JPS63253513A - Thin-film magnetic head - Google Patents
Thin-film magnetic headInfo
- Publication number
- JPS63253513A JPS63253513A JP8742687A JP8742687A JPS63253513A JP S63253513 A JPS63253513 A JP S63253513A JP 8742687 A JP8742687 A JP 8742687A JP 8742687 A JP8742687 A JP 8742687A JP S63253513 A JPS63253513 A JP S63253513A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- layers
- thin
- nonmagnetic insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 20
- 239000004020 conductor Substances 0.000 claims abstract description 14
- 239000010408 film Substances 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 109
- 238000009413 insulation Methods 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は複数層の導体コイルを備えた薄膜磁気ヘッド
に関し、導体コイルを絶縁保護する非磁性絶縁層の形状
の影響が上部磁性層に及ばないようにしたものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a thin-film magnetic head equipped with a plurality of layers of conductive coils, and the present invention relates to a thin-film magnetic head equipped with a plurality of layers of conductor coils. I tried to avoid it.
磁気ディスク等の磁気記録媒体への情報の記録・再生に
使用する磁気ヘッドのひとつに薄膜磁気ヘッドがある。A thin film magnetic head is one of the magnetic heads used for recording and reproducing information on magnetic recording media such as magnetic disks.
この薄膜磁気ヘッドは、フォトリソグラフィ技術を用い
て磁性層や導体コイルを形成したものであり、製法上、
バルク形磁気ヘッドを機械加工で製作するのに比べ、寸
法の微小化に適するほか、高周波損失やマルチトラック
とした場合のトラック間漏洩が少ないなどの特徴がある
。This thin-film magnetic head uses photolithography technology to form magnetic layers and conductor coils, and due to the manufacturing method,
Compared to manufacturing bulk magnetic heads by machining, this method is suitable for miniaturization, and has features such as low high-frequency loss and low inter-track leakage when used with multi-tracks.
このような薄膜磁気ヘッドの中には、記録再生効率の向
上をはかるため導体コイルを多層に形成した多層R膜磁
気ヘッドがあり、例えば4層薄膜磁気ヘッドの構造は、
第3図に示寸ように、磁性あるいは非磁性の基板1上に
パーマロイやセンダスト等を蒸着あるいはスパッタリン
グして下部磁性層2を成膜し、この下部磁性m2上に磁
気ギャップを形成するため非磁性体を成膜して磁気ギャ
ップ層3とし、居間絶縁用の非磁性絶縁WJ4および導
体コイル5を交互に積層して4層の導体コイル層を形成
し、最上部にパーマロイやセンダスト等を蒸着あるいは
スパッタリング等で成膜して上部磁性層6としている。Among such thin-film magnetic heads, there is a multilayer R-film magnetic head in which conductor coils are formed in multiple layers in order to improve recording and reproducing efficiency.For example, the structure of a four-layer thin-film magnetic head is as follows.
As shown in FIG. 3, a lower magnetic layer 2 is formed by vapor-depositing or sputtering permalloy, sendust, etc. on a magnetic or non-magnetic substrate 1, and a non-magnetic layer 2 is formed on the lower magnetic layer m2 to form a magnetic gap. A magnetic material is deposited to form a magnetic gap layer 3, non-magnetic insulating WJ 4 for living room insulation and a conductor coil 5 are alternately laminated to form a 4-layer conductor coil layer, and permalloy, sendust, etc. is evaporated on the top. Alternatively, the upper magnetic layer 6 is formed by forming a film by sputtering or the like.
、 このような4層薄膜磁気ヘッドでは、上部磁性層
6と下部磁性層2との間にvlmされている4層の導体
コイル5を絶縁保護する非磁性絶縁層4を上層になるに
従って順次小さく(小面v4)なるよう積層している。In such a four-layer thin film magnetic head, the non-magnetic insulating layer 4, which insulates and protects the four-layer conductor coil 5 placed between the upper magnetic layer 6 and the lower magnetic layer 2, is made smaller in size as the upper layer increases. (facet v4).
