JPH01196729A - Surface treatment of underlying ni-cu-p plated substrate for magnetic disk - Google Patents

Surface treatment of underlying ni-cu-p plated substrate for magnetic disk

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Publication number
JPH01196729A
JPH01196729A JP2231088A JP2231088A JPH01196729A JP H01196729 A JPH01196729 A JP H01196729A JP 2231088 A JP2231088 A JP 2231088A JP 2231088 A JP2231088 A JP 2231088A JP H01196729 A JPH01196729 A JP H01196729A
Authority
JP
Japan
Prior art keywords
substrate
water
surface treatment
immersed
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2231088A
Other languages
Japanese (ja)
Inventor
Shoshi Koga
詔司 古賀
Masahiro Kawaguchi
雅弘 川口
Hideo Fujimoto
日出男 藤本
Hideyoshi Usui
碓井 栄喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP2231088A priority Critical patent/JPH01196729A/en
Publication of JPH01196729A publication Critical patent/JPH01196729A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To prevent discoloration of the surface of a substrate subjected to a surface treatment at the time of rinsing and storing by subjecting the substrate to mirror polishing, then immersing the same into a specific soln. CONSTITUTION:The substrate formed by subjecting an Al alloy substrate to the surface treatment by electroless Ni-Cu-P plating is subjected to the mirror polishing and is then immersed into the aq. soln. of an org. compd. (e.g.: benzotriazole) which forms a reactive film insoluble in water by reacting with Ni-Cu or the like, by which an inhibitor film is formed on the surface. The discoloration of the substrate surface at the time of the rinsing after the mirror polishing or during the storage is then prevented and the corrosion resistance is improved.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気ディスク用下地メッキ基盤の製造技術に係
り、より詳細には、アルミニウム合金基盤上に無電解N
i−Cu−Pメッキ処理を施した後、鏡面研磨したサブ
ストレートの耐食性、特に耐変色性を向上し得る表面処
理法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a technology for manufacturing an underplating substrate for magnetic disks, and more specifically, the present invention relates to a technology for manufacturing an underplating substrate for magnetic disks, and more specifically, it relates to an electroless N-plated substrate on an aluminum alloy substrate.
The present invention relates to a surface treatment method that can improve the corrosion resistance, particularly the discoloration resistance, of a mirror-polished substrate that has been subjected to i-Cu-P plating treatment.

(従来の技術) 一般に磁気ディスク用基盤としては、アルミニウム合金
等の金属製ディスク用基盤上に磁性薄膜媒体を形成して
製造されるが、近年、記録密度の高密度化、高信頼性化
の要求に伴って磁気ディスク用基盤と磁気ヘッドとの間
隔を小さくするべくますます厳しくなり、0.1μm程
度まで狭くするよう要請されてきている。
(Prior art) Generally, magnetic disk substrates are manufactured by forming a magnetic thin film medium on a metal disk substrate such as an aluminum alloy. In line with the demand, it has become increasingly strict to reduce the distance between the magnetic disk substrate and the magnetic head, and it has been requested to reduce the distance to about 0.1 .mu.m.

このため、磁気ディスク用基盤の平滑度が重要な特性と
なり、具体的には、基盤表面の欠陥はできるだけ小さく
、かつ、その表面精度もできるだけ高いこと等が要求さ
れるようになった。
For this reason, the smoothness of the magnetic disk substrate has become an important characteristic, and specifically, it has become necessary to have as few defects as possible on the substrate surface and to have as high a surface precision as possible.

一方、薄膜媒体についても、従来の金属メッキ膜、金属
スパッタ膜に代わり、γ−Fe、Offスパッタ膜が開
発されており、それに伴って磁気ディスク用基盤の製造
技術面でも新たな問題が幾つか生じてきている。
On the other hand, regarding thin film media, γ-Fe and Off-sputtered films have been developed in place of conventional metal plating films and metal sputtering films, and this has brought with it several new problems in terms of manufacturing technology for magnetic disk substrates. It's starting to happen.

例えば、γ−Fe、O,スパッタ膜の成膜プロセスにお
いては300”C以上での熱処理が必要であるが、この
熱処理に際しては従来のNi−Pメッキ皮膜では非磁性
を保つことができないため、これを下地メッキ基盤とし
て使用することができなくなる。そこで、300℃以上
での熱処理でも非磁性であるNi−Cu−Pメッキ皮膜
を下地として用いることが検討されている。
For example, in the film formation process of γ-Fe, O, and sputtered films, heat treatment at 300"C or higher is required, but during this heat treatment, conventional Ni-P plating films cannot maintain nonmagnetic properties. This cannot be used as a base plating base.Therefore, the use of a Ni-Cu-P plating film, which is nonmagnetic even when heat treated at 300° C. or higher, is being considered as a base.

