JPS63239893A - Flexible printed wiring - Google Patents
Flexible printed wiringInfo
- Publication number
- JPS63239893A JPS63239893A JP7154487A JP7154487A JPS63239893A JP S63239893 A JPS63239893 A JP S63239893A JP 7154487 A JP7154487 A JP 7154487A JP 7154487 A JP7154487 A JP 7154487A JP S63239893 A JPS63239893 A JP S63239893A
- Authority
- JP
- Japan
- Prior art keywords
- film
- aromatic polyamide
- present
- fpc
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims description 87
- 239000004760 aramid Substances 0.000 claims description 25
- 229920003235 aromatic polyamide Polymers 0.000 claims description 25
- 239000013039 cover film Substances 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 230000035699 permeability Effects 0.000 claims description 8
- 238000000034 method Methods 0.000 description 24
- 229920000642 polymer Polymers 0.000 description 22
- 238000009413 insulation Methods 0.000 description 21
- 239000000853 adhesive Substances 0.000 description 20
- 230000001070 adhesive effect Effects 0.000 description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 16
- 239000011889 copper foil Substances 0.000 description 13
- 229920001721 polyimide Polymers 0.000 description 11
- 239000002184 metal Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 108010025899 gelatin film Proteins 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 230000015271 coagulation Effects 0.000 description 4
- 238000005345 coagulation Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000006386 neutralization reaction Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 229910017053 inorganic salt Inorganic materials 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 2
- MGLZGLAFFOMWPB-UHFFFAOYSA-N 2-chloro-1,4-phenylenediamine Chemical compound NC1=CC=C(N)C(Cl)=C1 MGLZGLAFFOMWPB-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 2
- 239000000920 calcium hydroxide Substances 0.000 description 2
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 2
- 229910052808 lithium carbonate Inorganic materials 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 125000006274 (C1-C3)alkoxy group Chemical group 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- MSWAXXJAPIGEGZ-UHFFFAOYSA-N 2-chlorobenzene-1,4-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C(Cl)=C1 MSWAXXJAPIGEGZ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 238000012695 Interfacial polymerization Methods 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、フレキシブルプリント配線板(以下、FPC
と略す)に関するもの、さらに詳しくは、使用雰囲気の
湿度変化に対して安定な性能を有するFPCに関するも
のである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to flexible printed wiring boards (hereinafter referred to as FPCs).
More specifically, it relates to an FPC that has stable performance against changes in humidity in the atmosphere in which it is used.
[従来の技術]
近年、電気・電子工業分野において機器の小型、軽量化
の要求から、FPCの需要が増大しつつある。このFP
Cの一般的な構成は、基材フィルム片面あるいは両面に
電気回路を形成し、この回路の上にカバーフィルムを積
層するというものである。基材フィルム及びカバーフィ
ルムとしては従来ポリイミドフィルムあるいはポリエス
テルフィルムが多用されており、特にFPCへの部品実
装時に半田浴へこれを一浸漬させるような場合には、耐
熱性の点から、基材フィルムおよびカバーフィルム共に
ポリイミドフィルムを用いたFPCが通常使用されてい
る。[Background Art] In recent years, the demand for FPCs has been increasing due to the demand for smaller and lighter equipment in the electrical and electronic industry fields. This FP
The general structure of C is that an electric circuit is formed on one or both sides of a base film, and a cover film is laminated on top of this circuit. Conventionally, polyimide films or polyester films have often been used as base films and cover films.Especially when immersing them in a solder bath when mounting components on an FPC, base films are often used in terms of heat resistance. An FPC using a polyimide film for both the cover film and the cover film is usually used.
[発明が解決しようとする問題点]
最近、部品の高密度実装あるいはFPC自体の小型化の
ために、FPCの電気回路の高密度化、すなわち配線の
細線化と隣接する配線間の距離の短縮への要求が強い。[Problems to be solved by the invention] Recently, due to high-density mounting of components or miniaturization of FPCs themselves, electrical circuits of FPCs have been increased in density, that is, wiring has become thinner and the distance between adjacent wires has been shortened. There is a strong demand for
しかし一方で、回路の短絡を防止するために配線間の絶
縁抵抗を高く維持する必要がある。線間絶縁抵抗値は回
路の周囲の接着剤あるいはフィルムの絶縁性能によって
決定されるが、これも吸湿した場合には絶縁性能が、大
幅に低下する。特にポリイミドフィルムを使用したFP
Cにおいては、FPCの最外層に位置して外気と接触す
るポリイミドフィルムの水蒸気透過率が非常に大きいた
め、FPC使用雰囲気の湿度が上昇すると接着剤等の含
水率が増加し、線間絶縁抵抗が低下する場合が生じる。However, on the other hand, it is necessary to maintain high insulation resistance between wiring lines to prevent short circuits. The inter-line insulation resistance value is determined by the insulation performance of the adhesive or film surrounding the circuit, and if this also absorbs moisture, the insulation performance will drop significantly. Especially FP using polyimide film
In C, the water vapor permeability of the polyimide film located at the outermost layer of the FPC and in contact with the outside air is extremely high, so when the humidity of the FPC use atmosphere increases, the moisture content of adhesives, etc. increases, and the insulation resistance between lines increases. There may be cases where the value decreases.
したがって、RPCの設計にあたっては線間絶縁抵抗に
余裕を持たせておくために配線間距離を大きくとる必要
があり、回路の高密度化への障害となっていた。Therefore, when designing an RPC, it is necessary to increase the distance between wires in order to provide a margin for the insulation resistance between the wires, which has been an obstacle to increasing the density of the circuit.
また、高電圧で使用される回路においては信頼性という
面でも問題であった。In addition, reliability has also been a problem in circuits used at high voltages.