ところが、このように非磁性絶縁層4を上層に向って順
次小さくすると、各層間に段差ができるとともに、非磁
性絶縁層4の形成時にフォトレジスト現像液を使用する
と、最下層の非磁性絶縁層4が4回この液にさらされる
ことになり、第3図(b)に示すように、形状がくずれ
微小の凹凸ができてしまう。このため最上部の上部磁性
層6が滑らかに成膜されず磁気特性が低下してしまう。However, when the non-magnetic insulating layer 4 is made gradually smaller toward the upper layer in this way, steps are created between each layer, and if a photoresist developer is used when forming the non-magnetic insulating layer 4, the bottom non-magnetic insulating layer 4 will be exposed to this liquid four times, and as shown in FIG. 3(b), the shape will collapse and minute irregularities will be formed. For this reason, the uppermost magnetic layer 6 is not formed smoothly, resulting in deterioration of magnetic properties.
そこで、非磁性絶縁図を形成する場合に、第4図に示す
ように、隣接する下側の非磁性絶縁層4を上側の非磁性
絶縁層4で覆うにうにし、各層の非磁性絶縁層4が1回
だけフォトレジスト現像液等の薬品にざらされるように
したものもあるが、磁気ギャップ層3上での最下層の非
磁性絶縁層4の先端から最上層の非磁性絶縁層4の先端
までの長さDが長くなり過ぎ、磁気ヘッドの磁路長が長
くなって磁気特性の低下を招いてしまう。Therefore, when forming a nonmagnetic insulation diagram, as shown in FIG. 4, the adjacent lower nonmagnetic insulation layer 4 is covered with the upper nonmagnetic insulation layer 4, and the nonmagnetic insulation layer 4 is exposed to a chemical such as a photoresist developer only once, but the layer 4 is exposed from the tip of the bottom non-magnetic insulating layer 4 on the magnetic gap layer 3 to the top non-magnetic insulating layer 4. The length D to the tip of the magnetic head becomes too long, and the magnetic path length of the magnetic head becomes long, resulting in deterioration of magnetic properties.
この発明はかかる従来技術の問題点に鑑みてなされたも
ので、複数層の非磁性絶縁層の形状の影響が上部磁性層
に及ばず、磁気特性の優れた薄膜磁気ヘッドを提供しよ
うとするものである。This invention has been made in view of the problems of the prior art, and aims to provide a thin-film magnetic head with excellent magnetic properties in which the shape of a plurality of non-magnetic insulating layers does not affect the upper magnetic layer. It is.
上記問題点を解決するためこの発明は、上部および下部
磁性層間に磁気ギトツプを形成する磁気ギャップ層と複
数層の導体コイルおよびこれらを絶縁保護する複数層の
非磁性絶縁層とをvlFjiしてなる薄膜磁気ヘッドに
おいて、各層の導体コイルを絶縁保護する複数の非磁性
絶縁層を上部磁性層に向って隣接層を順次小面積に形成
し、これら非磁性絶縁層を最上層の非磁性絶縁層で覆う
よう積層したことを特徴とするものである。In order to solve the above problems, the present invention comprises a magnetic gap layer that forms a magnetic gap between the upper and lower magnetic layers, a plurality of conductor coils, and a plurality of nonmagnetic insulating layers that insulate and protect them. In a thin film magnetic head, a plurality of nonmagnetic insulating layers are formed to insulate and protect the conductor coils in each layer, and adjacent layers are successively formed in small areas toward the upper magnetic layer. It is characterized by being laminated so as to cover it.
