32a is too wide, and there is a possibility that the glass substrate cannot be stably held.

また、下部支持部材32bについては、側部支持部材32aと同様に溝34bの断面形状が互いに平行な平坦部を有する構成でも良いが、以下のような構成にするのが好ましい。
即ち、ガラス基板31の外周端部の2箇所が面取り加工され、その加工面のなす角度をθ2としたとき、下部支持部材32bに設けた溝の断面形状は、図6に示すようにV字状で、該V字状の角度θ1は、下記式の範囲が好ましい。
Further, the lower support member 32b may have a configuration in which the cross-sectional shapes of the grooves 34b are parallel to each other like the side support member 32a, but the following configuration is preferable.
That is, when the two corners of the outer peripheral edge of the glass substrate 31 are chamfered and the angle formed by the processed surface is θ2, the cross-sectional shape of the groove provided in the lower support member 32b is V-shaped as shown in FIG. The V-shaped angle θ1 is preferably in the range of the following formula.

θ2<θ1<170°
V字状の溝34bのV字の角度θ1をこの範囲にすることで、ガラス基板31の外周端部の面取り部33と下部支持部材32bとの接触する箇所が、面取り部33の最も外側の部分P1で接触することになり、ガラス基板31の記録面S1、S2と接触することがない。また、ガラス基板31の外周端面35(厚さHの平坦部)が下部支持部材32bの溝34bに密着することもない。よって、記録媒体用ガラス基板の製造工程における化学強化工程を行っても、ガラス基板31にキズや歪みを生じさせることが無く、また、接触部P1でわずかなキズが発生したとしても、記録面S1、S2をキズをつけることがなく、品質のよいガラス基板31を製造することが出来る。
θ2 <θ1 <170 °
By setting the V-shaped angle θ1 of the V-shaped groove 34b within this range, the place where the chamfered portion 33 at the outer peripheral end of the glass substrate 31 contacts the lower support member 32b is the outermost portion of the chamfered portion 33. The contact is made at the portion P1, and there is no contact with the recording surfaces S1, S2 of the glass substrate 31. Further, the outer peripheral end surface 35 (flat portion having a thickness H) of the glass substrate 31 does not adhere to the groove 34b of the lower support member 32b. Therefore, even if the chemical strengthening step in the manufacturing process of the glass substrate for recording medium is performed, the glass substrate 31 is not scratched or distorted, and even if a slight scratch occurs at the contact portion P1, the recording surface It is possible to manufacture a glass substrate 31 with good quality without scratching S1 and S2.

また、V字の角度θ1が面取り角度θ2よりも小さい場合は、図7のようにガラス基板31の面取り部33と記録面S1、S2との境界部P2で溝34bと接触することになり、接触部P2でわずかなキズが発生すると、記録面S1、S2をキズつけることがある。   When the V-shaped angle θ1 is smaller than the chamfering angle θ2, the groove 34b comes into contact with the boundary portion P2 between the chamfered portion 33 of the glass substrate 31 and the recording surfaces S1 and S2, as shown in FIG. If slight scratches occur at the contact portion P2, the recording surfaces S1 and S2 may be scratched.

また、V字状の溝34のV字の角度θ1が、170°以上になると、図8に示すように、横の溝とのピッチを広く取らないと、ガラス基板31が横にずれやすくなり、ガラス基板31が溝間の山を越えて隣の溝に移動し、隣り合うガラス基板と接触して記録面S1,S2をキズつけることがある。   Further, when the V-shaped angle θ1 of the V-shaped groove 34 is 170 ° or more, the glass substrate 31 is liable to be shifted to the side unless the pitch with the horizontal groove is wide as shown in FIG. In some cases, the glass substrate 31 moves over the crest between the grooves to the adjacent groove and comes into contact with the adjacent glass substrate to scratch the recording surfaces S1 and S2.

また、V字状の角度θ1は110°〜160°であることが好ましい。この範囲にすることで、より記録面S1、S2をキズつけることが少なくなる。   The V-shaped angle θ1 is preferably 110 ° to 160 °. By setting this range, the recording surfaces S1 and S2 are less likely to be scratched.

また、図9に示すようにガラス基板31の外周端部がラウンド加工がされている場合では、下部支持部材32bの溝34bのV字状の角度θ1が90°〜170°が好ましい。このようにすることで、ガラス基板のラウンド加工された曲面部36が、下部支持部材32bの溝34bの断面と接触することになり、曲面部36と溝34bとの接触部で、わずかにキズが発生したとしても記録面S1、S2をキズつけることがない。また、V字状の溝34bのV字の角度θ1が、170°以上になると、横の溝とのピッチを広く取らないと、ガラス基板31が横にずれやすくなり、ガラス基板31が溝間の山を越えて隣の溝に移動し、隣り合うガラス基板と接触して記録面S1,S2をキズつけることがある。   In addition, when the outer peripheral end of the glass substrate 31 is rounded as shown in FIG. 9, the V-shaped angle θ1 of the groove 34b of the lower support member 32b is preferably 90 ° to 170 °. By doing so, the rounded curved surface portion 36 of the glass substrate comes into contact with the cross section of the groove 34b of the lower support member 32b, and is slightly scratched at the contact portion between the curved surface portion 36 and the groove 34b. Even if this occurs, the recording surfaces S1 and S2 are not scratched. In addition, when the V-shaped angle θ1 of the V-shaped groove 34b is 170 ° or more, the glass substrate 31 is liable to be displaced laterally unless the pitch with the horizontal groove is widened. May move to the adjacent groove and contact the adjacent glass substrate to scratch the recording surfaces S1 and S2.