本発明はかかる問題を解決し、使用雰囲気の湿度変化に
対して、線間絶縁抵抗を安定に保ち得るFPCを提供す
ることを目的とする。An object of the present invention is to solve this problem and provide an FPC that can maintain stable line-to-line insulation resistance against changes in humidity in the atmosphere in which it is used.
[問題点を解決するための手段]
本発明は、基板フィルムの少なくとも片面に形成された
電気回路の上にカバーフィルムが積層された構成のフレ
キシブルプリント配線板において、該フレキシブルプリ
ント配線板の両面の最外層が水蒸気透過率5.0 <g
/rrf’/24hr10.1mm>以下の芳香族ポリ
アミドフィルムであることを特徴とするフレキシブルプ
リント配線板である。[Means for Solving the Problems] The present invention provides a flexible printed wiring board having a structure in which a cover film is laminated on an electric circuit formed on at least one side of a substrate film. The outermost layer has a water vapor transmission rate of 5.0 <g
/rrf'/24hr10.1mm> This is a flexible printed wiring board characterized by being an aromatic polyamide film having the following properties.
本発明における芳香族ポリアミドとは、次式の構成単位
、
を50モル%以上好ましくは70モル%以上含む重合体
からなるものである。ここでAr1 、ArSはハロゲ
ン基、ニトロ基、01〜C3のアルキル基、C1〜C3
のアルコキシ基、p、qは○〜3のアルキル基、C1〜
C3のアルコキシ基、Yは−C−、−CH2−、−0−
、−8O2−を表わし、Zはハロゲン基、ニトロ基、C
1〜C3のアルキル基、C1〜C3のアルコキシ基で、
m。The aromatic polyamide in the present invention is a polymer containing 50 mol% or more, preferably 70 mol% or more of the structural unit of the following formula. Here, Ar1 and ArS are halogen group, nitro group, 01-C3 alkyl group, C1-C3
alkoxy group, p and q are ○~3 alkyl groups, C1~
C3 alkoxy group, Y is -C-, -CH2-, -0-
, -8O2-, Z is a halogen group, a nitro group, C
1 to C3 alkyl group, C1 to C3 alkoxy group,
m.
n、rはO〜3の整数、ユは○または1の(1)または
(2)のいずれかの構1を有するものである。この芳香
族ポリアミドは、酸クロライドとジアミンの反応、ある
いはジイソシアネートとカルボン酸の反応によって得ら
れる。n and r are integers of 0 to 3, and y has the structure 1 of either (1) or (2) of ○ or 1. This aromatic polyamide is obtained by the reaction of acid chloride and diamine or the reaction of diisocyanate and carboxylic acid.
本発明は上記の一般式で示される構成単位を50モル%
以上、好ましくは70モル%以上含むことが必要である
が、この範囲より少ないと本発明の目的を達成するのに
十分な機械特性、耐熱性を得ることができない。また5
0モル%未満、好ましくは30モル%未満の共重合成分
については特に限定されるものではなく、エステル結合
、ウレタン結合、イミド結合、複素環結合などを含有し
ていてもよい。The present invention contains 50 mol% of the structural unit represented by the above general formula.
As mentioned above, it is necessary to preferably contain 70 mol% or more, but if it is less than this range, sufficient mechanical properties and heat resistance cannot be obtained to achieve the object of the present invention. Also 5
The copolymerization component of less than 0 mol %, preferably less than 30 mol %, is not particularly limited, and may contain ester bonds, urethane bonds, imide bonds, heterocyclic bonds, etc.
また本発明の芳香族ポリアミドにはフィルムの物性を損
わない程度に、滑剤、酸化防止剤、熱安定化剤その他の
添加剤が混入されていてもよい。Further, the aromatic polyamide of the present invention may contain lubricants, antioxidants, heat stabilizers, and other additives to the extent that the physical properties of the film are not impaired.
本発明において重要なことは、使用する芳香族ポリアミ
ドフィルムの水蒸気透過率が5.0(g/rr?/ 2
4 hr/ 0 、1 mm>以下、好ましくは2゜0
(g/rrl’/24hr10.1mm)以下、更に
好ましくは1. O(g/rr1′/24hr10.
1mm)以下と、従来F I) Cで使用されてきたポ
リイミドフィルムよりも1〜2桁小さな値であるという
点であり、このような特性を有するフィルムによって初
めて、使用雰囲気の湿度上昇に対する吸湿速度が抑えら
れ、回路に接する部分の含水率を長期間低く維持できる
こととなり、湿度変動に対して安定した線間絶縁性能を
有するFPCが得られることとなった。What is important in the present invention is that the aromatic polyamide film used has a water vapor permeability of 5.0 (g/rr?/2
4 hr/0, 1 mm> or less, preferably 2°0
(g/rrl'/24hr10.1mm) or less, more preferably 1. O(g/rr1'/24hr10.
1mm) or less, which is one to two orders of magnitude smaller than the polyimide film conventionally used in FI).For the first time, a film with such characteristics can reduce the moisture absorption rate as the humidity of the operating atmosphere increases. As a result, the moisture content of the portion in contact with the circuit can be maintained low for a long period of time, and an FPC with stable line-to-line insulation performance against humidity fluctuations can be obtained.
水蒸気透過率の低い芳香族ポリアミドフィルムを得るに
は、ポリマ中の芳香核に存するハロゲン基、ニトロ基、
01〜C3のアルキル基、C1〜C3のアルコキシ基等
の置換基の数の多いポリマを選択することによっても可
能であり、本発明の芳香族ポリアミドフィルムにおいて
は、ポリマ中の前述の置換基とアミド結合の割合(置換
基数/アミド結合数)で表現すれば、0.2以上である
ことが好ましく、0.4以上であれば更に好ましい。In order to obtain an aromatic polyamide film with low water vapor permeability, halogen groups, nitro groups present in the aromatic nucleus in the polymer,
This is also possible by selecting a polymer with a large number of substituents such as 01 to C3 alkyl groups and C1 to C3 alkoxy groups. When expressed as the ratio of amide bonds (number of substituents/number of amide bonds), it is preferably 0.2 or more, and more preferably 0.4 or more.