(作 用)
複数層の非磁性絶縁図層を下部磁性層側から順次小さく
し、最上層の非磁性絶縁層を最下層の非磁性絶縁層より
大きくして各非磁性絶縁層を覆うようにし、各層間の段
差を最上層の非磁性絶縁層で吸収するとともに、磁路長
の増大を防止し、磁気特性の優れた薄膜磁気ヘッドとし
ている。(Function) The multiple non-magnetic insulating layers are made smaller sequentially from the bottom magnetic layer side, and the top non-magnetic insulating layer is made larger than the bottom non-magnetic insulating layer to cover each non-magnetic insulating layer. The difference in level between each layer is absorbed by the uppermost non-magnetic insulating layer, and an increase in magnetic path length is prevented, resulting in a thin-film magnetic head with excellent magnetic properties.
以下、この発明の一実施例を図面に基づき詳細に説明す
る。Hereinafter, one embodiment of the present invention will be described in detail based on the drawings.
第1図および第2図はこの発明の薄膜磁気ヘッドの一実
施例にかかり、4層構造とした場合の断面図および平面
図である。FIGS. 1 and 2 are a cross-sectional view and a plan view of an embodiment of the thin-film magnetic head of the present invention having a four-layer structure.
この薄膜磁気ヘッド10は、磁性あるいは非磁性の基板
1上に下部磁性層2が成膜され、この下部磁性層2上に
磁気ギャップを形成する非磁性体の磁気ギャップ層3が
成膜されており、この磁気ギャップ層3上に層間絶縁用
の非磁性絶縁層4と導体コイル5が交互に4層積層され
、この上に先端部が磁気ギャップ層3上に位置し、中間
部が最上層の非磁性絶R層4に沿うよう配置されるとと
もに、基端部が下部磁性層2上に位置する結合部6aで
連結されて磁路を形成するよう上部磁性層 6が成膜さ
れている。This thin film magnetic head 10 has a lower magnetic layer 2 formed on a magnetic or non-magnetic substrate 1, and a non-magnetic magnetic gap layer 3 forming a magnetic gap formed on the lower magnetic layer 2. On this magnetic gap layer 3, non-magnetic insulating layers 4 for interlayer insulation and conductor coils 5 are alternately laminated in four layers, the tip portion is located on the magnetic gap layer 3, and the middle portion is located on the top layer. An upper magnetic layer 6 is formed so as to be arranged along the non-magnetic insulating R layer 4, and to form a magnetic path by being connected at a coupling portion 6a with its base end located on the lower magnetic layer 2. .
そして、下部磁性層2と上部磁性層6との間に設けられ
る4層の非磁性絶縁層41〜44と導体コイル5とは、
磁気ギャップ層3上の第1層目から第3層目の非磁性絶
縁層41〜43は、上層になるに従って順次わずかずつ
小さくし、小面積となるようv4層され、最上層となる
第4層目の非磁性絶縁層44は第1層から第3層までの
非磁性絶縁層4〜43を覆うよう第1層目の非磁性絶縁
層41より大きくなっている。The four non-magnetic insulating layers 41 to 44 provided between the lower magnetic layer 2 and the upper magnetic layer 6 and the conductor coil 5 are as follows:
The first to third non-magnetic insulating layers 41 to 43 on the magnetic gap layer 3 are gradually made smaller as they move toward the upper layer, and are formed into v4 layers so as to have a small area. The nonmagnetic insulating layer 44 of the first layer is larger than the nonmagnetic insulating layer 41 of the first layer so as to cover the nonmagnetic insulating layers 4 to 43 from the first layer to the third layer.