また、図10に示すように下部支持部材32b溝34bの断面形状が円弧状の場合、ガラス基板31の外周端部の2カ所が面取り加工されており、ガラス基板31の面取り加工された面取り部の外端P1が、支持部材32bの溝34bの円弧状の断面と接触するよう、溝34bの断面が円弧状の形状であることが好ましい。即ち、ガラス基板31の記録面S1、S2と面取り部との境界位置P2と下部支持部材32bの溝34bとが、接触しないように、溝34bの曲率半径R1を設定している。このようにすることで、ガラス基板31の面取り部の外端P1と溝34bとの接触部で、わずかにキズが発生したとしても記録面S1、S2をキズつけることがない。
また、図11に示すように、ガラス基板31の外周端部がラウンド加工されている場合で、下部支持部材32bの溝34bを円弧状とした場合、ガラス基板31の外周端部の曲率半径をR2、下部支持部材32bの溝34bの円弧状の曲率半径をR1としたとき、R1がR2よりも大きいことが好ましい。このようにすることでガラス基板31の外周端部のラウンド加工面と溝34bとが接触することとなり、該接触部で、わずかにキズが発生したとしても記録面S1、S2をキズつけることがない。また、下部支持部材32bの溝34bの断面の曲率半径R1がガラス基板31の外周端部の曲率半径R2より小さいと、下部支持部材32bがガラス基板31を安定して保持することができない。また、R2がR1よりも大きい場合で、ガラス基板31の厚さが薄く、溝34bにはまる場合があるが、ガラス基板31の記録面S1、S2とラウンド加工面との境界位置P3が、溝34bと接触することとなり、該接触部で、わずかにキズが発生したとしても記録面S1、S2をキズつけることになり好ましくない。また、下部支持部材32bの溝34bの断面の曲率半径R1とガラス基板31の外周端部の曲率半径R2とが等しい場合は、溝34bとガラス基板31の外周端部が面接触し、化学強化工程で高温にした後、低温に冷却するときガラス基板31の外周端部に歪みが発生し、キズになることがある。
Also, as shown in FIG. 10, when the cross-sectional shape of the lower support member 32b groove 34b is an arc shape, the chamfered portion of the glass substrate 31 is chamfered at two locations on the outer peripheral end portion of the glass substrate 31. It is preferable that the cross section of the groove 34b has an arcuate shape so that the outer end P1 of the groove 34b contacts the arcuate cross section of the groove 34b of the support member 32b. That is, the radius of curvature R1 of the groove 34b is set so that the boundary position P2 between the recording surfaces S1 and S2 of the glass substrate 31 and the chamfered portion does not contact the groove 34b of the lower support member 32b. By doing so, even if a slight scratch is generated at the contact portion between the outer end P1 of the chamfered portion of the glass substrate 31 and the groove 34b, the recording surfaces S1 and S2 are not scratched.
As shown in FIG. 11, when the outer peripheral end of the glass substrate 31 is rounded and the groove 34b of the lower support member 32b has an arc shape, the radius of curvature of the outer peripheral end of the glass substrate 31 is R2 is preferably larger than R2 when R1 is the radius of curvature of the arc of the groove 34b of the lower support member 32b. By doing so, the round processed surface at the outer peripheral end of the glass substrate 31 and the groove 34b come into contact with each other, and even if a slight scratch occurs at the contact portion, the recording surfaces S1 and S2 can be scratched. Absent. Moreover, if the curvature radius R1 of the cross section of the groove 34b of the lower support member 32b is smaller than the curvature radius R2 of the outer peripheral end portion of the glass substrate 31, the lower support member 32b cannot hold the glass substrate 31 stably. Further, when R2 is larger than R1, the thickness of the glass substrate 31 is thin and may fit into the groove 34b. However, the boundary position P3 between the recording surfaces S1 and S2 of the glass substrate 31 and the round processed surface is the groove. 34b, and even if a slight scratch occurs at the contact portion, the recording surfaces S1 and S2 are scratched, which is not preferable. Further, when the curvature radius R1 of the cross section of the groove 34b of the lower support member 32b is equal to the curvature radius R2 of the outer peripheral end portion of the glass substrate 31, the groove 34b and the outer peripheral end portion of the glass substrate 31 are in surface contact and chemically strengthened. After the temperature is raised in the process, when the glass substrate 31 is cooled to a low temperature, the outer peripheral end of the glass substrate 31 may be distorted and may be damaged.

以上のように側部支持部材32aの溝34aの形状を本発明にかかる構成とすることにより、ガラス基板31のひびやキズ、割れ等を防止することができる。   As described above, by making the shape of the groove 34a of the side support member 32a according to the present invention, it is possible to prevent the glass substrate 31 from being cracked, scratched or broken.