(発明が解決しようとする課題) ところで、アルミニウム合金製の磁気ディスク用下地メ
ッキ基盤を製造する場合、アルミ基盤上に無電解Ni−
Cu−Pメッキ皮膜を形成した後、鏡面研磨を行い、次
いで薄膜媒体の形成を行うが、鏡面研磨後、スラリーの
除去のために中性洗剤による洗浄及び仕上洗浄作業を実
施する必要がある。
(Problems to be Solved by the Invention) By the way, when manufacturing a base plated substrate for a magnetic disk made of aluminum alloy, electroless Ni-
After forming the Cu-P plating film, mirror polishing is performed, and then a thin film medium is formed, but after mirror polishing, it is necessary to perform cleaning with a neutral detergent and final cleaning to remove slurry.

この洗浄作業においては、該下地Ni−Cu−Pメッキ
基盤(サブストレート)を少しでも水中に浸漬しておく
と、鏡面研磨後の表面が変色を起こすと共に酸化物が生
成し、そのため、薄膜媒体形成時にスパッタ膜の付着に
ムラができ易く、精度不良、特性エラーが発生し易くな
り、商品としての価値がなくなる等の問題がある。
In this cleaning process, if the underlying Ni-Cu-P plating substrate is immersed in water even for a little while, the mirror-polished surface will discolor and oxides will be generated, which may cause the thin film medium to There are problems such as uneven adhesion of the sputtered film during formation, poor accuracy and characteristic errors, and loss of value as a product.

この点、鏡面研磨後の水洗浄時の変色を防止する方法と
しては、鏡面研磨後のスラリー除去のための中性洗剤に
よる洗浄を行った後、素早く水洗浄し、しかもIPA、
フロン等で直ちに乾燥する等、水中に浸漬しておく時間
を極力短くすること−が必要である。
In this regard, a method to prevent discoloration during water washing after mirror polishing is to wash with a neutral detergent to remove slurry after mirror polishing, and then quickly wash with water.
It is necessary to shorten the time immersed in water as much as possible, such as by immediately drying with Freon or the like.

しかし乍ら、実際の鏡面研磨作業では、ディスクサイズ
にもよるが、少なくとも5〜40枚程度を同時に研磨し
、次いでこれらを洗浄することになるが、上記の如くこ
れらを同時に洗浄、乾燥することは実際には難しいので
、どうしても水中に数分〜数十分は浸漬したまま保管し
ておくことになる。
However, in actual mirror polishing work, at least 5 to 40 disks are polished at the same time, depending on the disk size, and then they are cleaned. In practice, it is difficult to do this, so it is necessary to store it immersed in water for several minutes to several tens of minutes.

本発明は、か\る状況に鑑みてなされたものであって、
磁気ディスク用アルミニウム合金基盤上に無電解Ni−
Cu−Pメッキを施した下地Ni−Cu−P基盤につき
、鏡面研磨後の水洗浄及び保管時に発生する基盤表面の
変色を防止し、耐食性を向上させ得る新規で実際的な表
面処理法を提供することを目的とするものである。
The present invention was made in view of the above situation, and
Electroless Ni- on aluminum alloy substrate for magnetic disks
Provides a new and practical surface treatment method that can prevent discoloration of the substrate surface that occurs during water washing and storage after mirror polishing and improve corrosion resistance for Ni-Cu-P substrates coated with Cu-P plating. The purpose is to

(課題を解決するための手段) 上記目的を達成するため、本発明者は、アルミニウム合
金基盤上に無電解Ni−Cu−Pメッキを施した下地処
理サブストレートを鏡面研磨後に表面処理する方法につ
いて検討を重ねた結果、鏡面研磨後、一旦、該基盤を特
定の溶液中に浸漬しインヒビターとなる膜を成膜すれば
、その後は水中に保管していても該基盤表面の変色を防
止でき、耐食性を向上でき、その後のスパッタによる磁
性膜を形成したメディアにおいて、性能劣化させること
なく十分使用できることを見い出したものである。
(Means for Solving the Problems) In order to achieve the above object, the present inventors have proposed a method for surface treatment after mirror polishing a base treatment substrate in which electroless Ni-Cu-P plating is applied on an aluminum alloy base. As a result of repeated studies, we found that once the substrate is immersed in a specific solution after mirror polishing to form an inhibitor film, discoloration of the substrate surface can be prevented even if the substrate is stored in water. It has been discovered that the corrosion resistance can be improved and that it can be used satisfactorily in media on which a magnetic film is subsequently formed by sputtering without deteriorating performance.