このような4層構造の非磁性絶R層4の各層の大ぎさは
、薄膜磁気ヘッド10の最上部の上部磁性層6の傾斜部
6bの角度に応じて決定され、非磁性絶縁層4の各層の
大きさを適当に変えることで逆に傾斜部6bの角度を任
意に変えることかでき、上部磁性層6の磁気特性を最良
にすることもできる。また、非磁性絶縁層4の最上層と
なる第4層目の非磁性絶縁層44の厚さ、特に第1層目
の非磁性絶縁層41の磁気ギャップ側の先端部を覆う長
さを変えることにより第1層目の非磁性絶縁層4 の先
端から第4層目の非磁性絶縁層44の先端までの距離り
を任意に変えることができ、磁路長増加分の長さを最小
限にすることができ、磁気特性の劣化を沼くこともない
。The size of each layer of the non-magnetic insulating R layer 4 having such a four-layer structure is determined according to the angle of the slope portion 6b of the uppermost magnetic layer 6 of the thin-film magnetic head 10. Conversely, by appropriately changing the size of each layer, the angle of the inclined portion 6b can be arbitrarily changed, and the magnetic properties of the upper magnetic layer 6 can be optimized. Also, the thickness of the fourth non-magnetic insulating layer 44, which is the top layer of the non-magnetic insulating layer 4, is changed, especially the length that covers the tip of the first non-magnetic insulating layer 41 on the magnetic gap side. By doing this, the distance from the tip of the first non-magnetic insulating layer 4 to the tip of the fourth non-magnetic insulating layer 44 can be changed arbitrarily, and the increase in magnetic path length can be minimized. can be used without causing deterioration of magnetic properties.
このような非磁性絶縁層4の形成法としては、例えばポ
ジ型フォトレジストをスピンコー]・シたのち、所定の
形状に露光現像し、これをハードベーキングする方法等
を採用すれば良い。As a method for forming such a non-magnetic insulating layer 4, for example, a method may be employed in which a positive type photoresist is spin-coated, exposed and developed into a predetermined shape, and then hard-baked.
なお、上記実施例では、4層構造としたもので説明した
が、これに限らず、ざらに多層とする場合はもちろん3
層以上の場合に広く適用できる。In the above embodiment, a four-layer structure has been described, but the structure is not limited to this.
It can be widely applied to cases with more than one layer.
以上、一実施例とともに具体的に説明したようにこの発
明の薄Il!1IF41気ヘッドによれば、複数層の非
磁性絶縁層を下部磁性層側から順次小さくして小面積と
し、最上層の非磁性絶縁層を最下層の非磁性絶縁層より
大きくして各非磁性絶縁層を覆う構成としたので、多層
の非磁性絶縁層の斜面に段差が発生せず、斜面をなだら
かにすることができ、この上に形成する上部磁性層も段
差のないなだらかな形状にでき、磁気特性を向上するこ
とができる。As described above in detail along with one embodiment, the thin Il! According to the 1IF41 magnetic head, multiple non-magnetic insulating layers are made smaller in size from the bottom magnetic layer side to make the area smaller, and the top non-magnetic insulating layer is made larger than the bottom non-magnetic insulating layer to make each non-magnetic insulating layer smaller. Since the structure covers the insulating layer, there are no steps on the slopes of the multilayer non-magnetic insulating layer, and the slopes can be made gentle, and the upper magnetic layer formed thereon can also have a gentle shape with no steps. , magnetic properties can be improved.
また、第1層目の非磁性絶縁層の先端部に積層される非
磁性絶縁層は最上層のものだけであり、上部磁性層と下
部磁性層とで形成される磁路長の増加分が長くなり過ぎ
ることがなく、非磁性絶縁層の積層数に何んら影響され
ることがない。In addition, the nonmagnetic insulating layer laminated at the tip of the first nonmagnetic insulating layer is only the top layer, and the increase in the magnetic path length formed by the upper and lower magnetic layers is It does not become too long and is not affected by the number of laminated nonmagnetic insulating layers.
ざらに、非磁性絶縁層の上層になるに従って小面積とな
る割合を任意に選択しても最上層の非磁性絶縁層で覆う
ので、層間に形成される段差を減らすことができ、非磁
性絶縁層の周囲の傾斜面の傾きを任意に選ぶことで上部
磁性層の傾斜部の角度を変え、磁気特性を向上すること
ができる。Roughly speaking, even if you arbitrarily select a ratio that decreases the area toward the top of the non-magnetic insulating layer, it is covered with the top non-magnetic insulating layer, so the step formed between the layers can be reduced, and the non-magnetic insulating By arbitrarily selecting the slope of the slope around the layer, the angle of the slope of the upper magnetic layer can be changed and the magnetic properties can be improved.