上記では保持治具30を使用する工程を化学強化工程における化学強化液浸漬工程と、その後の水浸漬工程としているが、化学強化液浸漬工程の前の洗浄工程で水に浸漬する場合に使用することができる。   In the above, although the process using the holding jig 30 is the chemical strengthening liquid immersion process in the chemical strengthening process and the subsequent water immersion process, it is used in the case of immersing in water in the cleaning process before the chemical strengthening liquid immersion process. be able to.

保持治具30を構成する材料としては、例えば、金属系では、工具鋼(0.3〜2.0%の炭素を含む鋼材)、純鉄、純アルミニウム、純チタン、チタン合金、マグネシウム合金、ジルコニウム、インコネルHX(耐熱特殊鋼)、ニッケル、SUS304、SUS316、SUS310S、SUS329、SUS410、SUS430等がある。また、セラミックス系では、窒化珪素(Si)、炭化珪素(SiC)、窒化アルミ、窒化ホウ素、アルミナ、ムライト(3Al・2SiO)、ジルコニア(ZrO)、コージエライト、マセライト(切削性セラミックス)等がある。更に、石英ガラスがある。これらの材料を用いて保持治具を構成する場合、保持治具を構成する各部材の熱膨張係数を考慮して保持治具の熱変形を抑えることが好ましい。As a material constituting the holding jig 30, for example, in a metal system, tool steel (steel material containing 0.3 to 2.0% carbon), pure iron, pure aluminum, pure titanium, titanium alloy, magnesium alloy, Zirconium, Inconel HX (heat resistant special steel), nickel, SUS304, SUS316, SUS310S, SUS329, SUS410, SUS430, and the like. In the ceramic system, silicon nitride (Si 3 N 4 ), silicon carbide (SiC), aluminum nitride, boron nitride, alumina, mullite (3Al 2 O 3 · 2SiO 2 ), zirconia (ZrO 2 ), cordierite, macerite ( Machinable ceramics). In addition, there is quartz glass. When a holding jig is constituted using these materials, it is preferable to suppress thermal deformation of the holding jig in consideration of the thermal expansion coefficient of each member constituting the holding jig.

上記の保持治具30を構成する材料は、高温の化学強化液に対する耐食性が優れており、微小粉を生じない発塵性の低い材料がより好ましい。耐食性が優れていることで、保持治具30の耐久性が良好となり、腐食による微小粉の発生が抑えられる。また、発塵性が低いことで、化学強化液や洗浄水に浸漬することによるガラス基板に付着する異物の発生を抑えることができる。   The material constituting the holding jig 30 is more preferably a material having excellent corrosion resistance against a high-temperature chemical strengthening solution and having a low dust generation property that does not generate fine powder. Since the corrosion resistance is excellent, the durability of the holding jig 30 is improved, and generation of fine powder due to corrosion is suppressed. Moreover, generation | occurrence | production of the foreign material adhering to a glass substrate by being immersed in a chemical strengthening liquid or washing | cleaning water can be suppressed because dust generation property is low.

(化学強化液浸漬工程)
化学強化液浸漬工程は、化学強化剤を溶融した化学強化液にガラス基板31を浸漬させて、ガラス基板表層のアルカリ金属イオンを化学強化液のアルカリ金属イオンにイオン交換する。
(Chemical strengthening liquid immersion process)
In the chemical strengthening solution immersion step, the glass substrate 31 is immersed in a chemical strengthening solution in which the chemical strengthening agent is melted, and the alkali metal ions on the surface of the glass substrate are ion-exchanged with the alkali metal ions of the chemical strengthening solution.

化学強化剤としては従来公知のものを使用でき、例えば、硝酸カリウム(KNO)、硝酸ナトリウム(NaNO)、炭酸カリウム(KCO)などが挙げられ、これらを単独又は2種以上混合して使用する。As the chemical strengthening agent, conventionally known ones can be used, and examples thereof include potassium nitrate (KNO 3 ), sodium nitrate (NaNO 3 ), potassium carbonate (K 2 CO 3 ) and the like. These can be used alone or in combination of two or more. To use.

化学強化剤は化学強化処理槽に所定量投入し、加熱することによって溶融して化学強化液となる。化学強化液の加熱温度は、イオン交換の速度やガラス基板のTg(ガラス転移温度)などの点から280℃〜660℃の範囲が好ましく、より好ましくは300℃〜450℃の範囲である。この高温側(上限値)がガラス転移温度Tgより低い300℃〜450℃の範囲とすることで、イオン交換の反応速度が遅すぎることなく、また、ガラス基板の形状に影響が生じない。   The chemical strengthening agent is charged into a chemical strengthening treatment tank in a predetermined amount and heated to melt and become a chemical strengthening liquid. The heating temperature of the chemical strengthening solution is preferably in the range of 280 ° C. to 660 ° C., more preferably in the range of 300 ° C. to 450 ° C., from the viewpoint of ion exchange rate and Tg (glass transition temperature) of the glass substrate. By setting this high temperature side (upper limit) to a range of 300 ° C. to 450 ° C. lower than the glass transition temperature Tg, the reaction rate of ion exchange is not too slow, and the shape of the glass substrate is not affected.