すなわち、本発明に係る磁気ディスク用下地Ni−Cu
−Pメッキ基盤の表面処理法は、アルミニウム合金基盤
上に無電解Ni−Cu−Pメッキによる下地処理を施し
たサブストレートを、鏡面研磨後、一旦、Ni、Cuと
反応して水に不溶性の反応膜を作る有機化合物を水或い
は水可溶の溶媒に溶解した液中に浸漬することを特徴と
するものである。
That is, the magnetic disk base Ni-Cu according to the present invention
-The surface treatment method for P-plated substrates involves mirror-polishing the substrate, which is made by applying electroless Ni-Cu-P plating on an aluminum alloy substrate, and then reacts with Ni and Cu to form a water-insoluble material. This method is characterized by immersing the organic compound forming the reaction membrane in water or a solution in which the organic compound is dissolved in a water-soluble solvent.

以下に本発明を実施例に基づいて詳細に説明する。The present invention will be explained in detail below based on examples.

本発明法が対象とする磁気ディスク用基盤は、従来と同
様にして適宜材質のアルミニウム合金製基盤を製造し、
これに無電解Ni−Cu−Pメッキを施したものであり
、特にその製造条件、メッキ条件等々には制限されない
The magnetic disk substrate targeted by the method of the present invention is produced by manufacturing an aluminum alloy substrate of an appropriate material in the same manner as in the past.
This is subjected to electroless Ni--Cu--P plating, and the manufacturing conditions, plating conditions, etc. are not particularly limited.

また、該サブストレートに対する鏡面研磨も、従来と同
様、市販の研磨剤メデイボールN08(不二児研磨剤工
業(株)、商品名)などを使用し、両面研磨盤により研
磨を行えばよく、特に研磨条件等には制限されない。
In addition, the mirror polishing of the substrate can be performed using a commercially available abrasive such as Mediball N08 (Fujiko Abrasive Industries Co., Ltd., trade name) with a double-sided polishing machine, as in the past. There are no particular restrictions on the polishing conditions.

かへる鏡面研磨を施したサブストレートは、本発明では
、鏡面研磨後(通常はその後、スラリー除去洗浄と仕上
水洗浄した後)、一旦、速やかに特定の有機化合物を溶
解した溶液中に浸漬するのである。
In the present invention, the mirror-polished substrate is immediately immersed in a solution containing a specific organic compound after mirror-polishing (usually followed by slurry removal cleaning and finishing water cleaning). That's what I do.

このように、水洗浄直後、サブストレートを有機化合物
を溶解した水溶液中に一旦浸漬すれば、その後再び水洗
浄液中に戻しても、乾燥する迄の間、変色を起こさずに
保管できる。勿論、有機化合物を溶解した水溶液中に引
き続き浸漬したままでもよいが、従前の水洗浄工程、乾
燥工程をそのまま利用し、且つ保管の経済性を考慮すれ
ば、前者の如く水洗浄後に、一旦、有機化合物を溶解し
た液に浸漬する態様が好ましい。また、研磨後保管する
必要があるときはその都度、上記方法により保管すれば
良い等、様々な態様が可能である。
In this way, if the substrate is once immersed in an aqueous solution in which an organic compound is dissolved immediately after washing with water, it can be stored without discoloration until it is dried, even if it is returned to the water washing solution. Of course, it is possible to continue immersing the organic compound in the aqueous solution in which the organic compound is dissolved; A preferred embodiment is immersion in a solution containing an organic compound. In addition, various modes are possible, such as storing it by the above method each time it is necessary to store it after polishing.

上記有機化合物としては、Ni−Cuと反応して水に不
溶性の反応膜(インヒビター)を作る有機化合物であり
、例えば、ベンゾトリアゾール、安息香酸、メルカプト
ベンゾチアゾール、トリルトリアゾール、ペンズイミア
ゾール等を挙げることができる。これらを水又は水可溶
の適宜溶媒に溶解して使用する。
The above organic compound is an organic compound that reacts with Ni-Cu to form a water-insoluble reaction film (inhibitor), such as benzotriazole, benzoic acid, mercaptobenzothiazole, tolyltriazole, penzimiazole, etc. be able to. These are used after being dissolved in water or an appropriate water-soluble solvent.

なお、研磨後に行う中性洗剤によるスラリー除去洗浄や
仕上げ水洗浄、乾燥、或いは薄膜媒体形成プロセス等々
は、本発明の表面処理法を採用しても何ら変更されるこ
とはない。
Note that the slurry removal cleaning using a neutral detergent, finishing water cleaning, drying, thin film medium forming process, etc. performed after polishing are not changed in any way even if the surface treatment method of the present invention is adopted.