本発明のフィルムの吸湿率は、3.0%以下が好ましく
2.5%以下が更に好ましい。吸湿率が高い場合、フィ
ルムと接する接着剤の含水率も高くなって絶縁性能が低
下するからであり、フィルムにメッキ、蒸着等によって
直接金属が積層されている場合にはフィルムの吸湿率が
低いことはより重要である。The moisture absorption rate of the film of the present invention is preferably 3.0% or less, and more preferably 2.5% or less. This is because if the moisture absorption rate is high, the moisture content of the adhesive that comes into contact with the film will also be high, reducing the insulation performance.If the film is directly laminated with metal by plating, vapor deposition, etc., the moisture absorption rate of the film will be low. That is more important.
本発明の芳香族ポリアミドフィルムの熱膨張係数は、1
.OXI○−5以上4.0XIO−5(1/’C)以下
であることが好ましく、更に好ましくは1.5X10−
’以上3、OX 10−” < 1/’C)である。こ
れは、金属箔特に銅箔と接着剤を用いて貼り合せ、更に
接着剤を熱硬化させるような場合には、銅とフィルムの
f!!:11張が異なると常温に戻した際にカールする
からであり、またFPCを製造してこれに部品を実装す
る際においてハンダ浴に浸漬するような場合にも同様の
問題が生じる。The thermal expansion coefficient of the aromatic polyamide film of the present invention is 1
.. OXI○-5 or more and 4.0XIO-5 (1/'C) or less, more preferably 1.5X10-
3, OX 10-"<1/'C). This means that when bonding a metal foil, especially a copper foil, with an adhesive, and then heat-curing the adhesive, the bond between the copper and the film is f!!: 11 This is because if the tension is different, it will curl when returned to room temperature, and a similar problem will occur when immersing it in a solder bath when manufacturing an FPC and mounting components on it. arise.
また本発明の芳香族ポリアミドフィルムの寸法変化率は
、250°Cにおいて2.0%以下が好ましく、更に好
ましくは1.5%以下である。これは、ハンダ浴の温度
が通常250〜260℃であるため、FPCをハンダ浴
に浸漬する場合にはフィルムの寸法変化率が大きいとF
PCにしわを生じるためである。Further, the dimensional change rate of the aromatic polyamide film of the present invention is preferably 2.0% or less, more preferably 1.5% or less at 250°C. This is because the temperature of the solder bath is usually 250 to 260°C, so when the FPC is immersed in the solder bath, the dimensional change rate of the film is large.
This is because it causes wrinkles on the PC.
しかし、FPCの製造工程あるいはその使用時において
フィルムに対して上記のような加熱が行なわれないよう
な場合においては、上記の熱膨張係数、寸法変化率の範
囲を満たず必要はない。However, in cases where the film is not heated as described above during the FPC manufacturing process or during its use, the above-mentioned ranges of thermal expansion coefficient and dimensional change rate are not satisfied and there is no need.
次に本発明のFPCの製造方法について説明する。Next, a method for manufacturing an FPC according to the present invention will be explained.
本発明の芳香族ポリアミドフィルムは有機溶媒中に芳香
族ポリアミド樹脂を溶解さぜなポリマ溶液から、溶液製
脱法によって成形する。The aromatic polyamide film of the present invention is formed from a polymer solution in which an aromatic polyamide resin is dissolved in an organic solvent by a solution molding method.
ポリマの重合は、N−メチルピロリドン、ジメチルアセ
トアミド、ジメチルホルムアミド、テトラメチル尿素な
どの有機溶媒中にモノマを添加して行なう溶液重合法、
あるいは水系媒体を使用する界面重合法などによって行
なわれ、ポリマの構成単位によっては硫酸中で重合され
る場合もある。Polymerization is carried out by solution polymerization, in which a monomer is added to an organic solvent such as N-methylpyrrolidone, dimethylacetamide, dimethylformamide, or tetramethylurea;
Alternatively, it may be carried out by an interfacial polymerization method using an aqueous medium, and depending on the constituent units of the polymer, it may be polymerized in sulfuric acid.
フィルムを製膜する場合には重合後のポリマ溶液をその
まま使用する場合と、ポリマを水中などで一旦再沈させ
て単離し、乾燥後再度有機溶媒に溶解させて製膜に使用
する場合がある。When forming a film, there are cases where the polymer solution after polymerization is used as is, and cases where the polymer is once reprecipitated in water etc. to isolate it, and after drying, it is dissolved again in an organic solvent and used for film formation. .
重合後のポリマ溶液から直接製膜する場合において、モ
ノマとして酸クロライドとジアミンを使用する時には、
重合時に副生ずる塩化水素を中和する必要があり、中和
剤としては水酸化カルシウム、水酸化リチウム、炭酸カ
ルシウム、炭酸リチウム、などの無機塩基あるいはそれ
らの水和物や、アンモニア、ジェタノールアミンなどの
有機塩基を用いる。When forming a film directly from a polymer solution after polymerization, when using acid chloride and diamine as monomers,
It is necessary to neutralize hydrogen chloride produced as a by-product during polymerization, and neutralizing agents include inorganic bases such as calcium hydroxide, lithium hydroxide, calcium carbonate, and lithium carbonate, or their hydrates, ammonia, and jetanolamine. Use an organic base such as
中和時に無機塩基などを用いた場合には、塩化カルシウ
ム、塩化リチウムなどが生成するが、これらの無機塩は
ポリマの溶解助剤としての効果を持ち、同様の理由から
、前述のポリマを溶媒に再溶解する場合にも、これらの
無機塩を添加することもある。When an inorganic base is used during neutralization, calcium chloride, lithium chloride, etc. are produced, but these inorganic salts have the effect of dissolving the polymer, and for the same reason, the above-mentioned polymer cannot be used as a solvent. These inorganic salts may also be added when redissolving in the solution.