ガラス基板31を化学強化液に浸漬する時間は0.1時間〜数十時間の範囲が好ましい。また、本例に示しているように、ガラス基板31を化学強化液に浸漬する前に、予め加熱しておくことが好ましい。予めガラス基板31を加熱すると、化学強化液に浸漬した際に化学強化液の温度が低下し過ぎることがなく化学強化が効率的に行うことができる。   The time for immersing the glass substrate 31 in the chemical strengthening solution is preferably in the range of 0.1 hour to several tens of hours. Moreover, as shown in this example, it is preferable to preheat the glass substrate 31 before immersing it in the chemical strengthening solution. When the glass substrate 31 is heated in advance, when the glass substrate 31 is immersed in the chemical strengthening solution, the temperature of the chemical strengthening solution does not decrease excessively and chemical strengthening can be performed efficiently.

強化層の厚みとしては、ガラス基板31の強度向上とポリッシング工程の時間の短縮との兼ね合いから、5μm〜15μm程度の範囲が好ましい。   The thickness of the reinforcing layer is preferably in the range of about 5 μm to 15 μm in view of improving the strength of the glass substrate 31 and shortening the time for the polishing process.

(水浸漬工程)
ガラス基板31を化学強化液に浸漬した後、連続してガラス基板の表面の化学強化液をムラなく除去するために水に浸漬する。ガラス基板31の全体を水に浸漬することで化学強化液がガラス基板上に部分的に存在することが無く、部分的に化学強化が進むことがなくなる。このため、化学強化にムラがないため、ガラス基板31に一様な強度を持たせることができる。
(Water immersion process)
After immersing the glass substrate 31 in the chemical strengthening solution, the glass substrate 31 is continuously immersed in water in order to remove the chemical strengthening solution on the surface of the glass substrate evenly. By immersing the entire glass substrate 31 in water, the chemical strengthening liquid does not partially exist on the glass substrate, and chemical strengthening does not proceed partially. For this reason, since there is no unevenness in chemical strengthening, the glass substrate 31 can have a uniform strength.

ガラス基板31の表面から化学強化液や化学強化液を成す塩の結晶物は、浸漬する水の温度を高くするほどより短時間で効率よく除去することができる。こうした水の温度は、大気圧下で、35℃から100℃が好ましい。また、ガラス基板を水に浸漬する時間は、1秒以上が好ましい。1秒未満であると、ガラス基板上の化学強化液を十分に除去できないため化学強化液がガラス基板上に残り、強化ムラが生じる。水に浸漬する時間の上限は、特に制限はなく、生産性を考慮して適宜決めればよい。   The crystal strengthening liquid or the salt crystal forming the chemical strengthening liquid can be efficiently removed from the surface of the glass substrate 31 in a shorter time as the temperature of the immersion water is increased. The temperature of such water is preferably 35 ° C. to 100 ° C. under atmospheric pressure. The time for immersing the glass substrate in water is preferably 1 second or longer. If it is less than 1 second, the chemical strengthening solution on the glass substrate cannot be sufficiently removed, so that the chemical strengthening solution remains on the glass substrate and unevenness of strengthening occurs. The upper limit of the time for immersing in water is not particularly limited, and may be appropriately determined in consideration of productivity.

また、水の温度と化学強化液との温度差により水浸漬工程においてガラス基板のひび、割れが発生しないように温度差を緩和するために、化学強化液浸漬工程と水浸漬工程との間でガラス基板31を冷却する冷却工程を設けてもよい。   In addition, in order to reduce the temperature difference so that the glass substrate does not crack or crack in the water immersion process due to the temperature difference between the water temperature and the chemical strengthening liquid, between the chemical strengthening liquid immersion process and the water immersion process. A cooling step for cooling the glass substrate 31 may be provided.

(ガラス基板)
化学強化されるガラス基板31としては特に限定はないが、二酸化ケイ素、酸化ナトリウム、酸化カルシウムを主成分としたソーダライムガラス;二酸化ケイ素、酸化アルミニウム、RO(R=K、Na、Li)を主成分としたアルミノシリケートガラス;ボロシリケートガラス;酸化リチウム−二酸化ケイ素系ガラス;酸化リチウム−酸化アルミニウム−二酸化ケイ素系ガラス;R’O−酸化アルミニウム−二酸化ケイ素系ガラス(R’=Mg、Ca、Sr又はBa)を使用することができ、これらガラス材料に酸化ジルコニウムや酸化チタン等を添加したものであってもよい。
(Glass substrate)
The glass substrate 31 to be chemically strengthened is not particularly limited, but soda lime glass mainly composed of silicon dioxide, sodium oxide, calcium oxide; silicon dioxide, aluminum oxide, R 2 O (R = K, Na, Li) Borosilicate glass; lithium oxide-silicon dioxide glass; lithium oxide-aluminum oxide-silicon dioxide glass; R'O-aluminum oxide-silicon dioxide glass (R '= Mg, Ca Sr or Ba) may be used, and these glass materials may be added with zirconium oxide, titanium oxide or the like.

またガラス基板31の大きさに限定はなく2.5インチ,1.8インチ、1インチ、0.85インチあるいはそれ以下の小径ディスクにも本発明の方法を適用することができ、またその厚さが2mmや1mm、0.63mm、あるいはそれ以下といった薄型のものにも適用することができる。   The size of the glass substrate 31 is not limited, and the method of the present invention can be applied to a small-diameter disk of 2.5 inches, 1.8 inches, 1 inch, 0.85 inches or less, and the thickness thereof. It can be applied to a thin type having a thickness of 2 mm, 1 mm, 0.63 mm, or less.