(実施例) 次に本発明の実施例を示す。(Example) Next, examples of the present invention will be shown.

大庭舛よ 5インチサイズのアルミニウム合金基盤上に常法により
無電解Ni−Cu−Pメッキ皮膜を形成した後、両面研
磨機により5枚を同時に鏡面研磨した。
After forming an electroless Ni--Cu--P plating film on a 5-inch size aluminum alloy substrate by Masuyo Oba using a conventional method, the five substrates were mirror-polished at the same time using a double-sided polishing machine.

これらを試料とし、鏡面研磨後、ベルクリン布と中性洗
剤によりスラリー除去を行い、イオン交換水による仕上
げ洗浄が終了した直後に、25℃の0.2%ベンゾトリ
アゾール水溶液に1分間浸漬し、その後、IPA、フロ
ンによる乾燥を行うまでの間(最初の試料で約IR1’
Jl)、イオン交換水中に浸漬し、保管しておいた。
These were used as samples, and after mirror polishing, the slurry was removed using a Berglin cloth and a neutral detergent. Immediately after the final cleaning with ion-exchanged water was completed, they were immersed in a 0.2% benzotriazole aqueous solution at 25°C for 1 minute, and then , IPA, until drying with Freon (approximately IR1' for the first sample)
Jl), immersed in ion exchange water and stored.

次いで、全部の試料の水洗浄が終了した時点で全試料を
イオン交換水中から取り出し、上記乾燥を行った。
Next, when all the samples had been washed with water, they were taken out of the ion exchange water and dried as described above.

去美濠[礼 実施例1と同様の方法で下地メッキ、鏡面研磨した試料
について、中性洗剤によるスラリー除去、イオン交換水
によるスラリー除去後、イオン交換水による仕上げ洗浄
が終了した直後に、25℃の2%安息香酸ナトリウム水
溶液中に1分間浸漬し、その後、IPA、フロンによる
乾燥を行うまでの間、イオン交換水中に浸漬し、保管し
ておいた。
After removing the slurry with a neutral detergent, removing the slurry with ion-exchanged water, and finishing the final cleaning with ion-exchanged water, the sample was subjected to base plating and mirror polishing in the same manner as in Example 1. It was immersed in a 2% sodium benzoate aqueous solution at .degree. C. for 1 minute, and then immersed in ion-exchanged water and stored until it was dried with IPA and Freon.

次いで、全部の試料の水洗浄が終了した時点で全試料を
安息香酸ナトリウム水溶液中から取り出し、上記乾燥を
行った。
Next, when all the samples had been washed with water, they were taken out of the aqueous sodium benzoate solution and dried as described above.

え笠叢 比較のため、実施例1と同様の方法で下地メッキ、鏡面
研磨した試料について、中性洗剤によるスラリー除去後
、IPA、フロンによる乾燥を行うまでの間、イオン交
換水に浸漬し、保管しておいた。
For comparison, samples were plated and mirror-polished in the same manner as in Example 1, and after removing the slurry with a neutral detergent, they were immersed in ion-exchanged water until drying with IPA and Freon. I kept it.

次いで、全部の試料の洗浄が終了した段階で全試料をイ
オン交換水中より取り出し、上記乾燥を行った。
Next, when all the samples had been washed, they were taken out of the ion exchange water and dried as described above.

以上の各実施例及び比較例で得られた試料について、水
洗浄後の時間経過に伴う表面変色状況を調べた。その結
果を第1表に示す。なお、同表中、洗浄順番Nαは最初
の試料Nα1から順に洗浄した順位を示す。
Regarding the samples obtained in each of the above Examples and Comparative Examples, the state of surface discoloration over time after washing with water was investigated. The results are shown in Table 1. In the same table, the cleaning order Nα indicates the order in which the samples were washed starting from the first sample Nα1.

第1表よりわかるように、イオン交換水に浸漬し保管し
ておいた比較例の場合、鏡面研磨直後に水洗、乾燥を行
った最後の試料Nα5には変色が認められないが、先に
イオン交換水により水洗浄し。
As can be seen from Table 1, in the case of the comparative example that was immersed in ion-exchanged water and stored, no discoloration was observed in the final sample Nα5, which was washed and dried immediately after mirror polishing, but Rinse with replacement water.

同じイオン交換水中に浸漬、保管しておいたものは、乾
燥後の時間の経過と共に表面の変色がひどくなる。
Items that have been immersed and stored in the same ion-exchanged water will become more discolored on the surface as time passes after drying.