以上のように調製したポリマ溶液から、乾式、湿式、乾
湿式法などの方法によってフィルムは成形される。A film is formed from the polymer solution prepared as described above by a method such as a dry method, a wet method, or a dry-wet method.
乾式法は、ドラム、エンドレスベルト等の上にポリマ溶
液を流延し、熱風加熱などによって溶媒を蒸発させてフ
ィルムを得る方法である。但し、ポリマ溶液中に無機塩
が含有されている場合には、無機塩がフィルム中に残存
してフィルムの機械的物性等を低下させるため、この方
法は好ましくない。The dry method is a method in which a polymer solution is cast onto a drum, endless belt, etc., and the solvent is evaporated by heating with hot air to obtain a film. However, if the polymer solution contains an inorganic salt, this method is not preferred because the inorganic salt remains in the film and deteriorates the mechanical properties of the film.
湿式法では、ポリマ溶液を直接凝固洛中に押し出したり
、一旦ドラム等の支持体上に流延した後に支持体ごと凝
固浴中へ導入する方法であり、凝固洛中で有機溶媒や無
機塩の抽出が行なわれ、水を含有するゲルフィルムが成
形される。ゲルフィルムは次に浴から取り出されて乾燥
が行なわれ、最終フィルムとなる。ここで凝固浴は一般
に水系媒体からなり、有機溶媒や無機塩等を混合してお
く場合もある。In the wet method, the polymer solution is directly extruded into a coagulation bath, or the polymer solution is once cast onto a support such as a drum and then introduced together with the support into a coagulation bath, and organic solvents and inorganic salts are extracted in the coagulation bath. A water-containing gel film is formed. The gel film is then removed from the bath and dried to form the final film. Here, the coagulation bath generally consists of an aqueous medium, and may be mixed with an organic solvent, an inorganic salt, etc.
乾湿式法では、乾式法と同様にポリマ溶液を一旦支持体
上で乾燥してゲルフィルムを成形し、次にこれを水を主
体とする洛中に浸漬して湿式法と同様に溶媒、無機塩の
抽出を行ない、更に水分の乾燥を行なってフィルムを製
膜する方法である。In the dry-wet method, similar to the dry method, the polymer solution is once dried on a support to form a gel film, and then this is immersed in a solution mainly composed of water, and the same as in the wet method, the polymer solution is dried on a support and a gel film is formed. In this method, a film is formed by extracting the water and then drying the water.
これらいずれの方法においても、その製膜工程中におい
ては、IrPC用のフィルムとして十分な物性を発現さ
せるために、延伸、熱処理の処理を行なう必要がある。In any of these methods, it is necessary to perform stretching and heat treatment during the film forming process in order to develop sufficient physical properties as a film for IrPC.
具体的には、延伸は面倍率で0.9〜9倍(面倍率とは
延伸後のフィルム面積を延伸前の面積で除した値であり
、ここで1未満は収縮を意味する)、熱処理は200〜
400℃、好ましくは250〜350℃で、0.1〜1
0分間であり、これらの延伸、熱処理条件を、ポリマの
構成単位に応じて設定することによって所定の物性をフ
ィルムに与えることができる。Specifically, stretching is performed at an areal magnification of 0.9 to 9 times (area magnification is the value obtained by dividing the film area after stretching by the area before stretching, where less than 1 means shrinkage), and heat treatment. is 200~
At 400°C, preferably 250-350°C, 0.1-1
By setting these stretching and heat treatment conditions according to the constituent units of the polymer, predetermined physical properties can be imparted to the film.
このようにして得られた芳香族ポリアミドフィルムを基
板フィルムあるいはカバーフィルムとして用いてFPC
を製造するには、従来のポリイミドフィルムを使用する
場合の方法によればよい。The aromatic polyamide film obtained in this way is used as a substrate film or cover film for FPC.
can be produced by a conventional method using a polyimide film.
まず基板フィルムの片面あるいは両面に導体を積層する
のであるが、導体としての金属箔、特に銅の積層方法と
しては電解銅箔あるいは圧延銅箔を耐熱性の優れた接着
剤で貼り合わせるか、あるいはメッキ法、蒸着法によっ
てフィルム表面に金属を析出させる方法などがあるが、
いずれの方法を適用してもよい。但し、本発明の芳香族
ポリアミドフィルムの特性から注意すべき点もあり、例
えば、接着剤を使用して銅箔とフィルムを貼り合わせる
場合には接着剤の遇択および接着方法に注意が必要であ
る。接着剤としてはF P Cとしての性能を満たすよ
うな耐熱性、耐薬品性、電気特性を有していることが必
要であり、エポキシ/ポリアミド系、エポキシ/ポリエ
ステル系、変性エポキシ系、アクリル系などが好適な例
である。一方、加熱時に気体が発生するウレタン系など
の接着剤は、本発明の芳香族ポリアミドフィルムの気体
透過率が低いなめに、銅箔とフィルム間に気泡が形成さ
れ好ましくない。同様の理由から銅箔の貼り合わせの際
には、フィルムあるいは銅箔に予めコーティングした接
着剤中の残存溶媒を十分に、乾燥しておく必要がある。First, a conductor is laminated on one or both sides of the substrate film, and the method for laminating metal foil, especially copper, as a conductor is to bond electrolytic copper foil or rolled copper foil with a heat-resistant adhesive, or There are methods such as plating and vapor deposition to deposit metal on the film surface.