化学強化工程に提供されるガラス基板31において、主表面および端面部分の粗さに特に限定はないが、ガラス基板31の主表面の表面粗度は、Rmax(最大高さ)が10nm以下、Ra(中心線平均粗さ)が1.0nm以下であるのが好ましい。また端面の表面粗度は、Rmaxが0.01μm〜1μmの範囲、Raが0.001μm〜0.8μmの範囲であるのが好ましい。表面研磨されたガラス基板31を化学強化すると、強化層を均一に形成することができるようになる。   In the glass substrate 31 provided in the chemical strengthening step, the roughness of the main surface and the end face portion is not particularly limited, but the surface roughness of the main surface of the glass substrate 31 is Rmax (maximum height) of 10 nm or less, Ra (Center line average roughness) is preferably 1.0 nm or less. The surface roughness of the end face is preferably in the range of Rmax from 0.01 μm to 1 μm and Ra in the range of 0.001 μm to 0.8 μm. When the glass substrate 31 whose surface is polished is chemically strengthened, the reinforcing layer can be formed uniformly.

(記録媒体)
次に、これまで説明した記録媒体用ガラス基板を用いた記録媒体について説明する。この記録媒体用ガラス基板を用いると、耐久性および高記録密度が実現される。以下、図面に基づき記録媒体について説明する。
(recoding media)
Next, a recording medium using the recording medium glass substrate described so far will be described. When this recording medium glass substrate is used, durability and high recording density are realized. Hereinafter, a recording medium will be described with reference to the drawings.

図12は磁気ディスクの斜視図である。この磁気ディスクDIは、円形の記録媒体用ガラス基板1の表面に磁性膜2を直接形成されている。磁性膜2の形成方法としては従来公知の方法を用いることができ、例えば磁性粒子を分散させた熱硬化性樹脂を基板上にスピンコートして形成する方法や、スパッタリング、無電解めっきにより形成する方法が挙げられる。スピンコート法での膜厚は約0.3μm〜1.2μm程度、スパッタリング法での膜厚は0.04μm〜0.08μm程度、無電解めっき法での膜厚は0.05μm〜0.1μm程度であり、薄膜化および高密度化の観点からはスパッタリング法および無電解めっき法による膜形成が好ましい。   FIG. 12 is a perspective view of the magnetic disk. In the magnetic disk DI, a magnetic film 2 is directly formed on the surface of a circular recording medium glass substrate 1. As a method for forming the magnetic film 2, a conventionally known method can be used. For example, a method in which a thermosetting resin in which magnetic particles are dispersed is spin-coated on a substrate, or a method by sputtering or electroless plating is used. A method is mentioned. The film thickness by spin coating is about 0.3 μm to 1.2 μm, the film thickness by sputtering is about 0.04 μm to 0.08 μm, and the film thickness by electroless plating is 0.05 μm to 0.1 μm. From the viewpoint of thinning and densification, film formation by sputtering and electroless plating is preferable.

磁性膜に用いる磁性材料としては、特に限定はなく従来公知のものが使用できるが、高い保持力を得るために結晶異方性の高いCoを基本とし、残留磁束密度を調整する目的でNiやCrを加えたCo系合金などが好適である。具体的には、Coを主成分とするCoPt、CoCr、CoNi、CoNiCr、CoCrTa、CoPtCr、CoNiPtや、CoNiCrPt、CoNiCrTa、CoCrPtTa、CoCrPtB、CoCrPtSiOなどが挙げられる。磁性膜は、非磁性膜(例えば、Cr、CrMo、CrVなど)で分割しノイズの低減を図った多層構成(例えば、CoPtCr/CrMo/CoPtCr、CoCrPtTa/CrMo/CoCrPtTaなど)としてもよい。上記の磁性材料の他、フェライト系、鉄−希土類系や、SiO、BNなどからなる非磁性膜中にFe、Co、FeCo、CoNiPt等の磁性粒子を分散された構造のグラニュラーなどであってもよい。また、磁性膜は、内面型および垂直型のいずれの記録形式であってもよい。The magnetic material used for the magnetic film is not particularly limited, and a conventionally known material can be used. However, in order to obtain a high coercive force, Ni having a high crystal anisotropy is basically used, and Ni or A Co-based alloy to which Cr is added is suitable. Specific examples include CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, and CoNiPt containing Co as a main component, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtB, and CoCrPtSiO. The magnetic film may have a multilayer structure (for example, CoPtCr / CrMo / CoPtCr, CoCrPtTa / CrMo / CoCrPtTa) that is divided by a nonmagnetic film (for example, Cr, CrMo, CrV, etc.) to reduce noise. Addition to the above magnetic material, ferrite, iron - rare-earth or be in a non-magnetic film made of SiO 2, BN Fe, Co, FeCo, etc. granular structure magnetic particles are dispersed, such CoNiPt Also good. Further, the magnetic film may be either an inner surface type or a vertical type recording format.