これに対し、ベンゾトリアゾール水溶液、或いは安息香
酸ナトリウム水溶液中に一時浸漬した本発明例のものは
、その後、イオン交換水に浸漬して1時間経過後におい
ても、表面に変色が認められず、鏡面研磨直後に引き続
きスラリー除去、水洗浄、乾燥したものと全く同じ表面
のものが得られた。
On the other hand, the samples of the present invention that were temporarily immersed in an aqueous benzotriazole solution or an aqueous sodium benzoate solution showed no discoloration on the surface even after 1 hour had passed after being immersed in ion-exchanged water, resulting in a mirror-like surface. Immediately after polishing, the slurry was removed, washed with water, and dried to obtain the same surface.

【以下余白] また、これらの各試料に対して常法によりC。[Left below] In addition, each of these samples was subjected to a conventional method to obtain C.

−Ni磁性薄膜媒体をスパッター法にて形成し、媒体特
性について調査したところ、本発明例のものはエラー発
生が少なく、安定した特性が得られていたことを確認し
た。
A -Ni magnetic thin film medium was formed by a sputtering method and the medium characteristics were investigated, and it was confirmed that the inventive example had few errors and stable characteristics were obtained.

なお、メルカプトベンゾチアゾール水溶液、トリルトリ
アゾール水溶液、ペンズイミアゾール水溶液を使用した
場合においても同様の効果が得られることを確認した。
In addition, it was confirmed that similar effects could be obtained when using an aqueous mercaptobenzothiazole solution, an aqueous solution of tolyltriazole, and an aqueous solution of penzimiazole.

(発明の効果) 以上詳述したように、本発明によれば、磁気ディスク用
アルミニウム合金基盤上に無電解N i −Cu−Pメ
ッキ皮膜を形成したサブストレートを、鏡面研磨後、一
旦、所定の溶液中に浸漬するので。
(Effects of the Invention) As described in detail above, according to the present invention, a substrate in which an electroless Ni-Cu-P plating film is formed on an aluminum alloy base for a magnetic disk is polished to a predetermined position after mirror polishing. Because it is immersed in a solution of.

その後、水洗浄液中に長時間浸漬保管していても、表面
の変色が起らず、極めて優れた耐食性を付与することが
できる。したがって、その後の磁性薄膜媒体の形成性が
良く、特性エラー発生の防止等を可能にするものである
。更に、本発明法は簡易で実際的な方法であるので、他
の処理加工作業に何ら支障を来たすことなく可能である
Thereafter, even if it is stored immersed in a water cleaning solution for a long time, the surface does not discolor, and extremely excellent corrosion resistance can be imparted. Therefore, the subsequent formation of the magnetic thin film medium is good, and it is possible to prevent characteristic errors from occurring. Furthermore, since the method of the present invention is a simple and practical method, it can be carried out without any hindrance to other processing operations.

特許出願人   株式会社神戸製鋼所 代理人弁理士  中  村   尚Patent applicant: Kobe Steel, Ltd. Representative Patent Attorney Takashi Nakamura

Claims (1)

【特許請求の範囲】[Claims] アルミニウム合金基盤上に無電解Ni−Cu−Pメッキ
による下地処理を施したサブストレートを、鏡面研磨後
、一旦、Ni、Cuと反応して水に不溶性の反応膜を作
る有機化合物を水或いは水可溶の溶媒に溶解した液中に
浸漬することを特徴とする磁気ディスク用下地Ni−C
u−Pメッキ基盤の表面処理法。
After mirror-polishing the aluminum alloy substrate, which has been subjected to a surface treatment using electroless Ni-Cu-P plating, an organic compound that reacts with Ni and Cu to form a water-insoluble reaction film is first coated with water or water. Ni-C base material for magnetic disks characterized by being immersed in a liquid dissolved in a soluble solvent
Surface treatment method for u-P plating base.
JP2231088A 1988-02-02 1988-02-02 Surface treatment of underlying ni-cu-p plated substrate for magnetic disk Pending JPH01196729A (en)

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Application Number Priority Date Filing Date Title
JP2231088A JPH01196729A (en) 1988-02-02 1988-02-02 Surface treatment of underlying ni-cu-p plated substrate for magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2231088A JPH01196729A (en) 1988-02-02 1988-02-02 Surface treatment of underlying ni-cu-p plated substrate for magnetic disk

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JPH01196729A true JPH01196729A (en) 1989-08-08

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JP2231088A Pending JPH01196729A (en) 1988-02-02 1988-02-02 Surface treatment of underlying ni-cu-p plated substrate for magnetic disk

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