Either method may be applied. However, there are some points to be careful of due to the characteristics of the aromatic polyamide film of the present invention. For example, when bonding copper foil and film using an adhesive, care must be taken in selecting the adhesive and the bonding method. be. The adhesive must have heat resistance, chemical resistance, and electrical properties that satisfy the performance as an FPC, and adhesives such as epoxy/polyamide, epoxy/polyester, modified epoxy, and acrylic are used. etc. are suitable examples. On the other hand, urethane-based adhesives that generate gas when heated are not preferred because air bubbles are formed between the copper foil and the film because the aromatic polyamide film of the present invention has a low gas permeability. For the same reason, when bonding copper foil, it is necessary to sufficiently dry the remaining solvent in the adhesive coated on the film or copper foil in advance.
以上のように基板フィルムにfi層された金属箔を目的
とするパターンにエツチングを行なって回路を形成し、
電気回路が多層である場合にはスルーホール加工等を行
ない、この回路の上にカバーフィルムを耐熱性接着剤等
によって積層し、更に穴あけ、打抜き等を行なって所定
の形状に成形して最終のFPCが得られる。As described above, the metal foil layered on the substrate film is etched into the desired pattern to form a circuit.
If the electrical circuit is multi-layered, through-hole processing is performed, a cover film is laminated on top of the circuit using a heat-resistant adhesive, etc., and the final shape is formed by drilling, punching, etc. FPC is obtained.
本発明の芳香族ポリアミドフィルムは、ポリマ中に含ま
れるアミド結合の極性が強いため、接着剤との親和性が
良好であるため表面処理を施していないフィルムであっ
ても、金属箔と十分な強度で接着することができる。こ
れは従来ポリイミドフィルム等では接着力を上げるため
に通常サンドブラスト等の加工を行なう必要があったこ
とと比較すると非常に大きな利点である。また本発明の
芳香族ポリアミドフィルムをコロナ処理、グロー放電処
理等の表面処理あるいはアンカーコーティングを行なう
と、更に大きな接着強度を接着剤での接着、メッキ、蒸
着等によって積層された金属との間に与えることができ
る。The aromatic polyamide film of the present invention has a strong affinity with adhesives due to the strong polarity of the amide bonds contained in the polymer, so even if the film is not surface-treated, it will be able to bond well with metal foil. Can be bonded with strength. This is a very large advantage compared to conventional polyimide films, which usually require processing such as sandblasting to increase adhesive strength. Furthermore, when the aromatic polyamide film of the present invention is subjected to surface treatment such as corona treatment or glow discharge treatment, or anchor coating, even greater adhesive strength can be achieved between the aromatic polyamide film and metal laminated by adhesive bonding, plating, vapor deposition, etc. can give.
本発明のFPCにおいては、湿度変化に対して安定化す
るという目的から明らかなように、外気と直接に接触す
るFPCの最外層に特定の芳香族ポリアミドフィルムを
用いるから、上記のFPC製造工程においては、例えば
基板フィルムの片面に回路を形成しカバーフィルムを積
層する場合には基板フィルムとカバーフィルム両方共に
本発明の芳香族ポリアミドフィルムを使用するが、基板
フィルムに他のフィルムを使用した場合でもその外側に
本発明の芳香族ポリアミドフィルムを更に積層すればよ
く、また基板フィルムの両面に回路を形成しその両方の
上にカバーフィルムを積層する場合には、2つのカバー
フィルムが本発明の芳香族ポリアミドフィルムであれば
基板フィルムが他のフィルムであってもよい。更に電気
回路が3層以上積層して形成されているようなRPCに
おいても同様に最外層の2面に本発明の芳香族ポリアミ
ドフィルムが積層されていればよい。In the FPC of the present invention, a specific aromatic polyamide film is used for the outermost layer of the FPC that comes into direct contact with the outside air, as is clear from the purpose of stabilizing against humidity changes. For example, when forming a circuit on one side of a substrate film and laminating a cover film, the aromatic polyamide film of the present invention is used for both the substrate film and the cover film, but even if another film is used for the substrate film. The aromatic polyamide film of the present invention may be further laminated on the outside thereof, and when circuits are formed on both sides of the substrate film and cover films are laminated on both sides, the two cover films may be laminated with the aromatic polyamide film of the present invention. The substrate film may be any other film as long as it is a group polyamide film. Furthermore, even in an RPC in which an electric circuit is formed by laminating three or more layers, the aromatic polyamide film of the present invention may be similarly laminated on two surfaces of the outermost layer.
[特性の測定方法] 本発明の特性値は次の測定法による。[Method of measuring characteristics] The characteristic values of the present invention are determined by the following measurement method.
(1)水蒸気透過率
Honeywe l 1社製の高速度水分透過率測定器
く型式:W825)あるいはJIS Z−0208の
方法によって測定した。(1) Water vapor permeability The water vapor permeability was measured using a high-speed water permeability measuring instrument manufactured by Honeywell (Model: W825) or the method of JIS Z-0208.
(2) 熱膨張係数
熱収縮や吸脱湿の影響を除くなめ、フィルムを一旦15
0℃まで加熱し徐々に冷却して行った時の80℃〜15
0℃の頭載における寸法変化から計算した。寸法変化量
は熱機械分析計(TMA)によって測定した。(2) After removing the effects of thermal expansion coefficient thermal contraction and moisture absorption and desorption, the film was
80℃~15 when heated to 0℃ and gradually cooled
It was calculated from the dimensional change at 0°C when loaded on the head. The amount of dimensional change was measured using a thermomechanical analyzer (TMA).