また、磁気ヘッドの滑りをよくするために磁性膜の表面に潤滑剤を薄くコーティングしてもよい。潤滑剤としては、例えば液体潤滑剤であるパーフロロポリエーテル(PFPE)をフレオン系などの溶媒で希釈したものが挙げられる。   In addition, a lubricant may be thinly coated on the surface of the magnetic film in order to improve the sliding of the magnetic head. Examples of the lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a freon-based solvent.

さらに必要により下地層や保護層を設けてもよい。磁気ディスクにおける下地層は磁性膜に応じて選択される。下地層の材料としては、例えば、Cr、Mo、Ta、Ti、W、V、B、Al、Niなどの非磁性金属から選ばれる少なくとも一種以上の材料が挙げられる。Coを主成分とする磁性膜の場合には、磁気特性向上等の観点からCr単体やCr合金であることが好ましい。また、下地層は単層とは限らず、同一又は異種の層を積層した複数層構造としても構わない。例えば、Cr/Cr、Cr/CrMo、Cr/CrV、NiAl/Cr、NiAl/CrMo、NiAl/CrV等の多層下地層としてもよい。   Furthermore, you may provide a base layer and a protective layer as needed. The underlayer in the magnetic disk is selected according to the magnetic film. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni. In the case of a magnetic film containing Co as a main component, Cr alone or a Cr alloy is preferable from the viewpoint of improving magnetic characteristics. Further, the underlayer is not limited to a single layer, and may have a multi-layer structure in which the same or different layers are stacked. For example, a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV may be used.

磁性膜の摩耗や腐食を防止する保護層としては、例えば、Cr層、Cr合金層、カーボン層、水素化カーボン層、ジルコニア層、シリカ層などが挙げられる。これらの保護層は、下地層、磁性膜など共にインライン型スパッタ装置で連続して形成できる。また、これらの保護層は、単層としてもよく、あるいは、同一又は異種の層からなる多層構成としてもよい。なお、上記保護層上に、あるいは上記保護層に替えて、他の保護層を形成してもよい。例えば、上記保護層に替えて、Cr層の上にテトラアルコキシシランをアルコール系の溶媒で希釈した中に、コロイダルシリカ微粒子を分散して塗布し、さらに焼成して二酸化ケイ素(SiO)層を形成してもよい。Examples of the protective layer that prevents wear and corrosion of the magnetic film include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be formed continuously with an in-line type sputtering apparatus, such as an underlayer and a magnetic film. In addition, these protective layers may be a single layer, or may have a multilayer structure including the same or different layers. Note that another protective layer may be formed on the protective layer or instead of the protective layer. For example, in place of the protective layer, tetraalkoxysilane is diluted with an alcohol-based solvent on the Cr layer, and then colloidal silica fine particles are dispersed and applied, and then baked to form a silicon dioxide (SiO 2 ) layer. It may be formed.

以上、記録媒体の一実施態様として磁気ディスクについて説明したが、記録媒体はこれに限定されるものではなく、光磁気ディスクや光ディスクなどにも本発明のガラス基板を用いることができる。   The magnetic disk has been described above as one embodiment of the recording medium. However, the recording medium is not limited to this, and the glass substrate of the present invention can be used for a magneto-optical disk, an optical disk, and the like.

(実施例1〜10)
化学強化を行うガラス基板として、外径φ1=65mm、内径φ2=20mm、板厚d=0.635mmのアルミノシリケートガラス基板を準備し、外周端部の2カ所をを図6に示すように面取り加工した。端面に平坦部厚さH=0.3mmを残して、面取り角度90°のものを作成した。また、保持治具としては、1本の下部支持部材と2本の側部支持部材を用いて、ガラス基板を保持する保持治具を用いた。側部支持部材の断面形状は、図5に示すコの字状とし、外径14mm、溝部外径7mm、平坦部の間隔D及び平坦部の長さd0を表1に示す値とした。各溝のピッチは6.5mmとした。下部支持部材の溝形状は、図6に示す形状のものを用い、V字の角度θ1を110°とした。下部支持部材の外径は、φ14mmである。保持治具を構成する材料は、すべてSUS304を用いた。
(Examples 1 to 10)
As a glass substrate for chemical strengthening, an aluminosilicate glass substrate having an outer diameter of φ1 = 65 mm, an inner diameter of φ2 = 20 mm, and a plate thickness d = 0.635 mm is prepared, and the outer peripheral end portions are chamfered as shown in FIG. processed. A sample with a chamfering angle of 90 ° was prepared, leaving a flat portion thickness H = 0.3 mm on the end face. Further, as the holding jig, a holding jig that holds the glass substrate using one lower support member and two side support members was used. The cross-sectional shape of the side support member was a U-shape as shown in FIG. 5, and the values shown in Table 1 were the outer diameter of 14 mm, the groove outer diameter of 7 mm, the flat portion interval D, and the flat portion length d0. The pitch of each groove was 6.5 mm. The groove shape of the lower support member was the one shown in FIG. 6, and the V-shaped angle θ1 was 110 °. The outer diameter of the lower support member is φ14 mm. SUS304 was used for all the materials constituting the holding jig.