第1図および第2図はこの発明の薄膜磁気ヘッドの一実
施例にかかり、4層構造とした場合の断面図および平面
図、第3図は従来例にかかり、同図(a)は断面図、同
図(b)は非磁性絶縁層の積層状態の平面図、第4図は
従来例の断面図である。
10・・・薄膜磁気ヘッド、1・・・駐板、2・・・下
部磁性層、3・・・磁気ギヤツブ府、4.4.〜44・
・・非磁性絶縁層、5・・・尋体コイル、6・・・上部
磁性層、6a・・・結合部、6b・・・傾斜部。1 and 2 show an embodiment of the thin film magnetic head of the present invention, and are a cross-sectional view and a plan view of a four-layer structure, and FIG. 3 shows a conventional example, and (a) is a cross-sectional view. FIG. 4B is a plan view of the laminated state of the nonmagnetic insulating layers, and FIG. 4 is a sectional view of the conventional example. 10... Thin film magnetic head, 1... Parking plate, 2... Lower magnetic layer, 3... Magnetic gear hub, 4.4. ~44・
. . . Nonmagnetic insulating layer, 5 . . . Body coil, 6 . . .
Claims (1)
ギャップ層と複数層の導体コイルおよびこれらを絶縁保
護する複数層の非磁性絶縁層とを積層してなる薄膜磁気
ヘッドにおいて、各層の導体コイルを絶縁保護する複数
の非磁性絶縁層を上部磁性層に向って隣接層を順次小面
積に形成し、これら非磁性絶縁層を最上層の非磁性絶縁
層で覆うよう積層したことを特徴とする薄膜磁気ヘッド
。In a thin-film magnetic head that is composed of a magnetic gap layer that forms a magnetic gap between the upper and lower magnetic layers, multiple layers of conductor coils, and multiple layers of non-magnetic insulating layers that insulate and protect them, the conductor coils of each layer are insulated. A thin film magnetic film characterized in that a plurality of protective non-magnetic insulating layers are stacked such that adjacent layers are successively formed in small areas toward the upper magnetic layer, and these non-magnetic insulating layers are covered by a top non-magnetic insulating layer. head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8742687A JPS63253513A (en) | 1987-04-09 | 1987-04-09 | Thin-film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8742687A JPS63253513A (en) | 1987-04-09 | 1987-04-09 | Thin-film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63253513A true JPS63253513A (en) | 1988-10-20 |
Family
ID=13914547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8742687A Pending JPS63253513A (en) | 1987-04-09 | 1987-04-09 | Thin-film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63253513A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0376011A (en) * | 1989-08-16 | 1991-04-02 | Nec Corp | Thin-film magnetic head |
JPH03156714A (en) * | 1989-08-23 | 1991-07-04 | Hitachi Ltd | Thin-film magnetic head and production thereof |
JPH0684639A (en) * | 1991-07-04 | 1994-03-25 | Amorphous Denshi Device Kenkyusho:Kk | Thin film magnetic element |
WO2003019537A1 (en) * | 2001-08-27 | 2003-03-06 | Fujitsu Limited | Thin-film magnetic head |
-
1987
- 1987-04-09 JP JP8742687A patent/JPS63253513A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0376011A (en) * | 1989-08-16 | 1991-04-02 | Nec Corp | Thin-film magnetic head |
JPH03156714A (en) * | 1989-08-23 | 1991-07-04 | Hitachi Ltd | Thin-film magnetic head and production thereof |
JPH0684639A (en) * | 1991-07-04 | 1994-03-25 | Amorphous Denshi Device Kenkyusho:Kk | Thin film magnetic element |
JPH0673335B2 (en) * | 1991-07-04 | 1994-09-14 | 株式会社アモルファス・電子デバイス研究所 | Thin film magnetic element |
WO2003019537A1 (en) * | 2001-08-27 | 2003-03-06 | Fujitsu Limited | Thin-film magnetic head |
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