(3)寸法変化率
フィルムを幅10mm、長さ250mmに切り、両端か
ら25mmの位置に印を付けて紙長20ommの試験片
を作成し、これを250°C雰囲気下で10分間加熱し
、放冷後の長さを測定して寸法変化率を次式によって算
出した。(3) Dimensional change rate Cut the film to 10 mm wide and 250 mm long, mark 25 mm from both ends to create a 20 mm paper test piece, heat this in an atmosphere of 250 ° C for 10 minutes, The length after cooling was measured and the dimensional change rate was calculated using the following formula.
寸法変化率(%)=
l t 7 (mm −■熱′の−さくmm) l X
100試長
(4)線間絶縁抵抗
JPCA(日本プリント回路工業会)規格FC01の絶
縁抵抗の測定法により、カバーフィルムのないサンプル
と、カバーフィルムのあるサンプルについて抵抗値を測
定した。Dimensional change rate (%) = l t 7 (mm - ■heat' - mm) l X
100 test length (4) Line-to-line insulation resistance The resistance values were measured for a sample without a cover film and a sample with a cover film using the insulation resistance measurement method of JPCA (Japan Printed Circuit Industry Association) standard FC01.
(5) 吸湿率
25℃、75%RHで96時間調湿したフィルムを絶乾
状態にし、前後の重量変化から吸湿率をポリマに対する
重量%として計算しな。(5) Moisture Absorption Rate A film that has been conditioned for 96 hours at 25° C. and 75% RH is brought to an absolutely dry state, and the moisture absorption rate is calculated as a weight % based on the weight of the polymer from the weight change before and after.
(6)強度、伸度
ASTM−D−882によるテンシロン型引張試験機に
幅10mm、紙長50mmとなるようにセットし、引張
速度300 mm7分で引張り、フィルムが破断する時
の強度、伸度を測定した。(6) Strength and elongation A sheet of paper with a width of 10 mm and a length of 50 mm was set in a Tensilon type tensile testing machine according to ASTM-D-882, and the film was pulled at a tensile speed of 300 mm for 7 minutes.The strength and elongation when the film broke. was measured.
[実施例] 本発明を実施例に基づいて説明する。[Example] The present invention will be explained based on examples.
実施例 I
N−メチル−2−ピロリドン(以下NMPと略す)15
0flに2−クロル−p−フェニレンジアミン4.99
k(Jと4,4°−ジアミノジフェニルスルホン3.7
2k(]とを溶解させ、この中にテレフタル酸クロライ
ド10.15k(]を添加し、2時間撹拌して重合を完
了した後、水酸化カルシウム3゜71kgを添加、撹拌
して中和を行ない、透明な芳香族ポリアミド溶液を得た
。このポリマ溶液を金属製ドラムに流延し、150℃の
雰囲気で約10分間乾燥した後、自己保持性を得たゲル
フィルムを連続的に剥離し、次に水槽内に導入して水中
に浸漬しながらフィルム長手方向に1.13倍延伸した
。更にフィルムをテンター内へ導入し、350℃で幅方
向に1.20倍延伸しながら約3分間加熱し、厚さ16
μのフィルムを得た。Example I N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP) 15
2-chloro-p-phenylenediamine 4.99 to 0fl
k (J and 4,4°-diaminodiphenylsulfone 3.7
2k () and terephthalic acid chloride (10.15k) were added thereto, and after stirring for 2 hours to complete polymerization, 3.71 kg of calcium hydroxide was added and stirred for neutralization. , a transparent aromatic polyamide solution was obtained. This polymer solution was cast onto a metal drum, dried in an atmosphere of 150°C for about 10 minutes, and the gel film that had achieved self-retention was continuously peeled off. Next, the film was introduced into a water tank and stretched 1.13 times in the longitudinal direction while immersed in water.The film was then introduced into a tenter and heated at 350°C for about 3 minutes while being stretched 1.20 times in the width direction. and thickness 16
A film of μ was obtained.
このフィルムを基板フィルムとして接着剤を乾燥後の塗
布厚さが15〜20μとなるように塗布し70°Cで3
分間乾燥した後、35μの電解銅箔を100℃で加熱圧
着しな。次に熱風オーブン中で140℃で3時間硬化を
行なって銅貼り板を得た。接着剤は、“バイロン200
” (ポリエステル樹脂)[東洋紡■製]100部と“
エピコート871” (エポキシ樹脂)[シェル化学■
製1100部をメチルエチルケトン500部に溶解し、
更に無水フタル酸(硬化剤)を15部加えて調製した。Using this film as a substrate film, apply adhesive to a coating thickness of 15 to 20 μm after drying and heat at 70°C for 30 minutes.
After drying for a minute, heat and press a 35μ electrolytic copper foil at 100°C. Next, curing was performed at 140° C. for 3 hours in a hot air oven to obtain a copper-clad board. The adhesive is “Byron 200”
” (polyester resin) [manufactured by Toyobo ■] 100 copies and “
Epicoat 871” (epoxy resin) [Shell Chemical ■
1,100 parts of the product was dissolved in 500 parts of methyl ethyl ketone,
Further, 15 parts of phthalic anhydride (hardening agent) was added to prepare the product.
銅貼り板の特性を第1表に示す。Table 1 shows the properties of the copper-clad board.
上記銅貼り板の銅箔層をエツチングして線間絶縁抵抗測
定用のパターンを形成したサンプルを作成した。また、
これと同様の電気回路を形成した後、この回路の上に上
述の基板フィルムと銅箔の貼り合せと同じフィルム、接
着剤、接着条件でカバーフィルムを積層したサンプルを
作成した。A sample was prepared by etching the copper foil layer of the above-mentioned copper-clad plate to form a pattern for measuring inter-line insulation resistance. Also,
After forming an electric circuit similar to this, a sample was created in which a cover film was laminated on top of this circuit using the same film, adhesive, and bonding conditions as those for bonding the substrate film and copper foil described above.