上記のガラス基板100枚を保持治具に収納し、予め350℃に加熱後、化学強化液に15分間浸漬した。化学強化液は、NaNOとKNOとを質量比1:9の割合とした化学強化剤を化学強化槽に投入し330℃に加熱したものとした。ガラス基板と側部指示部材との重なり領域dは、ガラス基板が2本の側部支持部材の何れかに偏り、平坦部の長さd0となって重なっていた。100 glass substrates described above were stored in a holding jig, preheated to 350 ° C., and then immersed in a chemical strengthening solution for 15 minutes. As the chemical strengthening solution, a chemical strengthening agent containing NaNO 3 and KNO 3 in a mass ratio of 1: 9 was charged into a chemical strengthening tank and heated to 330 ° C. In the overlapping region d between the glass substrate and the side part indicating member, the glass substrate was biased to one of the two side supporting members and overlapped with the flat part length d0.

化学強化液に浸漬した後、化学強化した100枚のガラス基板を保持治具に収納した状態で60℃のアルカリ金属イオンを含む水に5分間浸漬し、その後乾燥した。   After dipping in a chemical strengthening solution, 100 chemically strengthened glass substrates were immersed in water containing alkali metal ions at 60 ° C. for 5 minutes while being stored in a holding jig, and then dried.

保持治具よりガラス基板を取りだして、ガラス基板を目視またはルーペを用いた目視にてひび、割れ、色変化、化学強化液の残存の有無を確認した。100枚中1枚でもひび、割れの発生したものを×、100枚中1枚でも色変化しているものを△、100枚すべてのガラス基板にひび、割れ、色変化のないものを○、化学強化液の残存している物を×、わずかに残存しているものを△、残存のない物を○として、評価した。×評価は、記録媒体用ガラス基板としては、使用できないレベルであり、△、○評価は、使用できるれべるである。
(比較例1)
比較例1としては、側部支持部材の溝を図4に示すV字状でθを90°とした他は、実施例3と同様の条件に作成し、評価した。
The glass substrate was taken out from the holding jig, and the glass substrate was visually or visually checked with a magnifying glass to check for cracks, cracks, color change, and the presence of the chemical strengthening solution. Even if one of the 100 sheets is cracked or cracked, X indicates that one of the 100 sheets is color-changed, △ indicates that all 100 glass substrates are cracked, cracked, or has no color change, ○ Evaluation was made by assuming that the remaining chemical strengthening solution was x, Δ was slightly remaining, and ○ was not left. X Evaluation is a level that cannot be used as a glass substrate for a recording medium, and Δ and ○ evaluations can be used.
(Comparative Example 1)
Comparative Example 1 was prepared and evaluated under the same conditions as in Example 3 except that the side support member grooves were V-shaped as shown in FIG. 4 and θ was 90 °.

表1に評価結果を示す。   Table 1 shows the evaluation results.

表1の結果において、実施例3と比較例1とを比較すると、比較例1においては、側部支持部材の断面形状がV字状であるため、ガラス基板にキズ、割れ等が発生しているのに比べ、実施例3のように側部支持部材の断面形状が、互いに平行な平坦部を有する形状とすることで、キズ、割れの発生のない良好なガラス基板を製造できることがわかる。また、実施例1〜5を比較すると、側部支持部材の互いに平行な平坦部の間隔Dは、1〜2mmが好ましいことがわかる。また、実施例6〜10を比較すると、側部支持部材とガラス基板との重なる領域は、0.5〜5mmが好ましいことがわかる。   In the result of Table 1, when Example 3 and Comparative Example 1 are compared, in Comparative Example 1, the cross-sectional shape of the side support member is V-shaped. It can be seen that, when the cross-sectional shape of the side support member is a shape having flat portions parallel to each other as in Example 3, a good glass substrate free from scratches and cracks can be produced. Moreover, when Examples 1-5 are compared, it turns out that 1-2 mm is preferable for the space | interval D of the flat part mutually parallel of a side part supporting member. Moreover, when Examples 6-10 are compared, it turns out that 0.5-5 mm is preferable for the area | region with which a side part supporting member and a glass substrate overlap.

Claims (13)

ガラス基板を化学強化液に浸漬し化学強化を行う工程で用いる前記ガラス基板を保持する保持治具において、
前記保持治具は、複数の支持部材と、該支持部材を取り付ける一対の固定部材とを有し、前記複数の支持部材は、前記ガラス基板を支持するための複数の溝を備えた、前記ガラス基板の下部を支持する下部支持部材と、前記ガラス基板の側部を支持する側部支持部材とからなり、
前記側部支持部材の溝の断面形状が互いに平行な平坦部を有することを特徴とする保持治具。
In the holding jig for holding the glass substrate used in the process of chemical strengthening by immersing the glass substrate in the chemical strengthening liquid,
The holding jig includes a plurality of support members and a pair of fixing members to which the support members are attached, and the plurality of support members include a plurality of grooves for supporting the glass substrate. A lower support member that supports the lower part of the substrate, and a side support member that supports the side part of the glass substrate,
A holding jig having flat portions in which the cross-sectional shapes of the grooves of the side support members are parallel to each other.
前記側部支持部材の溝の入り口が面取りした形状であることを特徴とする請求の範囲第1項に記載の保持治具。 The holding jig according to claim 1, wherein an entrance of a groove of the side support member is chamfered. 前記側部支持部材の溝の互いに平行な平坦部の間隔が1〜2mmであることを特徴とする請求の範囲第1項又は第2項に記載の保持治具。 The holding jig according to claim 1 or 2, wherein an interval between flat portions of the side support member grooves parallel to each other is 1 to 2 mm. 前記側部支持部材の溝の互いに平行な平坦部の何れか一方と、前記ガラス基板の側部との重なる領域が、0.5〜5mmであることを特徴とする請求の範囲第1項乃至第3項の何れか1項に記載の保持治具。 The region where one of the flat portions parallel to each other of the grooves of the side support member and the side portion of the glass substrate overlap is 0.5 to 5 mm. 4. The holding jig according to any one of the third item. 互いに対向配置された2本の前記側部支持部材間の前記ガラス基板の側部を指示する内側の間隔Lと、前記ガラス基板の外径Gとが、0.2mm≦L−G≦5.0mmの関係にあることを特徴とする請求の範囲第1項乃至第4項の何れか1項に記載の保持治具。 An inner distance L indicating the side of the glass substrate between the two side support members arranged opposite to each other and an outer diameter G of the glass substrate are 0.2 mm ≦ LG ≦ 5. The holding jig according to any one of claims 1 to 4, wherein the holding jig has a relationship of 0 mm. 前記側部支持部材の溝の断面形状がコの字状であることを特徴とする請求の範囲第1項乃至第5項の何れか1項に記載の保持治具。 The holding jig according to any one of claims 1 to 5, wherein a cross-sectional shape of the groove of the side support member is a U-shape. 前記下部支持部材の溝の断面形状がV字状であり、前記ガラス基板の外周端部の2カ所が面取り加工されており、該面取り加工後の2つの加工面のなす角度をθ2とした時、前記V字状の角度θ1が下記式の範囲であることを特徴とする請求の範囲第1項乃至第6項の何れか1項に記載の保持治具。
θ2<θ1<170°
When the cross-sectional shape of the groove of the lower support member is V-shaped, the outer peripheral end of the glass substrate is chamfered at two locations, and the angle formed by the two processed surfaces after chamfering is θ2. The holding jig according to any one of claims 1 to 6, wherein the V-shaped angle θ1 is within a range of the following formula.
θ2 <θ1 <170 °
前記下部支持部材の溝の断面形状がV字状であり、前記ガラス基板の外周端部がラウンド加工がされており、前記V字状の角度θ1が90°〜170°であることを特徴とする請求の範囲第1項乃至第6項の何れか1項に記載の保持治具。 The cross-sectional shape of the groove of the lower support member is V-shaped, the outer peripheral end of the glass substrate is rounded, and the V-shaped angle θ1 is 90 ° to 170 °. The holding jig according to any one of claims 1 to 6, wherein: 前記下部支持部材の溝の断面形状が円弧状であり、前記ガラス基板の外周端部の2カ所が面取り加工されており、前記ガラス基板の面取り加工された面取り部の外端が、前記溝の断面と接触することを特徴とする請求の範囲第1項乃至第6項の何れか1項に記載の保持治具。 A cross-sectional shape of the groove of the lower support member is an arc shape, two outer peripheral end portions of the glass substrate are chamfered, and an outer end of the chamfered portion of the glass substrate is chamfered. The holding jig according to any one of claims 1 to 6, wherein the holding jig is in contact with a cross section. 前記下部支持部材の溝の断面形状が曲率半径R1の円弧状であり、前記ガラス基板の外周端部がラウンド加工がされており、該外周端部の曲率半径をR2とした時、R1がR2よりも大きいことを特徴とする請求の範囲第1項乃至第6項の何れか1項に記載の保持治具。 The cross-sectional shape of the groove of the lower support member is an arc shape with a radius of curvature R1, the outer peripheral end of the glass substrate is rounded, and when the radius of curvature of the outer peripheral end is R2, R1 is R2. The holding jig according to any one of claims 1 to 6, wherein the holding jig is larger than the holding jig. ガラス基板を化学強化する工程を有する記録媒体用ガラス基板の製造方法において、
請求の範囲第1項乃至第10項の何れか1項の保持治具を用いて製造することを特徴とする記録媒体用ガラス基板の製造方法。
In the manufacturing method of the glass substrate for recording media which has the process of chemically strengthening a glass substrate,
A manufacturing method of a glass substrate for a recording medium, wherein the manufacturing method is performed using the holding jig according to any one of claims 1 to 10.
請求の範囲第11項に記載の記録媒体用ガラス基板の製造方法をもちいて製造されることを特徴とする記録媒体用ガラス基板。 A glass substrate for a recording medium, which is manufactured using the method for manufacturing a glass substrate for a recording medium according to claim 11. 請求の範囲第12項に記載の記録媒体用ガラス基板の表面に磁性膜を有することを特徴とする記録媒体。 A recording medium comprising a magnetic film on a surface of the glass substrate for a recording medium according to claim 12.
JP2008551018A 2006-12-26 2007-12-06 Holding jig, method for manufacturing glass substrate for recording medium using the holding jig, glass substrate for recording medium, and recording medium Pending JPWO2008078528A1 (en)

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