この2つのサンプルを25°C150%RH下で240
時間調湿した後、線間絶縁抵抗を測定し、更に同サンプ
ルを40℃、90%RH下に移して、線間絶縁抵抗の経
時変化を測定した。その結果を第1表に示す。These two samples were heated at 25°C and 150%RH for 240°C.
After conditioning the humidity for a period of time, the line-to-line insulation resistance was measured, and the sample was then moved to 40° C. and 90% RH to measure the change in the line-to-line insulation resistance over time. The results are shown in Table 1.
実施例 2
NMP150αに2−クロル−p−フェニレンジアミン
5.70k(Jと4,4゛−ジアミノジフェニルエーテ
ル2.0Ok(lを溶解させ、この中に2−タロルーテ
レフタル酸クロライド11.89kqを添加し、2時間
撹拌して重合を完了した後、炭酸カルシウム5.01k
gを添加、撹拌して中和を行ない芳香族ポリアミド溶液
を得た。このポリマ溶液を用いて実施例1と同様にして
厚さ16μのフィルムを作成した。但し延伸は長手方向
に1.05倍、幅方向に1.1倍、テンタ一温度は32
0°Cである。Example 2 5.70 kq (J) of 2-chloro-p-phenylenediamine and 2.0 kq (l) 4,4'-diaminodiphenyl ether were dissolved in NMP 150α, and 11.89 kq 2-taloroot terephthalic acid chloride was added thereto. After stirring for 2 hours to complete polymerization, 5.01k of calcium carbonate was added.
g was added and stirred for neutralization to obtain an aromatic polyamide solution. Using this polymer solution, a film with a thickness of 16 μm was prepared in the same manner as in Example 1. However, the stretching is 1.05 times in the longitudinal direction, 1.1 times in the width direction, and the tenter temperature is 32
It is 0°C.
このフィルムを基板フィルムおよびカバーフィルムとし
て使用し、実施例1と同様に銅箔と貼り合わせ、線間絶
縁抵抗測定用サンプルの作成を行ない実施例1と同様の
測定を行なった結果を第1表に示す。This film was used as a substrate film and a cover film, and was laminated with copper foil in the same manner as in Example 1 to prepare a sample for measuring inter-line insulation resistance. Table 1 shows the results of the same measurements as in Example 1. Shown below.
実施例 3
ジメチルアセトアミド300ccに4,4°−ジアミノ
ジフェニルメタン198gを溶解させ、この中に2−ク
ロル−テレフタル酸〉ロライド102gとテレフタル酸
クロライド119gを添加して重合を行なった後、炭酸
リチウム73.9gで中和を行ない芳香族ポリアミド溶
液を得た。これをガラス板上に流延して150℃で5分
間乾燥した後フィルムを剥離し、これを金属製の枠に固
定して水洗を行なった。Example 3 198 g of 4,4°-diaminodiphenylmethane was dissolved in 300 cc of dimethylacetamide, 102 g of 2-chloro-terephthalic acid chloride and 119 g of terephthalic acid chloride were added thereto for polymerization, and then 73.0 g of lithium carbonate was added. Neutralization was performed with 9 g to obtain an aromatic polyamide solution. This was cast onto a glass plate and dried at 150°C for 5 minutes, then the film was peeled off, fixed on a metal frame, and washed with water.
次に340℃で5分間加熱、乾燥を行ない、厚さ16μ
のフィルムを得た。Next, heat it at 340℃ for 5 minutes and dry it to a thickness of 16μ.
obtained the film.
このフィルムを基板フィルムおよびカバーフィルムとし
て使用して、実施例1と同様に線間絶縁抵抗測定用サン
プルを作成し、測定を行なった結果を第1表に示す。Using this film as a substrate film and a cover film, a sample for measuring inter-line insulation resistance was prepared in the same manner as in Example 1, and the measurement results are shown in Table 1.
比較例 1
ポリイミドフィルム(DuPont社製、商品名“カプ
トン”、厚さ25μ、接着面はサンドブラスト処理済み
)を基板フィルムおよびカバーフィルムとして使用し、
実施例1と同様に銅箔とのラミネート、線間絶縁抵抗測
定用のカバーフィルム無しサンプルおよびカバーフィル
ム付きサンプルの作成を行ない、実施例1と同様の測定
を行なった結果を第1表に示す。Comparative Example 1 Polyimide film (manufactured by DuPont, trade name "Kapton", thickness 25μ, adhesive surface sandblasted) was used as a substrate film and a cover film,
In the same manner as in Example 1, lamination with copper foil was carried out, and a sample without a cover film and a sample with a cover film for measuring the insulation resistance between lines were prepared, and the same measurements as in Example 1 were carried out. The results are shown in Table 1. .
比較例 2
実施例1で作成したフィルムに銅箔をラミネートした銅
貼り板を用いて、線間絶縁抵抗測定用の電気回路を形成
し、この上に比較例1のポリイミドフィルムをカバーフ
ィルムとして積層してサンプルを作成し、実施例1と同
様の線間絶縁抵抗の経時変化を測定した。その結果を第
1表に示す。Comparative Example 2 An electric circuit for measuring inter-line insulation resistance was formed using a copper clad plate in which copper foil was laminated onto the film prepared in Example 1, and the polyimide film of Comparative Example 1 was laminated on top of this as a cover film. A sample was prepared using the same method as in Example 1, and the change in inter-line insulation resistance over time was measured in the same manner as in Example 1. The results are shown in Table 1.
第1表に示したように、例えばRPCの雰囲気が、25
℃、50%RHから40℃、90%RHへというように
高温高温条件への変化した場合、ポリイミドフィルムを
使用した比較例ではほぼ30分間程度で線間絶縁抵抗値
が低下してしまうのに対して、本発明のFPCではフィ
ルム厚さが16μとポリイミドフィルムの25μより薄
いにも係わらず、100時間経過後でもなお高い抵抗値
を維持している。これより本発明のFPCが湿度変動に
対して非常に安定していることがわがる。As shown in Table 1, for example, the atmosphere of RPC is 25
When the high temperature conditions change from ℃ and 50% RH to 40℃ and 90% RH, the inter-line insulation resistance value decreases in about 30 minutes in the comparative example using polyimide film. On the other hand, although the FPC of the present invention has a film thickness of 16 μm, which is thinner than the 25 μm of the polyimide film, it still maintains a high resistance value even after 100 hours have elapsed. This shows that the FPC of the present invention is extremely stable against humidity fluctuations.
[発明の効果]
本発明にかかるFPCは、使用雰囲気の湿度変化に対し
て、線間絶縁抵抗を安定に保ち得るという効果を有する
。[Effects of the Invention] The FPC according to the present invention has the effect of being able to maintain stable line-to-line insulation resistance against changes in humidity in the atmosphere in which it is used.
また本発明のRPCは、RPCに要求される種々の特性
、例えばハンダ耐熱性、可撓性、耐薬品性、電気特性な
ど多くの面で優れた特性を発揮し、−mの電子機器の配
線材として用いることができるが、特に高温条件に曝さ
れる場合や、高電圧が印加される場合あるいは小型化の
ために高密度の配線が必要な場合に適している。In addition, the RPC of the present invention exhibits excellent properties in many aspects required for RPC, such as solder heat resistance, flexibility, chemical resistance, and electrical properties, and is suitable for wiring of -m electronic devices. Although it can be used as a material, it is particularly suitable when exposed to high temperature conditions, when high voltage is applied, or when high-density wiring is required for miniaturization.
Claims (1)
の上にカバーフィルムが積層されたフレキシブルプリン
ト配線板において、該フレキシブルプリント配線板の両
面の最外層が水蒸気透過率5.0(g/m^2/24h
r/0.1mm)以下の芳香族ポリアミドフィルムであ
ることを特徴とするフレキシブルプリント配線板。In a flexible printed wiring board in which a cover film is laminated on an electric circuit formed on at least one side of a substrate film, the outermost layer on both sides of the flexible printed wiring board has a water vapor permeability of 5.0 (g/m^2/ 24 hours
1. A flexible printed wiring board characterized by being an aromatic polyamide film having a thickness of r/0.1 mm or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62071544A JPH0682896B2 (en) | 1987-03-27 | 1987-03-27 | Flexible printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62071544A JPH0682896B2 (en) | 1987-03-27 | 1987-03-27 | Flexible printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63239893A true JPS63239893A (en) | 1988-10-05 |
JPH0682896B2 JPH0682896B2 (en) | 1994-10-19 |
Family
ID=13463786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62071544A Expired - Lifetime JPH0682896B2 (en) | 1987-03-27 | 1987-03-27 | Flexible printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0682896B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014065162A (en) * | 2012-09-25 | 2014-04-17 | Dainippon Printing Co Ltd | Thermal transfer sheet |
US9893242B2 (en) | 2015-09-30 | 2018-02-13 | Nichia Corporation | Light emitting device |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52112766A (en) * | 1976-03-06 | 1977-09-21 | Toray Industries | Flexible printed circuit board |
JPS5696253A (en) * | 1979-12-28 | 1981-08-04 | Canon Inc | Surface potentiometer |
JPS56136826A (en) * | 1980-03-17 | 1981-10-26 | Du Pont | Aromatic polyamide film and method thereof |
JPS56155762A (en) * | 1980-05-07 | 1981-12-02 | Japan Styrene Paper Corp | Laminated sheet |
JPS58108788A (en) * | 1981-12-23 | 1983-06-28 | 東芝ケミカル株式会社 | Method of coating flexible circuit board |
JPS5945124A (en) * | 1982-09-08 | 1984-03-13 | Toray Ind Inc | Aromatic polyamide film |
JPS61236825A (en) * | 1985-04-15 | 1986-10-22 | Toray Ind Inc | Aromatic polyamide film |
-
1987
- 1987-03-27 JP JP62071544A patent/JPH0682896B2/en not_active Expired - Lifetime
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52112766A (en) * | 1976-03-06 | 1977-09-21 | Toray Industries | Flexible printed circuit board |
JPS5696253A (en) * | 1979-12-28 | 1981-08-04 | Canon Inc | Surface potentiometer |
JPS56136826A (en) * | 1980-03-17 | 1981-10-26 | Du Pont | Aromatic polyamide film and method thereof |
JPS56155762A (en) * | 1980-05-07 | 1981-12-02 | Japan Styrene Paper Corp | Laminated sheet |
JPS58108788A (en) * | 1981-12-23 | 1983-06-28 | 東芝ケミカル株式会社 | Method of coating flexible circuit board |
JPS5945124A (en) * | 1982-09-08 | 1984-03-13 | Toray Ind Inc | Aromatic polyamide film |
JPS61236825A (en) * | 1985-04-15 | 1986-10-22 | Toray Ind Inc | Aromatic polyamide film |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014065162A (en) * | 2012-09-25 | 2014-04-17 | Dainippon Printing Co Ltd | Thermal transfer sheet |
US9893242B2 (en) | 2015-09-30 | 2018-02-13 | Nichia Corporation | Light emitting device |
Also Published As
Publication number | Publication date |
---|---|
JPH0682896B2 (en) | 1994-10-19 |
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